• Title/Summary/Keyword: Plasma spectroscopy

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Measurement of excited Xe atoms density in accordance with various barrier ribs in AC-PDP by laser absorption spectroscopy

  • Jeong, Se-Hoon;Oh, P.Y.;Hong, Y.J.;Lee, S.B.;Moon, M.W.;Song, K.B.;Lee, H.J.;Yoo, N.L.;Son, C.G.;Han, Y.G.;Jeong, S.J.;Kim, J.H.;Park, E.Y.;Choi, Eun-Ha
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.949-952
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    • 2006
  • We have measured the excited Xe atoms density in the $1s_5$ metastable states by laser absorption spectroscopy in accordance with various barrier ribs. In this experiment, the average density of one cell in the panel with stripe barrier rib has been measured to be $1.8{\times}10^{12}cm^{-3}$. The panel with close type barrier rib has been measured to be $5.1{\times}10^{12}cm^{-3}$.

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Amine functionalized plasma polymerized PEG film: Elimination of non-specific binding for biosensing

  • Park, Jisoo;Kim, Youngmi;Jung, Donggeun;Kim, Young-Pil;Lee, Tae Geol
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.378.2-378.2
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    • 2016
  • Biosensors currently suffer from severe non-specific adsorption of proteins, which causes false positive errors in detection through overestimation of the affinity value. Overcoming this technical issue motivates our research. Polyethylene glycol (PEG) is well known for its ability to reduce the adsorption of biomolecules; hence, it is widely used in various areas of medicine and other biological fields. Likewise, amine functionalized surfaces are widely used for biochemical analysis, drug delivery, medical diagnostics and high throughput screening such as biochips. As a result, many coating techniques have been introduced, one of which is plasma polymerization - a powerful coating method due to its uniformity, homogeneity, mechanical and chemical stability, and excellent adhesion to any substrate. In our previous works, we successfully fabricated plasmapolymerized PEG (PP-PEG) films [1] and amine functionalized films [2] using the plasma enhanced chemical vapor deposition (PECVD) technique. In this research, an amine functionalized PP-PEG film was fabricated by using the plasma co-polymerization technique with PEG 200 and ethylenediamine (EDA) as co-precursors. A biocompatible amine functionalized film was surface characterized by X-ray photoelectron spectroscopy (XPS) and Fourier-transform infrared spectroscopy (FT-IR). The density of the surface amine functional groups was carried out by quantitative analysis using UV-visible spectroscopy. We found through surface plasmon resonance (SPR) analysis that non-specific protein adsorption was drastically reduced on amine functionalized PP-PEG films. Our functionalized PP-PEG films show considerable potential for biotechnological applications such as biosensors.

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Etching Mechanism of $YMnO_3$ Thin Films in High Density $CF_4$/Ar Plasma ($CF_4$/Ar 가스 플라즈마를 이용한 $YMnO_3$ 박막의 식각 반응연구)

  • 김동표;김창일;이철인
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.14 no.12
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    • pp.959-964
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    • 2001
  • We investigated the etching characteristics of YMnO$_3$ thin films in high-density plasma etching system. In this study, YMnO$_3$ thin films were etched with CF$_4$/Ar gas chemistries in inductively coupled plasma(ICP). Etch rates of YMnO$_3$ increased up to 20% CF$_4$ in CF$_4$/(CF$_4$+Ar), but decreased with furthermore increasing CF$_4$ in CF$_4$/(CF$_4$+Ar). In optical emission spectroscopy (OES) analysis, F radical and Ar* ions in plasma at various gas chemistries decreased with increasing CF$_4$ content. Chemical states of YMnO$_3$ films exposed in plasma were investigated with x-ray photoelectron spectroscopy (XPS) and secondary ion mass spectrometry (SIMS). There is a chemical reaction between metal (Y, Mn) and F and metal-fluorides were removed effectively by Ar ion sputtering. YF$_{x}$, MnF$_{x}$ such as YF, YF$_2$, YF$_3$ and MnF$_3$ were detected using SIMS analysis. The etch slope is about 65$^{\circ}$ and cleasn surface. surface of the etched YMnO$_3$ thin films was investigated with X-ray photoelectron spectroscopy (XPS) and secondary ion mass spectrometry (SIMS). The etch profile was also investigated by scanning electron microscopy (SEM).EM).

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Laser absorption spectroscopy of ternary gas mixture of He-Ne-Xe in External Electrode Fluorescent Lamp (EEFL) (레이저 흡수 분광법을 이용한 He-Ne-Xe 상종가스의 외부전곡 램프의 $1s_4$ 공명준위와 $1s_5$ 준안정준위의 제논 원자 밀도에 대한 연구)

  • Jeong, S.H.;Oh, P.Y.;Lee, J.H.;Cho, G.S.;Choi, E.H.
    • Journal of the Korean Vacuum Society
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    • v.15 no.6
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    • pp.576-580
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    • 2006
  • Mercury-free lamp, external electrode fluorescent lamp (EEFL) which includes the xenon gas, is now going on the research for the replacement of mercury lamp. The densities of excited xenon atom in the $1s_4$ resonance state and the $1s_5$ metastable state are investigated in the EEFL by a laser absorption spectroscopy under various gas pressures. We have measured the absorption signals for both $1s_4$ resonance and the $1s_5$ metastable state in the EEFL by varying the discharge currents for a given pressure. This basic absorption characteristic is very important for improvement of the VUV luminous efficiency of the EEFL as well as plasma display panel.

Experimental Investigation of Steam Plasma Characteristics for High Energy Density Metal Powder Ignition Using Optical Emission Spectroscopy Method (OES 방법을 이용한 고에너지 금속 분말 점화용 스팀 플라즈마 특성에 관한 실험적 고찰)

  • Lee, Sang-Hyup;Ko, Tae-Ho;Yoon, Woong-Sup
    • Proceedings of the Korean Society of Propulsion Engineers Conference
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    • 2012.05a
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    • pp.545-550
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    • 2012
  • High Energy density metal powder has high melting point of oxide film. By this, the ignition source that can make a thermal effect of high-temperature during short time is needed to overcome ignition disturbance mechanism by oxide film. So effective ignition does not occurred with hydrocarbon ignitor, $H_2-O_2$ ignitor, high power laser. But steam plasma can be generate about 5000 K temperature field in short order. Because a steam plasma uses steam as the working gas, it is environmental-friendly and economical. Therefore in this study, we analyze steam plasma temperature field and radical species with optical emission spectroscopy method in order to apply steam plasma ignitor to metal combustion system and cloud particle ignition was identified in visual.

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Elemental Composition of the Soils using LIBS Laser Induced Breakdown Spectroscopy

  • Muhammad Aslam Khoso;Seher Saleem;Altaf H. Nizamani;Hussain Saleem;Abdul Majid Soomro;Waseem Ahmed Bhutto;Saifullah Jamali;Nek Muhammad Shaikh
    • International Journal of Computer Science & Network Security
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    • v.24 no.6
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    • pp.200-206
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    • 2024
  • Laser induced breakdown spectroscopy (LIBS) technique has been used for the elemental composition of the soils. In this technique, a high energy laser pulse is focused on a sample to produce plasma. From the spectroscopic analysis of such plasma plume, we have determined the different elements present in the soil. This technique is effective and rapid for the qualitative and quantitative analysis of all type of samples. In this work a Q-switched Nd: YAG laser operating with its fundamental mode (1064 nm laser wavelength), 5 nanosecond pulse width, and 10 Hz repetition rate was focused on soil samples using 10 cm quartz lens. The emission spectra of soil consist of Iron (Fe), Calcium (Ca), Titanium (Ti), Silicon (Si), Aluminum (Al), Magnesium (Mg), Manganese (Mn), Potassium (K), Nickel (Ni), Chromium (Cr), Copper (Cu), Mercury (Hg), Barium (Ba), Vanadium (V), Lead (Pb), Nitrogen (N), Scandium (Sc), Hydrogen (H), Strontium (Sr), and Lithium (Li) with different finger-prints of the transition lines. The maximum intensity of the transition lines was observed close to the surface of the sample and it was decreased along the axial direction of the plasma expansion due to the thermalization and the recombination process. We have also determined the plasma parameters such as electron temperature and the electron number density of the plasma using Boltzmann's plot method as well as the Stark broadening of the transition lines respectively. The electron temperature is estimated at 14611 °K, whereas the electron number density i.e. 4.1 × 1016 cm-3 lies close to the surface.

Stability of hydrophobic properties of plasma polymerized tetrakis(trimethylsilyloxy)silane film surface

  • Jang, Jinsub;Woo, Sungmin;Ban, Wonjin;Nam, Jaehyun;Lee, Yeji;Choi, Woo Seok;Jung, Donggeun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.147.1-147.1
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    • 2016
  • Hydrophobic thin films are variously applicable for encapsulation of organic devices and water repulsive glass, etc. In this work, the stability of hydrophobic characteristics of plasma polymerized tetrakis (trimethylsilyloxy) silane (ppTTMSS) thin films were investigated. The films were deposited with plasma enhanced chemical vapor deposition (PECVD) on the glass. The deposition plasma power and deposition pressure was 70 W and 600 mTorr, respectively. Thereafter, deposited films were treated by 248nm KrF excimer laser. Stability of hydrophobic properties of plasma polymerized tetrakis(trimethylsilyloxy)silane film surface was tested by excimer laser irradiation, which is thought to simulate severe outdoor conditions. Excimer laser irradiation cycles changed from 10 to 200 cycles. The chemical structure and hydrophobicity of ppTTMSS films were analyzed by using Fourier transform infrared (FTIR) spectroscopy and water contact angle (WCA) measurement, respectively. Absorption spectra peaks and WCA of excimer laser treated ppTTMSS films did not change notably. These results show that our ppTTMSS films possess stable hydrophobic properties.

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Measurement of excited Xe($1s_4$) and Xe($1S_5$) atoms by laser absorption spectroscopy in coplanar AC-PDP

  • Oh, P.Y.;Lee, J.H.;Moon, H.S.;Hong, J.W.;Jeon, W.;Cho, G.S.;Choi, E.H.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2004.08a
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    • pp.515-517
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    • 2004
  • The laser absorption spectroscopy has been used for measuresurement of the xenon atoms in the resonant $1S_4$ and metastable $1S_5$ states in coplanar AC PDP. For the purpose of improving VUV luminous efficiency and optimization of PDP cells, it is important to study behavior of excited Xe atoms in a micro-discharge cell of a coplanar AC-PDP. We measured the xenon excited density of $1S_5$ and $1S_4$ state under mixture gas of Ne-Xe(10%) with gas pressure of 350 Torr and sustaining gap distance of 150 um.

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Etching Mechanism of $YMnO_3$ Thin Films in High Density $CF_{4}/Ar$ Plasma (고밀도 $CF_{4}/Ar$ 플라즈마에서 $YMnO_3$ 박막의 식각 매카니즘)

  • Lee, Cheol-ln;Kim, Dong-Pyo;Kim, Chang-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.05b
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    • pp.12-16
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    • 2001
  • We investigated the etching characteristics of $YMnO_3$ thin films in high-density plasma etching system. In this study. $YMnO_3$ thin films were etched with $CF_{4}/Ar$ gas chemistries in inductively coupled plasma (ICP). Etch rates of $YMnO_3$ were measured according to gas mixing ratios. The maximum etch rate of $YMnO_3$ is 18 nm/min at $CF_{4}/(CF_{4}+Ar)$ of 20%. In optical emission spectroscopy (OES) analysis, F radical and Ar* ions in plasma at various gas chemistries decreased with increasing $CF_4$ content. Chemical states of $YMnO_3$ films exposed in plasma were investigated with x-ray photoelectron spectroscopy (XPS) and secondary ion mass spectrometry (SIMS). There is a chemical reaction between metal (Y, Mn) and F and metal-fluorides were removed effectively by Ar ion sputtering. $YF_x$, $MnF_x$ such as YF, $YF_2$, $YF_3$ and $MnF_3$ Were detected using SIMS analysis. The etch slope is about $65^{\circ}C$ and free of residues.

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