• 한국진공학회:학술대회논문집
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• 한국진공학회 2005년도 제29회 학술발표회 초록집
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• pp.189-190
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• 2005

• 대한전기학회:학술대회논문집
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• 대한전기학회 2000년도 하계학술대회 논문집 C
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• pp.2044-2046
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• 2000

A system to monitor the ion mass and charge-state as well as plasma potential value during plasma source ion implantation (PSII) has been developed. It was tested with 30-kV PI3D setup using alternatively hot cathode do (HC) and inductively coupled RF (ICP) discharge sources. The design and performance of the system will be described, and experimental results in nitrogen and argon plasmas produced by modular HC-ICP source will be discussed.

• 한국안전학회지
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• 제14권3호
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• pp.134-139
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• 1999

In this study, PSII(plasma source ion implantation) was used to improve the biocompatibility of bone-anchored Ti implant. According to potentiodynamic anodic polarization test in deaerated Hank's solution, open circuit potential of ion implanted specimens were increased compare to that of unimplanted specimen ; besides, passive current density and critical anodic current density of ion implanted specimens were lower than unimplanted specimen.

• 한국생산제조학회지
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• 제21권5호
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• pp.755-760
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• 2012

In this study, three dimensional cutting force components and surface roughness appeared in high speed cutting by using tungsten carbide endmill tools implanted ion or not found mutual relations through several analysis of statistical dispersion. It is showed that cutting force(Fx) is affect with spindle speed and feed rate, cutting force(Fy) is affect with spindle speed and ion implantation time and cutting force(Fz) is affect with feed rate in interaction through the statistical method of ANOVA of cutting force and surface roughness, it is analyzed that it is affected of spindle speed and feed rate in surface roughness.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2009년도 춘계학술대회 논문집
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• pp.435-436
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• 2009

• 마이크로전자및패키징학회지
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• 제9권4호
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• pp.31-34
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• 2002

For the mold die sticking mechanism, the major explanation is that the silica as a filler in EMC (epoxy molding compound) wears die surface to be roughened, which results in increase of adhesion strength. As the sticking behavior, however, showed strong dependency on the EMC models based on the experimental results from different semiconductor manufacturers, chemisorption or acid-base interaction is apt to be also functioning as major mechanisms. In this investigation, the plasma source ion implantation (PSII) using $O_2, N_2$, and $CF_4$ modifies sample surface to form a new dense layer and improve surface hardness, and change metal surface condition from hydrophilic to hydrophobic or vice versa. Through surface energy quantification by measuring contact angle and surface ion coupling state analysis by Auger, major governing mechanism for sticking issue was figured out to be a complex of mechanical and chemical factors.

• International Journal of Precision Engineering and Manufacturing
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• 제7권4호
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• pp.47-50
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• 2006

SCM415 alloy was implanted with nitrogen ions using plasma source ion implantation (PSII), at a dose range of $1{\times}10^{17}\;to\;6{\times}10^{17}\;N^+cm^{-2}$ Auger electron spectrometry (AES) was used to investigate the depth profile of the implanted layer. Friction and wear tests were carried out on a block-on-ring wear tester. Scanning electron microscopy (SEM) was used to observe the micro-morphology of the worn surface. The results revealed that after being implanted with nitrogen ions, the frictional coefficient of the surface layer decreased, and the wear resistance increased with the nitrogen dose. The tribological mechanism was mainly adhesive, and the adhesive wear tended to become weaker oxidative wear with the increase in the nitrogen dose. The effects were mainly attributed to the formation of a hard nitride precipitate and a supersaturated solid solution of nitrogen in the surface layer.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1999년도 하계학술대회 논문집 E
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• pp.2253-2255
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• 1999

Plasma source ion implantation (PSII) is a non-line-of-sight technique for surface modification of materials which is effective for non-planar targets. Properties such as hardness, corrosion resistance, wear resistance and friction can be improved without affecting the bulk properties of the material. Type 304 austenitic stainless steel was treated by nitrogen plasma ion implantation at a target bias of -50kV. Surface properties, including microhardness and ion depth profile, were studied.

• 한국정밀공학회지
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• 제27권1호
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• pp.33-40
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• 2010

In this research, the effects for surface Improvement of plasma ion implanted carbide endmill tools were observed by measuring cutting forces and tools wear affecting surface roughness in high speed cutting. From the 2nd ion mass analysis, the oxidation layer was found to be built up by sputtering. The residual gas contamination of oxygen was found to be contained impurities in nitrogen gas. The plasma implanted ion was found to be spreaded, especially the nitrogen was implanted up to 150nm depth as impressed voltage and ion implanting time. It is analyzed as bring surface improvement by spreading deeply forming oxidation on surface. The factors in Analysis of Variance(ANOVA) about mutuality cause reference of cutting force. The cutting force Fx is affected by the interaction of spindle rpm and federate, the cutting force Fy is influenced by spindle rpm and time injected ion, and cutting force Fz is affected by the interaction of impressed voltage and feedrate. Also, it was found that the cutting forces of implanted tools become lower and the surface roughness is improved by the effect of nitrogen according to the implantation.

• 한국자기학회지
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• 제8권1호
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• pp.6-12
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• 1998

플라즈마 이온주입 장치를 이용하여 $\alpha$-Fe foil에 질소 이온을 주입하여 질화철 결정상을 만들었으며, 이때 질소 이온 주입시간을 15분(FEN15)과 30분 (Fe30)으로 처리되었다. 오제 전자 분광법(Auger electron spectroscopy : AES)을 이용하여 측정한 주입된 질소 이온의 깊이는 사편 FeN15와 FeN30에서 각각 12000$\AA$과 40000$\AA$으로 나타난다. 진동 시편 자력계(vibrating sample magnetometer : VSM)측정결과 as-implanted 각각의 시편은 포화자화 값이 순수한 $\alpha$-Fe foil 보다 증가되었으며, 이는 $\alpha$'-Fe8N 또는 $\alpha$'-Fe16N2의 결정구조가 그원인으로 판단된다. 따라서 본 연구는 플라즈마 이온주입 방법으로 제작된 질화철에서 부분적인 $\alpha$'또는 $\alpha$'의 졀정구조 형성 가능성을 확인할 수 있었다.