• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.185.2-185.2
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• 2016

The plasma density is an essential plasma parameter describing plasma physics. Furthermore, it affects the throughput and uniformity of plasma processing (etching, deposition, ashing, etc). Therefore, a novel technique for plasma density measurement has been attracting considerable attention. Microwave probe is a promising diagnostic technique. Various type of cutoff, hairpin, impedance, transmission, and absorption probes have been developed and investigated. Recently, based on the basic type of probes, modified flat probe (curling and multipole probes), have been developing for in situ processing plasma monitoring. There is a need for comparative study between the probes. It can give some hints on choosing the reliable probe and application of the probes. In this presentation, we make attempt of numerical study of different kinds of microwave probes. Characteristics of frequency spectrum from probes were analyzed by using three-dimensional electromagnetic simulation. The plasma density, obtained from the spectrum, was compared with simulation input plasma density. The different microwave probe behavior with changes of plasma density, sheath and pressure were found. To confirm the result experimentally, we performed the comparative experiment between cutoff and hairpin probes. The sheath and collision effects are corrected for each probe. The results were reasonably interpreted based on the above simulation.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제37회 하계학술대회 초록집
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• pp.370-370
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• 2009

• Journal of Electrical Engineering and Technology
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• 제10권4호
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• pp.1804-1814
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• 2015

In order to explore the characteristics of electrons in DC negative corona discharge, an improved plasma chemical model is presented for the simulation of bar-plate DC corona discharge in dry air. The model is based on plasma hydrodynamics and chemical models in which 12 species are considered. In addition, the photoionization and secondary electron emission effect are also incorporated within the model as well. Based on this model, electron mean energy distribution (EMED), electron density distribution (EDD), generation and dissipation rates of electron at 6 typical time points during a pulse are discussed emphatically. The obtained results show that, the maximum of electron mean energy (EME) appears in field ionization layer which moves towards the anode as time progresses, and its value decreases gradually. Within a pulse process, the electron density (ED) in cathode sheath almost keeps 0, and the maximum of ED appears in the outer layer of the cathode sheath. Among all reactions, R1 and R2 are regarded as the main process of electron proliferation, and R₂₂ plays a dominant role in the dissipation process of electron. The obtained results will provide valuable insights to the physical mechanism of negative corona discharge in air.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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• pp.922-925
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• 2007

In the usual dry etching process for the TFT-LCD fabrication, it is hard to monitor the basic plasma parameters such as density and temperature. However, the basic parameters are easily monitored during the dry etching process. We have simultaneously measured the electric characteristics and basic plasma parameters of the dry etching chamber during the process, analyzed them to interpret plasma parameters. For the Ar plasma discharge case, we could obtain the density and temperature from the electric characteristics using a simple simple sheath model.

• 공업화학
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• 제22권6호
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• pp.711-717
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• 2011

전자충격반응을 고려한 three moment 플라즈마 모델과 전기적 중성성분의 반응을 고려한 유체 유동 모델을 결합하여 용량결합형 산소플라즈마에 대한 2차원적 전산모사 연구를 수행하였다. 전자의 에너지에 의하여 좌우되는 전자충격반응에 대한 반응속도는 전자와 $O_2$ 및 O 사이의 전자충돌단면적으로부터 계산되었다. 플라즈마 모델과 유체 유동 모델을 결합하고 상세한 반응메커니즘을 포함시킴으로써 전하를 띠는 전자와 이온($O_2{^+}$, $O^+$, $O_2{^-}$, and $O^-$) 그리고 기저상태의 산소($O_2$ and O)뿐만 아니라 $O_2(a^1{\Delta}_g)$, $O_2(b^1{{\Sigma}_g}^+)$, $O(^1D)$, $O(^1S)$ 등과 같이 산소플라즈마 특성에 중요한 역할을 하는 준안정상태 성분들의 시공간적 분포를 예측할 수 있었다. 또한 산소플라즈마의 전산모사로부터 sheath 경계에 이중층이 존재함을 확인할 수 있었다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1989년도 추계학술대회 논문집 학회본부
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• pp.94-97
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• 1989

It is shown that fundamental plasma characteristic, which are sheath voltage and ion concentration, can be derived from measuring RF impedence. Plasma characteristics from this simple method are verified by direct measuring, to be reasonable. Using these values a new relation between isotropy and the ratio of sheath voltage to ion concentration is derived. For etch in which $CF_4$ is used, anisotropic etch can be achieved in its order $10^{-12}Vcm^3$ and isotropic etch in $10^{-12}Vcm^3$. These results are useful in every asymetric diode type etch system.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1997년도 추계학술대회 논문집
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• pp.270-274
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• 1997

The numerical model that can describe the ignition of the pseudospark discharge using hybrid fluid-particle method has been developed. The evolution process of the discharge has been divided into four phases along the potential distribution. After the plasma enters in the hollow cathode, the confining effect which is one of hollow cathode properties occurs and the electron current on anode rises rapidly. As the plasma expands successively, the sheath contracts and as the electric field in the sheath increases, the field-enhanced thermionic emission(Schottky emission) occurs. From numerical results, the physical mechanism that causes the rapid current rise in the ignition of the pseudospark discharge could be identified.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2003년도 International Meeting on Information Display
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• pp.91-94
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• 2003

We studied the effect of barrier rib height variation using ray-optics code incorporated with three-dimensional plasma simulation to analyze the effects of cell geometry for varying pressure conditions. The optimal barrier rib height decreased as the Xe partial pressure increased which resulted in due to the formation of local, strong sheath under high Xe partial pressure condition.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2001년도 제21회 학술발표회 초록집
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• pp.161-161
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• 2001

• Applied Science and Convergence Technology
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• 제23권6호
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• pp.357-365
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• 2014

A non-invasive method for ion energy distribution measurement at a RF biased surface is proposed for monitoring the property of ion bombardments in capacitively coupled plasma sources. To obtain the ion energy distribution, the measured electrode voltage is analyzed based on the circuit model which is developed with the linearized sheath capacitance on the assumption that the RF driven sheath behaves like a simple diode for a bias power whose frequency is much lower than the ion plasma frequency. The method is verified by comparing the ion energy distribution function obtained from the proposed model with the experimental result taken from the ion energy analyzer in a dual cathode capacitively coupled plasma source driven by a 100 MHz source power and a 400 kHz bias power.