• 전기학회논문지
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• 제56권12호
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• pp.2173-2178
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• 2007

Dynamics of plasma sheath was analyzed using simple ion fluid model with poison equation. Incident ion current, energy, potential distribution and space charge density profile were calculated as a function of time. The effects of initial floating sheath on the evolution of biased sheath were compared with ideal matrix sheath. The effects of finite rising time of pulse bias voltage on the ion current and energy was studied. The influence of surface charging on the evolution of sheath was also investigated

• 한국표면공학회지
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• 제47권1호
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• pp.53-56
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• 2014

I-V characteristics of a cylindrical target in an ECR plasma were studied for sheath spatial evolutions when the target was pulsed biased to a high negative potential. The magnetic field effects on sheath thickness and sheath boundary speed were investigated by comparison between the experimental results and the theoretical results using the Child-Langmuir sheath model. The results showed that the magnetic field suppressed electron motion away from the target so that sheath thickness and sheath boundary speed decreased.

• 한국안광학회지
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• 제13권3호
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• pp.57-60
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• 2008

목적: 펄스형 방전플라스마 포커스 장치에서 반경방향 플라스마 current sheath 의 속력을 측정하였다. 방법: 측정에는 시간분해 분광분석법과 로고프스키 코일이 사용되었다. 결과: 15 kV의 방전전압과 수십 torr의 He과 Ar의 기체기압에서 $10^5$ cm/s의 속력이 측정되었으며, 기체기압이 증가할수록 current sheath의 속력은 감소되었다. 결론: 최적조건인 수 torr의 기압에서는 $10^7$ cm/s의 속력이 나올 것으로 예상된다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.181-181
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• 2012

The microwave probe for measuring plasma density is widely used for its advantages: First, it is not affected by the reactive gas. Second, it can measure local plasma parameters such as plasma density, plasma potential and plasma temperature. Third, it is simple and robust. A cut-off probe is the one of the most promising microwave probe. Recently, Kim et al. reveals the physics of the cut-off probe but the effect of the sheath on the determination of the plasma density is not explained. In this presentation, for taking account of sheath effects on determination of plasma density from the cut-off peak, a simplified circuit modeling and an E/M simulation are conducted. The results show that occupation ratio of sheath volume between two tips of the cut-off probe and subsequence pressure condition mainly change position of the cut-off peak with respect to plasma frequency. Magnitude of relative voltage taken on the impedance of sheath and the impedance of bulk plasma can explain this effect. Furthermore, effects of gap size, tip radius, and tip length ware revealed based on above analysis.

• 한국안광학회지
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• 제12권1호
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• pp.69-74
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• 2007

펄스형 방전플라스마장치에서 축방향 플라스마 curren sheath의 속력을 측정하였고, snowplow 모델과 비교하였다. Current sheath의 속력은 $10^6cm/s$로 측정되었다. 측정된 속력 중에서 가벼운 기체인 수소와 헬륨은 모델의 이론과 비슷한 결과가 나왔으나 무거운 기체인 아르곤은 이론과 조금 벗어났다. 그 이유는 current sheath의 불안정성 때문으로 추정된다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.470-470
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• 2010

Negative ions are generated in fusion edge plasmas, material processing plasmas, ionospheric plasmas. Analytic formulas for the deduction of the absolute density of negative ions was given by using the current-voltage(IV) characteristics of two electric probes at two different pressures [1], and negative ion density has been measured by one electric probe using the current-voltage characteristics of three different pressures [2]. Ratios of ion and electron saturation currents and electron temperatures and sheath areas of different pressures are usually incorporated into two equations with two unknowns for the negative ion density. In the previous publications, the sheath factor(sheath area, sheath density, sheath velocity) and effective masses of background ions with different pressures are qualitatively incorporated for the deduction of negative density. In this presentation, the quantitative and detailed relation of negative ion density with sheath factor and effective masses are going to be given. The effect of these parameters on the change of IV characteristics will be addressed.

• 대한전기학회논문지
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• 제45권3호
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• pp.426-431
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• 1996

It is well known that the understanding of the complex mechanism of magnetoplasma is closely related with understanding of the collective behavior of discharge plasma parameters such as the cathode-sheath potential, cathode-sheath thickness, electron temperature, electron density, and ambipolar diffusion. In this paper, some of the relationships between these plasma parameters and magnetic field is investigated experimentally with a Langmuir probe in the magnetoplasma generated by D.C diode system. It is found that when magnetic field is increased, cathode-sheath potential, cathode-sheath thickness, and ambipolar diffusion are decreased. In addition, peak ion density obtained as a parameter of ionic signal voltage by Faraday cup method is independent of magnetic field. (author). 9 refs., 11 figs.,1 tab.

• 한국표면공학회지
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• 제23권1호
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• pp.1-7
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• 1990

Ion implantation is a well established superior superior surface modification technique for the improvement of wear resistance, hardenece, hardness, corrosion resistance, biocompaibity, surface friction, as well as for the modification of surface electric conductance. Conventional ion implantaion is a line-of-sight process witch ues the ion beam accelerator techniques. Plasma sheath ion implantation (PSII), as a new technique, is described in this paper. In PSII high voltage pulse is applied to a target material placed directly in a plasma, forming a think ion-matrix sheath around the target. Ions accelerate through the sheath drop and bombard the traget from all sides simultaneosuslyregardless of the target shape. This paper describes the principle of PSII, which has non-line-of sight characteristics, as well as the experimental appratus.

• 전자공학회논문지D
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• 제35D권5호
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• pp.54-62
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• 1998

In a plasma etching system, ions become an important parameter in determining the wafer topography which depends on both the physical sputtering mechanism and the chemically enhanced reaction. this paper reports the energy and angular distributions of ions across the plasma sheath using a monte carlo method. The ion distribution is mainly affected by the magnitude of the sheath voltage and by the collision in the sheath. Furthemore, the local potential distribution in a plamsa sheath has been determined by solving the poisson's equation. In th is work, ionic collisions were cosidered in terms of both charge exchange and momentum transfer. The three-dimensional distributions of ions were calculated with varying the input process conditions in the plasma reactor.

• 대한전자공학회논문지
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• 제14권3호
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• pp.1-5
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• 1977

압축성 plasma내에서 sheath로 둘러쌓인 원주형도체에 의한 전자파의 산란에 관하여 해석적인 방법으로 조사하였다. 전자파가 입사하는 경우에 대하여 total scattering cross section과 back scattering cross section을 구하였으며 computer로 계산한 수치결과를 graph로 제시하였다.