• 한국표면공학회지
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• 제29권5호
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• pp.371-378
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• 1996

An RF inductively coupled plasma (ICP) torch has been developed as a typical thermal plasma generator and reactor. It has been applied to various materials processings such as plasma flash evaporation, thermal plasma CVD, plasma spraying, and plasma waste disposal. The RF ICP reactor has been generally operated under one atmospheric pressure. Lately the characteristics of low pressure RF ICP is attracting a great deal of attention in the field of plasma application. In our researches of RF plasma applications, low pressure RF ICP is mainly used. In many cases, the plasma generated by the ICP torch under low pressure seems to be rather capacitive, but high density ICP can be easily generated by our RF plasma torch with 3 turns coil and a suitable maching circuiit, using 13.56 MHz RF generator. Plasma surface modification (surface hardening by plasma nitriding and plasma carbo-nitriding), plasma synthesis of AIN, and plasma CVD of BN, B-C-N compound and diamond were practiced by using low pressure RF plasma, and the effects of negative and positive bias voltage impression to the substrate on surface modification and CVD were investigated in details. Only a part of the interesting results obtained is reported in this paper.

• Journal of Electrical Engineering and Technology
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• 제9권1호
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• pp.307-312
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• 2014

We present a full finite element analysis for plasma discharge in etching process of semiconductor circuit. The charge transport equations of hydrodynamic diffusion-drift model and the electric field equation were numerically solved in a fully coupled system by using a standard finite element procedure for transient analysis. The proposed method was applied to a real plasma reactor in order to characterize the plasma sheath that is closely related to the yield of the etching process. Throughout the plasma discharge analysis, the base electrode of reactor was tested and modified for improving the uniformity around the wafer edge. The experiment and numerical results were examined along with SEM data of etching quality. The feasibility and usefulness of the proposed method was shown by both numerical and experimental results.

• 대한전기학회논문지
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• 제43권5호
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• pp.802-808
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• 1994

The purpose of this paper is to describe an application of plasma polymerized thin film as an electron beam resist. Plasma polymerized thin film was prepared using an interelectrode capacitively coupled gas-flow-type reactor, and chosen methylmethacrylate(MMA)and methylmethacrylate-tetrameth-yltin(MMA-TMT) as a monomer. This thin films were also delineated by the electron-beam apparatus with an acceleration voltage of 30kV and an expose dose ranging from 20 to 900$\mu$C/cmS02T. The delineated pattern in the resist was developed with the same reactor which is used for polymerization using an argon as etching gas. The growth rate and etching rate of the thin film is increased with increasing of discharge power. Thin films by plasma polymerization show polymerization rate of 30~45($\pm$3) A/min, and etching rate of 440($\pm$30) A/min during Ar plasma etching at discharge power of 100W. In apparently lower than that of conventional PMMA, but the plasma-etching rate of PP(MMA-TMT) was higher than that of PPMMA.

• 한국연소학회지
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• 제11권3호
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• pp.1-7
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• 2006

A reaction mechanism of methane partial oxidation, which consists of thermal and plasma chemistry reaction pathways, has been investigated using with an arc-jet reactor. The reaction zone of the arc-jet reactor is spatially separated into thermal and non-thermal plasma zone. Methane conversion rates, selectivity of $H_2$ and $C_2$ chemicals in each zone are obtained, which reveals clearly different characteristics of reaction pathways depending on the temperature conditions. The conversion rates obtained in thermal plasma zone is higher than those in non-thermal plasma zone. The selectivity, however, obtained in non-thermal plasma zone is significantly higher than those in thermal plasma zone. Further parametric study on $O_2/C$ ratio, arc length and SED shows that the present process is mainly governed by thermal chemistry pathways.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1994년도 하계학술대회 논문집 C
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• pp.1609-1611
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• 1994

In ECR and helicon reactors for plasma processing, a high density plasma is generated in a source region which is connected to a diffusion region where the processing takes place. Large density and potential gradients can develop at the orifice of the source which drive ion currents into the diffusion region. The average ion velocity may become the order of the sound velocity. Measurements of the ion saturation current to a Langmuir probe are used as a standard method of determining the plasma density in laboratory discharges. However, the analysis becomes difficult in a steaming plasma. We have used the HAMLET plasma simulator to simulate the ion flow to a large langmuir probe in an ECR plasma. The collection surface was aligned with the Held upstream, normal to the field, and downstream. ion trajectories through the electric and magnetic fields were calculated including ion-neutral collisions. We examines the ratio of ion current density to plasma density as a function of magnetic field and pressure.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2010년도 제39회 하계학술대회 초록집
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• pp.95-95
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• 2010

An apparatus for generating flames and more particularly the microwave plasma burner for generating high-temperature large-volume plasma flame was presented. The plasma burner was composed of micvrowave transmission lines, a field applicator, discharge tube, coal and gas supply systems, and a reactor. The plasma burner is operated by injecting coal powders into a 2.45 GHz microwave plasma torch and by mixing the resultant gaseous hydrogen and carbon compounds with plasma-forming gas. We in this work used air, oxygen, steam, and their mixtures as a discharge gas or oxidant gas. The microwave plasma torch can instantaneously vaporize and decompose the hydrogen and carbon containing fuels. It was observed that the flame volume of the burner was more than 50 times that of the torch plasma. The preliminary experiments were carried out by measuring the temperature profiles of flames along the radial and axial directions. We also investigated the characteristics for coal combustion and gasification by analyzing the byproducts from the exit of reactor. As expected, various byproducts such as hydrogen, carbon monoxide, carbon dioxide, hydrogen sulfide, etc. were detected. It is expected that such burner cab be applied to coal gasification, hydrocarbon reforming, industrial boiler of power plants, etc.

• 한국환경과학회지
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• 제21권7호
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• pp.797-804
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• 2012

A dielectric barrier discharge (DBD) plasma reactor was investigated for the inactivation of Ralstonia Solanacearum which causes bacterial wilt in aquiculture. The DBD plasma reactor of this study was divided into power supply unit, gas supply unit and plasma reactor. The plasma reactor consisted of a quartz dielectric tube, discharge electrode (inner) and ground electrode (outer). The experimental results showed that the optimum 1st voltage, 2nd voltage, air flow rate and pH were for 100 V (1st voltage), 15 kV (2nd voltage), 4 L/min, and pH 3, respectively. At a low 1st voltage, shoulder and tailing off phenomena was observed. The shoulder phenomenon was decreased as the increase of 1st voltage. R. Solanacearum disinfection in the lower air flow rate was showed shoulder and tailing off phenomenon because the active species generated less. Under optimum condition, shoulder and tailing off phenomenon was reduced. When the 2nd voltage was less than 7.5 kV, tailing off phenomenon was observed and this was not vanishes even though the increase of the disinfection time. The inactivation efficiency increased as the increase of air flow rate, however, the efficiency decreased when the air flow rate was above 4 L/min. R. Solanacearum disinfection at pH 3 showed somewhat higher than in pH 11. The pH effect of R. Solanacearum deactivation is less than the impact on other factor.

• 공업화학
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• 제25권5호
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• pp.531-537
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• 2014

본 연구에서는 휘발성유기화합물의 일종인 아이소프로필 알코올(IPA) 산화에 촉매-플라즈마 반응 시스템을 이용하였다. ${\alpha}-Al_2O_3$로 이루어진 다공성 세라믹에 산화구리를 0.5% (w/w) 담지하여 촉매로 사용하였으며, 촉매상에 직접 플라즈마를 생성시켜 표면이 바로 플라즈마에 노출되도록 하였다. 촉매-플라즈마 공정의 특성을 파악하기 위하여 방전전압 및 온도 변화에 따른 IPA 및 분해부산물의 농도를 측정하였다. 촉매-플라즈마 반응기를 단열시키지 않았을 경우, 전압 17 kV (방전전력 : 28 W)에서 반응기 온도가 $120^{\circ}C$까지 증가하였으며, 유량 $1L\;min^{-1}$ (산소 : 10% (v/v); IPA : 1000 ppm) 조건에서 IPA가 모두 제거되었다. 그러나 $120^{\circ}C$ 이하의 온도에서는 바람직한 생성물인 이산화탄소 이외에도 아세톤, 포름알데하이드, 일산화탄소와 같은 유해 분해 부산물이 생성되었다. 반면 촉매-플라즈마 반응기 외부를 단열했을 때는 같은 조건에서 반응기 내부 온도가 $265^{\circ}C$까지 증가하였으며, IPA가 대부분 이산화탄소로 산화되었다. 다공성 세라믹에 산화구리를 담지하지 않았을 때는 촉매-플라즈마 반응기를 단열해도 이산화탄소와 일산화탄소가 유사한 비율로 생성되었다. 한편, 플라즈마를 생성시키지 않고 촉매만 단독으로 사용했을 때는(반응온도 : $265^{\circ}C$), 분해된 IPA의 70% 이상이 또 다른 휘발성유기화합물인 아세톤으로 전환되었으며, 이를 통해 촉매 단독공정보다 촉매-플라즈마 복합 공정이 IPA 산화에 더 효과적임을 알 수 있었다.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2007년도 춘계학술대회B
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• pp.2344-2347
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• 2007

To generate negative ion, a small dielectric barrier discharge (DBD) plasma reactor was used in this study and operated by high AC voltage. With increasing of voltage, we can get more negative ions. However unfortunately, if the input voltage is too high, it will also cause formation of ozone which is very harmful to human being health. So the work of finding out the best condition of Voltage and frequency was carried out firstly. After several times of measurement, operating at 20 kHz frequency is the best condition generating high ion concentration without ozone. For the purpose of finding out the best reactor structure, two types of surface dielectric barrier discharge (DBD) reactors were examined to produce negative oxygen ions at the conditions of 20 kHz frequency. The results indicated that the surface DBD reactor with several small tips showed better characteristics for generation of negative oxygen ions at the same condition.

• 한국산학기술학회논문지
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• 제17권8호
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• pp.1-7
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• 2016

수도권 대기관리권역 내에서 발생되는 휘발성 유기화합물(VOCs)를 규제하고 있다. VOCs는 산업 활동 및 일상생활에서 많이 쓰이고 있는 유기용제에서 발생되고 있다. 특히 주거지역과 인접하게 위치하고 있는 도장 공정에서는 다량의 유기용제를 사용하고 있으며, 그에 대한 영향이 크게 나타날 것으로 예상된다. 도장 공정에서 배출되는 VOCs을 제거하기 위하여 다양한 기술이 개발되고 있다. 최근 플라즈마를 이용하여 유해 VOCs를 고온에서 분해하는 공정이 제시되었는바, 본 연구에서는 반응기 설계에 앞서 전산유체역학기법을 사용하여 초고온 공정 수치해석을 실시하였다. 수치해석은 질량과 운동량에 대한 보존 방정식과 에너지 보존 방정식을 이용하였다. 원심력 반응기의 내부 유체유동은 내측 벽면을 타고 강한 선회류를 형성하면서 하부로 하강하는 것을 알 수 있었다. 플라즈마에 의한 고온 가스는 반응기 하부까지 영향을 주지만, 방사형 방향(radial direction)의 열전달은 거의 없는 것으로 나타났다. 시험용 VOCs인 톨루엔에 대한 분해효율을 계산한 결과, 반응기 전체에 대하여 67%가 얻어졌으며, 이는 실제 플라즈마를 이용한 실험실 규모의 실험 결과치인 약 70% 와 비교적 유사하게 나타났다.