• Title/Summary/Keyword: Plasma oxidation time

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Small Molecular Organic Nonvolatile Memory Cells Fabricated with in Situ O2 Plasma Oxidation

  • Seo, Sung-Ho;Nam, Woo-Sik;Park, Jea-Gun
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.8 no.1
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    • pp.40-45
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    • 2008
  • We developed small molecular organic nonvolatile $4F^2$ memory cells using metal layer evaporation followed by $O_2$ plasma oxidation. Our memory cells sandwich an upper ${\alpha}$-NPD layer, Al nanocrystals surrounded by $Al_2O_3$, and a bottom ${\alpha}$-NPD layer between top and bottom electrodes. Their nonvolatile memory characteristics are excellent: the $V_{th},\;V_p$ (program), $V_e$ (erase), memory margin ($I_{on}/I_{off}$), data retention time, and erase and program endurance were 2.6 V, 5.3 V, 8.5 V, ${\approx}1.5{\times}10^2,\;1{\times}10^5s$, and $1{\times}10^3$ cycles, respectively. They also demonstrated symmetrical current versus voltage characteristics and a reversible erase and program process, indicating potential for terabit-level nonvolatile memory.

A Method for Real Time Monitoring of Oxide Thickness in Plasma Electrolytic Oxidation of Titanium

  • Yoo, Kwon-Jong;Lee, Yong-K.;Lee, Kang-Soo
    • Corrosion Science and Technology
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    • v.9 no.1
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    • pp.8-11
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    • 2010
  • During PEO (plasma-electrolytic-oxidation) treatment of titanium, the relationship between the thickness of oxide film and the measured electrical information was investigated. A simple real time monitoring method based on the electrical information being gathered during PEO treatment is proposed. The proposed method utilizes the current flowing from a high frequency voltage source to calculate the resistance of an oxide film, which is converted into the thickness of an oxide film. This monitoring method can be implemented in PEO system in which an oxide film is grown by constant or pulsed voltage/current sources.

Local Current Distribution in a Ferromagnetic Tunnel Junction Fabricated Using Microwave Excited Plasma Method (마이크로파 여기 프라즈마법으로 제조한 강자성 터널링 접합의 국소전도특성)

  • Yoon, Tae-Sick;Kim, Cheol-Gi;Kim, Chong-Oh;Masakiyo Tsunoda;Migaku Takahashi;Ying Li
    • Journal of the Korean Magnetics Society
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    • v.13 no.2
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    • pp.47-52
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    • 2003
  • Ferromagnetic tunnel junctions were fabricated by dc magnetron sputtering and plasma oxidation process. The local transport properties of the ferromagnetic tunnel junctions were studied using contact-mode Atomic Force Microscopy (AFM) and the local current-voltage analysis. Tunnel junctions with the structure of sub./Ta/Cu/Ta/NiFe/Cu/Mn$\_$75/Ir$\_$25//Co$\_$70/Fe$\_$30//Al-oxide were prepared on thermally oxidized Si wafers. Al-oxide layers were formed with microwave excited plasma using radial line slot antenna (RLSA) for 5 and 7 sec. Kr gas was used as the inert gas mixed with $O_2$ gas for the plasma oxidization. No correlation between topography and current image was observed while they were measured simultaneously. The local current distribution was well identified with the distribution of local barrier height. Assuming the gaussian distribution of the local barrier height, the ferromagnetic tunnel junction with longer oxidation time was well fitted with the experimental results. As contrast, in the case of the shorter time oxidation junction, the current mainly flow through the low barrier height area for its insufficient oxygen. Such leakage current might result in the decrease of tunnel magnetoresistance (TMR) ratio.

The Effect of Exercise Training on Blood and Metabolic Variances, and Genes Expressions in Hyperlipidemic Rats (고지혈증 흰쥐에서 운동훈련이 혈액, 대사 변인 및 유전자 발현에 미치는 영향)

  • Kim, Kihoon;Kwon, Taedong;Kim, Jongyeon
    • Korean Journal of Exercise Nutrition
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    • v.13 no.2
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    • pp.93-100
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    • 2009
  • This study was conducted to investigate the effect of exercise training on blood and metabolic variances and genes expressions in hyperlipidemic rats. Three weeks-old male rats were randomly assigned into chow (n=7), high-fat diet (HF, n=7) and HF+exercise (HF+EX, n=7) groups. Exercise training consisted of the treadmill running 5 times per week during 8 weeks (0% grade, 30 min/time for first 4 weeks and 0% grade, 60 min/time the other 4weeks). The levels of triglyceride and total -cholesterol were increased in HF diet compared with chow group, and recovered to level of chow group by exercise training. Plasma glucose and insulin concentrations increased by 40 and 50%, respectively in HF diet compared with chow diet group, and these increases returned to the level of chow group by exercise training (p<.05). Body weight and abdominal fat mass were increased by high-fat diet compared with chow diet, and recovered to level of chow group by exercise training. Long-chain fatty acid oxidation rate and AMPK protein expression was not changed by HF diet, but increased by exercise training compared with high-fat diet (p<.05). UCP3 protein expression was not changed by either high-fat diet or exercise training compared with chow group. There was high correlation between plasma triglyceride and total cholesterol concentrations(p<.01). Plasma triglyceride or total cholesterol level showed correlation with following factors; plasma insulin and glucose levels, body weight, abdominal fat weight, UCP3 protein expression and long-chain fatty acid oxidation rate. These results showed that exercise training on the treadmill recovered hyperlipidemia, hyperglycemia and hyperinsulinemia induced by high-fat diet for 8 weeks. These exercise effects may be related with decreased body weight and abdominal fat mass, and increased long-chain fatty acid oxidation rate.

Tunnel Magnetoresistance with Top Layer Plasma Oxidation Time in Doubly Oxidized Barrier Process (이중 절연층 공정에서 상부절연층의 산화시간에 따른 터널자기저항 특성연구)

  • Lee, Ki-Yung;Song, Oh-Sung
    • Journal of the Korean Magnetics Society
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    • v.12 no.3
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    • pp.99-102
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    • 2002
  • We fabricated TMR devices which have doubly oxidized tunnel barrier using plasma oxidation method to form homogeneously oxidized AlO tunnel barrier. We sputtered 10 $\AA$-bottom Al layer and oxidized it with oxidation time of 10 sec. Subsequent sputtering of 13 $\AA$-Al was performed and the metallic layer was oxidized for 50, 80, and 120 sec., respectively. The electrical resistance changed from 500 Ω to 2000 Ω with increase of oxidation time, while variation of MR ratio was little spreading 27∼31 % which is larger than that of TMR device of ordinary single tunnel barrier. We calculated effective barrier height and width by measuring I-V curves, from which we found the barrier height was 1.3∼1.8 eV sufficient for tunnel barrier, and the barrier width (<15.0 $\AA$) was smaller than physical thickness. Our results may be caused by insufficient oxidation of Al precursor into A1$_2$O$_3$. However, doubly oxidized tunnel barriers were superior to conventional single tunnel barrier in uniformity and density. Our results imply that we were able to improve MR ratio and tune resistance by employing doubly oxidized tunnel barrier process.

Characteristics of Oxide Layers Formed on Al2021 Alloys by Plasma Electrolytic Oxidation in Aluminate Fluorosilicate Electrolyte

  • Wang, Kai;Koo, Bon-Heun;Lee, Chan-Gyu;Kim, Young-Joo;Lee, Sung-Hun;Byon, Eung-Sun
    • Journal of the Korean institute of surface engineering
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    • v.41 no.6
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    • pp.308-311
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    • 2008
  • Oxide layers were prepared on Al2021 alloys substrate under a hybrid voltage of AC 200 V (60 Hz) combined with DC 260 V value at room temperature within $5{\sim}60\;min$ by plasma electrolytic oxidation (PEO). An optimized aluminate-fluorosilicate solution was used as the electrolytes. The surface morphology, thickness and composition of layers on Al2021 alloys at different reaction times were studied. The results showed that it is possible to generate oxide layers of good properties on Al2021 alloys in aluminate-fluorosilicate electrolytes. Analysis show that the double-layer structure oxide layers consist of different states such as ${\alpha}-{Al_2}{O_3}$ and ${\gamma}-{Al_2}{O_3}$. For short treatment times, the formation process of oxide layers follows a linear kinetics, while for longer times the formation process slows down and becomes a steady stage. During the PEO processes, the average size of the discharge channels increased gradually as the PEO treatment time increased.

Formation of Coatings on SKD11 Core Mold Steel by Plasma Electrolytic Oxidation (코어금형용강 SKD11의 플라즈마 전해산화에 의한 피막 형성)

  • Kim, S.M.;Lee, T.H.;Kang, S.J.;Cho, Y.H.;Koo, J.M.
    • Journal of the Korean Society for Heat Treatment
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    • v.24 no.4
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    • pp.209-216
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    • 2011
  • Surface coatings were prepared on SKD11 core mold steel by plasma electrolytic oxidation (PEO). The coatings were investigated about the formation condition of core mold steel. SKD11 were coated by PEO in a mix solution of Sodium Aluminate $NaAlO_2$ (10 g/l), Sodium Silicate powder $Na_2SiO_3$ (0.5 g/l), Sodium tungstate dihydrate $Na_2WO_42H_2O$ (0.5 g/l) at less than $30^{\circ}C$. The electrical condition were voltage : 500~600 V; Pulse : 600~1800 Hz; current density 15~20 $A/dm^2$ various time : 3 min~40 min. The coatings surface morphology, cross-section, friction coefficient, hardness were investigated. The PEO coatings on SKD11 core mold steel showed the extended service life.

High Temperature Oxidation Behavior of Plasma Sprayed $ZrO_2$ Having Functionally Gradient Thermal Barrier Coating

  • Park, Cha-Hwan;Lee, Won-Jae;Cho, Kyung-Mox;Park, Ik-Min
    • Corrosion Science and Technology
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    • v.2 no.3
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    • pp.155-160
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    • 2003
  • Plasma spraying technique was used to fabricate functionally graded coating (FGC) of NiCrAIY/YSZ 8wt%$Y_2O_3-ZrO_2$ on a Co-base superalloy (HAYNES 188) substrate. Six layers were coated on the substrate for building up compositionally graded architecture. Conventional thermal barrier coating (TBC) of NiCrAIY/SZ with sharp interface was also fabricated. As-coated FGC and TBC samples were exposed at the temperature of $1100^{\circ}C$ for 10, 50, 100 hours in air. Microstructural change of thermally exposed samples was examined. Pores and microcracks were formed in YSZ layer due to evolution of thermal internal stress at high temperature. The amount of pores and microcracks in YSZ layer were increased with increasing exposure time at high temperature. High temperature oxidation of coatings occurred mainly at the NiCrAIY/YSZ interface. In comparison with the case of TBC. the increased area of the NiCrAIY/YSZ interface in FGC is likely to attribute to forming the higher amount of oxides.