• 제목/요약/키워드: Plasma implantation

검색결과 153건 처리시간 0.037초

혈소판 농축혈장이 임플랜트 주위 골결손부 재생에 미치는 영향 (The Effects of Platelet-Rich Plasma on Regeneration around Dental Implant Defects)

  • 홍기석;임성빈;정진형;이종헌
    • Journal of Periodontal and Implant Science
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    • 제33권4호
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    • pp.673-691
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    • 2003
  • The current interest in periodontal tissue regeneration has lead to research in bone graft, root surface treatments, guided-tissue regeneration, and the administration of growth factors as possible means of regenerating lost periodontal tissue. Several studies have shown that a strong correlation between platelet-rich plasma and the stimulation of remodeling and remineralization of grafted bone exists, resulting in a possible increase of 15-30% in the density of bone trabeculae. The purpose of this study was to study the histopathological correlation between the use of platelet-rich plasma and a bone xenograft used in conjunction with a non-resorbable guided-tissue membrane, e-PTFE, compared to a control group with regards to bone regeneration at the implant fixture site. Implant fixtures were inserted and graft materials placed into the left femur of in the experimental group, while the control group received only implant fixtures. In the first experimental group, platelet-rich plasma and BBP xenograft were placed at the implant fixture site, and the second experimental group had platelet-rich plasma, BBP xenograft, and the e-PTFE membrane placed at the fixture site. The degree of bone regeneration adjacent to the implant fixture was observed and compared histopathologically at 2 , 4, and 8 weeks after implant fixture insertion. The results of the experiment are as follows: 1. The rate of osseointegration to the fixture threads was found to be greater in the first experimental group compared to the control group. 2. The histopathological findings of the second experimental group showed rapid resorption of BBP with subsequent new bone formation replacing the resorbed BBP. 3. The second experimental group showed new bone formation in the area adjacent to the fixture threads beginning two weeks after fixture implantation, with continued bone remodeling in the areas mesial and distal to the fixture. 4. Significant new bone formation and bone remodeling was observed in both experimental groups near the implant fixture sites. 5. The rate of osseointegration at the fixture threads was greater in the second experimental group compared to the first group, and the formation of new bone and trabeculae around the fixture site occurred after the fourth week in the second experimental group. The results of the experiment suggest that a greater degree of new bone formation and osseointegration can occur at the implant fixture site by utilizing platelet-rich plasma and bone xenografts, and that these effects can be accelerated and enhanced by concurrent use of a non-resorbable guided tissue membrane.

PET 기질의 전처리효과가 상온 ECR 화학증착법에 의해 증착된 구리박막의 계면접착력에 미치는 영향 (Effects of Pretreatments of PET Substrate on the Adhesion of Copper Films Prepared by a Room Temperature ECR-MOCVD Method)

  • 현진;전법주;변동진;이중기
    • 한국재료학회지
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    • 제14권3호
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    • pp.203-210
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    • 2004
  • Effects of various pretreatments on the adhesion of copper-coated polymer films were investigated. Copper-coated polymer films were prepared by an electron cyclotron resonance-metal organic chemical vapor deposition (ECR-MOCVD) coupled with a DC bias system at room temperature. PET(polyethylene terephthalate) film was employed as a substrate material and it was pretreated by industrially feasible methods such as chromic acid, sand-blasting, oxygen plasma and ion-implantation treatment. Surface characterization of the copper-coated polymer film was carried out by AFM(Atomic Force Microscopy) and FESEM(Field Emission Scanning Electron Microscopy). Surface energy was calculated by based on the value of the contact angle measured. The adhesion of copper/PET films was determined by a pull-off test according to ASTM D-5179. It was found that suitable pretreatment of the PET substrate was required for obtaining good adhesion property between copper films and the substrate. In this study the highest adhesion was observed in sand-blasting, and then followed by those of acid and oxygen plasma treatment. However, the effect of surface energy was insignificant in our experimental range. This is probably due to compensating the difference in surface energy from various pretreatments by exposing substrate to ECR plasma for 5 min or longer at the early stage of the copper deposition. Therefore, it can be concluded that surface roughness of the polymer substrate plays an important role to determine the adhesion of copper-coated polymer for the deposition of copper by ECR-MOCVD.

Study of PSII-treated PMMA, PHEMA, and PHPMA ; Investigation of Their Surface Stabilities

  • Hyuneui Lim;Lee, Yeonhee;Seunghee Han;Jeonghee Cho;Moojin suh;Kem, Kang-Jin
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 1999년도 제17회 학술발표회 논문개요집
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    • pp.204-204
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    • 1999
  • The plasma source ion implantation(PSII) technique which is a method using high negative voltage pulse in plasma system has the potential to change the surface properties of polymer. PSII technique increase the surface free energy by introducing polar functional groups on the surface so that it improves reactivity, hydrophilicity, adhension, biocompatability, etc. However, the mobility of polymer chains enables the modified surface layers to adapt their composition to interfacial force. This hydrophobic recovery interrupts the stability of modified surfaces to keep for the long time. In this study, poly(methyl methacrylate)(PMMA), poly(2-hydroxyethyl methacrylate)(PHEMA), and polu(2-hydroxypropyl methacylate)(PHPMA) for contact lens application, were modified to improve the wettability with PSII technique and were investigated the surface stabilities. Polymer film was prepared with solution casting(3 wt.% solution) and was annealed at 11$0^{\circ}C$ under vacuum oven to remove solvent completely and to eliminate physical ageing. The thickness of the film measured by scanning electron microscopy (SEM) and surface profilometer was about 10${\mu}{\textrm}{m}$. Polymers were treated with different kinds of gases, pulse frequency, pulse with, pulse voltage, and treatment time. Even though PMMA, PHEMA, and PHPMA have similar repeat unit structure, the optimal treatment conditions and the tendency to hydrophobic recovery were different. PHPMA, more hydrophilic polymer than PMMA and PHEMA showd better wettability and stability after mild treatment. Surface tensions were obtained by water and diiodomethane contact angle measurements to monitor the relation between hydrophobic recovery and polymer structure. Different ion species in plasma change the polar component and dispersion component of polymer surface. For better wettability surface, the increase of polar component was a dominant factor. We also characterized modified polymer surfaces using x-ray photoelectron spectroscopy(XPS), secondary ion mass spectrometry(SIMS), Fourier Transform infrared spectroscopy(FT-IR), and SEM.

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Embryotoxicity and Toxicokinetics of the Antimalarial Artesunate in Rats

  • Chung, Moon-Koo;Yu, Wook-Joon;Lee, Jin-Soo;Lee, Jong-Hwa
    • Toxicological Research
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    • 제29권1호
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    • pp.27-34
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    • 2013
  • This study was conducted to investigate the potential embryo-fetal toxicity and toxicokinetics of the antimalarial agent artesunate (ARTS) in Sprague-Dawley rats. Pregnant rats were administered ARTS daily from gestational day 6~15 via oral gavage, at test doses of 0, 2, 4, or 8 mg/kg (22 females per group). The fetuses were examined for external, visceral, and skeletal abnormalities on gestational day 20. With regard to the dams, there were no deaths, treatment-related clinical signs, changes in body weight, or food intake in any of the treatment groups. There were no treatment-related gross findings at necropsy in any treatment group. In the 8 mg/kg group, there was a decrease in gravid uterine weight and in the weight of female fetuses. There was also an increase in fetal deaths (primarily late resorptions) and an increase in post-implantation losses (37%) at 8 mg/kg. An increase in the incidence of visceral and skeletal variations at 4 and 8 mg/kg was observed. These defects included minor changes in the appearance of the kidney and thymus, as well as absent ribs or thoracic vertebrae. Toxicokinetics were assessed in a parallel study, using 4 mated females per group. Using liquid chromatography-mass spectrometry (LC-MS) analysis, the concentration of ARTS and its metabolite dihydroartemisinin (DHA) were quantified in plasma from rats on gestational days 5, 6, 10, and 15. Amniotic fluid was assayed for ARTS and DHA on gestational day 15. There was evidence of rapid conversion of ARTS to the metabolite DHA in maternal plasma, since ARTS could not be consistently detected in plasma at the three doses tested. ARTS and DHA were not detected in amniotic fluid at gestational day 15, indicating limited placental transfer of the two agents. The embryo-fetal no-observable-adverse-effect level (NOAEL) of the test item was considered to be 8 mg/kg/day for dams, and 2 mg/kg/day for embryo-fetal development.

Maxillary Sinus Floor Augmentation Using Autogenous Tooth Bone Graft in Combination with Platelet-Rich Plasma for Dental Implants: Case Series

  • Ha, Jinhee;Jeon, Dohyun;Sung, Iel-Yong;Cho, Yeong-Cheol;Lim, Se-Jeong;Son, Jang-Ho
    • Journal of Korean Dental Science
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    • 제12권1호
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    • pp.5-12
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    • 2019
  • Purpose: To determine the benefits of autogenous tooth bone (ATB) graft in combination with platelet-rich plasma (PRP) in the rates of success and survival of dental implants placed simultaneously with maxillary sinus floor augmentation (MSFA). Materials and Methods: Patients who visited the Department of Oral and Maxillofacial Surgery at Ulsan University Hospital from 2012 to 2014 and underwent simultaneous placement of implants with MSFA using ATB plus PRP were included in the study. Success and survival rates of the implants were evaluated based on the parameters of age and sex of the patient, site, follow-up period, residual bone height before surgery, diameter, and length of implant, sinus mucosa impairment, and postoperative complications. Result: A total of 23 patients and 67 implants were included in this study. The average age of the patients was $53.78{\pm}10.00$ years. The average follow-up period after installation of the prosthesis was $53{\pm}5$ months. The success and survival rates of the implants after placement of prosthesis were 95.52% and 97.01%, respectively. Conclusion: Combination of ATB and PRP showed high overall success rate, and it can be concluded that this combination is a predictable bone graft procedure for MSFA.

반도체 스위치를 이용한 고압 펄스 파워 발생기 (High-voltage Pulse Power Generator Using Semiconductor switches)

  • 김종현;류명효;센드레이;김종수;임근희
    • 전력전자학회:학술대회논문집
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    • 전력전자학회 2004년도 전력전자학술대회 논문집(2)
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    • pp.682-685
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    • 2004
  • 본 논문은 반도체 스위치를 이용한 고압 펄스 발생기에 관한 연구이다. PSII (Plasma Source Ion Implantation)의 전원 장치로 사용되었으며, 기존의 hard switch나 싸이로트론 등을 이용한 고압 펄스 파워 발생기에 비해 다음과 같은 장점을 가진다. 장수명, 고효율과 펄스 크기, 반복률, 펄스폭 등의 조정이 자유로운 높은 유연성 등의 장점이다. 또한 제안된 펄스 발생기에서 사용된 반도체 스위치는 12개의 IGBT가 직렬로 연결되어 있으며, 그 중 하나의 스위치만 능동 구동기 두개가 존재하고 나머지 스위치는 수동 구동기만으로 구성되어 있어, 구동기가 매우 간단한 장점을 가지고 있다.

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이온 충돌에 의한 저온 확산 (Low Temperature diffusion by Ion Collisions)

  • 이희용
    • 대한전자공학회논문지
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    • 제11권1호
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    • pp.33-39
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    • 1974
  • 이온의 충돌에 위한 주입자의 저온광산식 주입방법과 아울러 그 장치의 구조를 초개하였다. 본주입작용은 희석된 건기의 푸라주마분국기내에서의 저에너지 입자의 충돌과 기판의 예용가열에 의한 방사증식철산의 원리에 봉로 기인되고 있다. 본법입방식에 의해서 각종주입자를 영도체들속에 법입시켜 본 결과도 또한 나타나 있다.

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반도체 플라즈마 이온 주입공정에서 직류 펄스 전압, 전류 감지를 통한 실시간 도즈 모니터링 시스템 개발

  • 오세진;김유신;이재원;정진욱
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.195-195
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    • 2011
  • 플라즈마를 이용한 반도체 이온 주입 공정(Plasma Immersion Ion Implantation)에서 이온 도즈량(DOSE) 측정은 공정 신뢰성 및 재현성 확보를 위해 중요하다. 본 연구에서는 도즈량 측정을 위해 패러데이컵과 같이 측정 장비를 챔버에 직접 삽입 시키지 않고 챔버 외부에서 이온 주입을 위한 바이어스 전극의 직류 펄스 전압 및 전류 신호 측정을 통해 실시간으로 도즈량을 추출하는 방법을 개발하였다. 펄스 전압 신호에서 전압 신호 상승, 하강 시간에 의해 발생된 변위 전류와 플라즈마 발생 소스의 RF잡음등을 제거한 후 이온 포격으로 인한 2차 전자 방출 계수를 고려하여 펄스 동작 기간 추출을 통해 실시간으로 측정하는 알고리즘을 구현하였다.

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반도체 공정 가스에 따른 가스의 초고순도화

  • 진영모;현영철
    • 전자통신동향분석
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    • 제3권2호
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    • pp.56-60
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    • 1988
  • 반도체 가스의 순도에 따라 반도체 박막의 특성이 좌우되기 때문에 현재의 고순도 가스에서 초고순도 가스로 사용하여야 한다. 최근 반도체 공정기술은 화학증착법으로 많은 특수 가스를 사용하는데 이런 가스들은 사전에 가스에 대한 전문 지식과 기술을 충분히 이해한 다음 사용하여야만 고성능화 공정기술이 가능하다. 반도체용 가스는 회로의 집적도가 높아짐에 따라 요구되는 가스의 품질이 점점 고순도화되고 있다. 따라서 현 반도체 공정에 사용되는 가스 순도를 초고순도화 시켜야만 초고집적 소자인 4M DRAM, 16M DRAM, 64M DRAM 제품 개발 및 제조가 가능하다. 다시말해서 공정에 따른 주변조건이 이루어져야 만 반도체 산업이 크게 신장 할 수 있다. 최근 반도체 공정 기술로는 플라즈마(Plasma), 드라이에칭(Dry etching), CVD(Chemical Vapor Deposition), MOCVD(Metal Organic Chemical Vapor Deposition), Ion Implantation, EPI 공정으로 거의 대부분 공정 가스가 가연성, 폭발성, 독성, 부식성 이기 때문에 한번 취급을 잘못하면 막대한 인명 및 재산 피해를 입히므로 취급상 특별한 주의를 요하고 사전에 가스의 전문 지식과 기술을 충분히 이해한 다음 사용하여야 한다.