• Proceedings of the IEEK Conference
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• 2002.06b
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• pp.201-204
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• 2002

A large area inductively coupled plasma which is applicable to LCD processing is built with a modified single loop RF antenna. Combination of parallel and series paths of RF current through the antenna induces local enhancement of plasma density, which in turn provides uniform plasma density near the substrate. The plasma density distribution is measured and compared with that of the conventional single loop antenna. Aisotropic etching of photoresist is performed, and it is found that etch uniformity is improved by 3％ from 15% of the conventional etcher over 350$\times$300mm glass substrates. Photoresist etching rate and uniformity can be further improved by applying a periodic weak axial magnetic fieid.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.179-179
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• 2012

Low pressure radio-frequency glow discharges are investigated using theoretical modeling and various experimental diagnostic methods. In the calculations, global models and transformer models are developed to understand the chemical kinetics as well as the electrical properties such as the effective collision frequency, the heating mechanism and the power transferred to the plasma electrons. In addition, Boltzmann equation solver is used to compensate the effect of the electron energy distribution function (EEDF) shape in the global model, and the general expression of energy balance for non-Maxwellian electrons is developed. In the experiments, a number of traditional plasma diagnostic methods are used to compare with calculated results such as Langmuir probe, optical emission spectroscopy (OES), optical absorption spectroscopy (OAS) and two-photon absorption laser-induced fluorescence (TALIF). These theoretical and experimental methods are applied to understand several interesting phenomena in low pressure ICP discharges. The chemical and physical properties of low pressure ICP discharges are described and the applications of these methods are discussed.

• Journal of Powder Materials
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• v.14 no.2 s.61
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• pp.140-144
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• 2007

Using Spark Plasma Sintering process (SPS), consolidation behavior of gas atomized $Mg_{97}Zn_1Y_2$ alloys were investigated via examining the microstructure and evaluating the mechanical properties. In the atomized ahoy powders, fine $Mg_{12}YZn$ particles were homogeneously distributed in the ${\alpha}-Mg$ matrix. The phase distribution was maintained even after SPS at 723 K, although $Mg_{24}Y_5$ particles were newly precipitated by consolidating at 748 K. The density of the consolidated bulk Mg-Zn-Y alloy was $1.86g/cm^3$. The ultimate tensile strength (UTS) and elongation were varied with the consolidation temperature.

• Journal of the Korean Society of Industry Convergence
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• v.7 no.1
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• pp.115-120
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• 2004

An indoor air cleaner consisting of a dielectric barrier discharge system and an electrostatic precipitator (ESP) was experimentally investigated. The function of the dielectric barrier discharge is to precharge particles by producing nonthermal plasma before indoor air enters ESP, leading to an enhancement in dust collection efficiency. The dependence of particle size distribution on the plasma discharge was examined to understand the mechanism of the particle precharging. The plasma discharge was found to increase the electrical force of the particles, rather than agglomerate them. Coarse particles in the range of 0.5 to $5.0{\mu}m$ were observed to be easily collected by this indoor air cleaner, and the present study laid emphasis on the removal of fine particles of $0.3{\mu}m$. The collection efficiency of the fine particles was largely enhanced by the plasma discharge.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.05b
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• pp.41-45
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• 2005

In this paper, parameters of electron temperature and density for the mercury-free lighting-source were measured to diagnosis and analyze in Xe based inductively coupled plasma(ICP). In results at several dependences of 20~100 mTorr Xenon pressure, 50~200W RF power and horizontal distribution were especially mentioned. When Xe pressure was 20mTorr and RF power was 200W, the electron temperature and density were respectively 3.58eV and $3.56{\times}10^{12}cm^{-3}$. The key parameters of Xe based ICP depended on Xe pressure more than RF power that could be verified. A high electron temperature and low electron density with a suitable Xe pressure are indispensible parameters for Xe based ICP lighting-source.

• The Korean Journal of Ceramics
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• v.3 no.1
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• pp.24-28
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• 1997

Diamond deposition by muti-cathode DC PACVD has been investigated. Five cathodes were independently connected to their own DC power supplies. The voltage and current of each cathods were varied up to 700 V and 3.5 A, respectively. The plasma formation and the diamond deposition behaviour on a substrate of 3 inch in diameter were investigated by optical emission spectroscopy, SEM and Raman spectroscopy. The plasma formed by five cathodes was non-uniform, which was depended on the geometry of cathods array. The growth rate and the quality of diamond film were closely related to the spatial distribution of the plasma.

• Transactions on Electrical and Electronic Materials
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• v.2 no.1
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• pp.1-6
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• 2001

$C_{x}F_{y}$ polymer film was deposited in rf and dc Fluorinert vapor ($C_{7}F_{16}$) plasmas. In the plasma phase, the spatial distribution of optical emission spectra and the temporal concentration of decomposed species were monitored, and kinetics of the $C_{7}F_{16}$ decomposition process was discussed. Deposition of $C_{x}F_{y}$ film has been tried on substrates of stainless steel, glass, molybdenum and silicon wafers at room temperature in the vapor pressures of 40 and 100 Pa. The films deposited in the rf plasma showed excellent electrical properties as an insulator for multi-layered interconnection of deep-submicron LSI, i.e. the low dielectric constant ∼2.0, the dielectric strength ∼2 MV/cm and the high deposition rate ∼100nm/min at 100W input power.

• Journal of Welding and Joining
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• v.11 no.2
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• pp.74-85
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• 1993

Effect of Si metal powders addition with the plasma transferred arc(PTA) overlaying process on characteristics of the alloyed layer in aluminum alloy(A5083) has been investigated. The overlaying conditions were 175-250A in plasma arc current, 500mm/min in travel speed, the 5-20g/min in powder feeding rate. Main results obtained are summarized as follows. 1)Sufficient size of molten pool on surface of base metal was required for forming an alloyed layer; in a fixed travel, the formation of alloyed layer with clear and beautiful surface depend upon the plasma arc current and powder feeding rate; the greater plasma arc current and the smaller powder feeding rate were, the better bead was formed. Optimum alloyed conditions by which an excellent alloyed bead obtained was 225A in plasma arc current. PTA process made it possible to form an alloyed layer with up to 67wt% Si. 2)Microstructure in the alloyed layer was in accord with prediction from the Al-Si phase diagram 3)The hardness of the alloyed layer increased in proportion to Si content. 4)As volume fraction of primary Si increased, the specific wearness of the alloyed layer was significantly improved. However, no further improvement was found when the volume fraction was greater than about 30%. 5)Utilizing the PTA process, a crack free alloyed layer with maximum hardness of about Hv 310 could be obtained.

• KIEE International Transactions on Electrophysics and Applications
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• v.2C no.5
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• pp.246-252
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• 2002

Two-dimensional steady state simulations of planar type radio frequency inductively coupled plasma (RFICP) have been performed. The characteristics of RFICP were investigated in terms of power transfer efficiency, equivalent circuit analysis, spatial distribution of plasma density and electron temperature. Plasma density and electron temperature were determined from the equations of ambipolar diffusion and energy conservation. Joule heating, ionization, excitation and elastic collision loss were included as the source terms of the electron energy equation. The electromagnetic field was calculated from the vector potential formulation of ampere's law. The peak electron temperature decreases from about 4eV to 2eV as pressure increases from 5 mTorr to 100 mTorr. The peak density increases with increasing pressure. Electron temperatures at the center of the chamber are almost independent of input power and electron densities linearly increase with power level. The results agree well with theoretical analysis and experimental results. A single turn, edge feeding antenna configuration shows better density uniformity than a four-turn antenna system at relatively low pressure conditions. The thickness of the dielectric window should be minimized to reduce power loss. The equivalent resistance of the system increases with both power and pressure, which reflects the improvement of power transfer efficiency.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07b
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• pp.1147-1150
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• 2003

The RF inductive discharge or inductively coupled plasma (ICP) continues to attract growing attention as an effective plasma source in many industrial applications, the best known of which are plasma processing and lighting technology Although most practical ICPs operate at 13.56 (MHz) and 2.65 (MHz), the trend to reduce the operating frequency is clearly recognizable from recent ICP developments. In an electrodeless fluorescent lamp, the use of a lower operating frequency simplifies and reduces cost of rf matching systems and rf generators and can eliminate capacitive coupling between the inductor coil and plasma, which could be a strong factor in wall erosion and plasma contamination. In this study, the configuration of ferrite and fixture which operates at the frequency of 2.65 (MHz) will be discussed, by using the electromagnetic simulation (Maxwell 2D).