• 제목/요약/키워드: Plasma distribution

검색결과 774건 처리시간 0.024초

신규 퀴놀론계 항생물질 DWQ-013의 흰쥐 및 생쥐에서의 체내동태 (Pharmacokinetic Study on DWQ-013, a New Quinolone, in Rats and Mice)

  • 조재열;남권호;김동오;이종완;박남준;강영숙;유영효;이재욱
    • 약학회지
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    • 제39권3호
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    • pp.223-230
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    • 1995
  • The phannacokinetics and tissue distribution of DWQ-013, a new quinolone, were examined in rats and mice following a single intravenous and oral administration. DWQ-013 in plasma and urine was determined by both HPLC and microbiological assay. The plasma concentration of the drug declined biexponentially. The terminal half life of the drug was 11.11$\pm$0.14 hour after intravenous dosing. The volume of distribution at terminal elimination phase(Vd$_\beta$) and total clearance of the drug were 1.29$\pm$0.15 l/kg and 0.78$\pm$0.09 l/h/kg. The bioavailability of DWQ-013 after oral administration was 56.0% (HPLC) and 77.2%(bioassay), respectively. Twelve-hour urinary recovery of drug was measured by HPLC and bioassay to 0.035$\pm$0009% and 4.71$\pm$066% after oral dosing, to 0.055$\pm$0.014% and 7.65$\pm$1.53% after intravenous dosing, which may indicate the presence of biologically active metabolites. Binding of the drug to plasma proteins ranged from 97%~99% at various concentrations. The drug was highly distributed in order of liver, kidney and lung after 1.5 hours in mice.

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Bubble occurrence and interhemispheric plasma transport

  • Park, Jaeheung;Lee, Jae-jin;Lee, Ensang;Min, Kyoung-Wook
    • 한국우주과학회:학술대회논문집(한국우주과학회보)
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    • 한국우주과학회 2004년도 한국우주과학회보 제13권1호
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    • pp.72-72
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    • 2004
  • We have compared here the seasonal average of the plasma density with the EPB occurrence in a given longitude sector, using KOMPSAT-1 and DMSP data. It could be evidenced on a global scale that the EPB occurrence was nearly anti-correlated with the poleward drift speed parallel to B-field, and with the degree of asymmetry of the latitudinal plasma distribution. But, the seasonal-longitudinal change of the asymmetry was different from what the current theory expected. (omitted)

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Monte Carlo 법을 이용한 플라즈마 내의 이온 운동 해석 (alysis of ion motion in fusion plasma by Monte Carlo Simulation)

  • 이홍식;황기웅
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1989년도 하계종합학술대회 논문집
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    • pp.447-450
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    • 1989
  • Single particle orbit in plasma is obtained by drift Hamiltonian formulation in magnetic coordinate. The collisional effect is implied by Monte Carlo Method and the velocity space diffusion, energy transfer to the back ground plasma and the variation of energy distribution of test particles are investigated from many particles analysis.

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이온 플레이팅 응용 스퍼터링 장치에 관한 연구 (A Study on the Sputtering System Using Ion Plating Technique)

  • 정연호;최영욱
    • 전기학회논문지
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    • 제56권12호
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    • pp.2179-2183
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    • 2007
  • In this paper, to produce sheet plasma with high density for ion plating, we designed magnetic circuit of ion plating device consisting of solenoid coil and rectangular permanent magnet. And, we analyzed the effects of the magnetic field distribution using FEM (Finite Element Methode). Additionally, we made a sputtering system including ion plating technique on the basis of the design and verified the possibility of the sheet plasma application for advanced sputter system.

이온유체방정식을 이용한 Plasma Sheath 시변 해석 (Analysis of Time-Dependent Behavior of Plasma Sheath using Ion Fluid Model)

  • 이호준;이해준
    • 전기학회논문지
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    • 제56권12호
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    • pp.2173-2178
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    • 2007
  • Dynamics of plasma sheath was analyzed using simple ion fluid model with poison equation. Incident ion current, energy, potential distribution and space charge density profile were calculated as a function of time. The effects of initial floating sheath on the evolution of biased sheath were compared with ideal matrix sheath. The effects of finite rising time of pulse bias voltage on the ion current and energy was studied. The influence of surface charging on the evolution of sheath was also investigated

Spatial Distribution of Excited Argon Species in and Inductively Coupled Plasma

  • 최범석
    • Bulletin of the Korean Chemical Society
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    • 제19권11호
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    • pp.1172-1174
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    • 1998
  • Spatial(radial and height) distributions of excited argon species are measured for an inductively coupled plasma under five operating conditions: 1) no carrier gas, 2) carrier gas without aerosol, 3) carrier gas with desolvated aerosol, 4) carrier gas with aerosol, 5) carrier gas with aerosol and excess lithium. A complete RF power mapping of argon excited states is obtained. The excited states of argon for a typical analytical torch rapidly diffuse towards the center in the higher region of the plasma. The presence of excess lithium makes no significant change in the excited states of argon. The increase in the RF power increases the intensity of argon excited states uniformly across the radial coordinate.

Numerical Investigation of Scattering from a Surface Dielectric Barrier Discharge Actuator under Atmospheric Pressure

  • Kim, Yuna;Kim, Sangin;Kim, Doo-Soo;Oh, Il-Young;Yook, Jong-Gwan
    • Journal of electromagnetic engineering and science
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    • 제18권1호
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    • pp.52-57
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    • 2018
  • Surface dielectric barrier discharge (SDBD), which is widely used to control turbulence in aerodynamics, has a significant effect on the radar cross-section (RCS). A four-way linearly synthesized SDBD air plasma actuator is designed to bolster the plasma effects on electromagnetic waves. The diffraction angle is calculated to predict the RCS because of the periodic structure of staggered electrodes. The simplified plasma modeling is utilized to calculate the inhomogeneous surface plasma distribution. Monostatic RCS shows the diffraction in the plane perpendicular to the electrode array and the notable distortion by plasma. In comparison, the overall pattern is maintained in the parallel plane with minor plasma effects. The trends also appear in the bistatic RCS, which has a significant difference in the observation plane perpendicular to the electrodes. The peaks by Bragg's diffraction are shown, and the RCS is reduced by 10 dB in a certain range by the plasma effect. The diffraction caused by the actuator and the inhomogeneous air plasma should be considered in designing an SDBD actuator for a wide range of application.

저온프로세스를 이용한 고분자필름의 플라즈마 표면처리 (Plasma Surface Treatment of the Polymeric Film with Low Temperature Process)

  • 조욱;양성채
    • 한국전기전자재료학회논문지
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    • 제21권5호
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    • pp.486-491
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    • 2008
  • The plasma processing is applied to many industrial fields as thin film deposition or surface treatment technique. In this study, we investigated large-area uniformed surface treatment of PET film at low temperature by using Scanning Plasma Method(SPM). Then, we measured difference and distribution of temperature on film's surface by setting up a thermometer. We studied the condition of plasma for surface treatment by examining intensity of irradiation of uniformed plasma. And we compared contact angles of treated PET film by using Ar and $O_2$ plasma based low temperature. In our result, surface temperature of 3-point of treating is low temperature about $22^{\circ}C$, in other hands, there is scarcely any variation of temperature on film's surface. And by using Ar plasma treatment, contact angle is lower than untreatment or $O_2$ plasma treatment. In case of PET film having thermal weak point, low temperature processing using SPM is undamaged method in film's surface and uniformly treated film's surface. As a result, Ar plasma surface treatment using SPM is suitable surface treatment method of PET film.

유체 시뮬레이션을 이용한 유도결합 Ar/CH4 플라즈마의 특성 분석 (Characterization of Inductively Coupled Ar/CH4 Plasma using the Fluid Simulation)

  • 차주홍;이호준
    • 전기학회논문지
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    • 제65권8호
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    • pp.1376-1382
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    • 2016
  • The discharge characteristics of inductively coupled $Ar/CH_4$ plasma were investigated by fluid simulation. The inductively coupled plasma source driven by 13.56 Mhz was prepared. Properties of $Ar/CH_4$ plasma source are investigated by fluid simulation including Navier-Stokes equations. The schematics diagram of inductively coupled plasma was designed as the two dimensional axial symmetry structure. Sixty six kinds of chemical reactions were used in plasma simulation. And the Lennard Jones parameter and the ion mobility for each ion were used in the calculations. Velocity magnitude, dynamic viscosity and kinetic viscosity were investigated by using the fluid equations. $Ar/CH_4$ plasma simulation results showed that the number of hydrocarbon radical is lowest at the vicinity of gas feeding line due to high flow velocity. When the input power density was supplied as $0.07W/cm^3$, CH radical density qualitatively follows the electron density distribution. On the other hand, central region of the chamber become deficient in CH3 radical due to high dissociation rate accompanied with high electron density.

반도체 플라즈마 식각 장치의 부품 가공 연구 (A Study of Machining Optimization of Parts for Semiconductor Plasma Etcher)

  • 이은영;김문기
    • 반도체디스플레이기술학회지
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    • 제19권4호
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    • pp.28-33
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    • 2020
  • Plasma etching process employs high density plasma to create surface chemistry and physical reactions, by which to remove material. Plasma chamber includes silicon-based materials such as a focus ring and gas distribution plate. Focus ring needs to be replaced after a short period. For this reason, there is a need to find materials resistant to erosion by plasma. The developed chemical vapor deposition processing to produce silicon carbide parts with high purity has also supported its widespread use in the plasma etch process. Silicon carbide maintains mechanical strength at high temperature, it have been use to chamber parts for plasma. Recently, besides the structural aspects of silicon carbide, its electrical conductivity and possibly its enhanced life time under high density plasma with less generation of contamination particles are drawing attention for use in applications such as upper electrode or focus rings, which have been made of silicon for a long time. However, especially for high purity silicon carbide focus ring, which has usually been made by the chemical vapor deposition method, there has been no study about quality improvement. The goal of this study is to reduce surface roughness and depth of damage by diamond tool grit size and tool dressing of diamond tools for precise dimensional assurance of focus rings.