• Proceedings of the Korean Vacuum Society Conference
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• 2000.02a
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• pp.194-194
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• 2000

There are difficulties on transport modelling on high density plasma discharge, because of severe restrictions on space grid size and time step size. We present a new unconditionally stable algorithm for fluid simulation of high density process plasma. The origin of the restriction is investigated and a new method to solve the problem is suggested, The simulation result is compared with the other methods previously developed.

• Applied Science and Convergence Technology
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• v.26 no.5
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• pp.133-138
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• 2017

We investigated the interface defect engineering and reaction mechanism of reduced transition layer and nitride layer in the active plasma process on 4H-SiC by the plasma reaction with the rapid processing time at the room temperature. Through the combination of experiment and theoretical studies, we clearly observed that advanced active plasma process on 4H-SiC of oxidation and nitridation have improved electrical properties by the stable bond structure and decrease of the interfacial defects. In the plasma oxidation system, we showed that plasma oxide on SiC has enhanced electrical characteristics than the thermally oxidation and suppressed generation of the interface trap density. The decrease of the defect states in transition layer and stress induced leakage current (SILC) clearly showed that plasma process enhances quality of $SiO_2$ by the reduction of transition layer due to the controlled interstitial C atoms. And in another processes, the Plasma Nitridation (PN) system, we investigated the modification in bond structure in the nitride SiC surface by the rapid PN process. We observed that converted N reacted through spontaneous incorporation the SiC sub-surface, resulting in N atoms converted to C-site by the low bond energy. In particular, electrical properties exhibited that the generated trap states was suppressed with the nitrided layer. The results of active plasma oxidation and nitridation system suggest plasma processes on SiC of rapid and low temperature process, compare with the traditional gas annealing process with high temperature and long process time.

• International Journal of Automotive Technology
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• v.3 no.1
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• pp.9-16
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• 2002

In plasma jet ignition, combustion enhancement effects occur toward the plasma jet issuing direction. Therefore, when the igniter is attached at the center of a cylindrically shaped combustion chamber, plasma jet should issue toward the round combustion chamber wall. The plasma jet igniter that had an annular circular orifice has been developed. The purpose of this study is to elucidate the relationship between the newly developed plasma Jet igniter configuration and combustion enhancement effects. In this newly developed plasma Jet igniter, flame front wrinkle appears on the flame front and flame propagates rapidly. Plasma Jet influences on the flame propagation far long period when the plasma jet igniter has issuing angle 90 degrees and large cavity volume, because the plasma jet only lasts several ms. However, in the early stage of combustion, flame front area of issuing angle 45 degrees is larger than that of 90 degrees, because the initial flame kernel is formed by the plasma jet.

• The Korean Journal of Ceramics
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• v.2 no.4
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• pp.231-237
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• 1996

Mullite ceramics can be sintered by rf plasma sintering to densities as high as 97% compared to the theoretical density of the mullite, while SiC whisker-reinforced mullite matrix ceramic composites were not sintered by plasma sintering. Decomposition of mullite occurs in a superficial regins at the outside surface of the specimen by volatilization of SiO at elevated temperature by plasma. SiC whiskers were destroyed, and the matrix was converted to alumina from SiC-whisker reinforced mullite matrix ceramic composites during the plasma sintering. Accelerated volatilization from the SiC whisker in the mullite prevents sintering. The volatile species are mainly SiC and CO gas species. The effects of plasma on mullite and SiC-whisker reinforced mullite matrix composites are interpreted by thermodynamic simulation of the volatile species in the plasma environment. The thermodynamic results show that the decomposition will not occur during hot pressing.

• Proceedings of the KIPE Conference
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• 2002.07a
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• pp.245-248
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• 2002

In this paper, the development of the RF power supply for Remote Plasma System is discussed. 7kW, 400kHz Remote Plasma Generator is designed and tested. The main power stage is used for the HB PWM inverter with an LC filter in the secondary circuit. The operation characteristics of Remote Plasma Generator are verified by simulation and experimental results.

• Applied Science and Convergence Technology
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• v.24 no.6
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• pp.232-236
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• 2015

The electro-optical characteristics of several functional layers over the MgO protective layer were studied during the continuous discharge of an AC-PDP. In order to observe the degradation of each functional layer on the MgO protection layer, we measured the surface morphology, cathodoluminescence (CL) spectrum, the secondary electron emission coefficient (${\gamma}$) and the discharge characteristics after 500 hours of discharge during the operation of the AC-PDP.

• Applied Science and Convergence Technology
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• v.23 no.4
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• pp.179-186
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• 2014

Fluid model based numerical simulation was carried out for an inductively coupled plasma assisted sputter deposition system. Power absorption, electron temperature and density distribution was modeled with drift diffusion approximation. Effect of an electrically conducting substrate was analyzed and showed confined plasma below the substrate. Part of the plasma was leaked around the substrate edge. Comparison between the quasi-neutrality based compact model and Poisson equation resolved model showed more broadened profile in inductively coupled plasma power absorption than quasi-neutrality case, but very similar Ar ion number density profile. Electric potential was calculated to be in the range of 50 V between a Cr rod source and a conductive substrate. A new model including Cr sputtering by Ar+was developed and used in simulating Cr deposition process. Cr was modeled to be ionized by direct electron impact and showed narrower distribution than Ar ions.

• Applied Science and Convergence Technology
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• v.27 no.2
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• pp.23-25
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• 2018

With respect to the electrode structure and the discharge characteristics, the atmospheric pressure plasma sheet of a thin polyimide film is introduced in this study; here, the flexible plasma device of a dielectric-barrier discharge with the ground electrode and the high-voltage electrode formulated on each surface of a polyimide film whose thickness is approximately $100{\mu}m$, that is operated with a sinusoidal voltage at a frequency of 25 kHz and a low voltage from 1 kV to 2 kV is used. The streamer discharge is appeared along the cross-sectional boundary line between two electrodes at the ignition stage, and the plasma is diffused on the dielectric-layer surface over the high-voltage electrode. In the development of a plasma sheet with thin dielectric films, the avoidance of the insulation breakdown and the reduction of the leakage current have a direct influence on the low-voltage operation.

• Journal of Hydrogen and New Energy
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• v.22 no.6
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• pp.934-941
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• 2011

Characteristics of low NOx burner is investigated. Low NOx burner introduced in this paper adopts two staged combustion with plasma burner for the 1st stage combustion. Extensive parametric tests were done to figure out the effect of burner stoichiometry, staged thermal load, electric power for plasma generation. Overall NOx production by burner shows effective reduction by adopting plasma staged burner. and the aspects depends on the fuel stoichiometry of 1st stage burner or operating condition of plasma burner. It is promising to use plasma burner as an alternative tools of low NOx burner technology.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.16 no.1
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• pp.20-24
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• 2006

Iridium-catalyzed carbon nanofilaments were formed on MgO substrate as a function of the gap between the substrate and the plasma using microwave plasma-enhanced chemical vapor deposition method. Under the remote plasma condition, carbon nanofibers were formed on the substrate. Under the adjacent plasma condition, on the other hand, carbon nanotubes-like materials instead of carbon nanofibers could be formed. When the substrate immersed into the plasma, any carbon nanofilaments formation couldn't be observed. During the reaction, the substrate temperatures were measured as a function of the gap. Based on these results, the cause for the different carbon nanofilaments formation according to the gap was discussed.