• 한국정밀공학회지
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• 제26권3호
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• pp.122-128
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• 2009

DBD(Dielectric Barrier Discharges) plasma is often used to clean the surface of semiconductor. The cleaning performance is affected mainly by plasma density and duration time. In this study, the plasma density is predicted by coupled simulation of flow, chemistry mixing and reaction, plasma, and electric field. 13.56 MHz of RF source is used to generate plasma. The effect of dielectric thickness, gap distance, and flow velocity on plasma density is investigated. It is shown that the plasma density increases as the dielectric thickness decreases and the gap distance increases.

• Nuclear Engineering and Technology
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• 제29권6호
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• pp.459-467
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• 1997

The steady-state behavior of recycling neutral atoms in a tokamak edge region has been analyzed through a two-dimensional Monte Carlo simulation. A particle tracking algorithm used in earlier research on the neutral particle transport is applied to this Monte Carlo simulation in order to perform more accurate calculations with the EDGETRAN code which was previously developed for a two-dimensional edge plasma transport in the authors' laboratory. The physical model of neutral recycling includes charge-exchange and ionization interactions between plasmas and neutral atoms. The reflection processes of incident particles on the device wall are described by empirical formulas. Calculations for density, energy, and velocity distributions of neutral deuterium-tritium atoms have been carried out for a medium-sized tokamak with a double-null configuration based on the KT-2 conceptual design. The input plasma parameters such as plasma density, ion and electron temperatures, and ion fluid velocity are provided from the EDGETRAN calculations. As a result of the present numerical analysis, it is noticed that a significant drop of the neutral atom density appears in the region of high plasma density and that the similar distribution of neutral energy to that of plasma ions is present as frequently reported in other studies. Relations between edge plasma conditions and the neutral recycling behavior are discussed from the numerical results obtained herein.

• 전기학회논문지P
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• 제62권1호
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• pp.18-22
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• 2013

This paper describes the information for quantitative simulation of weakly ionized plasma. We must grasp the meaning of the plasma state condition to utilize engineering application and to understand materials of plasma state. Using quantitative simulations of weakly ionized plasma, we can analyze gas characteristic. In this paper, the electron transport characteristic in $CH_4$ has been analysed over the E/N range 0.1~300[Td], at the 300[$_{\circ}\;K$] by the two term approximation Boltzmann equation method and Monte Carlo Simulation. Boltzmann equation method has also been used to predict swarm parameter using the same cross sections as input. The behavior of electron has been calculated to give swarm parameter for the electron energy distribution function has been analysed in $CH_4$ at E/N=10, 100 for a case of the equilibrium region in the mean energy. A set of electron collision cross section has been assembled and used in Monte Carlo simulation to predict values of swarm parameters. The result of Boltzmann equation and Monte Carlo Simulation has been compared with experimental data by Ohmori, Lucas and Carter. The swarm parameter from the swarm study are expected to sever as a critical test of current theories of low energy scattering by atoms and molecules.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제51권9호
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• pp.436-442
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• 2002

Recently color AC PDP(plasma display panel) technology is rapidly improved. However, the luminous efficiency improvement is a key issue for making plasma display into a large-area flat display. In this paper, we suggest a new concentration of Xe in He-Ne-Xe gas mixture in order to achieve a high luminous efficiency of color AC PDPs. We calculated the densities of 25 species as a function of the time zero dimensional simulation using CVODE solver and we compared the results of zero dimensional simulation with a measurement of photo wave brightness and luminous efficiency, in order to find the optimum mixing condition of He-Ne-Xe gas in color plasma display panel. We obtained a high discharge speed under Xe mixing ratio of 1% by simulation and confirmed that through measuring photo wave.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.544-545
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• 2013

Recently, low-temperature atmospheric-pressure plasmas have been investigated [1,2] for biomedical applications and surface treatments. Experiments for improving hydrophilicity of stainless steel (SUS 304) plate with atmospheric microwave argon and H2O2 mixture plasma jet [3] were carried out and experimental measurements and plasma simulations were conducted for investigating the characteristics of plasma for the process. After 30 s of low power (under 10 W) and low temperature (under $50^{\circ}C$) plasma treatment, the water contact angle decreased rapidly to around $10^{\circ}$ from $75^{\circ}$ and was maintained under $30^{\circ}$ for a day (24 hours). The surface free energy, calculated from the contact angles, increased. The chemical properties of the surface were examined by X-ray Photoelectron Spectroscopy (XPS) and the surface morphology and roughness were examined by Scanning Electron Microscopy (SEM) and Atomic Force Microscopy (AFM) respectively. The characteristics of plasma sources with several frequencies were investigated by Optical Emission Spectroscopy (OES) measurement and one-dimensional Particle-in-Cell (PIC) simulation and zero-dimensional global simulation [4]. The relation between plasma components and the efficacy of the surface modification were discussed.

• 전기학회논문지
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• 제57권5호
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• pp.816-820
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• 2008

The RF inductive discharge of inductively couples plasma (ICP) continues to attract growing attention as an effective plasma source in many industrial applications, the best known of which are plasma processing and lighting technology. Although most practical ICPs operate at 13.56 [MHz] and 2.65 [MHz], the trend to reduce the operating frequency is clearly recognizable from recent ICP developments. In an electrodeless fluorescent lamp, the use of a lower operating frequency simplifies and reduces cost of RF matching systems and RF generators and can eliminate capacitive coupling between the inductor coil and plasma, which could be a strong factor in wall erosion and plasma contamination. In this study, We discussed simulation and experimental results when changing ferrite position in antenna.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1996년도 하계학술대회 논문집 A
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• pp.163-165
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• 1996

In the PIC simulation of plasma, the fields are commonly calculated on uniform spatial grids using FDM. But, FDM has a difficulty in modeling a complex shaped model. FEM has a good flexibiblity in treating a complex shape, so that we calculated the field by using FEM not FDM. In this paper, the plasma between plane-to-plane electrodes was simulated using FEM and FDM. Comparing the results of those two methods told us that FEM is also valid as a calculating method in PIC plasma simulation. In order to verify the use of FEM, the discharge of rod-to-plane was simulated. There was not a little distortion of the electric field between the electrodes due to the distribution of space charges.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제52권9호
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• pp.407-411
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• 2003

The purpose of this paper is to study the removal of nitrogen oxide(NOx) using a wire-plate type plasma reactor with magnet attached for indoor air purification. In order to produce a more effective reactor, we conducted magnetic field simulations. The results of the magnetic field simulations show that NOx can be removed more effectively. The results from the magnetic field simulation show that when 7 magnets were applied to the reactor, the magnetic flux density was at its highest amount than when using 0, 3, or 5 magnets. From the data obtained by the simulation results a plasma reactor was made and thus, several experiments were conducted. The best removal efficiency was obtained with 14 W AC power to the reactor with 5 magnets.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제55권12호
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• pp.601-605
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• 2006

The resistance-capacitance (RC) delay of signals through interconnection materials becomes a big hurdle for high speed operation of semiconductors which contain multi-layer interconnections in smaller scales with higher integration density. Low-k materials are applied to the inter-metal dielectric (IMD) materials in order to overcome the RC delay. Relaxation continuum (RCT) model that includes neutral-species transport model have developed to model the etching process in a capacitively coupled plasma (CCP) device. We present the parametric study of the modeling results of a two-frequency capacitively coupled plasma (2f-CCP) with $N_2/H_2$ gas mixture that is known as promising one for organic low-k materials etching. For the etching of low-k materials by $N_2/H_2$ plasma, N and H atoms have a big influence on the materials. Moreover the distributions of excited neutral species influence the plasma density and profile. We include the neutral transport model as well as plasma one in the calculation. The plasma and neutrals are calculated self-consistently by iterating the simulation of both species till a spatio-temporal steady state profile could be obtained.

• Nuclear Engineering and Technology
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• 제56권2호
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• pp.546-551
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• 2024

As an effective methods of plasma heating, neutral beam injection (NBI) systems based on negative hydrogen ion sources will be utilized in future magnetic-confinement nuclear fusion experiments. Because of the collisions between the fast negative ions and the neutral background gas, the positive ions are inevitable created in the acceleration region in the negative NBI system. These positive ions are accelerated back into the ion source and become high energy backstreaming ions. In order to explore the characters of backstreaming ions, the track and power deposition of backstreaming H⁺ beam is estimated using the experimental and simulation methods at NNBI test facility. Results show that the flux of backstreaming positive ions is 1.93 % of that of negative ion extraction from ion source, and the magnet filed in the beam source has an effect on the backstreaming positive ions propagation.