• Proceedings of the Materials Research Society of Korea Conference
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• 2003.11a
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• pp.121-121
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• 2003

NiO thin films are very attractive for use as an antiferromagnetic layer, p-type transparent conducting films, in electrochromic devices and functional sensor layer for chemical sensors, due to their excellent chemical stability, as well as optical, electrical and magnetic properties. In addition, (100)- and (111)-oriented NiO films can be used as buffer layers on which to deposit other oriented oxide films, such as c-axis-oriented perovskite-type ferromagnetic films and superconducting films, because of the similarity in symmetry of oxygen ion lattice and lattice constants between the NiO films and the oriented oxide films. Thus, controlling the crystallographic orientation and surface roughness of the NiO films for a buffer layer are very important.

• Proceedings of the KWS Conference
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• 2002.10a
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• pp.606-611
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• 2002

Welding using lasers can be mass-produced in high speed. In the laser welding, performing real-time monitoring system of the welding quality is very important in enhancing the efficiency of welding. In this study, the plasma and molten metal which are generated during laser welding were measured using the UV sensor and IR sensors. The results of laser welding were classified into five categories such as optimal heat input, little low heat input, low heat input, partial joining due to gap mismatch, and nozzle deviation. Also, a system was formulated which uses the measured signals with a fuzzy pattern recognition method which is used to perform real-time evaluation of the welding quality and the defects which can occur in laser welding.

• Journal of the Korean institute of surface engineering
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• v.29 no.6
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• pp.703-708
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• 1996

Humidity sensing cheracterisrics of vacuum deposited plasma poly merized $YbPc_2$ films were evaluated. In both films, humidity caused an increase of pro-ton conduction. Polymerised film shows a threshold fo humidity increase and its sensitivity diminishes more than $38^{\circ}C$ of relative humidity. Furthermore, for the polymerized film, two min. of resssponse time and 1 min. of recovery time are also obtained. The sensitivity between 10% and 85% of relative hum-idities is found to be one hundred higher than that of the vacuum deposited film.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.16 no.8
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• pp.731-735
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• 2003

Ti-indiffused LiNbO$_3$waveguide have been used to various high speed optical device based on electro-optic effect such as modulators, switches, and sensor, etc. In order to high speed modulation of optical modulator have, one of the further devices, needed to increasing of electrode surrounding air by LiNbO$_3$dry etching because of impedance matching for optical and RF phase velocity between waveguide and electrode. We studied property of LiNbO$_3$dry etching after waveguide patterning lot optical modulation by using neutral loop discharge (NLD) plasma.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.460-461
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• 2007

본 연구에서는 반도체 플라즈마 장비 감시를 위한 CUSUM 제어 차트 설계기법에 관해 연구하였다. CUSUM 제어차트에 관여하는 설계변수의 다양한 조합에 대하여 플라즈마 장비의 감시 성능을 평가하였다. 평가를 위해 RF 정합망 감시시스템을 이용하여 플라즈마 임피던스 정합에 관여하는 정합변수에 대한 실시간 데이터를 수집하였으며, 여기에는 임피던스와 상위치에 대한 전기적 정보, 그리고 반사전력에 대한 정보가 포함된다. 평가결과, 설계변수의 조합에 대하여 감시 성능이 크게 달랐지만, 각 센서 정보의 감시 성능을 증진시키는 설계변수의 조합이 있었음을 확인하였으며, 이는 각 종 다양한 센서정보별 CUSUM 제어 차트의 설계가 필요함을 의미한다. 연구에서는 Raw 데이터 대비 성능 분석을 위해 CUSUM 제어 차트의 설계변수를 변수인 d와 ${\Theta}$값의 변화를 주어 다수의 (d, ${\Theta}$)의 조합에 따른 감시 성능을 평가하였으며, 평가에 이용된 데이터는 소스전력이 750 W, 압력이 15 mTorr, Ar 유량이 50 seem일 때 수집하였다.

• Journal of the Semiconductor & Display Technology
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• v.20 no.3
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• pp.27-31
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• 2021

VI probe, which is one of various in-situ plasma monitoring sensor, is frequently used for in-situ process monitoring in mass production environment. In this paper, we correlated the plasma etch results with VI probe data with the small amount of gas flow rate changes to propose usefulness of the VI probe in real-time process monitoring. Several different sized contact holes were employed for the etch experiment, and the etched profiles were measured by scanning electron microscope (SEM). Although the shape of etched hole did not show satisfactory relationship with VI probe data, the chamber status changed along the incremental/decremental modification of the amount of gas flow was successfully observed in terms of impedance monitoring.

• International Journal of Korean Welding Society
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• v.3 no.1
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• pp.45-50
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• 2003

Welding using lasers can be mass-produced in high speed. In the laser welding, performing real-time monitoring system of the welding quality is very important in enhancing the efficiency of welding. In this study, the plasma and molten metal which are generated during laser welding were measured using the UV sensor and IR sensors. The results of laser welding were classified into five categories such as optimal heat input, little low heat input, low heat input, partial joining due to gap mismatch, and nozzle deviation. Also, a system was formulated which uses the measured signals with a fuzzy pattern recognition method which is used to perform real-time evaluation of the welding quality and the defects which can occur in laser welding.

• Journal of the Korean Vacuum Society
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• v.9 no.2
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• pp.99-101
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• 2000

The fabrication of the submicron size hole has been interesting due to the potential application of the near field optical sensor or liquid metal ion source. The 2 micron size dot array was photolithographically patterned. After formation of the V-groove shape by anisotropic KOH etching, dry oxidation at $1000^{\circ}C$ for 600 minutes was followed. In this procedure, the orientation dependent oxide growth was performed to have an etch-mask for dry etching. The reactive ion etching by the inductively coupled plasma (ICP) system was performed in order to etch ~90 nm $SiO_2$ layer at the bottom of the V-groove and to etch the Si at the bottom. The negative ion energy would enhance the anisotropic etching by the $Cl_2$ gas. After etching, the remaining thickness of the oxide on the Si(111) surface was measured to be ~130 nm by scanning electron microscopy. The etched Si aperture can be used for NSOM sensor.

• Journal of the Microelectronics and Packaging Society
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• v.12 no.3 s.36
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• pp.227-233
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• 2005

Carbon nanotubes (CNT) which were grown, on the alumina substrate with a pair of comb-type Au electrodes, by plasma enhanced chemical vapor deposition have been investigated for $NO_2$ gas sensor. The electrical resistance of CNT film decreased with temperature, indicating a semiconductor type of CNT, and also the resistance of CNT sensor decreased with increasing $NO_2$ concentration. Upon exposure to $NO_2$ gas, the electrical resistance of CNT film sensor rapidly decreased within 3 minutes, and then showed a constant value after $20\~30$ minutes. It is found that the sensitivity of CNT sensor has been improved by air oxidation. The CNT sensor oxidized at $450^{\circ}C$ for 30 minutes showed higher sensitivity value than that without oxidation by $27\%$, even for a low 250 ppb $NO_2$ concentration at operating temperature of $200^{\circ}C$. But it needs a recovery time more than 20 minutes for reuse after detection of $NO_2$ gas.

• Journal of the Korean Ceramic Society
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• v.36 no.5
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• pp.465-470
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• 1999

Sensing properties of $\alpha$-Fe2O3 thin film to reducing gases such as CHx and CO were systematically examined after deposition on Al2O3 substrate by PECVD(Plasma Enhanced Chemical Vapor Deposition)technique. Microstructure of deposited $\alpha$-Fe2O3 thin film showed the porous island structure. This specimen was annealed at 450, 550, $650^{\circ}C$ to enhance the gas sensing properties and investigated in terms of CO and C4H10 concentration from 500ppm to 3,000 ppm at operating temperature of 35$0^{\circ}C$ The gas sensitivity(%) to C4H10 measured at the operating temperature of 35$0^{\circ}C$ was 98.24 (highest sensitivity) 69.51 to CO and 2% to CH4 respectviely.