• Proceedings of the Korean Institute of Building Construction Conference
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• 2020.06a
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• pp.83-84
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• 2020

In present study, we have deposited the Zinc coating using arc thermal spray and plasma arc spray processes onto the steel substrate and durability of the deposited coating was evaluated. The bond adhesion result shows that plasma arc sprayed Zn coating exhibited higher in its value compared to arc thermal spray. SEM shows that Zn coating deposited by plasma arc process is more compact, less porous and adherent compare to arc spray process. The corrosion resistance properties are evaluated in artificial ocean water solution with exposure periods. EIS results show that total impedance at 0.01 Hz of plasma arc sprayed coating is higher than arc thermal spray owing to the compact and less porous morphology. It is concluded that plasma arc sprayed Zn coating is better than arc thermal spray process.

• Journal of Surface Science and Engineering
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• v.57 no.3
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• pp.155-164
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• 2024

Physical properties of carbon nanomaterials are dependent on their nanostructures and they are modified by diverse synthesis methods. Among them, thermal plasma method stands out for synthesizing carbon nanomaterials by controlling chemical and physical reactions through various design and operating conditions such as plasma torch type, plasma gas composition, power capacity, raw material injection rate, quenching rate, kinds of precursors, and so on. The method enables the production of carbon nanomaterials with various nanostructures and characteristics. The high-energy integration at high-temperature region thermal plasma to the precursor is possible to completely vaporize precursors, and the vaporized materials are rapidly condensed to the nanomaterials due to the rapid quenching rate by sharp temperature gradient. The synthesized nanomaterials are averagely in several nanometers to 100 nm scale. Especially, the thermal plasma was validated to synthesize low-dimensional carbon nanomaterials, carbon nanotubes and graphene, which hold immense promise for future applications.

• Journal of the Korean Electrochemical Society
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• v.6 no.1
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• pp.6-12
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• 2003

Plasma carbon black(PB) which prepared by plasma pyrolysis of methane was treated at 800, 1300 and $2100^{\circ}C$ under $2\times10^{-2}$ torr. Four different samples including raw PB were added to $LiCoO_2$, cathode active material of lithium secondary battery, to investigate effects of properties of plasma black as conductors on electrochemical characteristics. Based on our experimental results, PB conductors with low amount of surface functional groups and high electrical conductivity enhanced the cyclability and the initial discharge capacity. However, deterioration of rate capability and cyclability were observed (or the plasma black treated at $2100^{\circ}C$ For the plasma black conductor prepared from plasma pyrolysis, the effects of properties of carbon black on electrochemical characteristics were combined results of changes in electrical conductivity and structural properties such as agglomeration of plasma black. The conductivity of plasma black increased with treatment temperature, while dispersion of plasma black decreased. As a result, the high cyclability of cell was observed at $800^{\circ}C$ of heat treatment temperature.

• Journal of the Korean Ceramic Society
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• v.47 no.3
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• pp.256-261
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• 2010

Physical properties of Plasma electrolytic oxidized 8 different types of Al alloys, A-1100, A-2024, A-5052, A-6061, A-6063, A-7075, ACD-7B and ACD-12 were investigated. The electrolyte for PEO was $Na_2SiO_3$ solutions with NaOH and some alkali earthen metal salts. Porous layer near the surface of PEO coating was not found, and surface roughness Ra50 was below 2.5 ${\mu}m$. Surface roughness was affected by growth rate of plasma electrolytic oxidized layer, not by Si content in Al alloy.

• Journal of the Korean Ceramic Society
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• v.40 no.2
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• pp.123-127
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• 2003

The effects of process parameters on coating formation and coating properties were investigated using a fused and crushed Ti $O_2$powder by the Taguchi method and L$_{9}$(3$^4$) orthogonal array. The Taguchi analysis was conducted through the results of the coating properties affected strongly by plasma spraying parameters and Ti $O_2$powder was sprayed on Ti-6Al-4V alloy substrate. The coating properties were characterized by thickness, microhardness, porosity and surface roughness using optical microscopy, image analyzer and surface roughness tester respectively. An observed optimum condition of plasma spraying process could be found for potential use as a bioceramic coating.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.20 no.10
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• pp.3234-3242
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• 1996

This paper describes experimental results of modified small punch( MSP) test conducted to evaluate the fracure characteristics and mechanical properties of plasma sparayed zirconia ($ZrO_2$ stabilized with 8wt. % $Y_20_3$ : YSZ) NiCrAlY composite. The mixing ratios of YSZ/NiCrAlY were 0/100, 25/75, 50/50, 100/0 v.%. Test temperatures ranged from 293K to 1473K. This study is directed at development of thermal barrrier coating(TBC) system with superior heat resistance and mechanical properties. The microstructure and fracture process of the composite were examined by SEM and AE method. The mechanical properties of 100% YSZ were nearly independent of the temperatures tested in this study. In contrast, the NiCrAlY-containing composites showed a significant decrease of the mechanical properties above 1273K, showing a ductile- brittle transition behavior up to the temperature. Furthermore, it can seen that 25% YSZ/75% NiCrAlY composite gave the highest fracure strength and fracture energy among the mixing ratio tested over the temperature range.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.77-77
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• 2016

Thin films synthesized by plasma processes have been widely applied in a variety of industrial sectors. The structure control of thin film is one of prime factor in most of these applications. It is well known that the structure of this film is closely associated with plasma parameters and species of plasma which are electrons, ions, radical and neutrals in plasma processes. However the precise control of structure by plasma process is still limited due to inherent complexity, reproducibility and control problems in practical implementation of plasma processing. Therefore the study on the fundamental physical properties that govern the plasmas becomes more crucial for molecular scale control of film structure and corresponding properties for new generation nano scale film materials development and application. The thin films are formed through nucleation and growth stages during thin film depostion. Such stages involve adsorption, surface diffusion, chemical binding and other atomic processes at surfaces. This requires identification, determination and quantification of the surface activity of the species in the plasma. Specifically, the ions and neutrals have kinetic energies ranging from ~ thermal up to tens of eV, which are generated by electron impact of the polyatomic precursor, gas phase reaction, and interactions with the substrate and reactor walls. The present work highlights these aspects for the controlled and low-temperature plasma enhanced chemical vapour disposition (PECVD) of Si-based films like crystalline Si (c-Si), Si-quantum dot, and sputtered crystalline C by the design and control of radicals, plasmas and the deposition energy. Additionally, there is growing demand on the low-temperature deposition process with low hydrogen content by PECVD. The deposition temperature can be reduced significantly by utilizing alternative plasma concepts to lower the reaction activation energy. Evolution in this area continues and has recently produced solutions by increasing the plasma excitation frequency from radio frequency to ultra high frequency (UHF) and in the range of microwave. In this sense, the necessity of dedicated experimental studies, diagnostics and computer modelling of process plasmas to quantify the effect of the unique chemistry and structure of the growing film by radical and plasma control is realized. Different low-temperature PECVD processes using RF, UHF, and RF/UHF hybrid plasmas along with magnetron sputtering plasmas are investigated using numerous diagnostics and film analysis tools. The broad outlook of this work also outlines some of the 'Grand Scientific Challenges' to which significant contributions from plasma nanoscience-related research can be foreseen.

• Korean Journal of Food Science and Technology
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• v.23 no.4
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• pp.428-432
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• 1991

This study was carried out to investigate the effect of NaCl, pH and phosphate on the functional properties of a mixed system of plasma protein and myofibrillar proteins. The solubility of plasma protein, myofibrillar protein and the mixture (plasma+myofibrillar protein) increased according to the increase of NaCl concentration ($0{\sim}4%$) and pH $pH4{\sim}8$). The solubility, emulsifying activity and capacity of the mixture were lower than those of plasma protein, whereas higher than those of myofibrillar protein. The gel strength of the mixture and myofibrillar protein showed a significant increase when NaCl concentration was increased from 2 to 3%. The gel strength of myofibrillar protein increased about four times when 0.3% polyphosphate added to the sample containing 2% NaCl, whereas the moisture loss of the mixture and myofibrillar protein decreased significantly. The gel strength of plasma protein, myofibrillar protein and the mixture increased slightly at $3{\sim}5%$ protein concentration, whereas the gel strength of those increased significantly as the protein concentration increased from 5 to 9%.

• Journal of the Semiconductor & Display Technology
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• v.9 no.1
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• pp.35-40
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• 2010

We have investigated the effects of hydrogen injection via in-situ gas addition ($O_2$, $H_2$, or $O_2$ + $H_2$ gas) and plasma post-treatment (Ar or Ar + H plasma) on material properties of ZnO that is considered to be as a channel layer in transparent thin film transistors. The variations in the electrical resistivity, optical transmittance and bandgap energy, and crystal quality of ZnO thin films were characterized in terms of the methods and conditions used in hydrogen injection. The resistivity was significantly decreased by injection of hydrogen; approximately $10^6\;{\Omega}cm$ for as-grown, $1.2\;{\times}\;10^2\;{\Omega}cm$ for in-situ with $O_2/H_2\;=\;2/3$ addition, and $0.1\;{\Omega}cm$ after Ar + H plasma treatment of 90 min. The average transmittance of ZnO films measured at a wavelength of 400-700 nm was gradually increased by increasing the post-treatment time in Ar + H plasma. The optical bandgap energy of ZnO films was almost monotonically increased by decreasing the $O_2/H_2$ ratio in in-situ gas addition or by increasing the post-treatment time in Ar + H plasma, while the post-treatment using Ar plasma hardly affected the bandgap energy. The role of hydrogen in ZnO was discussed by considering the creation and annihilation of oxygen vacancies as well as the formation of shallow donors by hydrogen.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.333-333
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• 2011

We have investigated the breakdown properties in liquids by high voltage pulse system. High voltage pulse power system is consisted of the Marx-generator with two capacitors (0.5 ${\mu}F$, withstanding voltage is 40 kV), to which the charging voltage can be applied to maximum 30 kV DC, spark gap switch and charging resistor of 20 $M{\Omega}$. We have made use of tungsten pin electrodes of anode-cathode (A-K), which are immersed into the liquids. The breakdown voltage and current signals are measured by high voltage probe (Tektronix P6015A) and current monitor (IPC CM-1.S). Especially the high speed breakdown or plasma propagation characteristics in the pulsed A-K gap have been investigated by using the high speed ICCD camera. We have measured the electron temperature through the Boltzmann plot method from the breakdown spectrums. Here the A-K gap has been changed by 1 mm, 2 mm, and 3 mm. The used liquids are distilled water and solution of salt (0.9 %). The output voltage and current signals at breakdown in distilled water are shown to be bigger than those in saline solution. The breakdown voltage and current characteristics in liquids will be discussed in accordance with A-K gap distances. It is also found that the electron temperatures and plasma densities in liquids are decreased in conformity with A-K gap.