• Journal of the Korean institute of surface engineering
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• v.36 no.6
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• pp.480-490
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• 2003

Effects of plasma-nitriding on the pitting corrosion of Fe-30at%Al-5at%Cr alloy containing Ti, Hf, and Zr were investigated using potentiostat in 0.1M HCl. The specimen was casted by the vacuum arc melting. The subsequent homogenization was carried out in Ar gas atmosphere at $1000^{\circ}C$ for 7days and phase stabilizing heat treatment was carried out in Ar gas atmosphere at $500^{\circ}C$ for 5 days. The specimen was nitrided in the $N_2$, and $H_2$, (1:1) mixed gas of $10^{-4}$ torr at $480^{\circ}C$ for 10 hrs. After the corrosion tests, the surface of the tested specimens were observed by the optical microscopy and scanning electron microscopy(SEM). For Fe-30at%Al-5Cr alloy, the addition of Hf has equi-axied structure and addition of Zr showed dendritic structure. For Fe-30at%Al-5Cr alloy containing Ti, plasma nitriding proved beneficial to decrease the pitting corrosion attack by increasing pitting potential due to formation of TiN film. Addition of Hf and Zr resulted in a higher activation current density and also a lower pitting potential. These results indicated the role of dendritic structure in decreasing the pitting corrosion resistance of Fe-30Al-5Cr alloy. Ti addition to Fe-30Al-5Cr decreased the number and size of pits. In the case of Zr and Hf addition, the pits nucleated remarkably at dendritic branches.

• Clean Technology
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• v.12 no.3
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• pp.138-144
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• 2006

Conversion of methane to synthesis gas in a capacitive rf plasma at low pressure was experimentally studied. In this plasma, electrons which had sufficient energy-level collided with the molecules of methane or oxygen-containing gas, which were than activated and converted to synthesis gas. The effect of input power, various oxygen-containing gas and composition of the gas mixture were investigated. The conversion of methane reached up to 100%. In all cases, hydrogen and carbon oxide were produced as primary products, and other compounds was generated. The conversion of methane and the yield of hydrogen and carbon oxides were increased with increasing the input power. Depending on the oxygen-containing gases, the composition of synthesis gas was varied.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.5-6
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• 2009

In this paper, plasma ion implant is performed with $PH_3$ gas diluted by helium gas on P-type Si wafer (100). Spike Rapid Thermal Processing(RTP) annealing performed for 30~60 sec from $800\;^{\circ}C$ to $1000\;^{\circ}C$ in $N_2+O_2$ ambient. Crystalline defect is analyzed by Transmission Electron Microscope(TEM) and Double crystal X-ray Diffraction(DXRD). Contact resistivity($\rho c$), contact resistance(Rc) and sheet resistance(Rs) are analyzed by measuring Transfer Length Method(TLM) using 4155C analysis. As annealing temperature increase, Rs decrease and ${\rho}c$ and Rc increase at temperature higher than $850\;^{\circ}C$. We achieve low Rs, ${\rho}c$ and Rc with Plasma ion implant and spike RTP.

• Proceedings of the KIEE Conference
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• 1991.07a
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• pp.183-186
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• 1991

In order to prepare the functional organic optic meterials, the capacitive coupled gas flow type plasma polymerization apparatus was designed and manufactured. Styrene and para-Xylene monomer were adopt as organic materisl. Optical constant, refrative index, extinction coefficient of organic thin films by the gas flow type plasma polymerization appratus were determined by envelope method using spectrophotometry. The refractive index of plasma polymerized thin films was decreased in accordance to increase of wave length and discharge time. The extinction coefficient was very small compared with refractive index. From the experimental result of optical constant and film thickness, it was considered that the films which had required optical properties and thickness can be prepared by control of polymerization condition.

• Journal of the Korea Institute of Military Science and Technology
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• v.5 no.3
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• pp.105-112
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• 2002

A combined process of non-thermal plasma and catalytic techniques has been investigated to treat toxic gas compounds in air. The treated gas in the present study is $CH_3$CN that has been known to be a simulant of toxic chemical agent. A planar type dielectric barrier discharge(DBD) reactor has been used to generate non-thermal plasma that produces various chemically active species, O, N, OH, $O_3$, ion, electrons, etc. Several different types of adsorbents and catalysts, which are MS 5A, MS 13X, Pt/alumina, are packed into the plasma reactor, and have been tested to save power consumption and to treat by-products. Various aspects of the present techniques, which are decomposition efficiencies along with the power consumption, by-product analysis, reaction pathways modified by the adsorbents and catalysts, have been discussed in the present study.

• Journal of the Korean Society of Combustion
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• v.8 no.1
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• pp.9-16
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• 2003

Carbon soot emission from combustion processes, especially from diesel engines, is a subject of growing concern since soot is known to seriously affect human health. Efforts have been made to oxidize soot particles utilizing Non-Thermal Plasma(NTP) techniques. When oxygen is carried into a plasma device, electrons generated by the plasma dissociate the oxygen, resulting in the formation of oxygen atoms. These highly activated atoms, called O radicals, are known as strong oxidizing agent. This paper presents concentration variations of CO and $CO_2$ at the exit of the plasma device, resulting from the soot oxidation by O radicals, with variations of inlet oxygen concentration, gas temperature, and gas flow rate. Based on the data, Arrehenious rate constants of reactions between C(s)+O and C(s)+O+O were proposed.

• Journal of Powder Materials
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• v.5 no.2
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• pp.111-121
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• 1998

Thick and dense deposit of higher than 97% of theoretical density was formed by induction plasma spraying. To investigate the effects of powder morphology on the density of deposit, two different kinds of Yttria-Stabilized-Zirconia powder, METCO202NS (atomized & agglomerated) and AMDRY146 (fused & crushed), were used and compared. After plasma treatment, porous METCO202NS powder was all the more densely deposited and its density was increased. In addition to the effect of powder morphology, the process parameters such as, sheath gas composition, probe position, particle size and spraying distance, and so on, were evaluated. The result of experiment with AMDRY146 powder, particle size and spraying distance affected highly on the density of the deposit. The optimum process condition for the deposition of -75 ${\mu}m$ of 20%-Yttria-Stabilized-Zirconia powder was 120/201/min of Ar/$H_2$ gas rate, 80 kW of plasma plate power, 8 cm of probe position and 150 Torr of spraying chamber pressure, at which its density showed 97.91% of theoretical density and its deposition rate was 20 mm/min. All the results were assessed by statistical approach what is called ANOVA.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.53 no.3
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• pp.133-136
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• 2004

Low-Pressure inductively coupled RF discharge sources have important industrial applications mainly because they can provide a high-density electrodeless plasma source with low ion energy and low power loss. In an inductive discharge, the RF power is coupled to the plasma by an electromagnetic interaction with the current flowing in a coil. In this paper, the experiments have been focussed on the electric characteristic and carried out using a single Langmuir probe. The internal electric characteristics of inductively coupled Ar RF discharge at 13.56(MHz) have been measured over a wide range of power at gas pressure ranging from 1∼70(mTorr).

• Proceedings of the Korean Vacuum Society Conference
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• 1994.06a
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• pp.158.1-158
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• 1994

Totally dry lithography is studying with using plasma polymerized resist for almost 15 years. Recently organo-silicon ITlOnOmer was proposed as a new resist. When the plasma polymerized resist was irradiated through a mask in oxygen gas, the resist was oxidized and a fine pattern of submicron was successfully developed by $Cl_2$ gas plasma.

• Journal of Korean Society for Atmospheric Environment
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• v.19 no.2
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• pp.157-165
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• 2003

A combined process of non-thermal plasma and catalytic technique has been investigated to treat $CH_3$CN gas in the atmosphere. A planar type dielectric barrier discharge (DBD) reactor has been used to generate the non-thermal plasma that produces various chemically active species, such as O, N, OH, $O_3$, ion, electrons, etc. Several different types of the beads. which are Molecular Sieve (MS) 5A, MS 13X, Pt/alumina beads, are packed into the DBD reactor, and have been tested to characterize the effects of adsorption and catalytic process on treating the $CH_3$CN gas in the DBD reactor. The test results showed that the operating power consumption and the amounts of the by-products of the non-thermal plasma process can be reduced by the assistance of the adsorption and catalytic process.