• 제목/요약/키워드: Plasma Gas

검색결과 2,290건 처리시간 0.033초

Safety Profile Assessment and Identification of Volatile Compounds of Krill Eupausia superba Oil and Residues Using Different Extraction Methods

  • Haque, A.S.M. Tanbirul;Kim, Seon-Bong;Lee, Yang-Bong;Chun, Byung-Soo
    • Fisheries and Aquatic Sciences
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    • 제17권2호
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    • pp.159-165
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    • 2014
  • In this study, Krill Eupausia superba oil was extracted using different solvents and supercritical carbon dioxide (SC-$CO_2$). During SC-$CO_2$ extraction, the pressure was set at 40 MPa and temperatures ranged from $40^{\circ}C$ to $55^{\circ}C$. We examined the differences in volatile compounds and safety profiles among extraction methods. Volatile compounds were determined using the thermal desorption system integrated with gas chromatography-mass spectrometry (GC-MS). Heavy metal content was analyzed by inductively coupled plasma mass spectrometry (ICP-MS). According to our results 10 volatile compounds were identified in krill sample. After SC-$CO_2$ extraction of oil, the concentrations of volatile compounds decreased, but increased after solvent extraction. In krill, heavy metal concentrations remained within the permissible limit. Moreover, Zn and Fe which have health benefits were detected at high concentrations. During a 90 days storage period at different temperatures, microbial activity was found to be lowest in SC-$CO_2$ extracted residues. Thus, the quality of krill oil and the residues obtained using SC-$CO_2$ extraction was higher and the oil was safer than those obtained using conventional solvent extraction. These results can be applied to the food industry to maintain high quality krill products.

$O_{2}$ re-annealing에 의한 식각된 PZT 박막의 식각 damage 개선 (Recovery of Etching Damage of the etched PZT Thin Films With $O_{2}$ Re-Annealing.)

  • 강명구;김경태;김창일;장의구;이병기
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 춘계학술대회 논문집 반도체재료
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    • pp.8-11
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    • 2001
  • In this study. the recovery of plasma induced damage in the etched PZT thin film with $O_2$ re-annealing have been investigated. The PZT thin films were etched as a function of $Cl_2/Ar$ and additive $CF_4$ into $Cl_{2}(80%)/Ar(20)%$. The etch rates of PZT thin films were $1600\dot{A}/min$ at $Cl_{2}(80%)/Ar(20)%$ gas mixing ratio and $1970\dot{A}/min$ at 30 % additive $CF_4$ into $Cl_{2}(80%)/Ar(20)%$. The etched profile of PZT films was obtained above 70 by SEM. In order to recovery properties of PZT thin films after etching, the etched PZT thin films were re-annealed at various temperatures in $O_2$ atmosphere. From the hysteresis curves, ferroelectrical properties are improved by $O_2$ re-annealing process. The improvement of ferroelectric behavior at annealed sample is consistent with the increase of the (100) and (200) PZT phase revealed by x-ray diffraction (XRD). From XPS analysis, intensity of Pb-O, Zr-O and Ti-O peak are increased and the chemical residue peak is reduced by $O_2$ re-annealing. The ferroelectric behavior consistent with the dielectric nature of TixOy is recovered by $O_2$ recombination during rapid thermal annealing process. From AFM images, it shows that the surface roughness of re-annealed sample after etching is improved.

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RF Reactive Sputtering법에 의한 산화주석 박막의 제조 및 특성 (Characterization and Fabrication of Tin Oxide Thin Film by RF Reactive Sputtering)

  • 김영래;김선필;김성동;김은경
    • 한국재료학회지
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    • 제20권9호
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    • pp.494-499
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    • 2010
  • Tin oxide thin films were prepared on borosilicate glass by rf reactive sputtering at different deposition powers, process pressures and substrate temperatures. The ratio of oxygen/argon gas flow was fixed as 10 sccm / 60 sccm in this study. The structural, electrical and optical properties were examined by the design of experiment to evaluate the optimized processing conditions. The Taguchi method was used in this study. The films were characterized by X-ray diffraction, UV-Vis spectrometer, Hall effect measurements and atomic force microscope. Tin oxide thin films exhibited three types of crystal structures, namely, amorphous, SnO and $SnO_2$. In the case of amorphous thin films the optical band gap was widely spread from 2.30 to 3.36 eV and showed n-type conductivity. While the SnO thin films had an optical band gap of 2.24-2.49 eV and revealed p-type conductivity, the $SnO_2$ thin films showed an optical band gap of 3.33-3.63 eV and n-type conductivity. Among the three process parameters, the plasma power had the most impact on changing the structural, electrical and optical properties of the tin oxide thin films. It was also found that the grain size of the tin oxide thin films was dependent on the substrate temperature. However, the substrate temperature has very little effect on electrical and optical properties.

Electrothermal-Hollow Cathode Glow Discharge Spectrometry(Et-HCGDS)를 이용하여 살펴본 Air Emission에 관한 연구 (A Study on Air Emission Spectra Observed by Using Electrothermal-Hollow Cathode Glow Discharge Spectrometry (Et-HCGDS))

  • 이상천;신정숙;강미라
    • 대한화학회지
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    • 제39권5호
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    • pp.399-407
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    • 1995
  • 회토류와 악티늄족 원소의 현장분석을 목적으로 휴대용 극미량 분석용 원자 분광계인 Electrothermal-Hollow Cathode Glow Discharge Spectrometry(Et-HCGDS)가 제작되었다.본 분광계의 기본 구조는 전기열과 글로우 방전에 기초를 두고 있으며 본 분광계가 미량의 원소분석에도 유용함을 실험적으로 살펴보았다. 본 연구는 새로이 제작된 Et-HCGDS라는 글로우방전 시스템을 사용하여 공기의 저온 플라스마를 만들고 여기서 얻은 공기의 방출 스펙스럼에 관하여 연구하였다. 본 연구를 통하여 Et-HCGDS를 사용할시에 공기가 흐름가스로 유용하며 이 경우 대기의 분석도 쉽게 이루어질 수 있음을 알았다. 글로우 방전을 이용하여 관찰한 공기의 방출 스펙트럼의 분석을 통하여 볼 때 거의 질소에 의한 방출이 전 자외선과 가시광선 영역에서 골고루 나타남을 살펴보았다. 공기를 흐름가스로 사용할 시에도 여러파장 영역에서 미량 분석이 가능함을 알았다. 이 결과는 앞으로 Et-HCGDS를 사용하여 현장에서 공기만을 사용하여 분석을 수행할 경우에 필요한 기초 자료로 활용될 수 있으리라 본다. 본 연구에서 수행한 공기 방출 스펙트럼의 분석은 대기 분석 및 물질 분석에도 중요한 기초자료로 쓰이게 되리라 기대하며 이와 더불어 방출을 이용한 분광분석에서 공기로 인한 간섭 스펙트럼등을 이해하는 경우에도 중요한 참고자료로 활용되리라 본다.

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플라즈마 증착 형상 모의 실험기의 앞덮개 효과를 고려한 근사 해석적 모델에 관한 연구 (A Study on the Approximation analytical Model of PECVD Topography simulator considering the effect of the presheath)

  • 이강환;손명식;황호정
    • 전자공학회논문지D
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    • 제36D권1호
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    • pp.90-99
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    • 1999
  • 본 논문에서는 반응로 안에서 쌍극성 확산장의 거리 확장에 따르는 앞덮개(Presheath)영역에서의 효과를 고려하고, 앞덮개 영역 내에서 이온과 중성자간의 충돌을 고려한 입사각 분포에 따른 에너지 플럭스를 계산하였다. 이론의 각분포 현상과 에너지 플럭스 분포를 이온의 온도와 함께 앞덮개 효과를 고려된 새로운 근사 해석적 모델을 제시한다. 실제 식각 공정에 대한 실험결과 충돌이 없는 덮개에서도 이온의 입사각이 산란되는 현상이 나타난다. 이 현상은 이온의 앞덮개지역을 통과하면서 쌍극성 확산장(ambipolar diffusion field)에 의해 운동에너지를 얻게 되는데, 이때 얻어진 운동에너지가 가스 분자 충돌에 의해 변화는 효과 때문이라고 볼 수 있다. 제안된 근사적 해석모델을 이용하여 트렌치에서의 중착 형상을 모의실험 하였다.

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Quantitative Speciation of Selenium in Human Blood Serum and Urine with AE- RP- and AF-HPLC-ICP/MS

  • Jeong, Ji-Sun;Lee, Jonghae;Pak, Yong-Nam
    • Bulletin of the Korean Chemical Society
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    • 제34권12호
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    • pp.3817-3824
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    • 2013
  • Various separation modes in HPLC, such as anion exchange (AE), reversed-phase (RP), and affinity (AF) chromatography were examined for the separation of selenium species in human blood serum and urine. While RP- and AE-HPLC were mainly used for the separation of small molecular selenium species, double column AF-HPLC achieved the separation of selenoproteins in blood serum efficiently. Further, the effluent of AF-HPLC was enzymatically hydrolyzed and then analyzed with RP HPLC for selenoamino acid study. The versatility of the hybrid technique makes the in-depth study of selenium species possible. For quantification, post column isotope dilution (ID) with $^{78}Se$ spike was performed. ORC ICP/MS (octapole reaction cell inductively coupled plasma/mass spectrometry) was used with 4 mL $min^{-1}$ Hydrogen as reaction gas. In urine sample, inorganic selenium and SeCys were identified. In blood serum, selenoproteins GPx, SelP and SeAlb were detected and quantified. The concentration for GPx, SelP and SeAlb was $22.8{\pm}3.4\;ng\;g^{-1}$, $45.2{\pm}1.7\;ng\;g^{-1}$, and $16.1{\pm}2.2\;ng\;g^{-1}$, respectively when $^{80}Se/^{78}Se$ was used. The sum of these selenoproteins ($84.1{\pm}4.4\;ng\;g^{-1}$) agrees well with the total selenium concentration measured with the ID method of $87.0{\pm}3.0\;ng\;g^{-1}$. Enzymatic hydrolysis of each selenium proteins revealed that SeCys is the major amino acid for all three proteins and SeMet is contained in SeAlb only.

Research and Development of High Performance 50-inch HD Plasma Display Panel

  • Choi, Kwang-Yeol;Min, Woong-Kee;Rhee, Byung-Joon;Ahn, Byung-Nam;Kim, Je-Seok;Moon, Won-Seok;Park, Min-Soo;Ryu, Byung-Gil;Kim, Sung-Tae;Ahn, Young-Joon;Yang, Sung-Soo;Kim, Kyung-Tae;Lee, Kyu-Sung
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.1547-1550
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    • 2008
  • We are suggesting a new index to represent the performance of PDP, such as Specific Performance Index (SPI) that includes luminous efficacy and panel reflectance. High Xe gas mixture and low panel capacitance are well known as key factors to improve luminous efficacy of PDP [1]. However, higher driving voltage and longer discharge time lag is an obstacle when applying these technologies. Modified cell design, new materials and driving waveform enable us to overcome these obstacles. High efficient phosphor is also a key material to improve luminous efficacy. Phosphors coated with pigment are used to reduce panel reflectance. High performance 50-inch HD PDP with luminous efficacy of 2.3 lm/W has been developed.

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Triode magnetron sputtering system의 제작 및 특성평가 (Characteristic evaluations and production of triode magnetron sputtering system)

  • 김현후;이무영;김광태;윤상현;유환구;김종민;박철현;임기조
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.2
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    • pp.787-790
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    • 2003
  • A rf triode magnetron sputtering system is designed and installed its construction in vacuum chamber. In order to calibrate the rf triode magnetron sputtering for thin films deposition processes, the effects of different glow discharge conditions were investigated in terms of the deposition rate measurements. The basic parameters for calibrating experiment in this sputtering system are rf power input, gas pressure, plasma current, and target-to-substrate distance. Because a knowledge of the deposition rate is necessary to control film thickness and to evaluate optimal conditions which are an important consideration in preparing better thin films, the deposition rates of copper as a testing material under the various sputtering conditions are investigated. Furthermore, a triode sputtering system designed in our team is simulated by the SIMION program. As a result, it is sure that the simulation of electron trajectories in the sputtering system is confined directly above the target surface by the force of $E{\times}B$ field. Finally, some teats with the above 4 different sputtering conditions demonstrate that the deposition rate of rf triode magnetron sputtering is relatively higher than that of the conventional sputtering system. This means that the higher deposition rate is probably caused by a high ion density in the triode and magnetron system. The erosion area of target surface bombarded by Ar ion is sputtered widely on the whole target except on both magnet sides. Therefore, the designed rf triode magnetron sputtering is a powerful deposition system.

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Si3N4 박막의 유기발광소자 수분침투 방지막으로의 응용 (Application of Si3N4 Thin Film as a Humidity Protection Layer for Organic Light Emitting Diode)

  • 김창조;신백균
    • 한국전기전자재료학회논문지
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    • 제23권5호
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    • pp.397-402
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    • 2010
  • In this paper, we studied WVTR(water vapor transmission rate) properties of $Si_3N_4$ thin film that was deposited using TCP-CVD (transformer coupled plasma chemical vapor deposition) method for the possibility of OLED(organic light emitting diode) encapsulation. Considering the conventional OLED processing temperature limit of below $80^{\circ}C$, the $Si_3N_4$ thin films were deposited at room temperature. The $Si_3N_4$ thin films were prepared with the process conditions: $SiH_4$ and $N_2$, as reactive gases; working pressure below 15 mTorr; RF power for TCP below 500 W. Through MOCON test for WVTR, we analyzed water vapor permeation per day. We obtained that WVTR property below 6~0.05 gm/$m^2$/day at process conditions. The best preparation condition for $Si_3N_4$ thin film to get the best WVTR property of 0.05 gm/$m^2$/day were $SiH_4:N_2$ gas flow rate of 10:200 sccm, working pressure of 10 mTorr, working distance of 70 mm, TCP power of 500 W and film thickness of 200 nm. respectively. The proposed results indicates that the $Si_3N_4$ thin film could replace metal or glass as encapsulation for flexible OLED.

Determination of Saturated and Unsaturated Fatty Acids Amount in Leukocyte Membranes from Subjects Fed with Solid and Fluid Oils

  • Erman, Fazilet;Aydin, Suleyman;Demir, Yasar;Akcay, Fatih;Bakan, Ebubekir
    • BMB Reports
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    • 제39권5호
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    • pp.516-521
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    • 2006
  • Modifications in dietary fatty acid intake might lead to a modification in membrane phospholipid fatty acid composition. The purpose of this study was to investigate relationship between different type of oil consumption and leukocyte membrane phospholipid composition. This study was carried out in subjects utilizing butter (n = 15), margarine (n = 15), fluid oil (n = 15) and mixed types of oils (n = 15) in total 60 subjects. Leukocytes were separated from total blood by dextran sedimentation method. Membrane lipids and proteins were isolated following the cell disruption. Fatty acids of membrane phospholipids were isolated by hydrolysation with phospholipase B under ultrasonic dismembranator. Free fatty acids were identified with gas chromatography at chloroform phase. The results obtained were compared with data obtained by chromatograms of the standards. Results more prominent values of arachidic, dihomo-$\gamma$-linolenic and palmitoleic acids were found in butter-or mixed oil-user groups; eicosadienoic, eicosamonoenoic, dihomo-$\gamma$-linolenic and behenic acids in fluid oil; heptanoic, valeric, eicosadienoic and linolenic acids in margarine groups. The fatty acid composition of mixed oil was similar to butter, while other two oils were so different. From this study, it was concluded that the type of oil consumption might have an influence on phospholipid components of plasma membranes.