• Title/Summary/Keyword: Plasma Gas

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Characteristics of Plasma Blacks Used as an Electrode of Direct Formic Acid Fuel Cell

  • Park, Young-Sook;Choi, Jong-Ho;Han, Jong-Hee;Lim, Tae-Hoon;Beak, Young-Soon;Ju, Jeh-Beck;Shon, Tae-Won;Lee, Joong-Kee
    • Carbon letters
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    • v.6 no.1
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    • pp.41-46
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    • 2005
  • Plasma carbon blacks of 20~30 nm diameter were synthesized by direct decomposition of natural gas using a hybrid plasma torch system with 50 kW direct current and 4 MHz of radio frequency. The insulating rector which inside diameter of 400 mm and length of 1500 mm, respectively was kept at 300~$400^{\circ}C$ during the preparation. The ultimate analysis of plasma carbon blacks reveals that the raw plasma carbon blacks contains a large quantity of volatile which is mainly consist of hydrogen. Therefore devolatilization of raw plasma carbon blacks were carried out at $900^{\circ}C$ for one hour under nitrogen atmosphere. The devolatilization leads to the decrease in electrical resistivity and surface oxygen functional groups of plasma carbon black significantly. In order to investigate the plasma carbon as a catalyst support, devolatilized plasma black at $900^{\circ}C$ (DPB) supported PtAu catalyst was synthesized by sodium boronhydride reduction method. Electrochemical measurements and direct formic acid fuel cell test indicated that catalytic activity of DPB supported PtAu catalyst for formic acid oxidation was similar to that of Vulcan XC-72 of commercial carbon black supported one.

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Effects of shielding Gas Types on $CO_2$ Laser Weldability (보호가스에 따른 Tailored Blank 레이저 용접성 평가에 관한 연구)

  • 정봉근;유순영;박인수;이창희
    • Laser Solutions
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    • v.1 no.1
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    • pp.30-38
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    • 1998
  • This study includes the efface of shielding gas types on $CO_2$ laser weldability of low carbon automotive galvanized steel. The types of shielding gas evaluated are He, $CO_2$, Ar, $N_2$, 50%Ar+50%$N_2$. The weld penetration, strength, formability(Erichsen test) of Laser weld are found to be strongly dependent upon the types of shielding gas used. Further, the maximum travel speed and flow rate to form a keyhole weld is also dependent upon types of shielding gas. The ability of shielding gas in removing plasma plume and thus increasing weld penetration is believed to be closely related with ionization/dissociation potential, which determine the period of plasma formation and disappearance. Further, thermal conductivity and reactivity of gas with molten pool also give strong effect on penetration and porosity formation which in turn affect on the formability and strength.

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Dry Etching of Ru Electrodes using O2/Cl2 Inductively Coupled Plasmas

  • Kim, Hyoun Woo
    • Corrosion Science and Technology
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    • v.2 no.5
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    • pp.238-242
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    • 2003
  • The characteristics of Ru etching using $O_2/Cl_2$ plasmas were investigated by employing inductively coupled plasma (ICP) etcher. The changes of Ru etch rate, Ru to $SiO_2$ etch selectivity and Ru electrode etching slope with the gas flow ratio, bias power, total gas flow rate, and source power were scrutinized. A high etching slope (${\sim}86^{\circ}$) and a smooth surface after etching was attained using $O_2/Cl_2$ inductively coupled plasma.

The Technology of Mist Removal in Flue Gas by the Plasma of Impulse Streamer Corona (저온플라즈마에 의한 배연 가스내의 미스트 처리기술)

  • 하상안;김일배;강신묵
    • Journal of environmental and Sanitary engineering
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    • v.14 no.4
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    • pp.69-76
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    • 1999
  • This research was carried but to investigate the characteristics of mist removal with the change of operating conditions in the plasma reactor of impulse streamer corona based on the distribution of particle size measured by laser diffraction spectrometers. The operating conditions in this experiment were power of impulse streamer corona, gas velocity, collection time, and SOx/NOx concentration. The collection efficiency T(d) was estimated by distribution of particle size in the collection zone through the advanced model.

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Performance Improvement of Dielectric Barrier Plasma Reactor for Advanced Oxidation Process (고급산화공정용 유전체 장벽 플라즈마 반응기의 성능 개선)

  • Kim, Dong-Seog;Park, Young-Seek
    • Journal of Korean Society of Environmental Engineers
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    • v.34 no.7
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    • pp.459-466
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    • 2012
  • In order to improved treatment performance of dielectric barrier discharge (DBD) plasma, plasm + UV process and gas-liquid mixing method has been investigated. This study investigated the degradation of N, N-Dimethyl-4-nitrosoaniline (RNO, indicator of the generation of OH radical). The basic DBD plasma reactor of this study consisted of a plasma reactor (consist of quartz dielectric tube, titanium discharge (inner) and ground (outer) electrode), air and power supply system. Improvement of plasma reactor was done by the combined basic plasma reactor with the UV process, adapt of gas-liquid mixer. The effect of UV power of plasma + UV process (0~10 W), gas-liquid mixing existence and type of mixer, air flow rate (1~6 L/min), range of diffuser pore size (16~$160{\mu}m$), water circulation rate (2.8~9.4 L/min) and UV power of improved plasma + UV process (0~10 W) were evaluated. The experimental results showed that RNO degradation of optimum plasma + UV process was 7.36% higher than that of the basic plasma reactor. It was observed that the RNO decomposition of gas-liquid mixing method was higher than that of the plasma + UV process. Performance for RNO degradation with gas-liquid mixing method lie in: gas-liquid mixing type > pump type > basic reactor. RNO degradation of improved reactor which is adapted gas-liquid mixer of diffuser type showed increase of 17.42% removal efficiency. The optimum air flow rate, range of diffuser pore size and water circulation rate for the RNO degradation at improved reactor system were 4 L/min, 40~$100{\mu}m$ and 6.9 L/min, respectively. Synergistic effect of gas-liquid mixing plasma + UV process was found to be insignificant.

Effect of Low Temperature Plasma Pretreatment on the Color Depth of Wool Fabrics (양모직물의 염착농도에 미치는 저온플라즈마 처리의 영향)

  • 배소영;이문철
    • Textile Coloration and Finishing
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    • v.4 no.2
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    • pp.76-83
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    • 1992
  • Wool tropical and nylon taffeta were treated with low temperature plasma of $O_2$, $N_2$, NH$_3$, CF$_4$ and CH$_4$ for the intervals of 10 to 300 sec, and then dyed with leveling and milling type acid dyes in presence or absence of buffer solution. From the color depth of dyed fabrics, effect of plasma gases, treated time, dyeing time and temperature on dyeing property was studied. The results of the experiment can be summarized as follows: 1) The plasma treatments except methane gas increased the color depth of dyed wool fabrics, but not that of dyed nylon fabrics regardless of the plasma gases used. 2) The color depth of wool fabrics dyed in the dye bath without buffer solution was increased by the low temperature plasma, especially increased much more by CF$_4$ plasma treatment. It is found that with the identification of F- ion in the residual dye bath the hydrogen fluoride gas was adsorbed on wool fabrics in the plasma treatment. 3) The color depth of wool fabrics was increased with the time of $O_2$ and CF$_4$ plasma treatments. 4) In both cases of the leveling and milling type acid dyes, the rate of dyeing was increased in the low temperature plasma treatments, and it is found that the leveling type acid dye increased the color depth at relatively low temperature below 4$0^{\circ}C$, compared with the milling type acid dye.

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Influence of Loading Position and Reaction Gas on Etching Characteristics of PMMA in a Remote Plasma System (Remote 플라즈마에서 위치 및 반응기체에 따른 PMMA의 식각 특성 분석)

  • Ko, Cheonkwang;Lee, Wongyu
    • Korean Chemical Engineering Research
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    • v.44 no.5
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    • pp.483-488
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    • 2006
  • Etching process of PMMA (Polymethyl Methacrylate) on glass surface was investigated by dry etching technique using remote plasma. To determine the etching characteristics, the remote plasma etching was conducted for various process parameters such as plasma power, reaction gas and distance from plasma generation. As the distance from the plasma generation was increased, the etch rate of PMMA was linearly decreased by radical density in plasma. PMMA has removed by reactive radicals in the plasma. The etch rate increased with plasma power because of more reactive radicals. The etch rate and surface roughness of PMMA increased with $O_2$ concentration in the etchant.

Hydrogen Plasma Characteristics for Photoresist Stripping Process in a Cylindrical Inductively Coupled Plasma

  • Yang, Seung-Kook;Cho, Jung Hee;Lee, Seong-Wook;Lee, Chang-Won;Park, Sang-Jong;Chae, Hee-Sun
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.13 no.4
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    • pp.387-394
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    • 2013
  • As the feature size of integrated circuits continues to decrease, the challenge of achieving an oxidation-free exposed layer after photoresist (PR) stripping is becoming a critical issue for semiconductor device fabrication. In this article, the hydrogen plasma characteristics in direct plasma and the PR stripping rate in remote plasma were studied using a $120{\Phi}$ cylindrical inductively coupled plasma source. E mode, H mode and E-H mode transitions were observed, which were defined by matching the $V_{rms}$ and total impedance. In addition, the dependence of the E-H mode transition on pressure was examined and the corresponding plasma instability regions were identified. The plasma density and electron temperature increased gradually under the same process conditions. In contrast, the PR stripping rate decreased with increasing proportion of $H_2$ gas in mixed $H_2/N_2$ plasma. The decrease in concentration of reactive radicals for the removal of PR with increasing $H_2$ gas flow rate suggests that NH radicals have a dominant effect as the main volatile product.

A Study on the Effect of Pre-treatment on the Formation of Nitriding Layer by Post Plasma (포스트 플라즈마를 이용한 질화의 질화층 형성에 미치는 전처리의 영향에 대한 연구)

  • Moon, Kyoung Il;Byun, Sang Mo;Cho, Yong Ki;Kim, Sang Gweon;Kim, Sung Wan
    • Journal of the Korean Society for Heat Treatment
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    • v.18 no.1
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    • pp.24-28
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    • 2005
  • New post plasma nitriding can achieve a high uniformity that have been difficult in DC nitriding and have a high productivity comparable to gas nitriding. However, it has not a enough high nitriding potential for a rapid nitriding, because surface activation or ion etching in the general plasma nitriding cannot be expected. Thus, in this study, the effects of pre-treatments with oxidation and reduction gas have been investigated to improve the nitriding kinetics of post plasma nitriding. An effective pre-treatment consisting of oxidation and reduction resulted in the increase of surface energy of STD 11. This induced the surface hardness and the effective nitriding depth of STD 11. It is thought that the increase of the surface energy and the surface area with pre-treatment promote the nucleation of nitriding layer.