• Title/Summary/Keyword: Plasma Discharge

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The Effects of Processing Parameters on Surface Hardening Layer Characteristics of Low Temperature Plasma Nitriding of 316L Austenitic Stainless Steel (316L 오스테나이트계 스테인리스강의 저온 플라즈마질화처리시 공정변수가 표면경화층 특성에 미치는 영향)

  • Lee, Insup
    • Journal of Surface Science and Engineering
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    • v.52 no.4
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    • pp.194-202
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    • 2019
  • A systematic investigation was made on the influence of processing parameters such as gas composition and treatment temperature on the surface characteristics of hardened layers of low temperature plasma nitrided 316L Austenitic Stainless Steel. Various nitriding processes were conducted by changing temperature ($370^{\circ}C$ to $430^{\circ}C$) and changing $N_2$ percentage (10% to 25%) for 15 hours in the glow discharge environment of a gas mixture of $N_2$ and $H_2$ in a plasma nitriding system. In this process a constant pressure of 4 Torr was maintained. Increasing nitriding temperature from $370^{\circ}C$ to $430^{\circ}C$, increases the thickness of S phase layer and the surface hardness, and also makes an improvement in corrosion resistance, irrespective of nitrogen percent. On the other hand, increasing nitrogen percent from 10% to 25% at $430^{\circ}C$ decreases corrosion resistance although it increases the surface hardness and the thickness of S phase layer. Therefore, optimized condition was selected as nitriding temperature of $430^{\circ}C$ with 10% nitrogen, as at this condition, the treated sample showed better corrosion resistance. Moreover to further increase the thickness of S phase layer and surface hardness without compromising the corrosion behavior, further research was conducted by fixing the $N_2$ content at 10% with introducing various amount of $CH_4$ content from 0% to 5% in the nitriding atmosphere. The best treatment condition was determined as 10% $N_2$ and 5% $CH_4$ content at $430^{\circ}C$, where the thickness of S phase layer of about $17{\mu}m$ and a surface hardness of $980HV_{0.1}$ were obtained (before treatment $250HV_{0.1}$ hardness). This specimen also showed much higher pitting potential, i.e. better corrosion resistance, than specimens treated at different process conditions and the untreated one.

Light Emission and Plasma Property in the External Electrode Fluorescent Lamps (외부전극 형광램프의 발광 및 플라즈마 특성)

  • Ahn, S.;Lee, M.;Jeong, J.;Kim, J.;Yoo, D.;Koo, J.;Kang, J.;Hong, B.;Choi, E.;Cho, G.
    • Journal of the Korean Vacuum Society
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    • v.16 no.3
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    • pp.172-180
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    • 2007
  • A new diagnostics of plasma electron temperature and plasma density is introduced with the observation of the light emission along the tube of external electrode fluorescent lamps. With two different methods operating an external electrode fluorescent lamp of outer diameter 4.0 mm and length 860 mm for the back-light source of 37-inch LCD-TVs, the lighting modes and the plasma properties are investigated. In the center balance operation, the light-emission propagates simultaneously from both sides of the high voltage electrodes to the center of the lamp, while in conventional operation the light-emission propagates from the one end of a high voltage to the other ground electrode. In the operation value of luminance $10,000{\sim}15,000cd/m^2$, the electron plasma thermal energy $(kT_e)$ is about $1.3{\sim}2.7eV$ with the electron density $(n_e)$ is about $(1.6{\sim}3.6){\times}10^{16}m^{-3}$.

Research on the Multi-electrode Plasma Discharge for the Large Area PECVD Processing

  • Lee, Yun-Seong;You, Dae-Ho;Seol, You-Bin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.478-478
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    • 2012
  • Recently, there are many researches in order to increase the deposition rate (D/R) and improve film uniformity and quality in the deposition of microcrystalline silicon thin film. These two factors are the most important issues in the fabrication of the thin film solar cell, and for the purpose of that, several process conditions, including the large area electrode (more than 1.1 X 1.3 (m2)), higher pressure (1 ~ 10 (Torr)), and very high frequency regime (VHF, 40 ~ 100 (MHz)), have been needed. But, in the case of large-area capacitively coupled discharges (CCP) driven at frequencies higher than the usual RF (13.56 (MHz)) frequency, the standing wave and skin effects should be the critical problems for obtaining the good plasma uniformity, and the ion damage on the thin film layer due to the high voltage between the substrate and the bulk plasma might cause the defects which degrade the film quality. In this study, we will propose the new concept of the large-area multi-electrode (a new multi-electrode concept for the large-area plasma source), which consists of a series of electrodes and grounds arranged by turns. The experimental results with this new electrode showed the processing performances of high D/R (1 ~ 2 (nm/sec)), controllable crystallinity (~70% and controllable), and good uniformity (less than 10%) at the conditions of the relatively high frequency of 40 MHz in the large-area electrode of 280 X 540 mm2. And, we also observed the SEM images of the deposited thin film at the conditions of peeling, normal microcrystalline, and powder formation, and discussed the mechanisms of the crystal formation and voids generation in the film in order to try the enhancement of the film quality compared to the cases of normal VHF capacitive discharges. Also, we will discuss the relation between the processing parameters (including gap length between electrode and substrate, operating pressure) and the processing results (D/R and crystallinity) with the process condition map for ${\mu}c$-Si:H formation at a fixed input power and gas flow rate. Finally, we will discuss the potential of the multi-electrode of the 3.5G-class large-area plasma processing (650 X 550 (mm2) to the possibility of the expansion of the new electrode concept to 8G class large-area plasma processing and the additional issues in order to improve the process efficiency.

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A study of the space sterilization device using atmospheric-pressure DBDs plasma (대기압 유전체장벽방전을 적용한 플라즈마오존 공간살균장치에 관한 연구)

  • Oh, Hee-Su;Lee, Kang-yeon;Park, Ju-Hoon;Jeong, Byeong-Ho
    • Journal of the Korea Convergence Society
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    • v.13 no.3
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    • pp.281-289
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    • 2022
  • Plasma ozone is utilized in a variety of applications in the field of sterilization due to its high sterilization performance. Dielectric materials used in DBD(dielectric barrier discharges) are mainly polymer, quartz and ceramics. These dielectric layers have the advantage of limiting the amount of supplied electron charge and allowing plasma to occur evenly on the surface of dielectric. Actually, the target or environment for sterilization is often a complex structure, so research and academic study are needed by utilizing the concept of space sterilization. In this study, the device is applied to generate DBD plasma at atmospheric pressure for disinfection due to the effectiveness in producing radicals and ozone. The generator of plasma ozone is a basic structure of dielectric barrier discharge by placing ceramic tube dielectrics and stainless steel electrical conductors at regular intervals. Various applications can be developed based on the proposed design method. Plasma ozone generation for space sterilization device is recognized as an excellent sterilization device. Through the design and verification of the device, we intend to establish an optimal design of the spatial sterilization device and provide the basis data for sterilization applications.

Simulations of Capacitively Coupled Plasmas Between Unequal-sized Powered and Grounded Electrodes Using One- and Two-dimensional Fluid Models

  • So, Soon-Youl
    • KIEE International Transactions on Electrophysics and Applications
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    • v.4C no.5
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    • pp.220-229
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    • 2004
  • We have examined a technique of one-dimensional (1D) fluid modeling for radio-frequency Ar capacitively coupled plasmas (CCP) between unequal-sized powered and grounded electrodes. In order to simulate a practical CCP reactor configuration with a grounded side wall by the 1D model, it has been assumed that the discharge space has a conic frustum shape; the grounded electrode is larger than the powered one and the discharge space expands with the distance from the powered electrode. In this paper, we focus on how much a 1D model can approximate a 2D model and evaluate their comparisons. The plasma density calculated by the 1D model has been compared with that by a two-dimensional (2D) fluid model, and a qualitative agreement between them has been obtained. In addition, 1D and 2D calculation results for another reactor configuration with equal-sized electrodes have also been presented together for comparison. In the discussion, four CCP models, which are 1D and 2D models with symmetric and asymmetric geometries, are compared with each other and the DC self-bias voltage has been focused on as a characteristic property that reflects the unequal electrode surface areas. Reactor configuration and experimental parameters, which the self-bias depends on, have been investigated to develop the ID modeling for reactor geometry with unequal-sized electrodes.

Study on the Characteristics of Dielectric Barrier Discharging System and Usability as a Disinfectant (2계면 플라즈마 방전시스템(DBD System)의 특징 및 소독제로서 방전수의 사용가능성에 대한 연구)

  • Ryu, Seungmin;Park, Heekyung;Lee, Bongju
    • Journal of Korean Society of Water and Wastewater
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    • v.18 no.4
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    • pp.529-536
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    • 2004
  • Innovated technique to inactivate microorganisms has been developed. This technique uses plasma discharge in 2-phase (Air-Water). Dielectric Barrier (two phase) Discharging system is able to produce new oxidants for microorganisms. Products from discharging are $HNO_2$, $NO_2{^-}$, $HNO_3$, $NO_3{^-}$ and ozone but many other radicals can be generated as well. DBD water has low concentration of ozone (about 0.5mg/L), $NO_2{^-}$, $NO_3{^-}$ (about 10mg-N/L, 20mg-N/L respectively) and lots of $H^+$. These products play an important role in oxidation. Oxidation power by KI titration methods is approximately equivalent to $50mg-O_3/L$. Surprisingly stored DBD water could oxidize KI and maintain stable pH (about pH3) even after several days. Stored DBD water for 5 days has also more than 4log disinfection power to E. coli. However, DBD water cannot be used for drinking water directly due to it's toxicity. Additional process to neutralize pH and decrease toxicity must be applied.

Research and Development of High Performance 42-inch XGA Plasma Display Panel

  • Choi, Kwang-Yeol;Min, Byoung-Kuk;Kim, Tae-Hyung;Song, Byung-Soo;Yoo, Eun-Ho;Kim, Jin-Young;Jung, Yun-Kwon;Kim, Won-Tae;Yang, Hee-Chan;Ryu, Jae-Hwa
    • 한국정보디스플레이학회:학술대회논문집
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    • 2004.08a
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    • pp.231-235
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    • 2004
  • High performance 42 inch XGA PDP with high luminance of 1,000 cd/$m^2$ has been developed using high efficient electrode structure, discharge gas and closed barrier ribs. For high speed addressing with single scan technique, address discharge time lag was reduced over 40% with FAST driving scheme and new materials. High dark room contrast ratio of 5,000 : 1 was achieved and picture quality was improved using new algorithm for eliminating false contour and improving gray level linearity.

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Operation modes and Protection of VS(Vertical Stabilization) Converter for International Thermonuclear Experimental Reactor (국제 핵융합실험로용 VS(Vertical Stabilization) 컨버터의 운전모드 및 보호동작)

  • Jo, Hyunsik;Jo, Jongmin;Oh, Jong-Seok;Suh, Jae-Hak;Cha, Hanju
    • The Transactions of the Korean Institute of Power Electronics
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    • v.20 no.2
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    • pp.130-136
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    • 2015
  • This study describes the structure and operation modes of vertical stabilization (VS) converter for international thermonuclear experimental reactor (ITER) and proposes a protection method. ITER VS converter supplies voltage (${\pm}1000V$)/current (${\pm}22.5kA$) to superconducting magnets for plasma current vertical stabilization. A four-quadrant operation must be achieved without zero-current discontinuous section. The operation mode of the VS converter is separated in 12-pulse mode, 6-pulse mode and circulation current mode according to the magnitude of the load current. Protection measures, such as bypass and discharge, are proposed for abnormal conditions, such as over current, over voltage, short circuit, and voltage sag. VS converter output voltage is controlled to satisfy voltage response time within 20 msec. Bypass operation is completed within 60 msec and discharge operation is performed successfully. The feasibility of the proposed control algorithm and protection measure is verified by assembling a real controller and implementing a power system including the VS converter in RTDS for a hardware-in-loop (HIL) facility.

The Relationships between Discharge Cell Structure and Addressing Characteristics in AC PDP

  • Lee, Don-Kyu;Shim, Kyung-Ryeol;Kim, Young-Rak;Heo, Jeong-Eun;Kim, Dong-Hyun;Lee, Ho-Jun;Park, Chung-Hoo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2003.07a
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    • pp.734-738
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    • 2003
  • The addressing time should be reduced by modifying cell and/or driving method in order to replace the dual scan system by single scan and increase the luminance in large ac plasma display panel(PDP). In this paper, the relationships between of discharge cell structure and addressing time in ac PDP are investigated. It is found out that the addressing time was decreased with decreasing gap of ITO electrode and thickness of transparence dielectric layer on the front glass. The decrease rates were 4% per $10{\mu}m$ and 4% per $5{\mu}m$, respectively. Also in cases of decreasing height of barrier rip and thickness of white dielectric layer on the rear glass, addressing times were at the rate of 4% per $10{\mu}m$ and 4% per $2{\mu}m$, respectively.

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The Measurement of the Wall Charge on the Three Electrodes in the Addressing Period of ac PDP (AC PDP의 addressing 시 3전극 상에서의 벽전하량 계측)

  • Lee, Ki-Bum;Kim, Dong-Hyun;Kang, Dong-Sik;Park, Cha-Soo;Cho, Chung-Soo;Park, Chung-Hoo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.05b
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    • pp.103-107
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    • 2000
  • The relationships between driving voltage and the wall charge distribution in the address period of surface discharge type AC Plasma Display Panel have been investigated. The quantity of wall charge on each electrode are detected simultaneously from the electrode current after applying only one addressing discharge pulse. The wall charge Qy on the scan electrode Y is nearly the sum of Qx on the address electrode X and Qz on the sustain electrode Z. The Qy increased with the driving voltage regardless of the kind of electrode, whereas the address time Td decreased, Qz and Qy are increased considerably with the blocking voltage Vz, whereas Qx is decreased. The increase rate of Qx, Qy and Qz for increase in Vz was $-13{\times}10^{-2}$ (pc/Vz), and $60{\times}10^{-2}$ (pc/Vz) and $70{\times}10^{-2}$(pc/Vz), respectively.

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