• Title/Summary/Keyword: Plasma

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Development Status of High Enthalpy Plasma Equipment (전북대 고온플라즈마 설비 구축 및 응용연구 소개)

  • Choi, Chea-Hong;Lee, Mi-Yun;Kim, Min-Ho;Hong, Bong-Guen;Seo, Jun-Ho
    • Proceedings of the Korean Society of Propulsion Engineers Conference
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    • 2011.11a
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    • pp.694-696
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    • 2011
  • The high enthalpy plasma research center in Chonbuk national university is under construction for four types of plasma equipments. The equipments are 1set of 0.4 MW class enhanced Huels type plasma equipment, 1 set of 2.4 MW class enhanced Huels type plasma quipment, 1 set of 60 kW RF plasma equipment and 1 set of 200 kW RF plasma equipment. 60kW RF plasma system is R&D and pilot scale production equipment of nano powder synthesis and plasma spray coating. 200kW RF plasma system is mass production equipment with high power capacity of nano powder synthesis. 0.4MW plasma system can be applied to the ground test facility for material testing under re-entry conditions for space vehicles.

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The characteristics of AC-PDPs According to binary and ternary gas mixtures of He-Ne-Xe_

  • Lee, H.J.;Son, C.G.;Lee, S.B.;Han, Y.K.;Jeoung, S.H.;You, N.L.;Lim, J.E.;Lee, J.H.;Moon, M.W.;Oh, P.Y.;Jeoung, J.M.;Choi, E.H.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07b
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    • pp.1195-1198
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    • 2005
  • The improvement of efficiency is the one of the most important part in AC PDPs . To achieve high efficiency, high VUV emission efficiency and High ion induces secondary electron emission coefficient are needed. We have measured the emission spectra of vacuum ultraviolet rays and ion induced secondary electron emission coefficient of MgO protective layer in surface discharge AC-PDP with binary and ternary gas mixtures. We have investigated electro-optical characteristics of AC-PDPs to optimum gas mixture for high efficient.

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Dietary Sesame Meal Increases Plasma HDL-cholesterol Concentration in Goats

  • Hirano, Y.;Kashima, T.;Inagaki, N.;Uesaka, K.;Yokota, H.;Kita, K.
    • Asian-Australasian Journal of Animal Sciences
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    • v.15 no.11
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    • pp.1564-1567
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    • 2002
  • Influence of dietary sesame meal on plasma glucose, non-esterified fatty acid (NEFA), triglyceride, total cholesterol, high-density lipoprotein (HDL)-cholesterol and urea concentrations in goats was examined. Goats were fed a control diet (50% timothy hay and 50% concentrates) (CD) or a sesame meal diet (50% timothy hay, 25% concentrates and 25% sesame meal) (SMD) during 12 days. Blood samples were taken after overnight fasting and afternoon every day. Body weight was not changed by feeding either CD or SMD. The concentrations of plasma triglyceride and urea were higher (p<0.05) in goats fed SMD than those fed CD. Plasma NEFA concentration was higher in plasma samples after overnight fasting. Plasma glucose concentration in plasma samples collected afternoon was higher than those after overnight fasting. Plasma total cholesterol concentration was significantly increased by feeding SMD but not by feeding CD, which was due to the remarkable increase of plasma HDL-cholesterol concentration. In conclusion, dietary sesame meal brought about an increase in plasma total cholesterol concentration accompanied with an increment in plasma HDL-cholesterol consentration in goats.

Comparative study of plasma effects on human liver normal and cancer cells (정상 간세포와 간암세포의 플라즈마 특성에 관한 비교연구)

  • Kim, Dae-Yeon;Gweon, Bo-Mi;Kim, Dan-Bee;Choe, Won-Ho;Shin, Jennifer H.
    • Proceedings of the KSME Conference
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    • 2008.11a
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    • pp.1539-1542
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    • 2008
  • Plasma is 4th state of matters, which consists of electrons, neutral, and ionized particles. In biomedical research, cold plasma, which is generated in atmospheric condition, has been applied to disinfect microorganisms such as bacteria and yeast cells. Because of its low temperature condition, the heat-sensitive medical device can be easily sterilized by the cold plasma treatment. In recent years, the effects of plasma on mammalian cells have arisen as a new issue. Generally, plasma induces intensity dependent necrotic cell death. In this research, we investigate the feasibility of cold plasma treatment for cancer therapy by conducting comparative study of plasma effects on normal and cancer cells. We use THLE-2 (human liver normal cell) and SK-Hep1 (human liver metathetic cancer cell) as our target cells. The needle type of cold plasma is generated by the Helium plasma device. Two types of cells have different onset plasma conditions for the necrosis, which may be explained by difference in electrical properties of these two cell types.

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Structural Evolution and Electrical Properties of Highly Active Plasma Process on 4H-SiC

  • Kim, Dae-Kyoung;Cho, Mann-Ho
    • Applied Science and Convergence Technology
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    • v.26 no.5
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    • pp.133-138
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    • 2017
  • We investigated the interface defect engineering and reaction mechanism of reduced transition layer and nitride layer in the active plasma process on 4H-SiC by the plasma reaction with the rapid processing time at the room temperature. Through the combination of experiment and theoretical studies, we clearly observed that advanced active plasma process on 4H-SiC of oxidation and nitridation have improved electrical properties by the stable bond structure and decrease of the interfacial defects. In the plasma oxidation system, we showed that plasma oxide on SiC has enhanced electrical characteristics than the thermally oxidation and suppressed generation of the interface trap density. The decrease of the defect states in transition layer and stress induced leakage current (SILC) clearly showed that plasma process enhances quality of $SiO_2$ by the reduction of transition layer due to the controlled interstitial C atoms. And in another processes, the Plasma Nitridation (PN) system, we investigated the modification in bond structure in the nitride SiC surface by the rapid PN process. We observed that converted N reacted through spontaneous incorporation the SiC sub-surface, resulting in N atoms converted to C-site by the low bond energy. In particular, electrical properties exhibited that the generated trap states was suppressed with the nitrided layer. The results of active plasma oxidation and nitridation system suggest plasma processes on SiC of rapid and low temperature process, compare with the traditional gas annealing process with high temperature and long process time.

PROPAGATION PROCESSES OF NEWLY DEVELOPED PLASMA JET IGNITER

  • Ogawa, Masaya;Sasaki, Hisatoshi;Yosgida, Koji;Shoji, Hideo;Tanaka, Hidenori
    • International Journal of Automotive Technology
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    • v.3 no.1
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    • pp.9-16
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    • 2002
  • In plasma jet ignition, combustion enhancement effects occur toward the plasma jet issuing direction. Therefore, when the igniter is attached at the center of a cylindrically shaped combustion chamber, plasma jet should issue toward the round combustion chamber wall. The plasma jet igniter that had an annular circular orifice has been developed. The purpose of this study is to elucidate the relationship between the newly developed plasma Jet igniter configuration and combustion enhancement effects. In this newly developed plasma Jet igniter, flame front wrinkle appears on the flame front and flame propagates rapidly. Plasma Jet influences on the flame propagation far long period when the plasma jet igniter has issuing angle 90 degrees and large cavity volume, because the plasma jet only lasts several ms. However, in the early stage of combustion, flame front area of issuing angle 45 degrees is larger than that of 90 degrees, because the initial flame kernel is formed by the plasma jet.

Research on Transmission Line Design for Efficient RF Power Delivery to Plasma (전송선로를 이용한 플라즈마 전력 전달 연구)

  • Park, In Yong;Lee, Jang Jae;Kim, Si-Jun;Lee, Ba Da;Kim, Kwang Ki;Yeom, Hee Jung;You, Shin Jae
    • Journal of the Semiconductor & Display Technology
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    • v.15 no.2
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    • pp.6-10
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    • 2016
  • In RF plasma processing, when the plasma is generated, there is the difference of impedance between RF generator and plasma source. Its difference is normally reduced by using the matcher and the RF power is transferred efficiently from the power generator to the plasma source. The generated plasma has source impedance that it can be changed during processing by pressure, frequency, density and so on. If the range of source impedance excesses the matching range of the matcher, it cannot match all value of the impedance. In this research, we studied the elevation mechanism of the RF power delivery efficiency between RF generator to the plasma source by using the transmission line and impedance tuning of the plasma source. We focus on two plasma sources (capacitive coupled plasma (CCP), inductive coupled plasma (ICP)) which is most widely used in industry recently.

Site Plan of High-enthalpy Plasma Research Center in Chonbuk National University (전북대학교 고온플라즈마응용연구센터 Site Plan)

  • Kim, Min-Ho;Choi, Seong-Man;Seo, Jun-Ho;Choi, Chea-Hong;Hong, Bong-Guen
    • Proceedings of the Korean Society of Propulsion Engineers Conference
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    • 2010.11a
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    • pp.764-767
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    • 2010
  • The high enthalpy plasma research center in Chonbuk national university is under construction for MW class plasma wind tunnel. Four types of plasma equipment will be installed in the research center. The equipments are 1set of 0.4 MW class enhanced Huels type plasma equipment, 1 set of 2.4 MW class enhanced Huels type plasma equipment, 1 set of 60 kW RF plasma equipment and 1 set of 200 kW RF plasma equipment. And electrical, water and gas utilities to assistant plasma equipments are under construction. The research center consists of experiment building, research building, power supply building, air supply building, cooling tower foundation.

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Flow Characteristics of An Atmospheric Pressure Plasma Torch

  • Moon, Jang-H.;Kim, Youn-J.;Han, Jeon-G.
    • Journal of the Korean institute of surface engineering
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    • v.36 no.1
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    • pp.69-73
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    • 2003
  • The atmospheric pressure plasma is regarded as an effective method for surface treatments because it can reduce the period of process and doesn't need expensive vacuum apparatus. The performance of non-transferred plasma torches is significantly depended on jet flow characteristics out of the nozzle. In order to produce the high performance of a torch, the maximum discharge velocity near an annular gap in the torch should be maintained. Also, the compulsory swirl is being produced to gain the shape that can concentrate the plasma at the center of gas flow. In this work, the distribution of gas flow that goes out to atmosphere through a plenum chamber and nozzle is analyzed to evaluate the performance of atmospheric pressure plasma torch which can present the optimum design of the torch. Numerical analysis is carried out with various angles of an inlet flow velocity. Especially, three-dimensional model of the torch is investigated to estimate swirl effect. We also investigate the stabilization of plasma distribution. For analyzing the swirl in the plenum chamber and the flow distribution, FVM (finite volume method) and SIMPLE algorithm are used for solving the governing equations. The standard k-model is used for simulating the turbulence.

Real-Time Plasma Process Monitoring with Impedance Analysis and Optical Emission Spectroscopy

  • Jang, Hae-Gyu;Kim, Dae-Kyoung;Kim, Hoon-Bae;Han, Sa-Rum;Chae, Hee-Yeop
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.473-473
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    • 2010
  • Plasma is widely used in various commercial etchers and chemical vapor deposition. Unfortunately, real-time plasma process monitoring is still difficult. Some methods of plasma diagnosis is improved, however, it is possible for real-time plasma diagnosis to use non-intrusive probe only. In this research, the object is to investigate the suitability of using impedance analysis and optical emission spectroscopy (OES) for real-time plasma process monitoring. It is assumed that plasma system is a equivalent circuit. Therefore, V-I probe is used for measuring impedance, which can be a new non-intrusive probe for plasma diagnosis. From impedance data, we tried to analyse physical properties of plasma. And OES, the other method of plasma diagnosis, is a typical non-intrusive probe for analyzing chemical properties. The amount of the OES data is typically large, so this poses a difficulty in extracting relevant information. To solve this problem, principal component analysis (PCA) can be used. For fundamental information, Ar plasma and $O_2$ plasma are used in this experiment. This method can be applied to real-time endpoint and fault detections.

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