• Nuclear Engineering and Technology
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• v.54 no.11
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• pp.4102-4110
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• 2022

Aiming at high-power and long-pulse operation up to 1000 s, some improvements have been made for both 2.45 GHz and 4.6 GHz lower hybrid (LH) systems during the recent 5 years. At first, the guard limiters of the LH antennas with graphite tiles were upgraded to tungsten, the most promising material for plasma facing components in nuclear fusion devices. These new guard limiters can operate at a peak power density of 12.9 MW/m². Strong hot spots were usually observed on the old graphite limiters when 4.6 GHz system operated with power >2.0 MW [B. N. Wan et al., Nucl. Fusion 57 (2017) 102019], leading to a reduction of the maximum power capability. With the new limiters, 4.6 GHz LH system, the main current drive (CD) and electron heating tool for EAST, can be operated with power >2.5 MW routinely. Long-pulse operation up to 100 s with 4.6 GHz LH power of 2.4 MW was achieved in 2021 and the maximal temperature on the guard limiters measured by an infrared (IR) camera was about 540 ℃, much below the permissible value of tungsten material (~1200 ℃). A discharge with a duration of 1056 s was achieved and the 4.6 GHz LH energy injected into the plasma was up to 1.05 GJ. Secondly, the fully-active-multijunction (FAM) launcher of 2.45 GHz system was upgraded to a passive-active-multijunction (PAM), for which the density of optimum coupling was relatively low (below the cut-off value). Good coupling with reflection coefficient ~3% has been achieved with plasma-antenna distance up to 11 cm for the new PAM. Finally, in order to eliminate the effect of ion cyclotron range of frequencies (ICRF) wave on 4.6 GHz LH wave coupling, the location of the ICRF launcher was changed to a port that is located 157.5° toroidally from the 4.6 GHz LH system and is not magnetically connected.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.77-77
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• 2012

As interest has increased in the interaction between low-temperature plasmas and materials, the role of modeling and simulation of processing in plasma has become important in understanding the effects of charged particles and radicals in plasma applications. Thus in this presentation, we present the theoretical and experimental studies of electron impact cross section for plasma processing gas, such as plasma etching and deposition processes. Also, here the work conducted at the Data Center for Plasma Properties (DCPP) over last 7 years on the systematic synthesis and assessment of fundamental knowledge on low-energy electron interactions with plasma processing gases is briefly summarized and discussed.

• Journal of Nutrition and Health
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• v.34 no.4
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• pp.393-400
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• 2001

We examined the relationship between plasma folate and total homocysteine(Hcy) levels and the distribution of plasma folate and Hcy levels from 204 Korean adults(113 men and 91 women aged between 20yr and 69yr). Plasma folate levels were significantly lower in men(12.2nmol/L) than in women(14.6nmol/L) after controlling for smoking and drinking(p<0.05). Plasma Hcy levels were significantly higher in men(13.9$\mu$mol/L) than in women(11.8$\mu$mol/L) after controlling and drinking. Plasma Hcy levels were more more strongly correlated with plasma folate in women(${\gamma}$=-0.321, p<0.05) than in men(${\gamma}$=-0.202, p<0.05), but the difference between men and women was no longer statistically significant controlling for plasma folate concentration. Prevalence of mild homocysteinemia(plama Hcy>15$\mu$mol/L) was greatest among subjects with lowest folate status. These results indicate a strong association between plasma Hcy concentration and folate status and the poor folate status is the strong causative factor of mild homocysteinemia. (Korean J Nutrition 34(4) : 393~400, 2001)

• Nuclear Engineering and Technology
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• v.44 no.1
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• pp.21-32
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• 2012

Fluorinated compounds mainly used in the semiconductor industry are potent greenhouse gases. Recently, thermal plasma gas scrubbers have been gradually replacing conventional burn-wet type gas scrubbers which are based on the combustion of fossil fuels because high conversion efficiency and control of byproduct generation are achievable in chemically reactive high temperature thermal plasma. Chemical equilibrium composition at high temperature and numerical analysis on a complex thermal flow in the thermal plasma decomposition system are used to predict the process of thermal decomposition of fluorinated gas. In order to increase economic feasibility of the thermal plasma decomposition process, increase of thermal efficiency of the plasma torch and enhancement of gas mixing between the thermal plasma jet and waste gas are discussed. In addition, noble thermal plasma systems to be applied in the thermal plasma gas treatment are introduced in the present paper.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.28 no.5
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• pp.587-593
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• 2004

In this paper, flow characteristics of plasma flow in a micro-tube were investigated experimentally using micro particle image velocimetry(micro-PIV). For comparison, the experiments were repeated for deionized(DI) wale. instead of plasma. Both velocity profiles of plasma and do-ionized water are well agreed with the theoretical velocity distribution of newtonian fluid. We also carried out generating plasma-in-oil droplet formation at a Y-junction microchannel. In order to clarify the hydrodynamic aspects involved in plasma droplet formation, Rhodamine-B were mixed with plasma only for visualization of plasma droplet. With oil as the continuous phase and plasma as the dispersed phase, plasma droplet can be generated in a continuous phase flow at a Y-junction. For given experimental parameters, regular-sized droplets are reproducibly formed at a uniform flow conditions.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.121.1-121.1
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• 2014

Recently, much attention has been given to plasma production under liquid and its applications [1]. However, most of plasma production techniques reported so far utilize high voltage dc, ac, rf or microwave power [2], where damage to discharge electrodes and small discharge volume are remained issues. As an alternative of plasma production method under liquid, we have proposed pulsed microwave excited plasma using slot antenna, where damage to the slot electrode can be minimized and plasma volume can be increased. We have also reported improvement of treatment efficiency with use of reduced-pressure condition during the discharge [3]. To realize low pressure conditions in liquid, various alternative technique can be considered. One possible technique is simultaneous injection of microwave power and ultrasonic wave. Ultrasonic wave induces pressure fluctuation with the wave propagation and is so far used for cavitation production in the water. We propose utilization of reduced pressure induced by ultrasonic cavitation for improvement of the plasma production. Correlation between the plasma production and the ultrasonic power will be discussed.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.522-522
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• 2013

Plasma can be used to various applications such as sterilization, inactivation/removal of microorganisms, wound healing, tooth bleaching, cancer treatment, surface modification and plasma polymerization. In this research, we studied the effect of plasma irradiation on the structural, optical, and biological properties of the polymer films. Several polymers were synthesized and then deposited on the glass substrates. The polymer films were treated by oxygen and nitrogen plasmas. Plasma-treated films were investigated by contact angle, infrared absorption spectroscopy, cathodoluminescence spectroscopy, and scanning electron microscopy. Functional materials were prepared on plasma-treated surface, and their performances were investigated using various techniques. Next, we discuss relationship between the performance of functional materials and the structural properties of plasma-treated polymer films.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.11 no.4
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• pp.261-266
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• 1998

In developing the high density memory device, the etching of fine pattern is becoming increasingly important. Therefore, definition of ultra fine line and space pattern and minimization of damage and contamination are essential process. Also, the high density plasma in low operating pressure is necessary. The candidates of high density plasma sources are electron cyclotron resonance plasma, helicon wave plasma, helical resonator, and inductively coupled plasma. In this study, planar type magnetized inductively coupled plasma etcher has been built. The density and temperature of Ar plasma are measured as a function of rf power, flow rate, external magnetic field, and pressure. The oxide etch rate and selectivity to polysilicon are measured as the above mentioned conditions and self-bias voltage.

• Journal of the Korean institute of surface engineering
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• v.29 no.5
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• pp.357-362
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• 1996

Several applications of radio-frequency (RF) thermal plasma to film formation are reviewed. Three types of injection plasma processing (IPP) technique are first introduced for the deposition of materials. Those are thermal plasma chemical vapor deposition (CVD), plasma flash evaporation, and plasma spraying. Radio-frequency (RF) plasma and hybrid (combination of RF and direct current(DC)) plasma are next introduced as promising thermal plasma sources in the IPP technique. Experimental data for three kinds of processing are demonstrated mainly based on our recent researches of depositions of functional materials, such as high temperature semiconductor SiC and diamond, ionic conductor $ZrO_2-Y_2O_3$ and high critical temperature superconductor $YBa_2Cu_3O_7-x$. Special emphasis is given to thermal plasma flash evaporation, in which nanometer-scaled clusters generated in plasma flame play important roles as nanometer-scaled clusters as deposition species. A novel epitaxial growth mechanism from the "hot" clusters namely "hot cluster epitaxy (HCE)" is proposed.)" is proposed.osed.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.929-931
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• 2006

In this experiment, we have investigated that the transported space charge between sub-pixels in AC-plasma cell discharge. The test pulse 30 V, $5{\mu}s$ was applied to the address electrodes of neighbor cells of discharge occurred cells. And we have measured the transported space charge between sub-pixels in accordance with the various last sustain pulse widths t(time gap between the rising edges of sustain and test pulses) of 0.2 to $3{\mu}s$. It was observed that the peak value of transported space charge has been shown to be 21.5pC at $1.0{\mu}s$. And the IR peak value have been occured after $0.51{\mu}s$ with respect to sustain voltage.