• Title, Summary, Keyword: Plasma

Search Result 16,193, Processing Time 0.053 seconds

Role of Non-Thermal DBD Plasma on Cell Migration and Cell Proliferation in Wound Healing

  • Ali, Anser;Lee, Seung Hyun;Kim, Yong Hee;Uhm, Han Sup;Choi, Eun Ha;Park, Bong Joo
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • /
    • pp.526-526
    • /
    • 2013
  • Plasma technology isbeing developed for a range of medical applications including wound healing. However, the effect of plasma on many cells and tissues is unclear. Cell migration and cell proliferation are very important biological processes which are affected by plasma exposure and might be a potential target for plasma therapy during wound healing treatment. In this study, we confirmed the plasma exposure time and incubation time after plasma treatment in skin fibroblast (L-929 cells) to evaluate the optimal conditions forplasma exposure to the cell in-vitro. In addition, we used a scratch method to generate artificial wound for evaluating the cell migration by plasma treatment. Where, the cells were treated with plasma and migration rate was observed by live-cell imaging device. To find the cell proliferation, cell viability assay was executed. The results of this study indicate the increased cell proliferation and migration on mild plasma treatment. The mechanisms for cell migration and cell proliferation after plasma treatment for future studies will be discussed.

  • PDF

Electron Temperature and Density of Non-Thermal Atmospheric Pressure Argon Plasma Jet by Convective Wave Packet Model

  • Sornsakdanuphap, Jirapong;Suanpoot, Pradoong;Hong, Young June;Ghimire, Bhagirath;Cho, Guangsup;Uhm, Han Sup;Kim, Doyoung;Kim, Yun Ji;Choi, Eun Ha
    • Journal of the Korean Physical Society
    • /
    • v.70 no.11
    • /
    • pp.979-989
    • /
    • 2017
  • The propagation velocities ($u_g$) of argon plasma jet are obtained by intensified charge coupled device (ICCD) camera images at fixed gate width time of 5 ns. The propagation velocities in upstream and downstream regions are in the order of $10^4-10^5m/s$. The plasma ambipolar diffusion velocities are measured to be in the order of $10-10^2m/s$. Plasma jet discharges are generated by sinusoidal power supply in varying voltages from 2 to 4 kV at repetition frequency of about 40 kHz. By employing convective wave packet model, the electron temperature ($T_e$) inside plasma bullet for argon non-thermal atmospheric pressure plasma jet is estimated to be about 1.18 eV. Also, the electron density ($n_e$) is found to be $8.0{\times}10^{14}-2.5{\tim}10^{15}cm^{-3}$.

Measurement of Plasma Parameters (Te and Ne) and Reactive Oxygen Species in Nonthermal Bioplasma Operating at Atmospheric Pressure

  • Choi, Eun Ha;Kim, Yong Hee;Kwon, Gi Chung;Choi, Jin Joo;Cho, Guang Sup;Uhm, Han Sup;Kim, Doyoung;Han, Yong Gyu;Suanpoot, Pradoong
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • /
    • pp.141-141
    • /
    • 2013
  • We have generated the needle-typed nonthermal plasma jet by using an Ar gas flow at atmospheric pressure. Diagnostics of electron temperature anddensity is critical factors in optimization of the atmospheric plasma jet source in accordance with the gas flow rate. We have investigated the electron temperature and density of plasma jet by selecting the four metastable Ar emission lines based on the atmospheric collisional radiative model and radial profile characteristics of current density, respectively. The averaged electron temperature and electron density for this plasma jet are found to be ~1.6 eV and ~$3.2{\times}10^{12}cm^{-3}$, respectively, in this experiment. The densities of OH radical species inside the various bio-solutions are found to be higher by about 4~9 times than those on the surface when the argon bioplasma jet has been bombarded onto the bio-solution surface. The densities of the OH radicalspecies inside the DI water, DMEM, and PBS are measured to be about $4.3{\times}10^{16}cm^{-3}$, $2.2{\times}10^{16}cm^{-3}$, and $2.1{\times}10^{16}cm^{-3}$, respectively, at 2 mm downstream from the surface under optimized Ar gas flow 250 sccm.

  • PDF

Carbon 계 유기막질 Plasma Etching에 있어 COS (Carbonyl Sulfide) Gas 특성에 관한 연구

  • Kim, Jong-Gyu;Min, Gyeong-Seok;Kim, Chan-Gyu;Nam, Seok-U;Gang, Ho-Gyu;Yeom, Geun-Yeong
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • /
    • pp.460-460
    • /
    • 2012
  • 반도체 Device가 Shrink 함에 따라 Pattern Size가 작아지게 되고, 이로 인해 Photo Resist 물질 자체만으로는 원하는 Patterning 물질들을 Plasma Etching 하기가 어려워지고 있다. 이로 인해 Photoresist를 대체할 Hard Mask 개념이 도입되었으며, 이 Hardmask Layer 중 Amorphous Carbon Layer 가 가장 널리 사용되고 지고 있다. 이 Amorphous Carbon 계열의 Hardmask를 Etching 하기 위해서 기본적으로 O2 Plasma가 사용되는데, 이 O2 Plasma 내의 Oxygen Species들이 가지는 등 방성 Diffusion 특성으로 인해, 원하고자 하는 미세 Pattern의 Vertical Profile을 얻는데 많은 어려움이 있어왔다. 이를 Control 하기 인해 O2 Plasma Parameter들의 변화 및 Source/Bias Power 등의 변수가 연구되어 왔으며, 이와 다른 접근으로, N2 및 CO, CO2, SO2 등의 여러 Additive Gas 들의 첨가를 통해 미세 Pattern의 Profile을 개선하고, Plasma Etching 특성을 개선하는 연구가 같이 진행되어져 왔다. 본 논문에서 VLSI Device의 Masking Layer로 사용되는, Carbon 계 유기 층의 Plasma 식각 특성에 대한 연구를 진행하였다. Plasma Etchant로 사용되는 O2 Plasma에 새로운 첨가제 가스인 카르보닐 황화물 (COS) Gas를 추가하였을 시 나타나는 Plasma 내의 변화를 Plasma Parameter 및 IR 및 XPS, OES 분석을 통하여 규명하고, 이로 인한 Etch Rate 및 Plasma Potential에 대해 비교 분석하였다. COS Gas를 정량적으로 추가할 시, Plasma의 변화 및 이로 인해 얻어지는 Pattern에서의 Etchant Species들의 변화를 통해 Profile의 변화를 Mechanism 적으로 규명할 수 있었으며, 이로 인해 기존의 O2 Plasma를 통해 얻어진 Vertical Profile 대비, COS Additive Gas를 추가하였을 경우, Pattern Profile 변화가 개선됨을 최종적으로 확인 할 수 있었다.

  • PDF

A Study on Magnetized Inductively Coupled Plasma Using Cutoff Probe (Cutoff Probe를 이용한 자화유도결합 플라즈마의 특성 연구)

  • Son, Eui-Jeong;Kim, Dong-Hyun;Lee, Ho-Jun
    • The Transactions of The Korean Institute of Electrical Engineers
    • /
    • v.65 no.10
    • /
    • pp.1706-1711
    • /
    • 2016
  • Electromagnetic wave simulation was performed to predict characteristics of manufactured cutoff probe at low temperature magnetized plasma medium. Microwave cutoff probe is designed for research the properties of magnetized inductively coupled plasma. It was shown that the cutoff probe method can safely be used for weakly magnetized high density plasma sources. Cutoff probe system with two port network analyzer has been prepared and applied to measure electron density distributions in large area, 13.56MHz driven weakly magnetized inductively coupled plasma source. The results shown that, the plasma frequency confirmed cut-off characteristics in low temperature plasma. Especially, cut-off characteristics was found at upper hybrid resonance frequency in the environment of the magnetic field. In case of a induced weak magnetic field in inductively coupled plasma, plasma density estimated from the cutoff frequency in the same way at unmagnetized plasma due to nearly same plasma frequency and upper hybrid resonance frequency. The plasma density is increased and uniformity is improved by applying a induced weak magnetic field in inductively coupled plasma.

A Study on the Characteristics of Plasma Blacks Prepared by Plasma Pyrolysis Over Metals Coated Honeycomb Catalysts

  • Park, Soo-Yeop;Lee, Joong-Kee;Yoo, Kyung-Seun;Cho, Won-Ihl;Baek, Young-Soon
    • Carbon letters
    • /
    • v.4 no.2
    • /
    • pp.74-78
    • /
    • 2003
  • Four kinds of plasma blacks were prepared by plasma pyrolysis under various metallic catalysts coated on honeycomb, and investigated the catalytic effect on the characteristics of the plasma blacks prepared under plasma pyrolysis condition. Pt, Pt-Rh, and Pd catalysts were employed as active materials to prepare the plasma blacks. In the experimental range studied, the metallic catalysts influenced on surface area, particle size, surface oxygen content and electrical conductivity of the plasma blacks prepared. It was showed that more dense particle of plasma blacks were prepared under existence of metallic catalysts. Presence of the metallic catalyst reduces the electrical resistivity of plasma blacks due to the decrease in the amount of oxygen functional groups. The highest electrical conductivity of plasma black was observed in the Pt catalyst and then followed by those Pt-Rh, Pd and bare cordierite honeycomb.

  • PDF

Development of Virtual Integrated Prototyping Simulation Environment for Plasma Chamber Analysis and Design (VIP-SEPCAD) (플라즈마 챔버의 특성 분석 및 최적 설계를 위한 가상의 시뮬레이션 환경 개발)

  • 김헌창;설용태
    • Journal of the Semiconductor & Display Technology
    • /
    • v.2 no.4
    • /
    • pp.9-12
    • /
    • 2003
  • This paper describes a newly developed simulation environment for analysis and design of a plasma processing chamber based on first principles including complicated physical and chemical interactions of plasma, fluid dynamics of neutrals, and transport phenomena of particles. Capabilities of our simulator, named VIP-SEPCAD (Virtual Integrated Prototyping Simulation Environment for Plasma Chamber Analysis and Design), are demonstrated through a two dimensional simulation of an oxygen plasma chamber. VIP-SEPCAD can provide plasma properties such as spatiotemporal profiles of plasma density and potential, electron temperature, ion flux and energy, etc. By coupling neutral and particle transport models with a three moment plasma model, VIP-SEPCAD can also predict spatiotemporal profiles of chemically reactive species and particles exist in plasma.

  • PDF

Design of Web based Plasma Properties Reference Data Collection and Evaluation System (Web기반 Plasma 물성 참조데이터 수집평가 시스템 설계)

  • Park, Jun-Hyoung;Hwang, Sung-Ha;Jang, Won-Suk;Kwon, Duek-Chul;Song, Mi-Young;Yoon, Jung-Sik
    • Proceedings of the Korea Information Processing Society Conference
    • /
    • /
    • pp.1062-1065
    • /
    • 2010
  • Plasma 물성 데이터는 Plasma내에서 일어나는 입자(전자, 원자, 이온, 분자 등)들의 충돌에 대한 데이터로써 Plasma 발생 장치 설계 및 제어의 핵심 요소이며, Plasma 공정조건 확립을 위한 필수 정보가 된다. 참조표준은 과학기술데이터나 정보에 대하여 정확도와 신뢰도에 대한 분석 및 평가가 이루어진 공인데이터를 말한다. 이러한 플라즈마 물성 정보를 체계적으로 관리하고 신뢰성 있는 데이터를 필요로 하는 산업체에 지원하기 위하여 특정 참조표준과 참조데이터로 제정, 보급하는 Plasma 물성 참조표준 수집평가 시스템이 필요하고, 이에 대한 설계가 필요하다.

  • PDF

The Effects of an RF Plasma and Electric Fields on the Death of G361 Melanoma Cells (RF 플라즈마 및 전기장의 흑색종 (G361 melanoma) 세포에 대한 사멸 효과)

  • Shon, Chae-Hwa;Kim, Gyoo-Cheon;Lee, Hae-June
    • The Transactions of The Korean Institute of Electrical Engineers
    • /
    • v.56 no.11
    • /
    • pp.1972-1977
    • /
    • 2007
  • Micro plasma has been recently studied to investigate the effects on various cells. We study a micro-plasma produced by a plasma needle that is operated with RF power and its effects on G361 melanoma cells. The micro plasma size ranges from sub-mm to several mm at a few watts of RF power. For the bio-medical treatment, low-temperature plasma is obtained and gas temperature is controlled within several tens of degrees $(^{\circ}C)$ in order not to disturb cell activities. Elementary spectroscopic studies to obtain plasma characteristics are presented for Ar and He plasma with different frequencies of RF power. Also the preliminary results of the micro plasma effects on G361 melanoma cells are presented. It was observed that the irradiation of micro plasma induces cell death through the deprivation of tyrosine phosphorylation in the G361 cells.

Surface Analysis of Fluorine-Plasma Etched Y-Si-Al-O-N Oxynitride Glasses

  • Lee, Jung-Ki;Hwang, Seong-Jin;Lee, Sung-Min;Kim, Hyung-Sun
    • Proceedings of the Materials Research Society of Korea Conference
    • /
    • /
    • pp.38.1-38.1
    • /
    • 2009
  • Plasma etching is an essential process for electronic device industries and the particulate contamination during plasma etching has been interested as a big issue for the yield of productivity. The oxynitride glasses have a merit to prevent particulate contamination due to their amorphous structure and plasma etching resistance. The YSiAlON oxynitride glasses with increasing nitrogen content were manufactured. Each oxynitride glasses were fluorine-plasma etched and their plasma etching rate and surface roughness were compared with reference materials such as sapphire, alumina and quartz. The reinforcement mechanism of plasma etching resistance of the YSiAlON glasses studied by depth profiling at plasma etched surface using electron spectroscopy for chemical analysis. The plasma etching rate decreased with nitrogen content and there was no selective etching at the plasma etched surface of the oxynitride glasses. The concentration of silicon was very low due to the generation of SiF4 very volatile byproduct and the concentration of aluminum and yttrium was relatively constant. The elimination of silicon atoms during plasma etching was reduced with increasing nitrogen content because the content of the nitrogen was constant. And besides, the concentration of oxygen was very low on the plasma etched surface. From the study, the plasma etching resistance of the glasses may be improved by the generation of nitrogen related structural groups and those are proved by chemical composition analysis at plasma etched surface of the YSiAlON oxynitride glasses.

  • PDF