• 제목/요약/키워드: Plasma

검색결과 16,873건 처리시간 0.062초

한국 일부 여대생의 식이 지방산과 혈장지질, 혈장 및 적혈구 지방산 조성과의 관계 (Relationship between Dietary Fatty Acids, Plasma Lipids, and Fatty Acid Compositions of Plasma and RBC in Young Korean Females)

  • 김양희
    • Journal of Nutrition and Health
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    • 제27권2호
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    • pp.109-117
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    • 1994
  • This study was conducted to evaluate dietary fat intake and its effect on the plasma lipids and fatty acids composition in plasma and red blood cells(RBC) in 96 healthy Korean female college student. Three-day food intakes were recorded, and fasting blood samples were collected and analyzed for plasma total cholesterol and triglyceride. Fatty acid compositions were determined in plasma and RBC membrane. Oleic acid was the most abundant in diet, followed by palmitic and linoleic acids. Mean daily intake of cholesterol was 219$\pm$127mg, mean plasma cholesterol was 160$\pm$24mg/이 and mean plasma triglyceride was 68$\pm$25mg/dl. Plasma fatty acids were mostly composed of linoleic, palmitic and oleic acids, while palmitic, stearic and arachidonic acids were high in RBC membrane. Plasma triglyceride showed positive correlation with BMI. Among dietary fatty acids, arachidonic acid, EPA and DHA showed negative correlation with plasma total cholesterol. Plasma triglyceride levels were negatively correlated with dietary arachidonic acid, plasma n-6 fatty acids and plasma polyunsaturated fatty acids. Dietary EPA and DHA levels were positively correlated with plasma EPA, dietary n-3/n-6 ratio were positively correlated with plasma n-3 fatty acids and n-3/n-6 ratio. Highly significant correlations were shown between the levels in plasma and RBC for several fatty acids.

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Measurement of characteristics of plasma discharge in liquid

  • Kim, Ju-Sung;Min, Boo-Ki;Kang, Seong-Oun;Choi, Eun-Ha
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.153-153
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    • 2015
  • Application of the plasma is already highlighted as a new technology in the last few years. In these days, there are lots of attempt in various application with plasma in that it is known as an effective treatment to animal, plants, material and so on. Plasma in liquid, one of new plasma applications, has advantages in ability to treat bio-cell or solutions. For example, electro-surgery, water purification, radical generation and so on. Especially, plasma discharge in solutions is very useful technique and difficult to generate due to electrolysis, vaporization and something else. In this study, we have performed plasma discharge and checked sustainability of plasma in solution(saline 0.9%). And we have measured basic characteristics of plasma in liquid. Such as electrical energy and plasma density are calculated from discharging current and voltage. Also, its thermal energy is measured with IR camera.

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Cellular and Molecular Responses of a Filamentous Fungus Neurospora Crassa to Non-thermal Plasma at Atmospheric Pressure

  • Park, Gyung-Soon;Ryu, Young-Hyo;Hong, Young-June;Uhm, Han-Sup;Choi, Eun-H.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.476-476
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    • 2012
  • Although plasma is an efficient means of microbial sterilization, mechanism of plasma effect on microorganisms still needs to be clarified. In addition, a limited number of studies are available on eukaryotic microorganisms such as yeast and fungi in relation to plasma application. Thus, we investigated cellular and molecular aspects of plasma effects on a filamentous fungus, Neurospora crassa by making use of argon plasma jet at atmospheric pressure. The viability and cell morphology of N. crassa spores exposed to plasma were both significantly reduced depending on the exposure time when treated in water. The intracellular genomic DNA content was dramatically reduced in fungal tissues after a plasma treatment and the transcription factor tah-3 was found to be required for fungal tolerance to a harsh plasma environment.

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Plasma Engineering for Nano-Materials

  • Kim, Seong-In;Shin, Myoung-Sun;Son, Byung-Koo;Song, Seok-Kyun;Choi, Sun-Yong
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.79-79
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    • 2012
  • A high temperature and a low temperature plasma process technologies were developed and demonstrated for synthesis, hybrid formation, surface treatment and CVD engineering of nano powder. RF thermal plasma is used for synthesis of spherical nano particles in a diameter ranged from 10 nm to 100 nm. A variety of nano particules such as Si, Ni, has been synthesized. The diameter of the nano-particles can be controlled by RF plasma power, pressure, gas flow rate and raw material feed rate. A modified RF thermal plasma also produces nano hybrid materials with graphene. Hemispherical nano-materials such as Ag, Ni, Si, SiO2, Al2O3, size ranged from 30 to 100 nm, has been grown on graphene nanoplatelet surface. The coverage ranged from 0.1 to 0.7 has been achieved uniformly over the graphene surface. Low temperature AC plasma is developed for surface modification of nano-powder. In order to have a three dimensional and lengthy plasma treatment, a spiral type of reactor has been developed. A similar plasma reactor has been modfied for nano plasma CVD process. The reactor can be heated with halogen lamp.

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Analysis of characteristics of discharge in liquid

  • Kim, Ju-Sung;Min, Boo-Ki;Hong, Young-June;Kang, Seong-Oun;Choi, Eun-Ha
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.209.2-209.2
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    • 2016
  • Up to now, Plasma applications are thought as a leading technology in industrial, chemical and even medical and biological field. Especially, Due to direct discharge in liquid with reaction in ambient solution, plasma in liquid is useful plasma technology. Such as electro-surgery, water purification, radical generation for synthesis. For using those plasma applications efficiently, plasma characteristics should be understood in advance. But discharge in liquid is not much well-known about its characteristics. And plasma discharge in solution is difficult to generate and analysis due to electrolysis, vaporization and radical generation. So, We make stable plasma discharge in solution(saline 0.9%) without input gas. We also analyze new type of plasma source in thermal and electrochemical view. And we check characteristics of plasma in liquid. For example, plasma density and radical density(OH) with optical emission, thermal energy with thermometer, electrical energy with oscilloscope and so on. And we try to explain the bubble and plasma formation with circuit analysis.

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Role of Non-Thermal DBD Plasma on Cell Migration and Cell Proliferation in Wound Healing

  • Ali, Anser;Lee, Seung Hyun;Kim, Yong Hee;Uhm, Han Sup;Choi, Eun Ha;Park, Bong Joo
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.526-526
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    • 2013
  • Plasma technology isbeing developed for a range of medical applications including wound healing. However, the effect of plasma on many cells and tissues is unclear. Cell migration and cell proliferation are very important biological processes which are affected by plasma exposure and might be a potential target for plasma therapy during wound healing treatment. In this study, we confirmed the plasma exposure time and incubation time after plasma treatment in skin fibroblast (L-929 cells) to evaluate the optimal conditions forplasma exposure to the cell in-vitro. In addition, we used a scratch method to generate artificial wound for evaluating the cell migration by plasma treatment. Where, the cells were treated with plasma and migration rate was observed by live-cell imaging device. To find the cell proliferation, cell viability assay was executed. The results of this study indicate the increased cell proliferation and migration on mild plasma treatment. The mechanisms for cell migration and cell proliferation after plasma treatment for future studies will be discussed.

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Multi-hole RF CCP 방전에서 방전 주파수가 미치는 영향

  • 이헌수;이윤성;서상훈;장홍영
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.145-145
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    • 2011
  • Recently, multi-hole electrode RF capacitively coupled plasma discharge is being used in the deposition of microcrystalline silicon for thin film solar cell to increase the speed of deposition. To make efficient multi-hole electrode RF capacitively coupled plasma discharge, the hole diameter is to be designed concerning the plasma parameters. In past studies, the relationship between plasma parameters such as pressures and gas species, and hole diameter for efficient plasma density enhancement is experimentally shown. In the presentation, the relationship between plasma deriving frequency and hole diameter for efficient multi-hole electrode RF capacitively coupled plasma discharge is shown. In usual capacitively coupled plasma discharge, plasma parameter, such as plasma density, plasma impedence and plasma temperature, change as frequency increases. Because of the change, the optimum hole diameter of the multi-hole electrode RF capacitively coupled plasma for high density plasma is thought to be modified when the plasma deriving frequency changes. To see the frequency effect on the multi-hole RF capacitively coupled plasma is discharged and one of its electrode is changed from a plane electrode to a variety of multi-hole electrodes with different hole diameters. The discharge is derived by RF power source with various frequency and the plasma parameter is measured with RF compensated single Langmuir probe. The shrinkage of the hole diameter for efficient discharge is observed as the plasma deriving frequency increases.

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NEW APPLICATIONS OF R.F. PLASMA TO MATERIALS PROCESSING

  • Akashi, Kazuo;Ito, Shigru
    • 한국표면공학회지
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    • 제29권5호
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    • pp.371-378
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    • 1996
  • An RF inductively coupled plasma (ICP) torch has been developed as a typical thermal plasma generator and reactor. It has been applied to various materials processings such as plasma flash evaporation, thermal plasma CVD, plasma spraying, and plasma waste disposal. The RF ICP reactor has been generally operated under one atmospheric pressure. Lately the characteristics of low pressure RF ICP is attracting a great deal of attention in the field of plasma application. In our researches of RF plasma applications, low pressure RF ICP is mainly used. In many cases, the plasma generated by the ICP torch under low pressure seems to be rather capacitive, but high density ICP can be easily generated by our RF plasma torch with 3 turns coil and a suitable maching circuiit, using 13.56 MHz RF generator. Plasma surface modification (surface hardening by plasma nitriding and plasma carbo-nitriding), plasma synthesis of AIN, and plasma CVD of BN, B-C-N compound and diamond were practiced by using low pressure RF plasma, and the effects of negative and positive bias voltage impression to the substrate on surface modification and CVD were investigated in details. Only a part of the interesting results obtained is reported in this paper.

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Cutoff Probe를 이용한 자화유도결합 플라즈마의 특성 연구 (A Study on Magnetized Inductively Coupled Plasma Using Cutoff Probe)

  • 손의정;김동현;이호준
    • 전기학회논문지
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    • 제65권10호
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    • pp.1706-1711
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    • 2016
  • Electromagnetic wave simulation was performed to predict characteristics of manufactured cutoff probe at low temperature magnetized plasma medium. Microwave cutoff probe is designed for research the properties of magnetized inductively coupled plasma. It was shown that the cutoff probe method can safely be used for weakly magnetized high density plasma sources. Cutoff probe system with two port network analyzer has been prepared and applied to measure electron density distributions in large area, 13.56MHz driven weakly magnetized inductively coupled plasma source. The results shown that, the plasma frequency confirmed cut-off characteristics in low temperature plasma. Especially, cut-off characteristics was found at upper hybrid resonance frequency in the environment of the magnetic field. In case of a induced weak magnetic field in inductively coupled plasma, plasma density estimated from the cutoff frequency in the same way at unmagnetized plasma due to nearly same plasma frequency and upper hybrid resonance frequency. The plasma density is increased and uniformity is improved by applying a induced weak magnetic field in inductively coupled plasma.