• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.1551-1554
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• 2005

The Titanium has many superior characteristics Which are specific strength, heat resistance, corrosion resistance, organism compatibility, non-magnetic and etc. and their quantity are abundant. this study performed turning operation of Ti-6Al-4V alloy using the TiAlN Coate Tool which treated PVD (Physical Vapor Deposition). Experimental works are also executed to measure cutting force, chip figuration and surface roughness for different cutting conditions. As a result of study. Tool wear was serious at over 100m/min of cutting speed and cutting condition was excellent at 1.0mm of cutting depth.

• Proceedings of the Korean Society of Machine Tool Engineers Conference
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• 2004.10a
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• pp.451-456
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• 2004

The Titanium has many superior characteristics Which are specific strength, heat resistance, corrosion resistance, organism compatibility, non-magnetic and etc. and their quantity are abundant this study performed turning operation of Ti-6Al-4V alloy using the TiAlN Coate Tool which treated PVD (Physical Vapor Deposition). Experimental works are also executed to measure cutting force, chip figuration and surface roughness for different cutting conditions. As a result of study. Tool wear was serious at over 100m/min of cutting speed and cutting condition was excellent at 1.0mm of cutting depth.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2012.05a
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• pp.37-37
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• 2012

The coated steels, mainly with zinc by either hot-dip galvanizing or electroplating, are widely used for panels of automotive, electrical appliances and construction, whose size of world market have reached 130 million tons in 2008. Current issues for the coated steels can be integrated in terms of high functionality, low cost, environment-friend and available resource. The best solution can be provided if thin layer coating with higher quality is produced by an eco-friendly process, and PVD, physical vapor deposition, can be an alternative practice to existing coating processes. PVD technologies have been very common ones in electronic and semiconductor industries, but recognized as non-profitable processes for the coated steels due to low process speed and lack of continuous operation skills. Systematic researches from 1990s in Europe, even though discouraged by a shutdown of the first Japanese PVD coating plant in 1999, have realized several continuous PVD coating plants, and also enhanced launching of developments in steel industries. To be successful with PVD coating technologies over existing ones, productivity to meet economics should be created from a highly sophisticated process. Some PVD technologies fit for the high-speed process will be introduced together with experiences from industrial applications.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.17 no.11
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• pp.1241-1245
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• 2004

Continuous physical vapor deposition (PVD) method is one of many processes to fabricate long length coated conductor which is required for successful large-scale application of superconducting power devices. Three film deposition systems (pulsed laser deposition, sputtering, and evaporation) equipped with reel-to-reel(R2R) metal tape moving apparatus were installed and used to deposit multi-layer oxide thin films. Both RABiTS and IBAD texture templates are used. IBAD template consists of CeO$_2$(PLD)/YSZ(IBAD) on stainless steel(SS) metal tape, and RABiTS template has the structure of CeO$_2$/YSZ/Y$_2$O$_3$ which was continuously deposited on Ni-alloy tape using R$_2$R evaporation and DC reactive sputtering in a deposition system designed to do both processes. 0.4 m-long coated conductor with Ic(77 K) of 34 A/cm was fabricated using RABiTS template. 0.5 m and 1.1 m-long coated conductor with Ic(77 K) of 41 A/cm and 26 A/cm were fabricated using IBAD template.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.125-125
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• 2012

물리증착(physical vapor deposition; PVD)은 진공 또는 특정 가스 분위기에서 고상의 물질을 기화시켜 기판에 피막을 형성하는 방법으로 증발과 스퍼터링 그리고 이온플레이팅 등이 있다. PVD 방법으로 박막을 제작하면 대부분의 박막은 주상정 구조로 성장하게 된다. 이러한 주상정의 조직을 제어하는 방법으로 빗각 증착(oblique angle deposition; OAD) 기술이 있다. OAD는 타겟(증발원)에 대해서 기판을 평행하게 배치하는 일반적인 코팅방법과는 달리 기판의 수직성분과 타겟의 수직성분이 이루는 각도가 0도 이상이 되도록 조절하여 기판을 기울인 상태로 코팅하는 방법을 말한다. OAD 방법을 이용하면 기판으로 입사하는 증기가 초기에 생성된 핵(seed)에 의해 shadowing이 발생하면서 증기가 수직으로 입사하는 normal 증착과는 다른 형상의 성장 조직이 만들어지게 된다. 본 논문에서는 OAD 방법을 이용하여 Al과 TiN 박막을 제조하고 그 특성을 비교하였다. Al 박막은 UBM (Un-Balanced Magnetron) 스퍼터링 소스를 이용하여 빗각을 각각 0, 30, 45, 60 및 90도의 각도에서 강판 및 실리콘 웨이퍼 상에 시편을 제조하되 단층 및 다층으로 시편을 제조하고 치밀도와 함께 조도와 반사율을 비교하고 염수분무시험을 이용하여 내식성을 평가하였다. TiN 박막은 Cathodic Arc 방식을 이용하되 Al 박막과 동일한 방법으로 코팅을 하고 내식성 및 경도 등의 특성을 비교하였다. TiN 박막은 경사각이 커지면서 경도가 낮아졌으나 바이어스 전압을 이용하여 다층으로 제조함에 의해 경도는 유지하면서 modulus를 낮출 수 있어서 박막의 신뢰성을 나타내는 H3/E2 값은 증가함을 알 수 있었다.

• Journal of the Korean institute of surface engineering
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• v.36 no.6
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• pp.423-429
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• 2003

It has been investigated corrosion resistance and crystal structure of Zn-Cr coatings fabricated by electroplating method and electron-beam physical vapor deposition method(EB-P VD). The electroplated Zn-Cr alloy consists mainly of η'-Zn phase for the lower Cr content than 7.9 wt% Cr and ${\gamma}$'-ZnCr phase for the higher Cr content. In the Zn-Cr alloy fabricated by EB-PVD the ${\gamma}$'-ZnCr phase appeared clearly at 3 wt% Cr and it became the sole phase at 50 wt%Cr. The amount of η'-Zn phase decreased obviously with increasing Cr content when it exceeded 15 wt% Cr. The electrochemical measurement of the electroplated Zn-Cr film has shown corrosion potential of about -1000 mV. The current density of active region and the amount of dissolved Zn and Cr decreased significantly with increasing Cr content. The electrochemical characteristics of Zn-Cr alloy fabricated by EB-PVD have shown that the alloy of 50 wt% Cr had the highest corrosion potential(-500 mV) and the lowest critical passive current density than that of the electroplated.

• Journal of Welding and Joining
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• v.17 no.4
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• pp.26-31
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• 1999

An attempt was made in this study to investigate the brazing characteristics of Zr-Be binary amorphous alloys for the development of a new brazing filler metal for joining Zircaloy-4 nuclear fuel cladding tubes. This study was also aimed at the feasibility study of rapidly solidified amorphous alloys to substitute the conventional physical vapor-deposited(PVD) metallic beryllium. The $Zr_{1-x}Be_{x}$($0.3\leq$x$\leq0.5$) binary amorphous alloys were produced in the ribbon form by the melt-spinning method. It was confirmed by x-ray diffraction that the ribbons were amorphous. The amorphous. the amorphous alloys were used to join bearing pads on Zircaloy-4 nuclear fuel cladding tubes. Using Zr-Be amorphous alloys as filler metals, it was found that the reduction in the tube wall thickness caused by erosion was prevented. Especially, in the case of using $Zr_{0.65}Be_{0.35}$ and $Zr_{0.7}Be_{0.3}$ amorphousalloys, the smooth and spherical primary $\alpha$-Zr particles appeared in the brazed layer, which was the most desirable microstructure from the corrosion-resistance standpoint.

• Transactions of the Korean Society of Automotive Engineers
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• v.13 no.4
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• pp.113-120
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• 2005

In order to investigate the characteristics of penatration and the effect of surface treatment in A15052-H34, Al5082-Hl31 and titanium alloy laminates which were treated by anodizing and PVD(Physical Vapor Desposition) method, ballistic tests were conducted. Thickness of surface membrane in A15052-H34, Al5082-Hl31, were $25{\mu}m$ and that of titanium $0.9{\mu}m$ respectively. Surface hardness test was conducted using micro Vicker's hardness tester. Resistance to penetration is determined by the protection ballistic limit(V50), a statistical velocity with $50\%$ probability for complete penetration. Fracture behaviors and ballistic tolerance, described by penetration modes, are observed from the results of V50 test and Projectile Through Plate(PTP) test at velocities greater than protection ballistic limit, respectively. Present experimental results derived from this research help to optimize laminate impact behavior by varing the laminate thickness and surface treated materials.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2006.05a
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• pp.177-181
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• 2006

반도체를 만드는데 있어서 여러가지 박막을 형성하는 공정이 있다. 이때 가장 많이 쓰이는 방법이 CVD(Chemical Vapor Deposition)방법이나 PVD(Physical Vapor Deposition)방법이다. 이들 방법으로 막을 형성하게 되면, 웨이퍼 이면에도 막이 형성되게 된다. 웨이퍼 후면에 증착된 막은 공정 특성상 두께분포가 균일하지 못하고 다음 공정 중에 웨이퍼 전면을 오염시킬 수 있다. 후면의 박막이 있는 상태로 웨이퍼가 batch 방식의 습식공정이 진행되면, 후면의 박막이 떨어져 나와서 웨이퍼 전면을 오염시키게 된다. 또한 공정에 따라서 기판전면은 식각 시키지 않고 후면만 식각 시키는 경우가 발생하는데, 이때 웨이퍼 아래에 설치된 노즐을 사용하여 웨이퍼 후면의 박막을 식각할 수 있다. 본 연구는 노즐에서 약액이 분사되는 방향과 위치를 조절하여 매엽식 장비에서 웨이퍼 후면의 막을 균일하게 식각 시킬 수 있는 노즐을 제작하고 웨이퍼 후면의 $Si_{3}N_{4}$막을 분당 $1000{\AA}$이상 식각 하였으며 균일도를 5% 이하로 하였다.

• Proceedings of the Korean Powder Metallurgy Institute Conference
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• 2002.04b
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• pp.53-53
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• 2002

본 연구에서는 산화텅스텐($WO_3$) 분말을 이용하여 여러 금속 기판에 텅스텐 박막을 코팅하는 방법에 관한 연구를 수행하였다. 본 연구에서 언급되는 W 코팅은 Lee 등이 보고한 W, Cu 산화물을 이용하여 W-Cu 복합분말을 제조하는 것으로부터 아이디어가 출발되었으며, 본 연구의 결과는 기존의 6불화 텅스텐 가스($WF_6$) 를 열 분해하여 증착시키는 화학증착법(CVD: chemical vapor deposition)과 순수 텅스텐 target을 sputtering하여 증착시키는 물리증착법(PVD: physical vapor deposition)과 달리, 산화텅스텐 분말, 금속 기판, 및 수소 가스만을 사용하기 때문에 경제적으로 큰 장점이 있는 새로운 코팅법의 하나로 연구되었다. 본 연구에서는 새로운 코팅법의 기구와 여러 금속에서 코팅되는 W의 코팅 현상 등에 대해 간단히 언급하고자 하였다.