• Proceedings of the Korean Vacuum Society Conference
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• 2000.02a
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• pp.137-137
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• 2000

The surface collective modes of thin K films deposited on Al(111) have been investigated using frequency dependent photoyield measurements and momentum resolved inelastic electron scattering. Jellium based theoretical calculations have predicted a richer set of features in the thin films than for the surface of a semi-infinite solid because there are th interference between two interfaces (substrate-film and film-vacuum) and heavy damping on the substrate. The use of an optical probe and electron scattering has allowed us to draw a more complete picture of the dynamic screening in thin films. The number, dispersion, damping and optical activity of the collective modes of the thin films have been measured as a function of K film thickness. New overlayer-induced excitations are observed : At qII=0, they correspond to the antisymmetric slab mode and the multipole surface plasmon. At finite qII=0, these modes undergo a transition towards the K multipole and monopole surface plasmons. With increasing coverage, the overlayer excitations turn into the collective modes of semi-infinite K. For a consistent interpretation of photoyield and electron energy loss spectra it is crucial to account for the non-analytic dispersion of the overlayer modes at small parallel wave vectors and for the finite angular resolution of the detector. The observed dispersions confirm predictions based on the time-dependent density functional approach.

• The Korean Journal of Ceramics
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• v.3 no.1
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• pp.21-23
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• 1997

Dependences of total photoyields on incident photon energies were measured using synchrotron radiation light for different chemical-vapor-deposited diamond with differently treated surface. Results show that a considerable amount of gap states are presented for as-grown specimens with H-terminated, that negative electron affinity (NEA) is realized for H-plasma-treated specimens, and that sufficient O-treatment to NEA specimens results in positive electron affinity. The observed electron affinity can be explained in terms of differences in strength of the surface dipole layer formed by difference in the electron negativity among C, H and O atoms.

• Journal of the Korean Magnetic Resonance Society
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• v.4 no.1
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• pp.50-63
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• 2000

Titanium dioxide particles with three different average sizes, prepared by three different methods, were incorporated into silica gel pores by impregnation. The titanium dioxide incorporated into the silica gel pores was photoionized by 240-400 nm irradiation at 77 K by a one-photon process to from trapped hole centers on OH group and trapped electron centers on titanium which were detected by electron paramagnetic resonance at 77 K. During the impregnation the smallest size range of TiO2 particles can be incorporated into silica gels with 2.5-1.5 nm pores. However, the largest size range of TiO2 particles can only be incorporated into silica gels with 6-15 nm pores and not into silica gels with 2.5-4 nm pores. The photoyield and stability of photoinduced hole and electron centers depends on the silica pore sizes of silica gels and surface area as well as on the TiO2 loading. In large pore silica gels and large particle size of TiO2, photoinduced charge separation reaches to a plateau at shorter irradiation times and the trapped hole and electron centers are more stable to decay.