• Title/Summary/Keyword: Photonic crystal micro-cavity

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Applied of Integrated Optical Biosensor based on Combination of Photonic Crystal Micro-Cavity and Ring Resonator (광결정 공진기와 링 공진기의 공진특성 결합을 통한 바이오센서 응용)

  • Kim, Hong-Seung;Kim, Doo-Gun;Oh, Geum-Yoon;Lee, Tae-Kyeong;Choi, Young-Wan
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.60 no.4
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    • pp.817-822
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    • 2011
  • We propose a novel ring structure based on the stadium-shaped ring resonator (SSRR) with dual photonic crystal microcavity (DPCM) for biosensor and analyzed the sensing characteristics. The Q-factor of the photonic crystal microcavity (PCM) can be significantly enhanced when the PCM or DPCM has the same resonance condition as the SSRR. The simulation results show that the Q-factor of the SRR with DPCM was increased by three times in comparison with single PCM structure. We also defined a mutual interference between two PCMs. Assuming a detectable spectral resolution of 10 picometers, a refractive index resolution of $3.03\times10-5$ can be measured on the SSRR-DPCM.

Viscoelastic Finite Element Analysis of Filling Process on the Moth-Eye Pattern (모스아이 패턴의 충전공정에 대한 점탄성 유한요소해석)

  • Kim, Kug Weon;Lee, Ki Yeon;Kim, Nam Woong
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.15 no.4
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    • pp.1838-1843
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    • 2014
  • Nanoimprint lithography (NIL) fabrication process is regarded as the main alternative to existing expensive photo-lithography in areas such as micro- and nano-electronics including optical components and sensors, as well as the solar cell and display device industries. Functional patterns, including anti-reflective moth-eye pattern, photonic crystal pattern, fabricated by NIL can improve the overall efficiency of such devices. To successfully imprint a nano-sized pattern, the process conditions such as temperature, pressure, and time should be appropriately selected. In this paper, a cavity-filling process of the moth-eye pattern during the thermal-NIL within the temperature range, where the polymer resist shows the viscoelastic behaviors with consideration of stress relaxation effect of the polymer, were investigated with three-dimensional finite element analysis. The effects of initial thickness of polymer resist and imprinting pressure on cavity-filling process has been discussed. From the analysis results it was found that the cavity filling can be completed within 100 s, under the pressure of more than 4 MPa.