• Proceedings of the KSME Conference
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• 2003.04a
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• pp.1078-1082
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• 2003

A feasibility study for the fabrication of master replication with nanostructures by Nanoimprint Lithography (NIL) was investigated for application of polymer Photonic Bandgap (PBG) devices used in photonic IC. Large area gratings of $9{\times}15(mm^2)$ with p = 400 nm was successfully embossed on PMMA on silicon wafer and the embossing parameters (temperature, pressure, time) were established. A precise control of $O_2$ plasma Reactive Ion Etching (RIE) process time allowed window opening over the whole area despite the presence of wafer bending. Master replication with aspect ratio 1 was successfully fabricated, but master replication with aspect ratio 3 needs to optimize parameters. All replications were done in a NIL process.

• Korean Journal of Optics and Photonics
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• v.16 no.2
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• pp.159-161
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• 2005

We report the selective area bandgap tuning of multiple quantum well structures by an impurity free vacancy induced quantum well intermixing technique. A 3dB waveguide directional coupler was fabricated in the disordered section of an intermixed quantum well sample as a demonstration of photonic device applications.

• Proceedings of the Optical Society of Korea Conference
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• 2000.02a
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• pp.268-269
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• 2000

We demonstrate a polarization insensitive waveguide filter using quantum well intermixing(QWI). The bandgap of epitaxial layer is modified from 1.55${\mu}{\textrm}{m}$ to 1.40${\mu}{\textrm}{m}$ using QWI and a Bragg grating filter is demonstrated using electron beam lithography technology. The fabricated waveguide filter has a 70% reflection efficiency and a 1.46nm filter bandwidth. Furthermore polarization insensitive transmission characteristics are observed. The device can be applied to photonic integrated circuits(PIC).