• 한국정보디스플레이학회:학술대회논문집
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• 2002.08a
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• pp.947-952
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• 2002

A new concept of forming self-aligned multidomains is used for fabricating wide-viewing liquid crystal displays (LCDs) with periodic surface gratings.An array of the periodic surface gratings is produced on substrates using a photosensitive polymer by the illumination o. the UV light through a patterned photomask. A multidomain structure is naturally formed on the grating surface by the initial director distortions together with continuous variations of an external electric field. The LCD cells with periodic surface gratings are found to show excellent extinction in the off-state and wide-viewing property m the on-state.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2009.05a
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• pp.258-258
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• 2009

• Ceramist
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• v.22 no.4
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• pp.429-451
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• 2019

Quartz glass is a key material for making semiconductor process components because of its purity, low thermal expansion, high UV transmittance and relatively low cost. Domestic quartz glass has a market worth about 500 billion won in 2018, and the market power of Japanese materials is very high. Quartz glass for semiconductor process can be divided into general process and exposure. For general process, molten quartz glass is mainly used, but synthetic quartz glass with higher purity is preferred. Synthetic quartz glass is used as the photomask for the exposure process. Recently, as semiconductors started the sub-nm process, the transition from the transmission type using ArF ultraviolet (194 nm) to the reflection type using EUV ultraviolet (13.5 nm) began. Therefore, the characteristics required for the synthetic quartz glass substrates used so far are also rapidly changing. This article summarizes the current technical trends of quartz glass and recent technical issues. Lastly, the present situation and development possibility of quartz glass technology in Korea were diagnosed.

• Journal of the Optical Society of Korea
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• v.13 no.4
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• pp.478-483
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• 2009

An optical sheet with a cone array is designed, simulated, and fabricated in order to substitute the dual crossed prism sheets in the edge-type LCD backlight. The optimum structure of cone textures that is compatible with the dual crossed prism sheets was obtained by simulating the backlight installed with the cone array optical sheet. A SU-8 photoresist films of thickness $30{\sim}50{\mu}m$ were spin-coated on a polyethylene terephtalate film (PET), and the cone texture array was formed by using the diffuse lithography that employed a photomask with circular patterns and an optical diffuser.

• Journal of Information Display
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• v.12 no.2
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• pp.101-107
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• 2011

To come up with a bistable liquid crystal (LC) device using unpolarized UV light, single-step laser patterning on a photoalignment layer using a photomask was proposed to achieve an equilibrium configuration of LC molecules in contact with a periodically patterned substrate. The patterns were formed by stripes of alternating random planar and homeotropic anchoring on a submicrometer scale in the order of $0.5{\mu}m$. Two possible configurations of bistable LC cells that can be obtained by combining a micropatterned surface formed with alternating random-planar- and homeotropic-alignment with planar- or homeotropic-alignment surfaces were proposed. The alignment properties of the two proposed models were investigated, along with the microscopic switching behavior of micropatterned nematic LC cells.

• Proceedings of the Optical Society of Korea Conference
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• 2003.07a
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• pp.64-65
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• 2003

Stereo-lithography using the two photon absorption(TPA) makes micro structures with great resolution. The technique is applied to correcting photomask, 3-D photonic crystal, 3-D optical storage, 3-D lithography and so on. In contrast to a conventional stereo-lithography with single-photon absorption which has a size problem caused by the geometrical diffraction limit, the stereo-lithography with TPA has no size limit. (omitted)

• JSTS:Journal of Semiconductor Technology and Science
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• v.1 no.2
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• pp.132-139
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• 2001

We considered the uniformity of fabricated micromirror arrays by characterizing the fabrication process and calculating the appropriate driving voltages of micromirrors used as virtual photomask in maskless photolithography. The uniformity of the micromirror array in terms of driving voltage and optical characteristics is adversely affected by factors, such as the air gap between the bottom electrode and the mirror plate, the spring shape and the deformation of the mirror plate or torsion spring. The thickness deviation of the photoresist sacrificial layer, the misalignment between mirror plate and bottom electrode, the aluminum deposition condition used to produce the spring and the mirror plate, and initial mirror deflection were identified as key factors. Their importance lies in the fact that they are related to air gap deviations under the mirror plate, asymmetric driving voltages in left and right mirror directions, and the deformation of the Al sring or mirror plate after removal of the sacrificial layer. The plasma ashing conditions used for removing the sacrificial layer also contributed to the deformation of the mirror plate and spring. Driving voltages were calculated for the pixel operation of the micromirror array, and the non-uniform characteristics of fabricated micromirrors were taken into consideration to improve driving performance reliability.

• Macromolecular Research
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• v.15 no.1
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• pp.74-81
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• 2007

A series of photoreactive mesogens based on chalcone were prepared and their morphological behavior and reactivity were studied according to a variable number of alkyloxy tail carbons. The linear ester compounds 3a-h comprised two chalcone units connected to a benzene ring through ester linkages. All linear ester compounds showed enantiotropic liquid crystalline phases. The X-ray diffractograms for the mesophases of compounds 3a-h showed a set of reflections in the small-angle region which consisted of more than three sharp diffraction peaks with d spacings in the ratio of 1:1/2:1/3, confirming the well defined smectic A structures of the compounds. Compounds 3a-h were considered to be bifunctional monomers due to the presence of two photoreactive chalcone groups. Upon UV irradiation, its polymerization proceeded through the [2+2] addition reaction between chalcone units in a stepwise manner. An image pattern was obtained by the photopolymerization of the liquid crystal of the compound (3h) with decyloxy tails through a photomask. The irradiated part became dark while the masked part remained birefringent under polarized optical microscopy, which was ascribed to the production via the UV irradiation of a polymer or a dimer having cyclobutane rings by [2+2] addition, which thereby disrupted the alignment of the molecules.

• Proceedings of the KIEE Conference
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• 2008.10a
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• pp.131-132
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• 2008

We describe a fabrication method of submicron glass trenches which have embedded metal lines for the future application of nano-scale RF MEMS devices. The glass wafer was etched using two different conditions to identify the relationship between the slope of glass trenches and the slope of photroresist. A self-aligned metal photomask and negative photroresist (PR) slope were used to insert metal lines inside the glass trenches. The PR slope patterned by backside photolithography was affected by the profile of preformed glass trenches. Gold was well fabricated in the $0.7{\mu}m$ wide trench thanks to the negative PR slope. Nano-scale glass trenches with embedded metal lines can be used as a bottom electrode in submicron beam resonators operating with a high resonant frequency.

• 제어로봇시스템학회:학술대회논문집
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• 2005.06a
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• pp.389-392
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• 2005

In the maskless photolithography based on the Digital Micromirror Device (DMD) by Texas Instruments Inc. (TI), the micromirror array works as a virtual photomask to write patterns directly onto Flat Panel Display (FPD) at high speed with low cost. However, it is neither simple to generate region-based patterns for the micromirror array nor easy to deliver sequences of patterns for the micromirror controller. Moreover, the quality of lithography yields the precise synchronization between generating sequence of patterns and irradiation rate off micromirrors. In this study, the region-based pattern generating system for maskless photolithography is devised. To verify salient features of devised functionalities, the prototype system is implemented and the system is evaluated with actual DMD based photolithography. The results show that proposed pattern generating method is proper and reliable. Moreover, the devised region-based pattern generating system is robust and precise enough to handle any possible user specified mandate and to achieve the quality of photolithography required by FPD manufacturer.