• Title/Summary/Keyword: Photolithography process

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Analysis of the Robot for Detection of Improvised Explosive Devices and a Technology for the CNT based Detection Sensor (급조 폭발물(IED) 제거 로봇의 개발비용 분석 및 카본나노튜브 기반 탐지센서기술에 관한 연구)

  • Kwon, Hye Jin
    • Journal of the Semiconductor & Display Technology
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    • v.17 no.1
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    • pp.54-61
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    • 2018
  • In this study, two aspects were analyzed about the robot for removal of explosive devices. First, the cost analyses were performed to provide a reasonable solution for the acquirement of the system. It is processed by an engineering estimate method and the process was consisted of two ways : a system development expense and a mass production unit price. In additions, the resultant cost analyses were compared between the cases excluding and including a mines detection system. As results, in the case of the acquirement of the robot system for removal of explosive devices, it is recommended that the performance by improving the mines detection ability should be considered preferentially rather than the cost because the material cost for the mines detection system is negligible compared to the whole system cost. Second, as a way for improving the system performance by the mine detection function, the carbon nanotube (CNT) based sensor technology was studied in terms of sensitivity and simple productivity with presenting its preliminary experimental results. The detection electrodes were formed by a photolithography method using a photosensitive CNT paste. As results, this method was shown as a scalable and expandable technology for the excellent mines detection sensors.

Fabrication of Multi-layered Macroscopic Hydrogel Scaffold Composed of Multiple Components by Precise Control of UV Energy

  • Roh, Donghyeon;Choi, Woongsun;Kim, Junbeom;Yu, Hyun-Yong;Choi, Nakwon;Cho, Il-Joo
    • BioChip Journal
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    • v.12 no.4
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    • pp.280-286
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    • 2018
  • Hydrogel scaffolds composed of multiple components are promising platform in tissue engineering as a transplantation materials or artificial organs. Here, we present a new fabrication method for implementing multi-layered macroscopic hydrogel scaffold composed of multiple components by controlling height of hydrogel layer through precise control of ultraviolet (UV) energy density. Through the repetition of the photolithography process with energy control, we can form several layers of hydrogel with different height. We characterized UV energy-dependent profiles with single-layered PEGDA posts photocrosslinked by the modular methodology and examined the optical effect on the fabrication of multi-layered, macroscopic hydrogel structure. Finally, we successfully demonstrated the potential applicability of our approach by fabricating various macroscopic hydrogel constructs composed of multiple hydrogel layers.

Fabrication and statistical characterization of Nb SQUID sensors for multichannel SQUID system

  • Kim, B.K.;Yu, K.K.;Kim, J.M.;Kwon, H.;Lee, S.K.;Lee, Y.H.
    • Progress in Superconductivity and Cryogenics
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    • v.22 no.4
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    • pp.62-66
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    • 2020
  • We fabricated superconducting quantum interference devices (SQUIDs) based on Nb Josephson junctions, and characterized the key parameters of the SQUIDs. The SQUIDs are double relaxation oscillation SQUIDs (DROSs) having larger flux-to-voltage transfer coefficient than the standard DC-SQUIDs. SQUID sensors were fabricated by using Nb junction technology consisted of a DC magnetron sputtering and a conventional photolithography process. In multichannel SQUID systems for whole-head magnetoencephalography measurement with a helmet-type SQUID array, we need about 336 SQUID sensors for each system. In this paper, we fabricated a few hundred SQUID sensors, measured the critical current, flux modulation voltage and decided if each tested SQUID can be used for the multichannel systems. As the criterion for the acceptance of the sensors, we chose the critical current and amplitude of the modulation voltage to be 8 ㎂ and 80 ㎶, respectively. The average critical current of the SQUIDs was 10.58 ㎂. The typical flux noise of the SQUIDs with input coil shorted was 2 μΦ0/√Hz at white region.

LARGE MAGNETORESISTANCE OF SPUTTERED BI THIN FILMS AND APPLICATION OF SPIN DEVICE

  • M. H. Jeun;Lee, K. I.;Kim, D. Y.;J. Y. Chang;K. H. Shin;S. H. Han;J. G. Ha;Lee, W. Y.
    • Proceedings of the Korean Magnestics Society Conference
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    • 2003.06a
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    • pp.66-67
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    • 2003
  • Bismuth (Bi) has been an attractive materials for studying spin dependent transport properties because it shows very large magnetoresistance (MR) resulting from its highly anisotropic Fermi surface, low carrier concentrations, long carrier mean free path 1 and small effective carrier mass m*[1-3]. With all the intriguing properties, difficulty in fabrication of high quality Bi thin films may have prevented extensive application of Bi in magnetic field sensing and spin-injection devices. Previous works found that the surface roughness and small grain size in 100-200 nm of Bi thin film made by evaporation and sputtering are major causes of low MR. Although relatively higher MR in electrodeposited Bi followed by annealing was reported, it still suffers from rough sulfate roughness which is so severs that it is hardly able to make a field sensing and spin-injection device using conventional photolithography process.

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TIR Holographic lithography using Surface Relief Hologram Mask (표면 부조 홀로그램 마스크를 이용한 내부전반사 홀로그래픽 노광기술)

  • Park, Woo-Jae;Lee, Joon-Sub;Song, Seok-Ho;Lee, Sung-Jin;Kim, Tae-Hyun
    • Korean Journal of Optics and Photonics
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    • v.20 no.3
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    • pp.175-181
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    • 2009
  • Holographic lithography is one of the potential technologies for next generation lithography which can print large areas (6") as well as very fine patterns ($0.35{\mu}m$). Usually, photolithography has been developed with two target purposes. One was for LCD applications which require large areas (over 6") and micro pattern (over $1.5{\mu}m$) exposure. The other was for semiconductor applications which require small areas (1.5") and nano pattern (under $0.2{\mu}m$) exposure. However, holographic lithography can print fine patterns from $0.35{\mu}m$ to $1.5{\mu}m$ keeping the exposure area inside 6". This is one of the great advantages in order to realize high speed fine pattern photolithography. How? It is because holographic lithography is taking holographic optics instead of projection optics. A hologram mask is the key component of holographic optics, which can perform the same function as projection optics. In this paper, Surface-Relief TIR Hologram Mask technology is introduced, and enables more robust hologram masks than those previously reported that were formed in photopolymer recording materials. We describe the important parameters in the fabrication process and their optimization, and we evaluate the patterns printed from the surface-relief TIR hologram masks.

Thin Film Battery Using Micro-Well Patterned Titanium Substrates Prepared by Wet Etching Method

  • Nam, Sang-Cheol;Park, Ho-Young;Lim, Young-Chang;Lee, Ki-Chang;Choi, Kyu-Gil;Park, Gi-Back
    • Journal of the Korean Electrochemical Society
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    • v.11 no.2
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    • pp.100-104
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    • 2008
  • Titanium sheet metal substrates used in thin film batteries were wet etched and their surface area was increased in order to increase the discharge capacity and power density of the batteries. To obtain a homogeneous etching pattern, we used a conventional photolithographic process. Homogeneous hemisphere-shaped wells with a diameter of approximately $40\;{\mu}m$ were formed on the surface of the Ti substrate using a photo-etching process with a $20\;{\mu}m{\times}20\;{\mu}m$ square patterned photo mask. All-solid-state thin film cells composed of a Li/Lithium phosphorous oxynitride (Lipon)/$LiCoO_2$ system were fabricated onto the wet etched substrate using a physical vapor deposition method and their performances were compared with those of the cells on a bare substrate. It was found that the discharge capacity of the cells fabricated on wet etched Ti substrate increased by ca. 25% compared to that of the cell fabricated on bare one. High discharge rate was also able to be obtained through the reduction in the internal resistance. However, the cells fabricated on the wet etched substrate exhibited a higher degradation rate with charge-discharge cycling due to the nonuniform step coverage of the thin films, while the cells on the bare substrate demonstrated a good cycling performance.

Development of Optical Illusion Design Pattern for Furniture Using a UV Curing Resin (UV 경화성 수지를 이용한 가구용 옵티컬 일루젼 디자인 패턴 개발)

  • Kim, Ki-Chul
    • Journal of Convergence for Information Technology
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    • v.7 no.1
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    • pp.43-48
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    • 2017
  • The design trend is changed with the times. The design trend of recent 21 century is eco-friendly design. The optical illusion design is a new trend of digital convergence era. In this study, optical illusion patterns were designed for furniture with eco-friendly UV-curable resin. The micro-patterns of optical illusion design were fabricated with the micro-mold which was mastered using a semiconductor micro-fabrication process by photolithography technique. The micro-patterns of optical illusion design were manufactured on PET film with a roll-to-roll process using a UV-curable resin. The manufactured PET film of optical illusion micro-pattern exhibits hologram effect, optical illusion effect, and texture of metal with the backside digital printing of metal tone. The furniture of new design concept so-called emotional furniture was manufactured with the various optical illusion design patterns. The optical illusion design patterns by UV mold prospect a new trend of interior design materials.

Experimental Demonstration of Enhanced Transmission Due to Impedance-matching Si3N4 Layer in Perforated Gold Film

  • Park, Myung-Soo;Yoon, Su-Jin;Hwang, Je-Hwan;Kang, Sang-Woo;Kim, Deok-kee;Ku, Zahyun;Urbas, Augustine;Lee, Sang Jun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.359-359
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    • 2014
  • In this study, surface plasmon resonance structures for the selective and the enhanced transmission of infrared light were designed. In order to relieve the large discontinuity of refractive index between air and metal hole array, $Si_3N_4$ was used as the impedance matching layer. Experimental parameter were calculated and determined in advance by the rigorous coupled wave analysis (RCWA) simulation, and then the experiment was carried out. A 2-dimensional metal hole array structures were patterned on the size of $1{\times}1cm^2$ GaAs substrate using photolithography process, and 5 nm thick Ti, 50 nm thick Au were deposited by E-beam evaporator, respectively. Subsequently, $Si_3N_4$ films with various thicknesses (150, 350, 550, and 750 nm) were deposited by plasma enhanced chemical vapor deposition (PECVD). For the comparison, transmittance of specimens with and without $Si_3N_4$ was measured using Fourier transform infrared spectroscopy (FTIR) in the range of $2.5-15{\mu}m$. Furthermore, the surface and the cross-sectional images were collected from the specimens by scanning electron microscopy (SEM). From the results, it was demonstrated that the transmittance was enhanced up to 80% by the deposition of 750 nm $Si_3N_4$ at $6.23{\mu}m$. It has advantage of enhanced transmission despite the simple fabrication process.

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Waste Minimization Technology Trends in Semiconductor Industries (반도체 제조 공정에서의 환경 유해성 배출물 절감 기술 동향)

  • Lee, Hyunjoo;Yi, Jongheop
    • Clean Technology
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    • v.4 no.1
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    • pp.6-23
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    • 1998
  • Recently, semiconductor industry has grown rapidly because of the large demand for electronic devices and equipment. The semiconductor industries have also played an important role on the economic growth in Korea. As the environmental regulations become strict, the proper environmental management and the well-developed waste minimization technologies in semiconductor industries are two of urgent problems to be solved. The semiconductor manufacturing process consists of a series of continuous chemical processes, such as cleaning, oxidation, diffusion, photolithography, etching and film deposition. During the processes, various environmentally hazardous wastes are produced. The wastes may be classified as wastewater, gaseous pollutants, and solid wastes. For waste minimization, the substitution of raw materials and process optimization techniques are used, while the selective destruction technologies of toxic chemicals contained in the wastes have been reported. Also, new technologies have been developed for source reduction and waste reduction, such as reduction of toxic chemical use and substitution of hazardous liquids with gaseous reactants or solvent.

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Development of an Injection Molded Disposable Chaotic Micromixer: Serpentine Laminating Micromixer (II) - Fabrication and Mixing Experiment - (사출 성형된 일회용 카오스 마이크로 믹서의 개발: 나선형 라미네이션 마이크로 믹서 (II) - 제작 및 혼합 실험 -)

  • Kim Dong Sung;Lee Se Hwan;Kwon Tai Hun;Ahn Chong H.
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.29 no.10 s.241
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    • pp.1298-1306
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    • 2005
  • In this paper, Part II, we realized the Serpentine Laminating Micromirer (SLM) which was proposed in the accompanying paper, Part I, by means of the injection molding process in mass production. In the SLM, the higher level of chaotic mixing can be achieved by combining two general chaotic mixing mechanisms of splitting/recombination and chaotic advection by the successive arrangement of 'F'-shape mixing units in two layers. Mold inserts for the injection molding process of the SLM were fabricated by SU-8 photolithography and nickel electroplating. The SLM was realized by injection molding of COC (cyclic olefin copolymer) with the fabricated mold inserts and thermal bonding of two injection molded COC substrates. To compare the mixing performance, a T-type micromixer was also fabricated. Mixing performances of micromixers were experimentally characterized in terms of an average mixing color intensity of a pH indicator, phenolphthalein. Experimental results show that the SLM has much better mixing performance than the I-type micromixer and chaotic mixing was successfully achieved from the SLM over the wide range of Reynolds number (Re). The chaotic micromixer, SLM proposed in this study, could be easily integrated in Micro-Total-Analysis- System , Lab-on-a-Chip and so on.