• Title/Summary/Keyword: Photoelectric devices

Search Result 42, Processing Time 0.024 seconds

Enhanced Infrared detection of photodetector using Ag nanowire-embedded ITO Layers

  • Kim, Hong-Sik;Kim, Jun-Dong;Patel, Malkeshkumar;Kim, Ja-Yeon;Gwon, Min-Gi
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2015.08a
    • /
    • pp.244.1-244.1
    • /
    • 2015
  • The Ag Nanowire is one of the materials that are widely studied as alternatives to ITO and is available for large area, low cost process and the flexible transparent electrode. However, Ag nanowire can have the problem of a lack of stability at high temperatures, making this impossible to form a film. Using a structure of ITO/AgNW/ITO in photodetector device, we improved the properties of the ITO in the IR region and improved the thermal stability of the AgNW. The structure of ITO/AgNW/ITO has a high transmittance value of 89% at a wavelength of 900 nm and provide a good electrical property. The AgNWs embedded ITO film has a high transmittance, this is because of the light scattering from the AgNW. The thermal stability of the developed ITO/AgNWs/ITO films were investigated and found AgNWs embedded ITO films posses considerable high stability compared to the solo AgNWs on the Si surface. The ITO/AgNWs/ITO device showed a improved photo-response ratio compared to those of the conventional TC device in IR region. This is attributed to the high transmittance and low sheet resistance. We suggest an effective design scheme for IR-sensitive photodetection by using an AgNW embedded ITO.

  • PDF

MoO3/p-Si Heterojunction for Infrared Photodetector (MoO3 기반 실리콘 이종접합 IR 영역 광검출기 개발)

  • Park, Wang-Hee;Kim, Joondong;Choi, In-Hyuk
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.30 no.8
    • /
    • pp.525-529
    • /
    • 2017
  • Molybdenum oxide ($MoO_3$) offers pivotal advantages for high optical transparency and low light reflection. Considering device fabrication, n-type $MoO_3$ semiconductor can spontaneously establish a junction with p-type Si. Since the energy bandgap of Si is 1.12 eV, a maximum photon wavelength of around 1,100 nm is required to initiate effective photoelectric reaction. However, the utilization of infrared photons is very limited for Si photonics. Hence, to enhance the Si photoelectric devices, we applied the wide energy bandgap $MoO_3$ (3.7 eV) top-layer onto Si. Using a large-scale production method, a wafer-scale $MoO_3$ device was fabricated with a highly crystalline structure. The $MoO_3/p-Si$ heterojunction device provides distinct photoresponses for long wavelength photons at 900 nm and 1,100 nm with extremely fast response times: rise time of 65.69 ms and fall time of 71.82 ms. We demonstrate the high-performing $MoO_3/p-Si$ infrared photodetector and provide a design scheme for the extension of Si for the utilization of long-wavelength light.

Study on the Photoelectric Composite Cable for Hybrid Interconnection Implementation (Hybrid 인터커넥션 구현을 위한 광전 복합케이블 제작에 관한 연구)

  • Kim, Jae-Yeol;You, Kwan-Jong;Park, Ryeok
    • Journal of the Korean Society of Manufacturing Process Engineers
    • /
    • v.16 no.3
    • /
    • pp.138-145
    • /
    • 2017
  • With the increasing use of smart electronic devices, the size of the related I/O interface market is increasing rapidly. Demand is also growing for the continuous increase of data and video signals-such as faster data processing speed and data storage capacity-in the smart electronic device input/output interface market. Currently, the POF hybrid cable used in the smart electronic device input / output interface market cannot transmit over a long distance because the optical loss is too large, and the GOF hybrid cable is both vulnerable to bending and other sudden outside changes, and expensive. Therefore, in this study, the design and fabrication of a GOF hybrid cable and fiber guide were carried out in order to develop a cable which can easily withstand external impact, has low optical losses, and meets the demand for continuous data and video signal increase in the smart electronic device input / output interface market.

Characteristics of Perovskite Solar Cells with ZnO Coated on Mesoporous TiO2 as an Electron Transfer Layer

  • Ahn, Joonsub;Song, Jaegwan;Han, Eunmi
    • Korean Journal of Materials Research
    • /
    • v.32 no.2
    • /
    • pp.94-97
    • /
    • 2022
  • We fabricated 3 types of ETL, mp TiO2, ZnO, and ZnO coated on mp TiO2(ZMT) to compare the photoelectric conversion efficiency (PCE) and fill factor (FF) of Perovskite solar cells. The structure of the cells was FTO/ETL/Perovskite (CH3NH3PbI3)/spiro-MeOTAD/Ag. SEM morphology assessment of the ETLs showed that mp TiO2 was porous, ZnO was flat, and the ZMT porous surface was filled with a thin layer. Via XRD measurements, the crystal structures of mp TiO2 and ZnO ETL were found to be anatase and wurtzite, respectively. The XPS patterns showing energy bonding of mp TiO2, ZnO, and ZMT O 1s confirmed these materials to be metal oxides such as ETL. The electrical characteristics of the Perovskite solar cells were measured using a solar simulator. Perovskite solar cells with ZMT ETL showed showed PCE of 10.29 % than that of conventional mp TiO2 ETL devices. This was considered a result of preventing Perovskite from seeping into the ETL and preventing recombination of electrons and holes.

Nanoscale NiO for transparent solid state devices

  • Patel, Malkeshkumar;Kim, Joondong;Park, Hyeong-Ho
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2015.08a
    • /
    • pp.243.2-243.2
    • /
    • 2015
  • We report a high-performing nanoscale NiO thin film grown by thermal oxidation of sputtered Ni film. The structural, physical, optical and electrical properties of nanoscale NiO were comprehensively investigated. A quality transparent heterojunction (NiO/ZnO) was formed by large-area applicable sputtering deposition method that has an extremely low saturation current of 0.1 nA. Considerable large rectification ratio of more than 1000 was obtained for transparent heterojunction device. Mott-Schottky analyses were applied to develop the interface of NiO and ZnO by establishing energy diagrams. Nanoscale NiO has the accepter carrier concentration of the order of 1018 cm-3. Nanoscale NiO Schottky junction device properties were comprehensively studied using room temperature impedance spectroscopy.

  • PDF

Nanoscale Protein Chip based on Electrical Detection

  • Choi, Jeong-Woo
    • 한국생물공학회:학술대회논문집
    • /
    • 2005.04a
    • /
    • pp.18-18
    • /
    • 2005
  • Photoinduced electron transport process in nature such as photoelectric conversion and long-range electron transfer in photosynthetic organisms are known to occur not only very efficiently but also unidirectionally through the functional groups of biomolecules. The basic principles in the development of new functional devices can be inspired from the biological systems such as molecular recognition, electron transfer chain, or photosynthetic reaction center. By mimicking the organization of the biological system, molecular electronic devices can be realized $artificially^{1)}$. The nano-fabrication technology of biomolecules was applied to the development of nano-protein chip for simultaneously analyzing many kinds of proteins as a rapid tool for proteome research. The results showed that the self-assembled protein layer had an influence on the sensitivity of the fabricated bio-surface to the target molecules, which would give us a way to fabricate the nano-protein chip with high sensitivity. The results implicate that the biosurface fabrication using self-assembled protein molecules could be successfully applied to the construction of nanoscale bio-photodiode and nano-protein chip based on electrical detection.

  • PDF

Emission Properties of P-LED EL Devices Based on ZnS:Mn,Cu (ZnS:Mn,Cu에 기초한 파우더형 EL소자의 발광특성)

  • 박수길;조성렬;손원근;김길용;이주성
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 1998.06a
    • /
    • pp.147-150
    • /
    • 1998
  • Since P-ELD(powders type electroluminescent device) phenomena were found by G.Destriau at first In 1936, lots of studying was performed in order to realize surface emission devices and flat panel display as a backlight. Due to the problem of low luminance and color and so on, it was delayed. Recently using electric field and thermal effect which can change it\`s molecular arrangement, it can be developed using photoelectric properties of P-ELD. P-ELD in this study was prepared by casting method. Basic structure is ITO/Phosphor/insulator/Al sheet, each layer was mixed by binder, which concentration 11p(poise) for phosphor, 8p(poise) fort insulator. Dielectric properties was investigated first and emission properties of P-ELD based on ZnS:Mn,Cu/ZnS:Cu,Br mixture. P-ELD prepared in this work exhibits about 100cd/㎡ 1-kHz simusoidal excitation.

  • PDF

Present Status and Future Prospect of Quantum Dot Technology (양자점 (Quantum dot) 기술의 현재와 미래)

  • Hong, H.S.;Park, K.S.;Lee, C.G.;Kim, B.S.;Kang, L.S.;Jin, Y.H.
    • Journal of Powder Materials
    • /
    • v.19 no.6
    • /
    • pp.451-457
    • /
    • 2012
  • Nowadays, research and development on quantum dot have been intensively and comprehensively pursued worldwide in proportion to concurrent breakthrough in the field of nanotechnology. At present, quantum dot technology forms the main interdisciplinary basis of energy, biological and photoelectric devices. More specifically, quantum dot semiconductor is quite noteworthy for its sub-micro size and possibility of photonic frequency modulation capability by controlling its size, which has not been possible with conventionally fabricated bulk or thin film devices. This could lead to realization of novel high performance devices. To further understand related background knowledge of semiconductor quantum dot at somewhat extensive level, a review paper is presently drafted to introduce basics of (semiconductor) quantum dot, its properties, applications, and present and future market trend and prospect.

Characterization of Wavelength Effect on Photovoltaic Property of Poly-Si Solar Cell Using Photoconductive Atomic Force Microscopy (PC-AFM)

  • Heo, Jinhee
    • Transactions on Electrical and Electronic Materials
    • /
    • v.14 no.3
    • /
    • pp.160-163
    • /
    • 2013
  • We investigated the effect of light intensity and wavelength of a solar cell device by using photoconductive atomic force microscopy (PC-AFM). The $POCl_3$ diffusion doping process was used to produce a p-n junction solar cell device based on a Poly-Si wafer and the electrical properties of prepared solar cells were measured using a solar cell simulator system. The measured open circuit voltage ($V_{oc}$) is 0.59 V and the short circuit current ($I_{sc}$) is 48.5 mA. Also, the values of the fill factors and efficiencies of the devices are 0.7% and approximately 13.6%, respectively. In addition, PC-AFM, a recent notable method for nano-scale characterization of photovoltaic elements, was used for direct measurements of photoelectric characteristics in local instead of large areas. The effects of changes in the intensity and wavelength of light shining on the element on the photoelectric characteristics were observed. Results obtained through PC-AFM were compared with the electric/optical characteristics data obtained through a solar simulator. The voltage ($V_{PC-AFM}$) at which the current was 0 A in the I-V characteristic curves increased sharply up to 1.8 $mW/cm^2$, peaking and slowly falling as light intensity increased. Here, $V_{PC-AFM}$ at 1.8 $mW/cm^2$ was 0.29 V, which corresponds to 59% of the average $V_{oc}$ value, as measured with the solar simulator. Also, while light wavelength was increased from 300 nm to 1,100 nm, the external quantum efficiency (EQE) and results from PC-AFM showed similar trends at the macro scale, but returned different results in several sections, indicating the need for detailed analysis and improvement in the future.

Characterization of Light Effect on Photovoltaic Property of Poly-Si Solar Cell by Using Photoconductive Atomic Force Microscopy (Photoconductive Atomic Force Microscopy를 이용한 빛의 세기 및 파장의 변화에 따른 폴리실리콘 태양전지의 광전특성 분석)

  • Heo, Jinhee
    • Korean Journal of Materials Research
    • /
    • v.28 no.11
    • /
    • pp.680-684
    • /
    • 2018
  • We investigate the effect of light intensity and wavelength of a solar cell device using photoconductive atomic force microscopy(PC-AFM). A $POCl_3$ diffusion doping process is used to produce a p-n junction solar cell device based on a polySi wafer, and the electrical properties of prepared solar cells are measured using a solar cell simulator system. The measured open circuit voltage($V_{oc}$) is 0.59 V and the short circuit current($I_{sc}$) is 48.5 mA. Moreover, the values of the fill factors and efficiencies of the devices are 0.7 and approximately 13.6 %, respectively. In addition, PC-AFM, a recent notable method for nano-scale characterization of photovoltaic elements, is used for direct measurements of photoelectric characteristics in limited areas instead of large areas. The effects of changes in the intensity and wavelength of light shining on the element on the photoelectric characteristics are observed. Results obtained through PC-AFM are compared with the electric/optical characteristics data obtained through a solar simulator. The voltage($V_{PC-AFM}$) at which the current is 0 A in the I-V characteristic curves increases sharply up to $18W/m^2$, peaking and slowly falling as light intensity increases. Here, $V_{PC-AFM}$ at $18W/m^2$ is 0.29 V, which corresponds to 59 % of the average $V_{oc}$ value, as measured with the solar simulator. Furthermore, while the light wavelength increases from 300 nm to 1,100 nm, the external quantum efficiency(EQE) and results from PC-AFM show similar trends at the macro scale but reveal different results in several sections, indicating the need for detailed analysis and improvement in the future.