• 대한기계학회:학술대회논문집
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• 대한기계학회 2008년도 추계학술대회A
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• pp.1847-1850
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• 2008

The process conditions during ultraviolet nanoimprint lithography (UV-NIL) process such as temperature, stamping pressure, UV irradiation, etc. are effective factors for successful imprinting of complex and fine patterns. In this study, the effects of aluminum mold on the thermal characteristics of UV-NIL process were investigated through imprinting experiments and numerical simulations. The temperature of polymer resin on mold was measured to study thermal characteristics during UV curing. From the experimental and numerical results, the importance of curing reaction control for UV-NIL process was discussed for deformation characteristics.

• 폴리머
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• 제29권1호
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• pp.102-105
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• 2005

다양한 치아 수복이 가능한 광중합형의 치아수복용 고분자 나노복합체(polymeric dental restorative nanocomposites, PDRNC)를 제조하고 이들의 심미적 물성을 고찰하였다. PDRNC 제조에 사용한 충전제는 평균 입경이 1${\mu}m$인 바륨실리케이트와 40 nm 및 7 nm 크기의 나노실리카를 혼성화시켜 사용하였는데 bisphenol A glycerolate methacrylate와 triethyleneglycol dimethacrylate (60/40 wt%)으로 구성되는 기재와의 혼화성 증가를 위해 실란으로 표면을 소수성으로 처리하였다. 가시광선을 이용한 PDRNC의 광중합에 필요한 광개시제는 camphorquinone을, 광증감제는 2-(dimethylamino)ethyl methacrylate을 사용하였다. 제조된 PDRNC의 심미적 물성을 Hunter L, a, b 값으로 평가한 결과, 7nm 크기의 나노 충전제가 첨가될수록 PDRNC의 투명성이 증가되어 심미적 특성이 향상됨을 알 수 있었다.

• 한국인쇄학회지
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• 제13권2호
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• pp.47-53
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• 1995

Photosensitive resin of azide type is good for resolution and inner solvent, but it is really problem to development of practical use because fanctional groups of polymer has many hydrophilic radicals. By careful attention to this point, this study was investigated synthesis term, photo property and development property of composed photosensitive resin of azida type, it is to this effect. 1) H-NMR spectrum of compared DABCI showed amion redical by $\delta$6.0~6.1ppm to substitude for azide radical by amino radical by $\delta$8.9~9.45ppm, and FT-IR absorption spectra showed the absorption bends at 2100cm. 2)FT-IR absorption spectra of PHS1-DAB, PHS2-DAB, CMM-DAB and CHM-DAB showed azida radical pick to be lost at after irradiation by UV light. 3) According to exposuer change of PHS1-DAB, PHS2-DAB, CMM-DAB and CHM-DAB, absorption maximum value of UV spectrum change was 280nm. 4) to compared relative sensitivity of compared photosensitive resin, PHS2-DAB was the best and to compared insolubility rate of compared photosensitive resin, CMM-DAB was the lower. 5)Solubility if NaOH was the best by 1.0mol/$\ell$ and solubility of developing solution of ethanol to water was it in the ratio of 4 to 1.

• 공업화학
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• 제16권3호
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• pp.422-426
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• 2005

가시광선에 의해 활성화되는 치아수복용 고분자 나노복합체를 제조하고 이들의 주요 물성을 고찰하였다. 복합체 제조에 사용한 충진재는 barium silicate와 나노 크기의 fumed silica가 혼합된 하이브리드 충진재를 사용하였으며 bisphenol A glycerolate methacrylate와 triethyleneglycol dimethacrylate로 구성되는 resin matrix와의 계면력 향상을 위해 실란 결합제로 표면을 소수성으로 처리하였다. 제조된 고분자 나노복합체의 기계적 물성을 평가한 결과, 나노 충진재가 첨가됨에 따라 내마모성이 향상되었다. 그러나 중합수축률 값은 나노 충진재 함량에 관계없이 3 vol% 이하로 거의 일정하였으며 광조사가 끝난 후에도 중합수축은 지속적으로 일어남을 알 수 있었다. 또한 복합체의 색차는 나노 충진재 함량이 늘어남에 따라 근소한 차이로 증가되었다.

• 폴리머
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• 제38권6호
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• pp.720-725
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• 2014

Hydride terminated polydimethylsiloxane과 allyl amine을 hydrosilylation 반응으로 aminopropylpoly-dimethylsiloxane을 합성하고, 이를 hexamethylenediisocyanate(HDI)의 고리화 반응으로 제조된 cyclic HDI trimer와 반응시켜 urea결합으로 결합된 polydimethylsiloxane 변성 urea을 제조하였다. Polydimethylsiloxane 변성 urea의 말단에 있는 isocyante기와 2-hydroxyethylmethacrylate를 반응시켜 말단에 multi acrylate기가 도입된 polydimethylsiloxane 변성 urea/acrylate(PUA)를 제조하였다. 제조한 화합물의 구조를 FTIR, $^1H$ NMR로 확인하였으며, PUA에 아크릴계 단량체, 광 개시제, 용매 등을 여러 가지 조성비로 혼합하여 코팅 액을 제조하였으며 이를 PET 필름에 도포하고 UV을 조사하여 고경도의 유연성을 갖는 코팅 막을 제조하였다. 제조한 코팅 막의 연필 경도는 3H, 접촉각은 $82^{\circ}$, bendability는 $7{\phi}$까지 scratch가 발생하지 않았다.

• 한국정밀공학회지
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• 제22권1호
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• pp.199-206
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• 2005

Mask manufacturing is a high COC and COO process in developing of semiconductor devices because of mask production tool with high resolution. Direct writing has been thought to be the one of the patterning method to cope with development or small-lot production of the device. This study consists two categories. One is the additional process of the direct and maskless patterning generation using SLA for easy and convenient application and the other is a removal process using wet-etching process. In this study, cured status of epoxy pattern is most important parameter because of the beer-lambert law according to the diffusion of UV light. In order to improve the contact force between patterns and substrate, prime process was performed and to remove the semi-cured resin which makes a bad effects to the pattern, spin cleaning process using TPM was also performed. At a removal process, contact force between photo-curable resin as an etching mask and Si wafer is important parameter.

• 마이크로전자및패키징학회지
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• 제27권4호
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• pp.113-117
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• 2020

논문에서는 고분자 나노구조 필름의 기계적 물성을 향상하기 위하여 광열효과를 이용한 열처리 공정을 응용하여 나노임프린트로 제작된 고분자 나노구조 필름의 기계적 물성에 미치는 영향을 규명하였다. Hybrid resin과 UV 나노임프린트을 이용하여 저반사 나노구조를 성형하고 IPL (intense pulsed light)를 이용하여 열처리를 수행한 뒤, 제작된 나노구조 필름의 투과율과 내스크래치성을 평가하여 나노구조의 성형성과 기계적 물성의 변화를 관찰하였다. 나노패턴의 특성에 의해서 나노구조의 투과율은 550 nm 파장에서 97.6%로 고투과율의 기능을 확인하였으며, IPL을 이용한 열처리를 진행한 경우 Hotplate를 이용한 열처리보다 경도는 0.51 GPa로, 0.27 GPa로 열처리한 시편에 비해 1.8배 향상하였으며, 동일 실험 조건에서 탄성율은 Hotplate 이용 시 4 GPa에서 IPL 이용 시 5.9 GPa로 1.4배 증가하였다.

• 한국응용과학기술학회지
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• 제15권1호
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• pp.9-15
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• 1998

Poly(p-anol-formaldehyde) cinnamates(AGEFCs) were synthesized to prepare a photo-sensitive polymer which enabled to be photodimerized via 6-center reaction. The photocharacteristics of the mixture of the AGEFCs and a sensitizer after exposure to light was tested. The yield of the residual film, which was closely related to the sensitivity of the film, was affected by the degree of polymerization of the backbone resin, sensitizers and their concentration. AGEFC-3 revealed a good photosensitive effect such as about 73% yield of residual film at 128 min. of exposed time.

• 폴리머
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• 제38권2호
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• pp.138-143
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• 2014

${\alpha},{\omega}$-Hydroxypropyl기를 갖는 polydimethylsiloxane을 합성하고 이를 hexamethylenediisocyanate(HDI)의 고리화 반응으로 제조된 HDI trimer와 반응시켜 말단에 이소시아네이트 기를 갖는 PDMS 변성 urethane(PSU)을 제조하였다. 이소시아네이트기를 갖는 PSU와 2-hydroxyethylmethacrylate를 urethane 반응으로 acrylate기를 갖는 PDMS 변성 urethane base 수지(PSUA)를 제조하였으며, 이를 FTIR, NMR로 구조를 확인하여 분석하였다. 제조한 base 수지에 아크릴계 경화제, 광 개시제, 용매들을 혼합하여 코팅 액을 제조하였으며 이를 PET 필름에 도포하고 자외선으로 조사하여 고경도의 유연성을 갖는 코팅 막을 얻었다. 얻어진 코팅 막의 광 투과도는 89.7%, 연필경도는 3H, 접촉각은 $88^{\circ}$였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.421-421
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• 2008

Generally, the polymer thick-film resistors for embedded organic or hybrid substrate are patterned by screen printing so that the accuracy of resistor pattern is not good and the tolerance of resistance is too high(${\pm}$20~30%). To reform these demerits, a method using Fodel$^{(R)}$ technology, which is the patterning method using a photosensitive resin to be developable by aqueous alkali-solution as a base polymer for thick-film pastes, was recently incorporated for the patterning of thermosetting thick-film resistor paste. Alkali-solution developable photosensitive resin system has a merit that the precise patterns can be obtained by UV exposure and aqueous development, so the essential point is to get the composition similar to PSR(photo solder resist) used for PCB process. In present research, we made the photopatternable resistor pastes using 8 kinds of epoxy acrylates and a conductive carbonblack (CDX-7055 Ultra), evaluated their developing performance, and then measured the resistance after final curing. To become developable by alkali-solution, epoxy acrylate oligomers with carboxyl group were prepared. Test coupons were fabricated by patterning copper foil on FR-4 CCL board, plating Ni/Au on the patterned copper electrode, applying the resistor paste on the board, exposing the applied paste to UV through Cr mask with resistor patterns, developing the exposed paste with aqueous alkali-solution (1wt% $Na_2CO_3$), drying the patterned paste at $80^{\circ}C$ oven, and then curing it at $200^{\circ}C$ during 1 hour. As a result, some test compositions couldn't be developed according to the kind of oligomer and, in the developed compositions, the measured resistance showed different results depending on the paste compositions though they had the same amount of carbonblack.