• Title/Summary/Keyword: Photo-curable Resin

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A Study on the reduction of surface roughness by analyzing the thickness of photocurable sculpture (광조형물의 패턴두께에 따른 표면 거칠기 저감을 위한 공정연구)

  • Kim, Young-Su;Yang, Hyoung-Chan;Kim, Go-Beom;Dang, Hyun-Woo;Doh, Yang-Hoi;Choi, Kyung-Hyun
    • Journal of Power System Engineering
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    • v.20 no.4
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    • pp.75-82
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    • 2016
  • In this paper, we developed a 3D printing system using a photo-curing resin in order to reduce the surface roughness of a sculpture produced with the 3D printer. Using the pattern of the resulting variable thickness, that gave rise to a stepped shape, and the area error of the photo-curable sculpture, a study was carried out for the process to reduce the surface roughness. At a given value of stage velocity (40~70 mm/s) and output air pneumatic pressure (20~60 kPa), the minimum pattern thickness of the pattern was achieved $65{\mu}m$ and the maximum pattern thickness of up to $175{\mu}m$. To increases the pattern resolution to about $40{\mu}m$, the process conditions should be optimized. 3D surface Nano profiler was used to find the surface roughness of the sculpture that was measured to be minimum $4.7{\mu}m$ and maximum $8.7{\mu}m$. The maximum surface roughness was reduced about $1.2{\mu}m$ for the maximum thickness of the pattern. In addition, a FDM was used to fabricate the same sculpture and its surface roughness measurements were also taken for comparison with the one fabricated using photo-curing. Same process conditions were used for both fabrication setups in order to perform the comparison efficiently. The surface roughness of the photo-curable sculpture is $5.5{\mu}m$ lower than the sculpture fabricated using FDM. A certain circuit patterns was formed on the laminated surface of the photo-curable sculpture while there was no stable pattern on the laminated surface of the FDM based sculpture the other hand.

A Study of Mastless Pattern Fabrication using Stereolithography (광조형을 이용한 마스크리스 패턴형성에 관한 연구)

  • 정영대;조인호;손재혁;임용관;정해도
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2002.05a
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    • pp.503-507
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    • 2002
  • Mask manufacturing is a high COC and COO process in developing of semiconductor devices, because of the mass production tool with high resolution. Direct writing has been thought to be one of the patterning method to cope with development or small-lot production of the device. This study focused on the development of the direct, mastless patterning process using stereolithography tool for the easy and convenient application to micro and miso scale products. Experiments are utilized by three dimensional CAD/CAM as a mask and photo-curable resin as a photo-resist in a conventional stereo-lithography apparatus. Results show that the resolution of the pattern was achieved about 300 micron because of complexity of SLA apparatus settings, inspite of 100 micro of inherent resolution. This paper concludes that photo resist and laser spot diameter should be adjusted to get finer patterns and the proposed method is significantly feasible to mastless and low cost patterning with micro and miso scale.

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Accuracy Improvement of Output in Projection Stereolithography by Optimizing Projection Resolution (전사방식 광조형 시스템의 해상도 최적화를 통한 출력물의 정밀도 향상)

  • Kim, Yeong-Heum;Kim, Kyu-Eon;Lee, Chibum
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.24 no.6
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    • pp.710-717
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    • 2015
  • Projection stereolithography is an additive manufacturing method that uses beam projection to cure the photo-reactive resin used. The light source of a cross-section layer-form illuminates photo-curable resin for building a three-dimensional (3D) model. This method has high accuracy and a fast molding speed because the processing unit is a face instead of a dot. This study describes a Scalable Projection Stereolithography 3D Printing System for improving the accuracy of the stereolithography. In a conventional projection 3D printer, when printing a small sized model, many pixels are not used in the projection or curing. The proposed system solves this problem through an optical adjustment, and keeps using the original image as possible as filling the whole projection area. The experimental verification shows that the proposed system can maintain the highest level of precision regardless of the output size.

Fabrication and Characterization of PZT Suspensions for Stereolithography based on 3D Printing

  • Cha, JaeMin;Lee, Jeong Woo;Bae, Byeonghoon;Lee, Seong-Eui;Yoon, Chang-Bun
    • Journal of the Korean Ceramic Society
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    • v.56 no.4
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    • pp.360-364
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    • 2019
  • PZT suspensions for photo-curable 3D printing were fabricated and their characteristics were evaluated. After mixing the PZT, photopolymer, photo-initiator, and dispersant for 10 min by using a high-shear mixer, the viscosity characteristics were investigated based on the powder content. To determine an appropriate dispersant content, the dispersant was mixed at 1, 3, and 5 wt% of the powder and a precipitation test was conducted for two hours. Consequently, it was confirmed that the dispersibility was excellent at 3 wt%. Through thermogravimetric analysis, it was confirmed that weight reduction occurred in the photopolymer between 120? and 500?, thereby providing a debinding heat treatment profile. The fabricated suspensions were cured using UV light, and the polymer was removed through debinding. Subsequently, the density and surface characteristics were analyzed by using the Archimedes method and field-emission scanning electron microscopy. Consequently, compared with the theoretical density, an excellent characteristic of 97% was shown at a powder content of 87 wt%. Through X-ray diffraction analysis, it was confirmed that the crystallizability improved as the solid content increased. At the mixing ratio of 87 wt% powder and 13 wt% photo-curable resin, the viscosity was 3,100 cps, confirming an appropriate viscosity characteristic as a stereolithography suspension for 3D printing.

A Study on the Polymer Lithography using Stereolithography (광조형법을 이용한 고분자 리소그래피에 관한 연구)

  • Jung Young Dae;Lee Hyun Seop;Son Jae Hyuk;Cho In Ho;Jeong Hae Do
    • Journal of the Korean Society for Precision Engineering
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    • v.22 no.1
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    • pp.199-206
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    • 2005
  • Mask manufacturing is a high COC and COO process in developing of semiconductor devices because of mask production tool with high resolution. Direct writing has been thought to be the one of the patterning method to cope with development or small-lot production of the device. This study consists two categories. One is the additional process of the direct and maskless patterning generation using SLA for easy and convenient application and the other is a removal process using wet-etching process. In this study, cured status of epoxy pattern is most important parameter because of the beer-lambert law according to the diffusion of UV light. In order to improve the contact force between patterns and substrate, prime process was performed and to remove the semi-cured resin which makes a bad effects to the pattern, spin cleaning process using TPM was also performed. At a removal process, contact force between photo-curable resin as an etching mask and Si wafer is important parameter.

Fabrication of Real 3D Shape Components Using Bi-Sn Alloys (Bi-Sn 합금을 이용한 3차원 미세 구조물의 제작기술 개발)

  • Chung, Sung-Il;Park, Sun-Joon;Im, Yong-Gwan;Choi, Jae-Young;Jeong, Hae-Do
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.28 no.5
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    • pp.624-631
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    • 2004
  • In this paper, new replication techniques fur a metal microcomponent having a real 3D shape were introduced. Helical gear was selected as one of a real 3D microcomponents for this study. The helical gear, which was made of photo-curable resin, was fabricated as a master pattern by microstereolithography technology. Then, a silicone rubber mold was fabricated from the master pattern. Lastly, a final bismuth alloy pattern was transferred from the silicone rubber mold by the microcasting process. In this paper, the replication technique is described in detail from the master pattern to the final pattern with some investigation on factors related to the technique.

Analysis of Mechanical Characteristics of Polymer Sandwich Panels Containing Injection Molded and 3D Printed Pyramidal Kagome Cores

  • Yang, K.M.;Park, J.H.;Choi, T.G.;Hwang, J.S.;Yang, D.Y.;Lyu, M.-Y.
    • Elastomers and Composites
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    • v.51 no.4
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    • pp.275-279
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    • 2016
  • Additive manufacturing or 3D printing is a new manufacturing process and its application is getting growth. However, the product qualities such as mechanical strength, dimensional accuracy, and surface quality are low compared with conventional manufacturing process such as molding and machining. In this study not only mechanical characteristics of polymer sandwich panel having three dimensional core layer but also mechanical characteristics of core layer itself were analyzed. The shape of three dimensional core layer was pyramidal kagome structure. This core layer was fabricated by two different methods, injection molding with PP resin and material jetting type 3D printing with acrylic photo curable resin. The material for face sheets in the polymer sandwich panel was PP. Maximum load, stiffness, and elongation at break were examined for core layers fabricated by two different methods and also assembled polymer sandwich panels. 3D printed core showed brittle behavior, but the brittleness decreased in polymer sandwich panel containing 3D printed core. The availability of 3D printed article for the three dimensional core layer of polymer sandwich panel was verified.

Development of Hybrid RP System and Fabrication of Nano Composite parts (하이브리드 쾌속 조형 시스템의 개발 및 나노 복합재 부품 제작)

  • Kim S.G.;Jung W.K.;Chu W.S.;Kim H.J.;Ahn S.H.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.10a
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    • pp.220-223
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    • 2005
  • The rapid prototyping (RP) technology has been advanced for various applications such as verification of design, functional test. However, many RP machines still have low accuracy and limitation of applications for various materials. In this research, a hybrid RP system was developed to improve precision of micro parts. This hybrid system consists of deposition and material removal process by mechanical micro machining to fabricate nano composites using photo-curable polymer resin with various nano particles. In this work, using hybrid RP process with Multi-Walled Carbon Nano Tube (MWCNT) and hydroxyapatite, micro parts were fabricated. The precision of parts was evaluated based on the original CAD design, and to see the effect of nano particles on mechanical properties, tensile strength was measured. From the results of experiments, it was confirmed that the part made by hybrid process had higher precision, and the addition of nano particles improved mechanical properties.

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Roll-to-roll process for large-area transfer of Ag nanowire electrode (은 나노 와이어 전극의 대면적 전사를 위한 롤 투 롤 공정)

  • Park, Yangkyu;Kim, Jae Pil;Kim, Wan Ho;Jung, Kang;Jeong, Ho-Jung
    • Journal of the Korean institute of surface engineering
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    • v.55 no.3
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    • pp.173-179
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    • 2022
  • This study presents a roll-to-roll process which is capable of Ag nanowire (AgNW) transfer from polyethylene terephthalate (PET) film to polycarbonate (PC) film. We developed a roll-to-roll machine that consists of two film suppliers, a coater of photo-curable resin, a film laminator, an ultraviolet (UV) exposure unit, and a film winder to facilitate large-area electrode transfer between different flexible substates. Using the process, optimal fabrication condition was investigated by parametric experiments in terms of the UV exposure time, number of thermal cycling, and exposure time of high temperature and humidity. A fabricated AgNW on PC film showed sheet resistance of 52 Ω/sq and optical transmittance of approximately 80 % over a range of visible light.

UV-nanoimprint Patterning Without Residual Layers Using UV-blocking Metal Layer (UV 차단 금속막을 이용한 잔류층이 없는 UV 나노 임프린트 패턴 형성)

  • Moon Kanghun;Shin Subum;Park In-Sung;Lee Heon;Cha Han Sun;Ahn Jinho
    • Journal of the Microelectronics and Packaging Society
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    • v.12 no.4 s.37
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    • pp.275-280
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    • 2005
  • We propose a new approach to greatly simplify the fabrication of conventional nanoimprint lithography (NIL) by combined nanoimprint and photolithography (CNP). We introduce a hybrid mask mold (HMM) made from UV transparent material with a UV-blocking Cr metal layer placed on top of the mold protrusions. We used a negative tone photo resist (PR) with higher selectivity to substrate the CNP process instead of the UV curable monomer and thermal plastic polymer that has been commonly used in NIL. Self-assembled monolayer (SAM) on HMM plays a reliable role for pattern transfer when the HMM is separated from the transfer layer. Hydrophilic $SiO_2$ thin film was deposited on all parts of the HMM, which improved the formation of SAM. This $SiO_2$ film made a sub-10nm formation without any pattern damage. In the CNP technique with HMM, the 'residual layer' of the PR was chemically removed by the conventional developing process. Thus, it was possible to simplify the process by eliminating the dry etching process, which was essential in the conventional NIL method.

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