• Title/Summary/Keyword: Petzval curvature

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Achromatic and Athermal Design of an Optical System with Corrected Petzval Curvature on a Three-dimensional Glass Chart

  • Lim, Tae-Yeon;Kim, Yeong-Sik;Park, Sung-Chan
    • Current Optics and Photonics
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    • v.1 no.4
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    • pp.378-388
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    • 2017
  • We present a graphical method for determining a pair of optical materials and powers to design an achromatic and athermal lens system with corrected Petzval curvature. To graphically obtain the solutions, a three-dimensional (3D) glass chart is proposed. Even if a particular material combination is unavailable, we can select an element suitable for a specific lens and continuously change the element powers of an equivalent single lens for aberrations correction. Thus, we can iteratively identify the materials and powers on a 3D glass chart. By designing a fisheye lens using this method, an achromatic and athermal system with flat Petzval curvature is obtained, over the specified waveband and temperature ranges.

Design of a Catadioptric System with Corrected Color Aberration and Flat Petzval Curvature Using a Graphically Symmetric Method

  • Lim, Tae-Yeon;Park, Sung-Chan
    • Current Optics and Photonics
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    • v.2 no.4
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    • pp.324-331
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    • 2018
  • This paper describes a symmetric method for determining a combination of element power and optical material to design a catadioptric system with corrected color aberration and flat Petzval curvature. To graphically obtain the solutions, a glass chart containing the Abbe number, the refractive index, and the optical power, which are closely related to these aberrations, is suggested. First, we recompose an optical system as a doublet of the specific lens and an equivalent single lens, and then locate both lenses on lines that are symmetric to each other on a glass chart, through changing the lens parameters effectively. Utilizing this method, an achromatic catadioptric system with flat Petzval curvature is obtained.

Design and Aberration Analysis of Four-Spherical Mirror System Corrected for 4 Aberrations (4개의 수차가 보정된 유한 물체점을 갖는 4-구면 반사경계의 설계 및 수차해석)

  • 김종태;공홍진;이상수
    • Korean Journal of Optics and Photonics
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    • v.2 no.3
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    • pp.127-132
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    • 1991
  • We have obtained the analytic solutions of the four spherical mirror system free from the Seidel third order aberratios which are spherical aberration, coma, astigmatism, and distortion, Vignetting. Petzval field curvature, and optical properties according to the design parameters are numerically investigated and optimized. The numerical aperture of this system is 0.2 and the half field angle is $1.5^{\circ}$.

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Optical System Design and Evaluation for an Augmented Reality Head-up Display Using Aberration and Parallax Analysis

  • Kim, Kum-Ho;Park, Sung-Chan
    • Current Optics and Photonics
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    • v.5 no.6
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    • pp.660-671
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    • 2021
  • We present a novel optical system for an augmented reality head-up display (AR HUD) with two virtual images at different conjugates by employing a confocal off-axis two-mirror and introducing the horopter circle. For a far virtual image with large asymmetrical aberrations, we initially obtain an off-axis two-mirror system corrected for these aberrations and compensated for the down angle by configuring its parameters to satisfy the confocal and Scheimpflug conditions, respectively. In addition, this system is designed to reduce the biocular parallax by matching Petzval surface into the longitudinal horopter circle in a near virtual image. This design approach enables us to easily balance the residual aberrations and biocular parallax when configuring the optical system with two different conjugates, which results in an AR HUD available for near and far virtual images together.

Analytic Design Procedure of Three-mirror Telescope Corrected for Spherical Aberration, Coma, Astigmatism, and Petzval Field Curvature

  • Lee, Jong-Ung;Yu, Seung-Moon
    • Journal of the Optical Society of Korea
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    • v.13 no.2
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    • pp.184-192
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    • 2009
  • There are total eight degrees of freedom in designing a three-mirror system. If we correct four kinds of third order aberrations and the system should have the specified effective focal length, the remaining three degrees of freedom can be used for selecting a suitable configuration for a specific application. We suggest an analytic design procedure for a three-mirror telescope system which has a suitably sized secondary mirror and proper separations between mirrors, and is corrected for four kinds of third order aberrations, spherical aberration, coma, astigmatism, and field curvature. Two design examples are shown. One has a compact configuration with off-axial field, the other has relatively long configuration with annular ring field.

Optimization of optical focus of composition optical system by OSLO (합성광학계의 OSLO를 통한 optical focus의 최적화)

  • Kim, Dae Nyoun;Choi, Gei Hun
    • Journal of Korean Ophthalmic Optics Society
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    • v.5 no.1
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    • pp.1-6
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    • 2000
  • This study was to calculate spot size, focus shift and optical focus by use of OSLO when 3 wavelength, ${\omega}{\upsilon}_1=0.588{\mu}$, ${\omega}{\upsilon}_2=0.486{\mu}$ and ${\omega}{\upsilon}_3=0.656{\mu}$ in composite lens optics system & ocular optical system were respectively here, Entrance Beam Radius(mm) 1 mm, Field angle(deg) 5.7296e-0.5 mm, Image Aperture 0.053055 mm, Exit Aperture 0.903711 mm, Reflective focal length 25.181544 mm, Petzval radius -19.21839 mm, n = 1.523. It was found that a range of spot size was 0.002 mm~0.07 mm when a range of back curvature radius was 1 mm~30 mm, and 0.0005 mm~0.002 mm when of it more than 50 mm. Focus shift, 50 mm a range 3 kinds of lens was small, and it saw that of all tendency was high up to 1 mm~15 mm and up to 25 mm beyond that limits, it was going down and then going up again, optical focus 100 mm lens was best and the value when optimization with this lens was $60{\pm}1mm$.

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Paraboloidal 2-mirror Holosymmetric System with Unit Maginification for Soft X-ray Projection Lithography (연X-선 투사 리소그라피를 위한 등배율 포물면 2-반사경 Holosymmetric System)

  • 조영민;이상수
    • Korean Journal of Optics and Photonics
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    • v.6 no.3
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    • pp.188-200
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    • 1995
  • A design of unit magnification 2-mirror system with high resolution is presented. It is for soft X-ray(wavelength of 13 nm) projection imaging and suitable for preparation of high density semiconductor chip. In general, a holosymmetric system with unit magnification has the advantage that both coma and distortion are completely eliminated. In our holosymmetric 2-mirror system, spherical aberration is addtionally removed by using two identical paraboloidal mirror surfaces and field curvature aberration is also corrected by balancing Petzval sum and astigmatism which depends on the distance between two mirrors, so that the system is a aplanatic flat-field paraboloidal 2-mirror holosymmetric system. This 2-mirror system is small in size, and has a simple configuration with rotational symmetry about optical axis, and has also small central obscuration. Residual finite aberrations, spot diagrams, and diffraction-based MTF's are analyzed for the check of performances as soft X-ray lithography projection system. As a result, the image sizes for the resolutions of$0.25\mum$and $0.18\mum$are 4.0 mm, 2.5 mm respectively, and depths of focus for those are $2.5\mum$, $2.4\mum$respectively. This system should be useful in the fabrication of 256 Mega DRAM or 1 Giga DRAM. DRAM.

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