• Korean Journal of Heritage: History & Science
• /
• v.33
• /
• pp.210-255
• /
• 2000

This study aims to classify the framework and arrangement of interior columns (Naeju) which are used in single-story Buddhist halls into several types, and to develop a theory on the process of changes among those types. Since interior columns are building materials which hold up the roof structure and make partitions in the interior space of halls, their framework and arrangement is closely linked to the development of building technology and is expected to reflect new architectural needs. The kinds of interior columns classified by the shape of framework are goju, chaduju, oepyonju, naepyonju. The arrangement of interior columns can he classified by two methods: One which counts the number of the interior column arrangements in a hall, and the other whose classification relates with the side wall columns - Jeongchibup and yijubup. With the combination of these classifications, we can divide the framework and arrangement of interior columns into 8 types From the remains of Korean and Chinese Architecture, we can presume that before the late-Goryo period, jeongchibup had always been applied in the construction of Buddhist halls, and gamju(column reducing) had only been used in examples of small scale. After the founding of Choseon Kingdom, however, national policy had weakened the economic power of Buddhist temples. Because of that, large-scale outdoor Buddhist mass was replaced by small-scale indoor mass, and for this reason, though the scale of Buddhist halls became smaller, the need for a broad interior space became stronger. Thus in early-Choseon period, reduction of interior columns became widely spread. Those types of framework and arrangement of interior columns where yijubup was applied were developed because the rear interior columns arrangements, in order to expand the interior space, have moved backward. Among these types, yiju-goju and yiju-chaduju were developed for the Buddhist halls with paljak roof(hipped-gabled roof), where the load of their side eaves caused structural problems at the side walls. And oepyonju type was for the small-scale and middle-scale Buddhist halls which needed more interior space but didn't want the extension of roof structure. From the local and periodic distribution of each types, we can conclude that the types jeongchi-goju, jeongchi-chaduju and yiju-chaduju have been settled as typical technique of local carpenters. Oepyonju was developed later than the other types, but for its merit of low cost, it became a popular type across the nation.

• Journal of the Korea Academia-Industrial cooperation Society
• /
• v.21 no.6
• /
• pp.584-591
• /
• 2020

Reliability is an important factor in weapons systems. Low reliability causes the weapons system to fail to function properly, which directly leads to the weakening of combat capability. This paper classifies the structure of the 5.56 mm rifle, which is currently used by the Korean army, into a total of seven assemblies and describes the eight functions necessary for the rifle to operate normally. In addition, the concept of reliability was defined as the MRBF, and the Poisson process model and TTT plot were explained as a reliability analysis theory for the repair function system. Next, the field-data obtained by defining failure as the replacement of parts other than periodic exchange of parts were refined, and the reliability was analyzed by entering the refined field operation specifications into the Minitab program. As a result, the reliability of the rifle was determined to be 251.73. The assembly parts that required improvement was identified as the barrel, lower body, and butt stock assembly, and 10 detailed parts needed to be improved. Finally, the limits of the reliability analysis using the field-data currently available for small caliber firearms were considered.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2008.06a
• /
• pp.241-241
• /
• 2008

Macrofore formation in silicon and other semiconductors using electrochemical etching processes has been, in the last years, a subject of great attention of both theory and practice. Its first reason of concern is new areas of macropore silicone applications arising from microelectromechanical systems processing (MEMS), membrane techniques, solar cells, sensors, photonic crystals, and new technologies like a silicon-on-nothing (SON) technology. Its formation mechanism with a rich variety of controllable microstructures and their many potential applications have been studied extensively recently. Porous silicon is formed by anodic etching of crystalline silicon in hydrofluoric acid. During the etching process holes are required to enable the dissolution of the silicon anode. For p-type silicon, holes are the majority charge carriers, therefore porous silicon can be formed under the action of a positive bias on the silicon anode. For n-type silicon, holes to dissolve silicon is supplied by illuminating n-type silicon with above-band-gap light which allows sufficient generation of holes. To make a desired three-dimensional nano- or micro-structures, pre-structuring the masked surface in KOH solution to form a periodic array of etch pits before electrochemical etching. Due to enhanced electric field, the holes are efficiently collected at the pore tips for etching. The depletion of holes in the space charge region prevents silicon dissolution at the sidewalls, enabling anisotropic etching for the trenches. This is correct theoretical explanation for n-type Si etching. However, there are a few experimental repors in p-type silicon, while a number of theoretical models have been worked out to explain experimental dependence observed. To perform ordered macrofore formaion for p-type silicon, various kinds of mask patterns to make initial KOH etch pits were used. In order to understand the roles played by the kinds of etching solution in the formation of pillar arrays, we have undertaken a systematic study of the solvent effects in mixtures of HF, N-dimethylformamide (DMF), iso-propanol, and mixtures of HF with water on the macrofore structure formation on monocrystalline p-type silicon with a resistivity varying between 10 ~ 0.01 $\Omega$ cm. The etching solution including the iso-propanol produced a best three dimensional pillar structures. The experimental results are discussed on the base of Lehmann's comprehensive model based on SCR width.