• Title/Summary/Keyword: Patterned glass

Search Result 111, Processing Time 0.024 seconds

Manufacturing of Flexible Patterned Cover Film for Solar Cell by Solution Coating (용액 코팅을 이용한 태양전지용 고분자 유연 패턴필름 제조)

  • Park, Chanwook;Kang, Ho-Jong
    • Polymer(Korea)
    • /
    • v.37 no.5
    • /
    • pp.656-662
    • /
    • 2013
  • The flexible patterned cover film was made by a simple solution coating process using polymethyl methacrylate (PMMA) solution with glass beads. The effect of patterned cover film on the efficiency of solar cell has been investigated. It was found that the relative solar cell efficiency increased up to 3.4% with the incident light angle between $0-90^{\circ}$ by the sphere shape of glass bead coated on the film surface. This was understood that the loss of transmittance and scattering due to the light directional dependency on solar cell were minimized because the light entered glass beads normal to its surface regardless of incident light angle. The maximum relative solar cell efficiency was achieved when glass bead shape on the film is hemisphere and the relative efficiency increased with increasing the amount of glass bead on the film surface. However, too much glass beads on the film surface resulted in the lower relative solar cell efficiency due to the lowering of transmittance as well as the occurring of light interference.

Precise Measurement of Optical Anisotropy of Rubbed Polyimide on Patterned Glass and its Nanoscale Variation (패턴이 있는 유리기층 위 러빙된 Polyimide의 광학 이방성 미세변화 정밀 측정)

  • Kim, Ha-Rang;Kim, Sang-Youl
    • Korean Journal of Optics and Photonics
    • /
    • v.20 no.5
    • /
    • pp.281-287
    • /
    • 2009
  • The optical anisotropy of rubbed PI(polyimide) film on patterned LCD glass substrate is analyzed using polarimetry. The direction of the optic axis and the magnitude of the very small retardation ($\sim$ 0.4 nm or less) is precisely measured by using a transmission ellipsometer. The variation of the optical anisotropy is presented as the curve of the optic axis versus the magnitude of the phase retardation and it is explained by using a simple optical model.

Fabrication of a Bottom Electrode for a Nano-scale Beam Resonator Using Backside Exposure with a Self-aligned Metal Mask

  • Lee, Yong-Seok;Jang, Yun-Ho;Bang, Yong-Seung;Kim, Jung-Mu;Kim, Jong-Man;Kim, Yong-Kweon
    • Journal of Electrical Engineering and Technology
    • /
    • v.4 no.4
    • /
    • pp.546-551
    • /
    • 2009
  • In this paper, we describe a self-aligned fabrication method for a nano-patterned bottom electrode using flood exposure from the backside. Misalignments between layers could cause the final devices to fail after the fabrication of the nano-scale bottom electrodes. A self-alignment was exploited to embed the bottom electrode inside the glass substrate. Aluminum patterns act as a dry etching mask to fabricate glass trenches as well as a self-aligned photomask during the flood exposure from the backside. The patterned photoresist (PR) has a negative sidewall slope using the flood exposure. The sidewall slopes of the glass trench and the patterned PR were $54.00^{\circ}$ and $63.47^{\circ}$, respectively. The negative sidewall enables an embedment of a gold layer inside $0.7{\mu}m$ wide glass trenches. Gold residues on the trench edges were removed by the additional flood exposure with wet etching. The sidewall slopes of the patterned PR are related to the slopes of the glass trenches. Nano-scale bottom electrodes inside the glass trenches will be used in beam resonators operating at high resonant frequencies.

Laser dissect writing from copper(II) formate using Ar+ laser (아르곤 이온 레이저를 이용한 CU의 직접 쓰기 기술)

  • Lee, Hong-Kyu;Lee, Cheon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2000.07a
    • /
    • pp.663-666
    • /
    • 2000
  • Laser direct writing of micro-patterned copper lines has been achieved by pyrolytic decomposition of copper formate films (Cu(HCOO)$_2$$.$4H$_2$O), as a precursor, using a focused Ar$\^$+/ laser beam ($\lambda$= 514 nm) on PCB boards and glass substrates. The linewidth and thickness of the lines were investigated as a function of laser power and scan speed. The profiles of the lines were measured by scanning electron microscope (SEM), surface profiler (${\alpha}$-step) and atomic force microscopy (AFM). The electrical resistivities of the patterned lines were also investigated as a function of laser parameter using probe station and semiconductor analyzer. we compared resistivities of the patterned lines with that of the Cu bulk, respectively.

  • PDF

Laser-Induced Direct Copper Patterning Using Focused $Ar^+$ Laser Beam (집속 아르곤 이온 레이저 빔을 이용한 레이저 유도 직접 구리 패터닝)

  • Lee, Hong-Kyu;Lee, Kyoung-Cheol;Ahn, Min-Young;Lee, Cheon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.13 no.11
    • /
    • pp.969-975
    • /
    • 2000
  • Laser direct writing of micro-patterned copper lines has been achieved by pyrolytic decomposition of copper formate films (Cu(HCOO)$_2$.4$H_2O$), as a metallo-organic precursor, using a focused CW Ar$^{+}$ laser beam (λ=514nm) on PCB boards and glass substrates. The linewidth and thickness of the lines wee investigated as a functin of laser power and scan speed. The profiles of the lines were measured by scanning electron microscope (SEM), surface profiler ($\alpha$-step) and atomic force measured by scanning electron microscope (SEM), surface profiler ($\alpha$-step) and atomic force microscopy (AFM). The electrical resistivities of the patterned lines were also investigated as a function of laser parameters using probe station and semiconductor analyzer. We compared resistivities of the patterned copper lines with these of the Cu bulk. Resistivities decreased due to changes in morphology and porosity of the deposit, which were about 3.8 $\mu$$\Omega$cm and 12$\mu$$\Omega$cm on PCB and glass substrates after annealing at 30$0^{\circ}C$ for 5 minutes.s.

  • PDF

Conversion Efficiency Enhancement of a-Si:H Thin-Film Solar Cell Using Periodic Patterned Substrate (주기적인 패턴 유리 기판을 사용한 비정질 실리콘 박막 태양전지의 효율 향상에 관한 연구)

  • Son, C.H.;Kim, K.M.;Kim, J.H.;Hong, J.;Kwon, G.C.
    • Journal of the Korean Vacuum Society
    • /
    • v.21 no.1
    • /
    • pp.55-61
    • /
    • 2012
  • We fabricated a-Si:H thin-film solar cell using the two-dimensional (2D) periodic patterned glass substrate. The use of a 3D periodic texture rather than a randomly texture at surface of TCO can result in higher short circuit current densities ($J_{sc}$). In order to analyze the optical effect of patterning glasses, ray-tracing simulations were performed. Also, p-i-n cells were deposited on patterned glasses as substrate by PECVD. UV-Vis spectroscopy, light I-V measurement were carried out for the optoelectronic characterization. The anti-reflective and light-trapping performance of patterning glass substrate was investigated by a comparison of experimental results with numerical simulations.

Adhesive bonding using thick polymer film of SU-8 photoresist for wafer level package

  • Na, Kyoung-Hwan;Kim, Ill-Hwan;Lee, Eun-Sung;Kim, Hyeon-Cheol;Chun, Kuk-Jin
    • Journal of Sensor Science and Technology
    • /
    • v.16 no.5
    • /
    • pp.325-330
    • /
    • 2007
  • For the application to optic devices, wafer level package including spacer with particular thickness according to optical design could be required. In these cases, the uniformity of spacer thickness is important for bonding strength and optical performance. Packaging process has to be performed at low temperature in order to prevent damage to devices fabricated before packaging. And if photosensitive material is used as spacer layer, size and shape of pattern and thickness of spacer can be easily controlled. This paper presents polymer bonding using thick, uniform and patterned spacing layer of SU-8 2100 photoresist for wafer level package. SU-8, negative photoresist, can be coated uniformly by spin coater and it is cured at $95^{\circ}C$ and bonded well near the temperature. It can be bonded to silicon well, patterned with high aspect ratio and easy to form thick layer due to its high viscosity. It is also mechanically strong, chemically resistive and thermally stable. But adhesion of SU-8 to glass is poor, and in the case of forming thick layer, SU-8 layer leans from the perpendicular due to imbalance to gravity. To solve leaning problem, the wafer rotating system was introduced. Imbalance to gravity of thick layer was cancelled out through rotating wafer during curing time. And depositing additional layer of gold onto glass could improve adhesion strength of SU-8 to glass. Conclusively, we established the coating condition for forming patterned SU-8 layer with $400{\mu}m$ of thickness and 3.25 % of uniformity through single coating. Also we improved tensile strength from hundreds kPa to maximum 9.43 MPa through depositing gold layer onto glass substrate.

Micro Mold Fabrication and the Micro Patterning by RTP Process (Micro Mold 제작 및 RTP 공정에 의한 미세 패턴의 성형)

  • Kim H. K.;Ko Y. B.;Kang J. J.;Rhim S. H.;Oh S. I.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
    • /
    • 2004.10a
    • /
    • pp.294-297
    • /
    • 2004
  • RTP(Rapid Thermal Pressing) is to fabricate desired pattern on polymer substrate by pressing patterned mold against the substrate heated around glass transition temperature. For a successful RTP process, the whole process including heating, molding, cooling and demolding should be conducted 'rapidly' as possible. As the RTP process is effective in replicating patterns on flat large surface without causing shape distortion after cooling, it is being widely used for fabricating various micro/bio application components, especially with channel-type microstructures on surface. This investigation finally aims to develop a RTP process machine for mass-producing micro/bio application components. As a first step for that purpose, we intended to examine the technological difficulties for realizing mass production by RTP process. Therefore, in the current paper, 4 kinds of RTP machines were examined and then the RTP process was conducted experimentally for PMMA film by using one of the machines, HEX 03. The micro-patterned molds used for RTP experiment was fabricated from silicon wafer by semi-conduct process. The replicated micro patterns on PMMA films were examined using SEM and the causes of defect observed in the replicated patterns were discussed.

  • PDF

Covalent Binding of DNA onto Glass Support for the Construction of Genosensor

  • Jeong, U-Seong;Baek, Se-Hwan
    • 한국생물공학회:학술대회논문집
    • /
    • 2000.11a
    • /
    • pp.709-710
    • /
    • 2000
  • Genosensor technology utilizes a patterned array of DNA molecules immobilized on solid supports for biomedical analysis. The detection capability of the sensor depended mainly on the way the capture probes are attached to the support as well as the sequence. We compared two different. coupling methods currently used to covalently graft DNA molecules onto a glass surface.

  • PDF