• 한국전기전자재료학회논문지
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• 제22권8호
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• pp.632-636
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• 2009

The local oxidation using an atomic force microscopy (AFM) is useful for Si-based fabrication of nanoscale structures and devices. SiC is a wide band-gap material that has advantages such as high-power, high-temperature and high-frequency in applications, and among several SiC polytypes, 4H-SiC is the most attractive polytype due to the high electron mobility. However, the AFM local oxidation of 4H-SiC for fabrication is still difficult, mainly due to the physical hardness and chemical inactivity of SiC. In this paper, we investigated the local oxidation of 4H-SiC surface using an AFM. We fabricated oxide patterns using a contact mode AFM with a Pt/Ir-coated Si tip (N-type, 0.01-0.025 ${\Omega}cm$) at room temperature, and the relative humidity ranged from 40 to 50 %. The height of the fabricated oxide pattern (1-3 nm) on SiC is similar to that of typically obtained on Si ($10^{15}^{\sim}10^{17}$ $cm^{-3}$). We perform the 2-D simulation to further analyze the electric field between the tip and the surface. We demonstrated that a specific electric field (4 ${\times}$ $10^7\;V/m$) and a doping concentration ($^{\sim}10^{17}$ $cm^{-3}$) is sufficient to switch on/off the growth of the local oxide on SiC.

• 한국마이크로전자및패키징학회:학술대회논문집
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• 한국마이크로전자및패키징학회 2000년도 추계 기술심포지움 논문집
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• pp.61-64
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• 2000

IMT 2000 단말기용 2.14 GHz 대역의 저잡음 증폭기 (Low Noise Amplifier, LNA)를 MCM-C 기술을 이용하여 제작하고 그 특성을 측정하였다. 먼저 저잡음 증폭기 회로를 설계한 후, 각 소자들의 고주파 library를 이용한 회로 시뮬레이션으로과 특성을 확인하였다. 시뮬레이션 상에서 이득(Gain)은 17 dB 였으며, 잡음지수 (Noise Figure)는 1.4 dB 였다. MCM-C 저잡음 증폭기는 LTCC 기판과 전극 및 저항체의 동시소성에 의해 코일(L), 콘덴서(C), 저항(R)을 기판 내부에 넣었으며, 마이크로 스트립 라인과 SMD 부품의 실장을 위한 Pad를 최상부에 제작하였다. 기판은 총 6 층으로 구성하였으며, 내부에 포함된 수동소자는 코일 2개, 콘덴서 2개, 저항 3개 등 총 7 개 였다. 시작품의 특성 측정 결과, 2.14 GHz에서 이득은 14.7 dB 였으며, 잡음지수는 1.5 dB 정도의 값을 가졌다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.389.2-389.2
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• 2014

Polydimethylsiloxane (PDMS) based electronic devices are widely used for various applications in large area electronics, biomedical wearable interfaces and implantable circuitry where flexibility and/or stretchability are required. A few fabrication methods of electronic devices directly on PDMS substrate have been reported. However, it is well known that micro-cracks appear in the metal layer and in the lithography pattern on a PDMS substrate. To solve the above problems, a few studies for fabrication of stiff platform on PDMS substrate have been reported. Thin-film islands of a stiff region are fabricated on an elastomeric substrate, and electronic devices are fabricated on these stiff islands. When the substrate is stretched, the deformation is mainly accommodated by the substrate, and the stiff islands and electronic devices experience relatively small strains. Here, we report a new method to achieve stiff islands structures on an elastomeric substrate at a various thickness, as the platform for stretchable electronic devices. The stiff islands were defined by conventional photolithography on a stress-free elastomeric substrate. This technique can provide a practical strategy for realizing large-area stretchable electronic circuits, for various applications such as stretchable display or wearable electronic systems.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.431-431
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• 2011

Graphene, two dimensional sheet of sp2-hybridized carbon, has attracted an enormous amount of interest due to excellent electrical, chemical and mechanical properties for the application of transparent conducting films, clean energy devices, field-effect transistors, optoelectronic devices and chemical sensors. Especially, graphene is promising candidate to detect the gas molecules and biomolecules due to the large specific surface area and signal-to-noise ratios. Despite of importance to the disease diagnosis, there are a few reports to demonstrate the graphene- and rGO-FET for biological sensors and the sensing mechanism are not fully understood. Here we describe scalable and facile fabrication of rGO-FET with the capability of label-free, ultrasensitive electrical detection of a cancer biomarker, prostate specific antigen/${\alpha}1$-antichymotrypsin (PSA-ACT) complex, in which the ultrathin rGO sensing channel was simply formed by a uniform self-assembly of two-dimensional rGO nanosheets on aminated pattern generated by inkjet printing. Sensing characteristics of rGO-FET immunosensor showed the highly precise, reliable, and linear shift in the Dirac point with the analyte concentration of PSA-ACT complex and extremely low detection limit as low as 1 fg/ml. We further analyzed the charge doping mechanism, which is the change in the charge carrier in the rGO channel varying by the concentration of biomolecules. Amenability of solution-based scalable fabrication and extremely high performance may enable rGO-FET device as a versatile multiplexed diagnostic biosensor for disease biomarkers.

• 한국재료학회지
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• 제24권8호
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• pp.429-433
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• 2014

As the fabrication technology used in FPDs(flat-panel displays) advances, the size of these panels is increasing and the pattern size is decreasing to the um range. Accordingly, a cleaning process during the FPD fabrication process is becoming more important to prevent yield reductions. The purpose of this study is to develop a FPD cleaning system and a cleaning process using a two-phase flow. The FPD cleaning system consists of two parts, one being a cleaning part which includes a two-phase flow nozzle, and the other being a drying part which includes an air-knife and a halogen lamp. To evaluate the particle removal efficiency by means of two-phase flow cleaning, silica particles $1.5{\mu}m$ in size were contaminated onto a six-inch silicon wafer and a four-inch glass wafer. We conducted cleaning processes under various conditions, i.e., DI water and nitrogen gas at different pressures, using a two-phase-flow nozzle with a gap distance between the nozzle and the substrate. The drying efficiency was also tested using the air-knife with a change in the gap distance between the air-knife and the substrate to remove the DI water which remained on the substrate after the two-phase-flow cleaning process. We obtained high efficiency in terms of particle removal as well as good drying efficiency through the optimized conditions of the two-phase-flow cleaning and air-knife processes.

• 한국재료학회지
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• 제23권2호
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• pp.89-97
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• 2013

The study of grinding behavior characteristics on aluminum powders and carbon nano tubes (CNTs) has recently gained scientific interest due to their useful effect in enhancing advanced nano materials and components, which significantly improves the property of new mechatronics integrated materials and components. We performed a series of dry grinding experiments using a planetary ball mill to systematically investigate the grinding behavior during Al/CNTs nano composite fabrication. This study focused on a comparative study of the various experimental conditions at several variations of rotation speeds, grinding time and with and without CNTs. The results were monitored for the particle size distribution, median diameter, crystal structure from XRD pattern and particle morphology at a given grinding time. It was observed that pure aluminum powders agglomerated with low rotation speed and completely enhanced powder agglomeration. However, Al/CNTs composites were achieved at maximum experiment conditions (350 rpm, 60 min.) of this study by a mechanical alloy process for Al/CNTs mixed powders because the grinding behavior of Al/CNTs composite powder was affected by addition of CNTs. Indeed, the powder morphology and crystal size of the composite powders changed more by an increase of grinding time and rotation speed.

• 한국표면공학회지
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• 제48권6호
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• pp.360-370
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• 2015

As the size of the semiconductor devices shrinks to nanometer scale, the importance of plasma etching process to the fabrication of nanometer scale semiconductor devices is increasing further and further. But for the nanoscale devices, conventional plasma etching technique is extremely difficult to meet the requirement of the device fabrication, therefore, other etching techniques such as use of multi frequency plasma, source/bias/gas pulsing, etc. are investigated to meet the etching target. Until today, various pulsing techniques including pulsed plasma source and/or pulse-biased plasma etching have been tested on various materials. In this review, the experimental/theoretical studies of pulsed plasmas during the nanoscale plasma etching on etch profile, etch selectivity, uniformity, etc. have been summarized. Especially, the researches of pulsed plasma on the etching of silicon, $SiO_2$, and magnetic materials in the semiconductor industry for further device scaling have been discussed. Those results demonstrated the importance of pulse plasma on the pattern control for achieving the best performance. Although some of the pulsing mechanism is not well established, it is believed that this review will give a certain understanding on the pulsed plasma techniques.

• Advances in materials Research
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• 제3권3호
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• pp.139-149
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• 2014

Surface enhanced Raman Scattering (SERS) has attracted attention because the technique enables detection of various chemicals, even down to single molecular scale. Among the diverse candidates for SERS substrates, Au nanoparticles are considered promising due to their fine optical properties, chemical stability and ease of surface modification. Therefore, the fabrication and optical characterization of gold particles on solid supports is highly desirable. Such structures have potential as SERS substrates because the localized surface plasmon resonance of gold nanoparticles is very sensitive to combined molecules and environments. In addition, it is well-known that the properties of Au nanoparticles are strongly dependent on their shape. In this work, arrays of shape-controlled Au nanoparticles were fabricated to exploit their enhanced and reproducible optical properties. First, shape-controlled Au nanoparticles were prepared via seed mediated solution-phase synthesis, including spheres, octahedra, and rhombic dodecahedra. Then, these shape-controlled Au nanoparticles were arranged on a PDMS substrate, which was nanopatterned using soft lithography of poly styrene particles. The Au nanoparticles were selectively located in a pattern of hexagonal spheres. In addition, the shape-controlled Au nanoparticles were arranged in various sizes of PDMS nanopatterns, which can be easily controlled by manipulating the size of polystyrene particles. Finally, the optical properties of the fabricated Au nanoparticle arrays were characterized by measuring surface enhanced Raman spectra with 4-nitrobenezenethiol.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2004년도 춘계학술대회
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• pp.978-982
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• 2004

We present high aspect ratio 100nm-scale nickel stamper using e-beam lithography process and Cr/Qz mask for the injection molding process of nano grating patterns. Conventional photolithography blank mask (CrON/Cr/Qz) consists of quartz substrate, Cr layer of UV protection and CrON of anti-reflection layer. We have used Cr/Qz blank mask without anti-reflection layer of CrON which is non-conductive material and ebeam lithography process in order to simplify the nickel electroplating process. In nickel electroplating process, we have used Cr layer of UV protection as seed layer of nickel electroplating. Fabrication conditions of photolithography mask using e-beam lithography are optimized with respect to CrON/Cr/Qz blank mask. In this paper, we have optimized e-beam lithography process using Cr/Qz blank mask and fabricated nickel stamper using Cr seed layer. CrON/Cr/Qz blank mask and Cr/Qz blank mask require optimal e-beam dosage of $10.0{\mu}C/cm^2$ and $8.5{\mu}C/cm^2$, respectively. Finally, we have fabricated $116nm{\pm}6nm-width$ and $240nm{\pm}20nm-height$ nickel grating stamper for the injection molding pattern.

• 센서학회지
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• 제6권4호
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• pp.337-345
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• 1997

마이크로 가스센서 제조를 위해 PSG/$Si_{3}N_{4}$를 다이아프램으로 하고 Pt 패턴을 히터로 하는 마이크로 히터를 설계하였다. 백금히터와 감지막을 위한 백금전극을 동일평면에 설계하여 하나의 노광공정으로 실현하도록 센서의 형태를 가정하였다. 마이크로 가스센서의 가열부의 열적거동을 유한요소법에 의해 수치해석하므로써 다이아프램부분의 온도분포, 소비전력 및 감지막부분의 온도분포를 예측할 수 있었다. 본 연구에서 제안된 히터와 감지막이 동일 평면에 이웃하는 구조의 센서와 일반적 마이크로센서구조인 감지막/절연막/히터의 구조를 갖는 센서의 열적거동을 비교 분석하였다.