• Title/Summary/Keyword: Particle-induced X-ray emission

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Characterization of Wintertime Atmospheric Aerosols in Seoul Using PIXE and Supplementary Analyzers

  • Ma, Chang-Jin;Mikio Kasahara;Hwang, Kyung-Chul;Yeo, Hyun-Gu;Park, Kum-Chan
    • Journal of Korean Society for Atmospheric Environment
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    • v.16 no.E
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    • pp.19-27
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    • 2000
  • Particle Induced X-ray Emission (PIXE) and Elemental Analysis Syztem (EAS) were applied to the investiga-tion of the Characteristics and sources of wintertime atmospheric aerosols in Seoul. Atmospheric aerosols were collected by both fine and coarse fractions using a two-stage filter pack sampler from Kon-Kuk university during the winter season of 1999. PIXE was applied to the analysis of the middle and heavy elements with atomic numbers greater than 14(Si) and EAS was applied to the measurement of the light elements such as H, C and N. The fact that 64.2% of mass of fine particles in Seoul consists of the light elements (N, C , and H) suggests that the measurement of light elements is extremely important. The average mass concentration is Seoul was 38.6$\mu\textrm{g}$m(sup)-3. Elements such as Ca, Fe, Mg, and Ti appeared to have very low Fine/Coarse ratios(0.1∼0.4), whereas che-mical components related to anthropogenic sources such as Br, V, Pb, and Zn were observed to accumulate in the fine fraction. In the Asian Dust Storm(ADS) event, the concentation of soil components increased dramatically. Reconstruction of the fine mass concentrations estimated by a newly revised simple model was fairly in good agreement with the measured ones. Source identification was attempted using the enrichment factor and Pearsons coefficient of correlation. The typical elements derived from each source could be classified by this method.

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PIXE Analysis for Elemental Analysis in Aerosol (PIXE 분석법을 이용한 대기분진 중 함유원소 분석)

  • Kim, Duk-Kyung;Choi, Han-Woo;Woo, Hyung-Joo;Kim, Young-Suk;Hong, Wan;Kim, Nak-Bae;Lee, Jin-Hong
    • Journal of Korean Society for Atmospheric Environment
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    • v.10 no.2
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    • pp.90-97
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    • 1994
  • PIXE( Proton Induced X- ray Emission ) analysis has been applied to the analysis of aerosol for the Purpose of pollution monitoring. Coarse and fine Particle fractions were sampled selectively, using Nuclepore filter in stacked filter units, once a month from February to September in 1993 at urban and rural sites. Concentration of 9 elements, Si, S, K, Ca, Mn, Fe, Cu, Zn and Pb was determined without Pretreatment of Samples. Comparison of data between urban and rural site revealed higher elemental concentration level in urban aerosol. From April to May aerosol sampling was carried out daily to observe the effect of Yellow Sand on the composition of aerosol in the Korean Peninsula. During the Yellow Sand period, Si, Ca, Fe content level in aerosol became more than 5 times higher than normal. The elemental concentration of the aerosol samples of Daejeon City was compared with that of two foreign cities. S and Pb( which are fuel- derived elements) levels in Daejeon City aerosol appeared to be lower than those of foreign cities. And it may be due to the leaded-fuel restriction policy of Korean government since 1987.

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Neutron-shielding behaviour investigations of some clay-materials

  • Olukotun, S.F.;Mann, Kulwinder Singh;Gbenu, S.T.;Ibitoye, F.I.;Oladejo, O.F.;Joshi, Amit;Tekin, H.O.;Sayyed, M.I.;Fasasi, M.K.;Balogun, F.A.;Korkut, Turgay
    • Nuclear Engineering and Technology
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    • v.51 no.5
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    • pp.1444-1450
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    • 2019
  • The fast-neutron shielding behaviour (FNSB) of two clay-materials (Ball clay and Kaolin)of Southwestern Nigeria ($7.49^{\circ}N$, $4.55^{\circ}E$) have been investigated using effective removal cross section, ${\Sigma}_R(cm^{-1})$, mass removal cross section, ${\Sigma}_{R/{\rho}}(cm^2g^{-1})$ and Mean free path, ${\lambda}$ (cm). These parameters decide neutron shielding behaviour of any material. A computer program - WinNC-Toolkit has been used for computation of these parameters. The toolkit evaluates these parameters by using elemental compositions and densities of samples. The proficiency of WinNC-Toolkit code was probe by using MCNPX and GEANT4 to model fast neutron transmission of the samples under narrow beam geometry, intending to represent the actual experimental setup. Direct calculation of effective removal cross section ($cm^{-1}$) of the samples was also carried out. The results from each of the methods for each types of the studied clay-materials (Ball clay and Kaolin) shows similar trend. The trend might be the fingerprint of water content retained in each of the samples being baked at different temperature. The compositions of each sample have been obtained by Particle-Induced X-ray Emission (PIXE) technique (Tandem Pelletron Accelerator: 1.7 MV, Model 5SDH). The FNSB of the selected clay-materials have been compared with standard concrete. The cognizance of various factors such as availability, thermo-chemical stability and water retaining ability by the clay-samples can be analyzed for efficacy of the material for their FNSB.

Plasma Etching Characteristics of Sapphire Substrate using $BCl_3$-based Inductively Coupled Plasma ($BCl_3$ 계열 유도결합 플라즈마를 이용한 사파이어 기판의 식각 특성)

  • Kim, Dong-Pyo;Woo, Jong-Chang;Um, Doo-Seng;Yang, Xue;Kim, Chang-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.363-363
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    • 2008
  • The development of dry etching process for sapphire wafer with plasma has been key issues for the opto-electric devices. The challenges are increasing control and obtaining low plasma induced-damage because an unwanted scattering of radiation is caused by the spatial disorder of pattern and variation of surface roughness. The plasma-induced damages during plasma etching process can be classified as impurity contamination of residual etch products or bonding disruption in lattice due to charged particle bombardment. Therefor, fine pattern technology with low damaged etching process and high etch rate are urgently needed. Until now, there are a lot of reports on the etching of sapphire wafer with using $Cl_2$/Ar, $BCl_3$/Ar, HBr/Ar and so on [1]. However, the etch behavior of sapphire wafer have investigated with variation of only one parameter while other parameters are fixed. In this study, we investigated the effect of pressure and other parameters on the etch rate and the selectivity. We selected $BCl_3$ as an etch ant because $BCl_3$ plasmas are widely used in etching process of oxide materials. In plasma, the $BCl_3$ molecule can be dissociated into B radical, $B^+$ ion, Cl radical and $Cl^+$ ion. However, the $BCl_3$ molecule can be dissociated into B radical or $B^+$ ion easier than Cl radical or $Cl^+$ ion. First, we evaluated the etch behaviors of sapphire wafer in $BCl_3$/additive gases (Ar, $N_2,Cl_2$) gases. The behavior of etch rate of sapphire substrate was monitored as a function of additive gas ratio to $BCl_3$ based plasma, total flow rate, r.f. power, d.c. bias under different pressures of 5 mTorr, 10 mTorr, 20 mTorr and 30 mTorr. The etch rates of sapphire wafer, $SiO_2$ and PR were measured with using alpha step surface profiler. In order to understand the changes of radicals, volume density of Cl, B radical and BCl molecule were investigated with optical emission spectroscopy (OES). The chemical states of $Al_2O_3$ thin films were studied with energy dispersive X-ray (EDX) and depth profile anlysis of auger electron spectroscopy (AES). The enhancement of sapphire substrate can be explained by the reactive ion etching mechanism with the competition of the formation of volatile $AlCl_3$, $Al_2Cl_6$ or $BOCl_3$ and the sputter effect by energetic ions.

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Simple one-step synthesis of carbon nanoparticles from aliphatic alcohols and n-hexane by stable solution plasma process

  • Park, Choon-Sang;Kum, Dae Sub;Kim, Jong Cheol;Shin, Jun-Goo;Kim, Hyun-Jin;Jung, Eun Young;Kim, Dong Ha;Kim, Daseulbi;Bae, Gyu Tae;Kim, Jae Young;Shin, Bhum Jae;Tae, Heung-Sik
    • Carbon letters
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    • v.28
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    • pp.31-37
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    • 2018
  • This paper examines a simple one-step and catalyst-free method for synthesizing carbon nanoparticles from aliphatic alcohols and n-hexane with linear molecule formations by using a stable solution plasma process with a bipolar pulse and an external resistor. When the external resistor is adopted, it is observed that the current spikes are dramatically decreased, which induced production of a more stable discharge. Six aliphatic linear alcohols (methanol-hexanol) containing carbon with oxygen sources are studied as possible precursors for the massive production of carbon nanoparticles. Additional study is also carried out with the use of n-hexane containing many carbons without an oxygen source in order to enhance the formation of carbon nanoparticles and to eliminate unwanted oxygen effects. The obtained carbon nanoparticles are characterized with field emission-scanning electron microscopy, energy dispersive X-ray spectroscopy, and Raman spectroscopy. The results show that with increasing carbon ratios in alcohol content, the synthesis rate of carbon nanoparticles is increased, whereas the size of the carbon nanoparticles is decreased. Moreover, the degree of graphitization of the carbon nanoparticles synthesized from 1-hexanol and n-hexane with a high carbon (C)/oxygen (O) ratio and low or no oxygen is observed to be greater than that of the carbon nanoparticles synthesized from the corresponding materials with a low C/O ratio.