• 제목/요약/키워드: Particle Contamination

검색결과 214건 처리시간 0.023초

젤라틴입자응집반응법을 이용한 국내 시판 고추종자의 Tobamovirus 검출 및 오염률 조사 (Detection of Tobamoviruses and Survey on Contamination Rate in Commercial Pepper Seeds Using Gelatin Particle Agglutination Test)

  • 한정헌;장태호;이철호;김영호;나용준
    • 식물병연구
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    • 제7권3호
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    • pp.170-174
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    • 2001
  • 시판고추 종자로부터 Tobamovirus를 검출하고 Tobamovirus 오염률을 조사하고자 gelatin particle agglutination test (GPAT)의 최적조건을 조사하였다. Gelatin 입자에 감작할 담배 모자이크 바이러스 고추 계통에 대한 ${\gamma}$-globulin G 의 최적농도는 100$\mu\textrm{g}$/$m\ell$이었고, GPAT의 바이러스 검출 감도는 효소면역항체법 및 dot immuno-binding assay와 유사하였으며, Tobamovirus 검출을 위한 종자시료의 최적 희석배수는 5배에서 25배였다. 그리고 최적화된 GPAT에 의한 국내시판 고추종자의 Tobamovirus 오염률은 평균 79.1%인 것으로 판명되었다.

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A Control Algorithm for Wafer Edge Exposure Process

  • Park, Hong-Lae;Joon Lyou
    • 제어로봇시스템학회:학술대회논문집
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    • 제어로봇시스템학회 2002년도 ICCAS
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    • pp.55.4-55
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    • 2002
  • In the semiconductor fabrication, particle contamination is wide-spread and one of major causes to yield loss. Extensive testing has revealed that even careful handling of wafers during processing may cause photo-resist materials to flake off wafer edges. So, to remove the photo-resist at the outer 5mm of wafers, UV(Ultraviolet) rays are exposed. WEE (Wafer Edge Exposure) process station is the system that exposes the wafer edge as prespecified by controlling the positioning mechanism and maintaining the light intensity level In this work, WEE process station has been designed so as to significantly lower the amount of particle contamination which occurs even during the most r...

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초청정 클린룸 난류유동장내에서의 오염입자 비정상 전파거동에 관한 연구 (Study on the Unsteady Contaminated Particle Transportation in the Flow Field for the Super Clean Room)

  • 오명도;임학규;배귀남
    • 대한기계학회논문집
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    • 제14권2호
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    • pp.430-439
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    • 1990
  • Steady state turbulent airflow and unsteady characteristics of generation, transportation, and recovery behavior of contaminate particles in the simplified 2 dimensional Vertical Laminar Flow (VLF) type clean room was numerically simulated using the low Reynolds number k-over bar.epsilon- turbulent model. Characteristics of airflow in VLF type clean room are greatly affected by the recirculation zone around working surface. The recirculation zone must be considered at the time of clean room design because the recirculation zone whose area increases with increment of inlet velocity exerts bad influence upon the performance of clean room in terms of particle contamination. The location of maximum particle concentration changes from the location of particle source to the recirculation zone, while averaged particle concentration is reduced exponentially with time. Recovery time of clean room with spontaneous particle generation source is inversely proportional to inlet velocity. We introduce nondimensionalized recovery time through the dimensional analysis, which can indicates the general performance of clean room with design structure change. It was identified that .tau. is independent of inlet velocity and background concentration. Therefore .tau. can be the simple factor to compare the different structure of clean room in terms of dynamic response to contamination and becomes larger with better structure of clean room.

반도체 제조용 사일렌 플라즈마 반응기 내에서의 입자 오염에 관한 이론적 연구 (Theoretical study on the particle contamination in silane plasma reactor for semiconductor processing)

  • 김동주;김교선
    • 한국진공학회지
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    • 제9권2호
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    • pp.172-178
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    • 2000
  • 반도체 제조공정 중 플라즈마 반응기 내에서 입자오염을 유발하는 입자들의 거동과 성장을 모델식을 사용하여 이론적으로 고찰하였다. 플라즈마 반응기 내에서 입자 거동에 영향을 미치는 힘들로 유체 대류, 입자 확산 및 외부힘 (ion drag force, electrostatic force, 중력) 등을 고려하였다. 플라즈마 벌크 영역에서 전하를 가진 입자들간의 충돌에 의한 입자 성장을 고려하기 위해 모델식에 입자 전하 분포를 고려하였다. 대부분의 입자들은 ion drag force와 electrostatic force가 균형을 이루고 있는 두 sheath 경계 영역에 존재하였으며 두 sheath 영역과 벌크 플라즈마에서의 입자 농도는 0에 접근하였다. 시간이 지남에 따라 입자 충돌로 인한 입자들의 크기는 증가하였으며 입자가 성장함에 따라 입자 표면적의 증가와 더불어 입자가 가지는 평균 전하량도 증가하였다.

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오염입자가 pico/nano-slider의 마찰 마모에 미치는 영향 (Effect of particulate contamination on the friction of wear of pico/nano-slider)

  • 윤의성
    • 한국윤활학회:학술대회논문집
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    • 한국윤활학회 2000년도 제31회 춘계학술대회
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    • pp.24-33
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    • 2000
  • The effect of particulate contamination on friction and wear between a negative-pressure picoslider / tri-pad nanoslider and laser-textured disk was studied. Particles of different concentration were injected at the head-disk interface consisting of disks with various textures and slider types at different speed. Durability increased and coefficient of friction decreased as the disk speed increased in a contaminated environment. Frictional characteristics and durability in the data zone were better for those of the laser-textured zone. It was also found that durability of head-disk interface (HDI)decreased as the particle concentration increased. The interface durability with a picoslider was better than that with a nanoslider at any condition in a contaminated environment. Based on the test results, mechanisms were proposed to explain the reasons why durability with a picoslider was superior to that with a nanoslider.

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오염입자가 pico/nano-slider의 마찰 마모에 미치는 영향 (Effect of Particulate Contamination on the Friction and Wear of Pico/Nano-Slider)

  • 윤의성
    • Tribology and Lubricants
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    • 제16권6호
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    • pp.469-476
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    • 2000
  • The effect of particulate contamination on the friction and wear between a negative-pressure picoslider/tri-pad nanoslider and laser-textured disk was studied. Particles of different concentration were injected at the head-disk interface consisting of disks with various textures and slider types at different speed. Durability increased and coefficient of friction decreased as the disk speed increased in a contaminated environment. Frictional characteristics and durability in the data Bone were better than those in the laser-textured zone. It was also found that durability of head-disk interface (HDI) decreased as the particle concentration increased. The interface durability with a picoslider was better than that with a nanoslider at any condition in a contaminated environment. Based on the test results, mechanisms were proposed to explain the reasons why durability with a picoslider was superior to that with a nanoslider.

오염입자가 Picoslider의 헤드-디스크 인테페이스 마찰 마모에 미치는 영향 (Effect of Particulate Contamination on the Friction and Wear of Head-Disk Interface with Picoslider)

  • 윤의성
    • Tribology and Lubricants
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    • 제16권5호
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    • pp.395-402
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    • 2000
  • The effect of particulate contamination on friction and wear between a negative-pressure picoslider and a laser-textured disk was studied. Particles of different concentrations, materials and sizes were injected to the head-disk interface (HDI), consisting of disks with various textures, at the same speed. In a contaminated environment, durability of head-disk interface gradually decreased as the particle concentration increased. Large particles caused HDI failure early and resulted in an extensive damage to the slider and disk surfaces. Hard particles also caused HDI failure earlier and damages more extensive than soft ones. Based on the test results, mechanisms of HDI failure with picoslider were presented.

반도체 세정 공정 평가를 위한 나노입자 안착 시스템 개발 (Development of Particle Deposition System for Cleaning Process Evaluation in Semiconductor Fabrication)

  • 남경탁;김영길;김호중;김태성
    • 반도체디스플레이기술학회지
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    • 제6권4호
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    • pp.49-52
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    • 2007
  • As the minimum feature size decrease, control of contamination by nanoparticles is getting more attention in semiconductor process. Cleaning technology which removes nanoparticles is essential to increase yield. A reference wafer on which particles with known size and number are deposited is needed to evaluate the cleaning process. We simulated particle trajectories in the chamber by using FLUENT. Charged monodisperse particles are generated using SMPS (Scanning Mobility Particle Sizer) and deposited on the wafer by electrostatic force. The Experimental results agreed with the simulation results well. We calculate the particles loss in pipe flow theoretically and compare with the experimental results.

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헤드/디스크 인터페이스 내에서 오염 입자의 거동에 관한 수치적 연구 (Numerical Investigation of Contamination Particle's Trajectory in a Head/slider Disk Interface)

  • 박희성;황정호;좌성훈
    • 대한기계학회논문집B
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    • 제24권3호
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    • pp.477-484
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    • 2000
  • Microcontamination caused by particle deposition on the head disk interface threatens the reliability of hard disk drive. Design of slider rail to control contamination becomes an important issue in magnetic recording. In this paper, how particles adhere to the slider and the disk is examined. To investigate accumulation mechanism of the particles, trajectory of the particles in a slider/disk interface is simulated with considering various forces including drag force, gravitational force, Saffman lift force, and electrostatic force. It is found that the charged particles can easily adhere to the slider or disk surface, if an electric field exists between the slider and the disk. It is supposed that the vertical motion of the particles should be related with not only Saffman force but also electrostatic force.

인공위성의 오염 측정, 분석 및 관리 (Contamination measurement, Analysis & Control for Satellite)

  • 이상훈;홍석종;조혁진;서희준;문귀원
    • 항공우주기술
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    • 제9권2호
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    • pp.116-122
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    • 2010
  • 우주환경에서 임무를 수행하는 인공위성의 경우, 조립, 시험, 운용시점까지 위성 표면에 흡착되는 오염물질을 최소화하기 위하여 전 기간 동안 세심한 주의를 기울여야 한다. 위성표면에 흡착된 미세한 오염물질은, 고진공 및 고온, 극저온이 반복되는 가혹한 우주환경 속에서 위성의 성능저하 및 효율의 손실을 가져올 수 있다. 예를 들어 위성 표면에 떨어진 입자오염은 별 추적장치의 오류를 발생시킴에 따른 위성 자세제어의 실패를 가져올 수도 있고, 표면에 흡착된 분자오염은 렌즈, 미러, 윈도우 등의 광학기기 및 주요 민감 표면에 작용하여 광학적 특성과 열제어 성능의 저하를 가져올 수 있다. 위성의 조립 및 시험을 관장하는 한국항공우주연구원에서는 위성의 오염물질에 대한 노출을 최소화하기 위해, 오염측정이 이루어지는 청정실을 운용하고 있는데, 본 논문에서는 청정실 및 진공챔버 내의 부유입자측정, 표면입자오염측정, 표면분자오염측정법을 소개하고 오염측정 결과에 대한 분석을 수행하였다.