Effects of changing the oxygen partial pressure in cooling after deposition of PZT thin films by reactive sputtering (Reactive sputtering법에 의한 PZT 박막 증착후 냉각시 산소분압의 영향에 관한 연구)
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- Journal of the Korean Crystal Growth and Crystal Technology
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- v.6 no.3
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- pp.406-414
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- 1996