• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.11 no.6
• /
• pp.458-464
• /
• 1998

This paper gives characterization of substrate and PZT(53/47) thin film deposited by metalorganic decomposition, which is concerned in deposition process and device fabrication process, to fabricate micro electro mechanical system (MEMS) device with piezoelectric material. The PZT thin films deposited by MOD at 700^{\circ}C$ for 30 minutes had a polycrystallinity, that is, no substrate dependence, while different interface were developed depending on the bottom electrodes. Such a structural variation could influence on not only the properties of the PZT film but also etching process for fabricating MEMS devices. Therefore the electrode structure is a very important factor in the deposition of the PZT film during etching process by HF acid for MEMS device with piezoelectric material. Piezoelectric coefficients of the PZT films on the different substrates were 40 and 80 pm/V at an applied voltage of 4V. Based in these results, it was possible for deposition of the PZT film by MOD to apply MEMS device fabrication process based on piezoelectricity after selection of proper bottom electrode.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2000.07a
• /
• pp.39-42
• /
• 2000

The effect of excess Pb contents on the etching of PZT thin films and their electrical properties has been investigated. Ferroelectric PZT(53/47) thin films were prepared by the metal alkoxide-based Sol-Gel method, in which they were spin-coating on P7Ti/Si02/Si substrate using the PZT(53/47) stock solutions with various excess Pb contents. Etching of PZT film was performed using planar inductively coupled Ar/Cl$_2$/BCl$_3$ plasma. The etch rate of PZT film was 2450 $\AA$/min at Ar(20)/BCl$_3$(80) gas mixing ratio and substrate temperature of 8$0^{\circ}C$.

• Particle and aerosol research
• /
• v.4 no.1
• /
• pp.21-25
• /
• 2008

$Pb(Zr_{0.53}Ti_{0.47})O_3$ (PZT) was synthesized by a multiple wet dry process. Precipitates prepared from reaction between $ZrOCl_2{\cdot}8H_2O$ and $TiOCl_2$ and $NH_4OH$ in an aqueous solution was dried at $100^{\circ}C$, and calcined at $500^{\circ}C$ and $700^{\circ}C$. The mixture mixed with PbO and as-dried or calcined $Zr_{0.53}Ti_{0.47}O_4$ (ZT) powders was calcined again at 700 and $800^{\circ}C$. Well crystallized ZT and PZT were formed at even $700^{\circ}C$. PZT piezoelectric ceramics of more than 98.5% in a relative density was obtained by sintering at as low as $900^{\circ}C$.

• Journal of the Korean Ceramic Society
• /
• v.39 no.8
• /
• pp.742-749
• /
• 2002

The PZT thin films werre deposited on Pt/Ti/$SiO_2$/Si substrate by R. F. magnetron sputtering with $Pb_{1.1}Zr_{0.53}Ti_{0.47}O_3$ target. When interlayers(PbO, $TiO_2$, PbO/$TiO_2$) were inserted between PZT and Pt, the crystallization of the PZT thin films was considerably improved and the processing temperature was lowered. Compared to the pure PZT thin films, dielectric constant, dielectric loss and polarization properties of PZT thin films with interlayers were considerably improved. From XPS depth profile analysis, it was confirmed that PZT thin films and interlayers existed independently. In particular, PZT thin films deposited on interlayer(PbO/$TiO_2$) showed the best dielectric property (${\varepsilon}_r$=414.94, tan${\delta}$=0.0241, Pr=22${\mu}C/cm^2$).

• Korean Journal of Materials Research
• /
• v.9 no.12
• /
• pp.1181-1187
• /
• 1999

PZT(53/47) precursor 1M sols were prepared using a diol based Sol-Gel process, and thin films were deposited by spin coating onto Pt/Ti/$SiO_2$/Si substrates. With a single coating, final film thickness of aproximately 0.9${\mu}m $ was achieved from diol-based PZT sol. Since PZT crystallized in a ferroelectric perovskite phase from an intermediate nonferroelectric pyrochlore phase, the effects of the presence of perovskite PZT seeds on the phase transformation of PZT were investigated. Seeded PZT films were prepared from the seeded PZT 1M sols in which seeds with less than 0.2${\mu}m $ in size and 1wt% were dispersed in n-propanol before mixing with the PZT stock solution. The seeding effects were confirmed by the fact that the formation temperature of perovskite phase decreased by 50$^{\circ}C$ with less than 1wt% seeds.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2003.07b
• /
• pp.641-643
• /
• 2003

The ferroelectric properties of PZT(53/47) thin film was investigated by methoxy enthanol solution based on sol-gel method. The thickness of each layer by spincoating 0.25M sol at one time was $0.1{\mu}m$ and crack-free film was formed. $LaNiO_3/Si(100)$ electrode and $Pt/Ti/SiO_2/Si(100)$ electrode was coated by PZT sol at several times. PZT orientation was confirmed as a method of XRD and coercive field(Ec) as well as remnant polarization(Pr) was investigated from hysterisis curve. As a result of XRD analysis, we can know that the orientation of on PZT/LNO/Si(100) is better than on $Pt/Ti/SiO_2/Si(100)$. The remnant polarization(Pr) in LNO electrode was $87.5{\mu}C/cm^2$ and $39.8{\mu}C/cm^2$ in Pt. From this figures, it is investigated that the Pr in LNO electrode was better than in Pt.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.14 no.11
• /
• pp.904-911
• /
• 2001

High-density lead zirconate titanate(Pb(Zr$\_$0.53/Ti$\_$0.47/)O$_3$, PZT) ceramics were fabricated by a new milling-precipitation(MP) process improved from the conventional solid state process. This process was progressed by a milling impregnation through mixing ZrO$_2$ and TiO$_2$ powders with lead nitrate(Pb(NO$_3$)$_2$) water solution in zirconia ball media, and then milling precipitation was induced from precipitation of PbC$_2$O$_4$ by adding ammonium of oxalate monohydrate((NH$_4$)$_2$C$_2$O$_4$$.$H$_2$O) as a precipitant. As a result of this process, single-phase perovskite structure was formed at the calcination temperature of 750$\^{C}$ for Pb(Zr$\_$0.53/Ti$\_$0.47/)O$_3$ powders. In addition, the highest density at the sintering temperature of 1100$\^{C}$ was obtained, because of the highly sinterable PZT Powders ground through the re-milling process. Piezoelectric and dielectric properties of sintered sample were improved by MP process.

• Journal of the Korean Ceramic Society
• /
• v.42 no.2 s.273
• /
• pp.104-109
• /
• 2005

To study the role of PbO as the buffer layer, Pt/PZT/PbO/Si with the MFIS structure was deposited on the p-type (100) Si substrate by the r.f. magnetron sputtering with $Pb_{1.1}Zr_{0.53}Ti_{0.47}O_3$ and PbO targets. When PbO buffer layer was inserted between the PZT thin film and the Si substrate, the crystallization of the PZT thin films was considerably improved and the processing temperature was lowered. From the result of an X-ray Photoelectron Spectroscopy (XPS) depth profile result, we could confirm that the substrate temperature for the layer of PbO affects the chemical states of the interface between the PbO buffer layer and the Si substrate, which results in the inter-diffusion of Pb. The MFIS with the PbO buffer layer show the improved electric properties including the high memory window and low leakage current density. In particular, the maximum value of the memory window is 2.0V under the applied voltage of 9V for the Pt/PZT(200 nm, $400^{\circ}C)/PbO(80 nm)/Si$ structures with the PbO buffer layer deposited at the substrate temperature of $300^{\circ}C$.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.27 no.1
• /
• pp.27-32
• /
• 2014

In this paper, PZT piezoelectric ceramic specimens with 4 compositions (Zr/Ti=50/50, 53/47, 56/44, 58/42) in $Pb(Zr,Ti)O_3$ system were fabricated. We studied effects of poling strength and thermal aging on the temperature characteristics of eletromechanical coupling factor k31 of the specimens, which were poled with the DC electric fields, 1.5, 2.5 and 3.5 kV/mm respectively and thermally aged for an hour at $200^{\circ}C$. The eletromechanical coupling factor k31 of the specimen with the composition Zr/Ti= 53/47, nearest to the morphotropic phase boundary decreased the most greatly, irrelevant to the intensity of poling field, due to 1st thermal aging. And the temperature coefficient of eletromechanical coupling factor k31 was (-) in the tetragonal phase composition and (+) in the rhombohedral phase composition, which is reverse in the temperature coefficient of resonance frequency. It is interesting that eletromechanical coupling factor k31 of PZT ceramics is shown to be able to increase as temperature increase in the interval $-20{\sim}80^{\circ}C$.

• Electrical & Electronic Materials
• /
• v.6 no.5
• /
• pp.436-445
• /
• 1993

2단계하소법에 의해 낮은 하소온도에서 미세하고도 균일한 PZT분말을 합성하였다. 우선 Zr $O_{2}$와 Ti $O_{2}$ 혼합분말을 1차하소하여 (Z $r_{0.53}$ $Ti_{0.47}$) $O_{3}$(ZTO) 분말을 합성하고 이 ZTO 고용분말에 PbO와 N $b_{2}$ $O_{5}$을 혼합한 후 650-800.deg.C에서 2시간 하소하여 PZT 분말을 합성하였는데 얻어진 분말은 고상반응법에 비해 미세할 뿐만 아니라 XRD 분석결과 710.deg.C의 낮은 하소온도에서도 PZT 단일상을 나타내었다. 2단계하소법에 의해 하소온도를 낮출 수 있는 주된 이유로는 고상반응법에서는 중간생성물인 PbTi $O_{3}$상의 생성이 수반됨으로 850.deg.C 이상 되어야만 안전한 PZT가 생성될 수 있는 점을 들 수 있다. 또 2단계하소법에 의하면 950.deg.C이하의 낮은 소결온도에서도 치밀화가 미루어지는 소결이 가능함을 알 수 있었는데 이와같이 소결온도를 낮출 수 있는 것은 고상반응법에 비해 미세한 PZT 분말을 사용하였기 때문이라 풀이된다.이된다.