• 제목/요약/키워드: PMMA film

검색결과 188건 처리시간 0.023초

Performance improvement in bottom-contact pentacene organic thin-film transistors by the PMMA layer insertion

  • Lyoo, Ki-Hyun;Kim, Byeong-Ju;Lee, Cheon-An;Jung, Keum-Dong;Park, Dong-Wook;Park, Byung-Gook;Lee, Jong-Duk
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.1139-1141
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    • 2006
  • For the bottom-contact pentacene organic thin-film transistors (OTFTs), the insertion of a thin PMMA layer $(20{\AA})$ between the pentacene and the electrode improves the electrical performances, such as carrier mobility and on-current magnitude, about 4 times larger than those of the devices without the PMMA. The performance enhancement is presumably due to the decreased contact resistance between metal and pentacene by inserting the thin PMMA layer.

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PMMA 판재의 제조 및 기계적 특성 (Preparation and Mechanical Properties of PMMA Panels)

  • 길기승;김의식;김대수
    • 폴리머
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    • 제27권2호
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    • pp.142-151
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    • 2003
  • PMMA 판재를 생산하기 위한 두 가지 형태의 방법이 있는 데 셀 주형 방법과 벨트 주형 방법이다. 그러나 이 방법들은 생산성이나 생산 단가 면에서 각각의 단점을 갖고 있다. 그러므로 고분자 가공연구자들은 플라스틱 필름을 주형으로 이용하여 PMMA 판재를 생산하는 새로운 가공 방법기 개발에 많은 관심을 갖게 되었는데 그 이유는 이러한 새로운 가공 방법이 벨트 주형 방법의 생산 단가를 낮출 수 있을 뿐만 아니라 셀 주형 방법의 생산성을 향상시킬 수 있기 때문이다. 그러한 새로운 주형 방법의 개발에 대한 하나의 해결책을 주기 위하여 본 연구에서는 MMA 배합물의 조성 및 경화 조건 PMMA 판재의 가공성 및 기계적 강도에 미치는 영향을 조사하였다. 폴리(비닐 아세테이트) 필름이 PMMA 판재의 생산을 위한 플라스틱 필름 주형으로 사용되었다. 우수한 가공성 및 경화 후 우수한 기계적 특성을 나타내는 MMA 배합물을 결정하기 위하여 성분 및 그들의 조성이 단계적으로 최적화 되었다. 결합제 및 개질제로 작용하는 아크릴산이 PMMA 판재의 기계적 특성의 향상에 중요한 역할을 하는 것으로 나타났다.

Contribution of light in high-energy film dosimetry using water substitute phantoms

  • Fujisaki, Tatsuya;Saitoh, Hidetoshi;Hiraoka, Takeshi;Kuwabara, Akio;Abe, Shinji;Inada, Tetsuo
    • 한국의학물리학회:학술대회논문집
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    • 한국의학물리학회 2002년도 Proceedings
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    • pp.272-274
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    • 2002
  • The contribution of light in high-energy film dosimetry was examined using six commercially available solid water substitute phantoms. As six commercially available phantoms; RMI-451, Mix-DP, WE211, WE211-Black, PMMA and PMMA Black were evaluated in this study. It is difficult to evaluate the contribution of Cerenkov radiation and the optical permeability to the relative and/or absolute dosimetry using unpacked film in these phantoms. Therefore the contribution of Cerenkov radiation was estimated by the comparison between film densities in the shielded side (shutting off the light) and unshielded sides on a phantom. The effect of optical permeability was measured under ambient light by the time scale method. The results suggest that the use of black colored phantoms may improve the accuracy of dose measurement in film dosimetry.

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PMMA 입자특성과 광확산필름의 광특성과의 상관관계에 관한 실험적 연구 (Effect of PMMA Particle Characteristics on Optical Diffusion Films)

  • 우종표;홍진호;안치희;김윤재
    • 한국응용과학기술학회지
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    • 제20권4호
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    • pp.332-340
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    • 2003
  • Crosslinked poly(methyl methacrylate) particles from 2.4 to $8.1{\mu}m$ in diameter were prepared by homogenized suspension polymerization. The effect of polymerization parameters such as homogenizing speed, homogenizing time and stabilizer concentration on the particle size were examined. Optical diffusion films were prepared with the crosslinked poly(methyl methacrylate) particles. The effect of film thickness, particle size, and particle size distribution on transmittance and haze of optical diffusion film was examined. Transmittance of optical diffusion film increased with increasing particle size and decreasing film thickness. Haze increased with increasing film thickness and decreasing particle size. We also found the existence of an optimum ratio for optical performance when the mixture of small particle and large particle was used.

The improvement of Cu metal film adhesion on polymer substrate by the low-power High-frequency ion thruster

  • Jung Cho;Elena Kralkina;Yoon, Ki-Hyun;Koh, Seok-Keun
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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    • pp.60-60
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    • 2000
  • The adhesion interface formation between copper and poly(ethylene terephthalate)(PET), poly(methyl methacrylate)(PMMA) and Polyimide films was treated using Ion assisted reaction system to sequential sputter deposition by High-Frequency ion source. The ion beam modification system used a new type of low power HF ion thruster for space application as new low thruster electric propulsion system. Low power HF ion thruster with diameter 100mm gives the opportunity to obtain beams of Ar+ with currents 20~150 mA (current density 0.5~3.5 mA/cm2) and energy 200~2500eV at HF power level 10~150 W. Using Ar as a working gas it is possible to obtain thrust within 3~8 mN. Contact angles for untreated films were over 95$^{\circ}$ and 80 for Pet, 10o for PMMA and 12o for PI samples as a condition of ion assisted reaction at the ion dose of 10$\times$1016 ions/cm2, the ion beam potential of 1.2 keV and 4 ml/min for environmental gas flow rate. 900o peel tests yielded values of 15 to 35 for PET, 18 to 40 and 12 to 36 g/min. respectively. High resolution X-ray photoelectron spectrocopy is the Cls region for Cu metal on these polymer substrates showed increases in C=O-O groups for polymide, whereas PET and PMMA treated samples showed only C=O groups with increase the ion dose. Finally, unstable polymer surface can be changed from hydrophobic to hydrophilic formation such as C-O and C=O that were confirmed by the XPS analysis, conclusionally, the ion assisted reaction is very effective tools to attach reactive ion species to form functional groups on C-C bond chains of PET, PMMA and PI.

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Monte Carlo 수치해석법을 이용한 PMMA resist에서의 저 에너지 전자빔 투과 깊이에 관한 연구 (Research on the penetration depth of low-energy electron beam in the PMMA-resist film using Monte Carlo numerical analysis)

  • 안승준;안성준;김호섭
    • 한국산학기술학회논문지
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    • 제8권4호
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    • pp.743-747
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    • 2007
  • 반도체 소자 제작에 있어서 회로의 pattern 형성에 이용하는 차세대 lithography 공정 기술을 위해서 전자빔 lithography 공정 기술 연구가 진행되고 있다. 본 연구에서는 Gauss 해석법과 Monte Carlo의 수치해석법을 사용하여 두께 100 nm의 PMMA (poly-methyl-methacrylate) resist에 전자 $1{\times}10^4$를 입사시키고, 입사 전자빔 에너지에 따른 PMMA 내에서의 투과 깊이를 비교하였다. 전자빔 에너지의 크기는 100eV, 300eV, 500eV, 700eV, 그리고 1000eV에 대하여 simulation을 실시하였다.

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핫엠보싱 공정에서 PMMA의 마이크로/나노 레올로지 특성 (Micro/Nano Rheological Characteristics of PMMA in Hot Embossing Process)

  • 김병희;김광순;반준호;신재구;김헌영
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2004년도 춘계학술대회 논문집
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    • pp.259-264
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    • 2004
  • The hot embossing process as a method for the fabrication of polymer is becoming increasingly important because of its simple process, low cost, high replication fidelity and relatively high throughput. In this paper, we carried out experimental studies and numerical simulations in order to understand the viscous flow of polymer film during hot embossing process. As the initial step of quantitating the hot embossing process, simple parametric studies for the embossing conditions have been carried out using high resolution masters which patterned by DRIE process. Under different embossing times and pressures, the viscous flow of PMMA films into micro/nano cavities has been investigated. Also, the viscous flow during the hot embossing process has been simulated by the continuum based FDM analysis considering micro/nano effect, such as surface tension and contact angle.

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PMMA 보호막을 이용한 용액 공정 기반의 인듐-이티륨-산화물 트랜지스터에 관한 연구 (Study on Solution Processed Indium-Yttrium-Oxide Thin-Film Transistors Using Poly (Methyl Methacrylate) Passivation Layer)

  • 김한상;김성진
    • 한국전기전자재료학회논문지
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    • 제30권7호
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    • pp.413-416
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    • 2017
  • We investigated solution-processed indium-yttrium-oxide (IYO) TFTs using apoly (methyl methacrylate) (PMMA) passivation layer. The IYO semiconductor solution was prepared with 0.1 M indium nitrate hydrate and 0.1 M yttrium acetate dehydrate as precursor solutions. The solution-processed IYO TFTs showed good performance: field-effect mobility of $13.13cm^2/Vs$, a threshold voltage of 8.2 V, a subthreshold slope of 0.93 V/dec, and a current on-to-off ratio of $7.2{\times}10^6$. Moreover, the PMMA passivation layers used to protectthe IYO active layer of the TFTs, did so without deteriorating their performance under ambient conditions; their operational stability and electrical properties also improved by decreasing leakage current.

푸리에변환 적외선분광분석법에 의한 누설전류의 발생 원인에 대한 연구 (Study on the Generation of Leakage Current by the Fourier Transform Infrared Analysis)

  • 오데레사
    • 한국전기전자재료학회논문지
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    • 제20권6호
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    • pp.514-519
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    • 2007
  • The surfaces of $SiO_2$ films were treated by PMMA diluted solutions, and analyzed the chemical shift from Fourier Transform Infrared Spectrometer. The $SiO_2$ film treated by PMMA diluted solution changed the properties of the surface, and showed the blue and red shift according to the concentration of PMMA. The C-H bond elongation effect due to the high electro-negative atom chlorine showed the red shift, and makes the final material with the cross-link structure. The leakage current was efficiently reduced at the sample No 7 with the red shift, witch depends on the electron deficient group.

Effect of self-assembled monolayer and aluminum oxide ALD film on a PMMA substrate

  • Shin, Sora;Park, Jongwan
    • Journal of Ceramic Processing Research
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    • 제19권6호
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    • pp.525-529
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    • 2018
  • The antireflective (AR) coated poly methyl methacrylate (PMMA) substrate was deposited by atomic layer deposition (ALD) on a self-assembled monolayer (SAM) to improve hydrophobicity and mechano-chemical properties of organic thin films. The water contact angles (WCA) were tested to characterize the surface wettability of SAM octadecyltrichlorosilane (OTS) films. Results showed that a contact angle of $105.9^{\circ}$ was obtained for the SAM films with an annealing process, and the highest WCA of $120^{\circ}$ was achieved for the films prepared by the SAM and ALD multi-process. The surface morphology of the SAM films with different assembly times and varying number of ALD cycles was obtained by atomic force microscopy (AFM). The maximum light transmittance for the SAM films on the PMMA substrate reached 99.9% at a wavelength of 450 nm. It was found that the SAM surfaces were not affected at all by the ALD process.