• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2003년도 추계학술대회논문집
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• pp.89-92
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• 2003

Nano-scratch tests were performed on PMMA thin films spin-coated on a Si substrate using an atomic force microscopy (AFM) with loads ranging from 10nN to 100nN. At low applied loads, a ridge pattern was formed on the PMMA surface. No wear particles were observed during the pattern-forming mild wear. At high applied loads, severe wear occurred accompanied by wear particles. The film with the highest hardness showed the highest wear resistance. Friction force generated during the Scratching was closely related with surface deformation of the film.

• 마이크로전자및패키징학회지
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• 제16권4호
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• pp.17-22
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• 2009

Two different organic-inorganic hybrid thin film transistors (OITFTs) with the structures of glass/ITO/ZnO/PMMA/Al (staggered structure) and glass/ITO/PMMA/ZnO/Al (inverted staggered structure), were fabricated and their electrical and structural properties were compared. The ZnO thin films used as active channel layers were deposited by the atomic layer deposition (ALD) method at a temperature of $100^{\circ}C$. To investigate the effect of the substrates on their properties, the ZnO films were deposited on bare glass, PMMA/glass and ITO/glass substrates and their crystal properties and surface morphologies were analyzed. The structural properties of the ZnO films varied with the substrate conditions. The ZnO film deposited on the ITO/glass substrate showed better crystallinity and morphologies, such as a higher preferred c-axis orientation, lower FWHM value and larger particle size compared with the one deposited on the PMMA/glass substrate. The field effect mobility ($\mu$), threshold voltage ($V_T$) and $I_{on/off}$ switching ratio for the OITFT with the staggered structure were about $0.61\;cm^2/V{\cdot}s$, 5.5 V and $10^2$, whereas those of the OITFT with the inverted staggered structure were found to be $0.31\;cm^2/V{\cdot}s$, 6.8 V and 10, respectively. The improved electrical properties for the staggered OITFTs may originate from the improved crystal properties and larger particle size of the ZnO active layer.

• 한국기계가공학회지
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• 제17권3호
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• pp.51-58
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• 2018

In this paper, the organic material Poly(methyl methacrylate) PMMA is used with inorganic $Al_2O_3$ to fabricate organic-inorganic multilayer barrier thin films. The organic thin films are developed using a roll-to-roll electrohydrodynamic atomization system, whereas the inorganic are grown using a roll-to-roll low-temperature atmospheric pressure atomic layer deposition system. For the first time, these two technologies are used together to develop organic-inorganic multilayer barrier thin films in atmospheric condition. The films are grown under optimized parameters and classified into three classes based on the layer structures, when the total thickness of the barrier is maintained at ~ 160 nm. All classes of barriers show good morphological, optical and chemical properties. The $Al_2O_3$ films with a low average arithmetic roughness of 1.58 nm conceal the non-uniformity and irregularities in PMMA thin films with a roughness of 5.20 nm. All classes of barriers show a notably good optical transmission of ~ 85 %. The hybrid organic-inorganic barriers show water vapor and oxygen permeation in the range of ${\sim}3.2{\times}10^{-2}g/m^2/day$ and $0.015cc/m^2/day$ at $23^{\circ}C$ and 100% relative humidity. It has been confirmed that it can be mass-produced and used as a low-cost barrier thin film in various printing electronic devices.

• 한국광학회지
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• 제7권4호
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• pp.357-362
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• 1996

스핀 코팅으로 제작한 MNA/PMMA 고분자박막의 두께 및 굴절율과 소광계수를 결정하였다. 타원해석 스펙트럼을 분석하여 박막의 두께 및 투과영역에서의 굴절율을 결정하고 광흡수 스펙트럼으로부터 흡수영역에서의 소광계수 스펙트럼을 역방계산하였다. 이 소광계수 스펙트럼을 가장 잘 나타내는 고전적 Lorentz 진동자 상수들과 양자역학적 진동자 상수들을 각각 구하고 이들 진동자에 의한 복소굴절율 스펙트럼들을 비교하였다. 이 방법은 대부분의 고분자박막의 두께 및 굴절율과 소광계수 스펙트럼을 구하는데 적용될 수 있으며 고분자박막의 광학적 특성을 규정짓는데 매우 유용하게 사용될 수 있겠다.

• 한국정보통신학회논문지
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• 제14권9호
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• pp.2065-2070
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• 2010

유기박막 반도체 소자에서 주로 보호막으로 사용되는 PMMA 코팅 박막의 특성에 대하여 FTIR 분석법을 이용하여 조사하였다. 희석된 PMMA 혼합액은 비율에 따라서 $SiO_2$ 박막의 표면을 친수성, 소수성 혹은 하이브리드 특성으로 변화시켰다. FTIR 분석에 의하여 탄소의 함량이 적은 샘플 7에서 화학적인 변화가 크게 일어나는 것을 확인하였다. 전자를 많이 포함한 소량의 탄소가 $SiO_2$ 박막의 분극성을 감소시키고 박막의 표면에너지를 감소시켜서 화학적으로 안정된 박막의 표면을 형성하여 누설전류가 감소되었다. FTIR 분석은 유기화합물 박막에서 일어나는 화학적 변화에 대하여 미세한 부분까지 측정할 수 있는 척도로서 유용한 분석 방법임을 확인하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1997년도 추계학술대회 논문집
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• pp.262-265
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• 1997

Various polymeric electrolytes were prepared from PEG, PEO and PMMA with LiClO$_4$ to develop lithium conductive electrolytes for smart windows. The complementary electrochromic devices were fabricated with these electrolytes involving cathodically coloring WO$_3$ and anodically coloring V$_2$O$\sub$5/ thin films. The performance of electrochromic device with PMMA/LiCLO$_4$ electrolyte was found to be excellent

• 한국고분자학회:학술대회논문집
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• 한국고분자학회 2006년도 IUPAC International Symposium on Advanced Polymers for Emerging Technologies
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• pp.81-82
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• 2006

In this study, the applications of the block copolymer thin films are introduced. For this purpose, we first obtained cylindrical nanodomains in polystyrene-block-poly(methyl methacrylate) copolymer perpendicularly oriented to a substrate. Then, nanoporous templates were prepared after removing the PMMA nanodomains by UV treatment. By using electropolymerization, high density nanowire arrays of conducting polymer of poly(pyrrole) and poly( 3-hexyl thiopene) were obtained and their electric properties were measured. Also, these nanoporous thin films were found to be very useful for the separation of human Rhinovirus type 14 (HRV 14), major pathogen of a common cold in humans, from the buffer solution.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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• pp.60-60
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• 2000

The adhesion interface formation between copper and poly(ethylene terephthalate)(PET), poly(methyl methacrylate)(PMMA) and Polyimide films was treated using Ion assisted reaction system to sequential sputter deposition by High-Frequency ion source. The ion beam modification system used a new type of low power HF ion thruster for space application as new low thruster electric propulsion system. Low power HF ion thruster with diameter 100mm gives the opportunity to obtain beams of Ar+ with currents 20~150 mA (current density 0.5~3.5 mA/cm2) and energy 200~2500eV at HF power level 10~150 W. Using Ar as a working gas it is possible to obtain thrust within 3~8 mN. Contact angles for untreated films were over 95$^{\circ}$ and 80 for Pet, 10o for PMMA and 12o for PI samples as a condition of ion assisted reaction at the ion dose of 10$\times$1016 ions/cm2, the ion beam potential of 1.2 keV and 4 ml/min for environmental gas flow rate. 900o peel tests yielded values of 15 to 35 for PET, 18 to 40 and 12 to 36 g/min. respectively. High resolution X-ray photoelectron spectrocopy is the Cls region for Cu metal on these polymer substrates showed increases in C=O-O groups for polymide, whereas PET and PMMA treated samples showed only C=O groups with increase the ion dose. Finally, unstable polymer surface can be changed from hydrophobic to hydrophilic formation such as C-O and C=O that were confirmed by the XPS analysis, conclusionally, the ion assisted reaction is very effective tools to attach reactive ion species to form functional groups on C-C bond chains of PET, PMMA and PI.

• 한국고분자학회:학술대회논문집
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• 한국고분자학회 2006년도 IUPAC International Symposium on Advanced Polymers for Emerging Technologies
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• pp.300-300
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• 2006

Nondestructive nanostructural analysis is indispensable in the development of nano-materials and nano-fabrication processes for use in nanotechnology applications. In this paper, we demonstrate for the first time a quantitative, nondestructive analysis of nanostructured thin films supported on substrates and their templated nanopores by using grazing incidence X-ray scattering and data analysis with a derived scattering theory. Our analysis disclosed that vertically oriented nanodomain cylinders had formed in 20-100 nm thick films supported on substrates consisting of a mixture of poly(styrene-b-methyl methacrylate) (PS-b-PMMA) and PMMA homopolymer, and that the PMMA nanodomains were selectively etched out by ultraviolet light exposure and a subsequent rinse with acetic acid, resulting in a structure consisting of hexagonally packed cylindrical nanopores.

• 대한전기학회논문지
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• 제43권5호
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• pp.802-808
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• 1994

The purpose of this paper is to describe an application of plasma polymerized thin film as an electron beam resist. Plasma polymerized thin film was prepared using an interelectrode capacitively coupled gas-flow-type reactor, and chosen methylmethacrylate(MMA)and methylmethacrylate-tetrameth-yltin(MMA-TMT) as a monomer. This thin films were also delineated by the electron-beam apparatus with an acceleration voltage of 30kV and an expose dose ranging from 20 to 900$\mu$C/cmS02T. The delineated pattern in the resist was developed with the same reactor which is used for polymerization using an argon as etching gas. The growth rate and etching rate of the thin film is increased with increasing of discharge power. Thin films by plasma polymerization show polymerization rate of 30~45($\pm$3) A/min, and etching rate of 440($\pm$30) A/min during Ar plasma etching at discharge power of 100W. In apparently lower than that of conventional PMMA, but the plasma-etching rate of PP(MMA-TMT) was higher than that of PPMMA.