• 제목/요약/키워드: PLZT 박막

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9/65/35 PLZT 박막의 유전적, 전기적 특성 (Dielectrical and Electrical Characteristics of 9/65/35 PLZT Thin Films)

  • 강종윤;최형욱;백동수;윤현상;신현웅;박창엽
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1994년도 하계학술대회 논문집 C
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    • pp.1305-1307
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    • 1994
  • 9/65/35 PLZT thin films were prepared by sol-gel processing and annealed by direct insertion, 9/65/35 PLZT thin films were poly-crystallized after direct insertion at $750^{\circ}C$ for 3omin. The grain size of film was 50 nm, coercive field was 28.2 kV/cm and remnant polarization was $3.68 {\mu}C/cm^2$.

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Sol-Gel법으로 제조한 PLZT 박막의 전기광학특성 (Electrooptic Properties of PLZT Thin Films Prepared by Sol-Gel Method)

  • 이성갑;정장호;배선기;이영희
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1996년도 하계학술대회 논문집 C
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    • pp.1505-1507
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    • 1996
  • In this study, $(Pb_{0.88}La_{0.12})(Zr_{0.40}Ti_{0.60})O_{2.97}$ (La/Zr/Ti=12/40/60) ceramic thin films were fabricated from an alkoxide-based by Sol-Gel method. PLZT stock solutions were made and spin-coated on the ITO-glass rubstrate at 4000[rpm] for 30[sec]. Coated specimens were baked to remove the organic materials at $400[^{\circ}C]$ for 10[min]. This procedure was repeated 5 times. The coated films were finally annealed at $450{\sim}700[^{\circ}C]$ for 1[hr]. The ferroelectric perovskite phases precipitated under the sintering of $550{\sim}700[^{\circ}C]$ for 1[hr]. Relative dielectric constant of the PLZT thin were increased with increasing the sintering temperature, the thin file sintered at $650[^{\circ}C]$ showed the highest value of 196. But in the PLZT thin film sintered at $700[^{\circ}C]$, relative dielectric constant was greatly decreased due to reacts between ITO electrode and glass substrate. In all thin films, the transmittance was more than 70[%] (at 632.8[nm]).

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ITO 기판 위의 PLZT 박막의 전기 및 광학 특성에 관한 연구 (A Study on Electrical and Optical Characteristics of PLZT Thin Films Deposited on ITO-glass)

  • 강종윤;최형욱;백동수;박용욱;박창엽
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1995년도 춘계학술대회 논문집
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    • pp.39-42
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    • 1995
  • In this study, PLZT thin films prepared by Sol-Gel method were deposited on ITO glass by spin coating and cryatallized at 750$^{\circ}C$ for 5 min by RTA in oreder to investigate their electrical and optical properties. Although thin film experieneced narrowing their hysteresis loops with increasing La content, E$\sub$c/ and P.sub r/ were higher for thin film than for bulk materials. $\varepsilon$$\sub$r/ and optical transmittance increased with increasing La content.

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Seeding층이 sol-gel법에 의한 PLZT 박막의 제조시 전기적 특성에 미치는 영향 (Effects of seeding layers on electrical properties of PLZT thin films prepared by sol-gel method)

  • 이진홍;박병욱
    • 한국결정성장학회지
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    • 제10권2호
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    • pp.140-144
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    • 2000
  • ($Pb_{0.91}$$La_{0.09}$)($Zr_{0.65}$$Ti_{0.35}$)$O_3$ thin films were prepared on ITO-coated glass by spin-coating. As $Pb_{0.9}$$La_{0.1}$)$TiO_3$ thin films were used as seeding layers, formation temperature of perovskite was reduced and theUrosette" structure was disappeared. PLZT thin films with a seeding layer of 40 nm thick showed a (100) preferred orientation and better dielectric and ferroelectric properties.ties.

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졸-겔법으로 백금 기판위에 제조된 PLZT 박막의 구조적, 전기적 특성변화 (Structural and Electrical Characteristics of Ferroelectric PLZT Thin Film Prepared on Pt Substrate by Sol-Gel Route)

  • 오영제;김태송;정형진
    • 한국세라믹학회지
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    • 제31권2호
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    • pp.171-176
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    • 1994
  • The spin-casted PLZT(9/65/35) thin films through polymeric sol-gel process were prepared on Pt substrate. The crack-free, uniform and dense films were obtained by post-annealing at the temperature between 35$0^{\circ}C$ and $700^{\circ}C$. The composite structure mixed together with large grains called "rosette" and surrounding small grains were observed on the films annealed over $600^{\circ}C$. Pyrochlore phase was completely changed to perovskite phase above $600^{\circ}C$ with the increase of annealing temperature. Dielectric constant (k) was larger with the increase of film thickness and annealing temperature. from the measurements of dielectric constant as a function of measuring temperature, it was also observed that Curie temperature was shifted to higher temperature with the increase of film thickness and annealing temperature. The pyroelectric coefficient(P) of 10 times coated film annealed at $700^{\circ}C$ was 65 $\mu$C/$\textrm{cm}^2$.K.$.K.

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졸-겔법에 의한 PLZT 박막의 결정화 및 균열 생성 (Crystallization and Crack Formation in Sol-Gel PLZT Thin Films)

  • 안기철;이전국;김호기;노광수
    • 한국세라믹학회지
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    • 제29권3호
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    • pp.216-222
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    • 1992
  • PLZT thin films were prepared using sol-gel spin coating. The films mainly consisted of perovskite phase when heat treated at 600$^{\circ}C$ and in O2 or air atmosphere for 2 hours after 7 coating cycles. Cracks were formed when smaller than after 9 coating cycles. When ITO interlayer existed between Corning 7059 glass substrate and the film, cracks were not formed after 9 coating cycles, but cracks were formed after 11 coating cycles because of large volume change of the film contracting on the substrate during the heat treatment. In the observation of microstructure, the thin films have perovskite phase of about 2 $\mu\textrm{m}$ grain size and pyrochlore phase of 100∼200${\AA}$ grain size.

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X/65/35 PLZT 강유전 박막의 전기 및 광학 특성에 관한 연구 (A Study on the Electrical and the Optical Characteristics of W/65/35 PLZT Ferroelectric Thin Films)

  • 허운행;최형욱;백동수;김준한;박창엽
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1994년도 추계학술대회 논문집 학회본부
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    • pp.209-211
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    • 1994
  • X/65/35 PLZT ferroelectric thin films were fabricated by sol-gel processing. Thin films were crystallized after rapid thermal processing at $750^{\circ}C$ for 5 min. The microstructure, the relative dielectric constant the curie point, the hysteresis curve and the optical transmittance of thin films were investigated.

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RF-magnetron Sputtering Process를 이용한 a-축 우선 배향된 PLZT(x/0/100)박막의 제조 (Characterization and Preparation of a-axis Preferred Oriented PLZT(x/0/100) Thin Films Deposited by RF-magnetron Sputtering Process)

  • 박명식;강승국;노광수;김동범;조상희
    • 한국재료학회지
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    • 제7권6호
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    • pp.522-528
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    • 1997
  • RF-magnetron Sputtering Process를 이용하여 Pt/Ti/Si(100)기판위에 lanthanum-modified lead titanate 박막을 제작하였다. 기판온도와 증착시간이 증가함에 따라 증착율은 감소하였다. 기판온도가 증가함에 따라 fine grain들은 large grain으로 변화하였다. Perovskite구조는 기판온도 54$0^{\circ}C$, gas pressure 30mtorr에서 나타나기 시작하였다. 본 실험에서 perovskite 박막제작에 대한 조건은 기판온도 58$0^{\circ}C$, gas pressure 30mtorr였다. Pt/Ti/Si(100) 우선 배향된 박막을 얻었다. La양이 증가함에 따라 유전율, 항전계, 잔류분극량은 증가하였다. 중심주파수가 44.7MHz, 전파속도는 2680m/sec를 가지는 SAW filter 특성을 얻었다.

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