• 한국진공학회:학술대회논문집
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• 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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• pp.162.1-162.1
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• 2015

The use of plasma has increased in bio-application field in recent years. Particularly, water treated by arc discharge or atmospheric pressure plasma has been actively utilized in bio-industry. In this study, we have developed a plasma activated water generating system. For this system, two kinds of plasma sources; dielectric barrier discharge (DBD) plasma and arc discharge plasma have been used. The discharge energy was calculated using the breakdown voltage and current, and the emission spectrum was measured to investigate the generated reactive species. We also analyzed the amount of reactive oxygen and nitrogen species in water using the chemical methods and nitric oxide sensor. Finally, the influence of plasma generated reactive species on the germination and growth of spinach (Spinacia oleracea) was investigated. Spinach is a green leafy vegetable that contains a large amount of various physiologically active organic compounds. However, it is characterized with a low seed germination rate.

• The Korean Journal of Ceramics
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• 제2권4호
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• pp.231-237
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• 1996

Mullite ceramics can be sintered by rf plasma sintering to densities as high as 97% compared to the theoretical density of the mullite, while SiC whisker-reinforced mullite matrix ceramic composites were not sintered by plasma sintering. Decomposition of mullite occurs in a superficial regins at the outside surface of the specimen by volatilization of SiO at elevated temperature by plasma. SiC whiskers were destroyed, and the matrix was converted to alumina from SiC-whisker reinforced mullite matrix ceramic composites during the plasma sintering. Accelerated volatilization from the SiC whisker in the mullite prevents sintering. The volatile species are mainly SiC and CO gas species. The effects of plasma on mullite and SiC-whisker reinforced mullite matrix composites are interpreted by thermodynamic simulation of the volatile species in the plasma environment. The thermodynamic results show that the decomposition will not occur during hot pressing.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2003년도 추계학술발표강연 및 논문개요집
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• pp.163-163
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• 2003

TiN barrier막 위에 metal organic chemical deposition(MOCVD)법으로 RuO$_2$ 를 증착시 TiN막 표면을 세정처리하지 않을 경우 RuO$_2$의 핵생성이 어렵고, 그로 인해 RuO$_2$ 연속막이 형성되기 힘들다. 그러므로 RuO$_2$의 핵생성을 향상시키기 위해 TiN막에 대한 전처리 세정이 필수적이다. TiN막의 전처리 세정방법으로 ECR plasma 세정법을 사용하였으며, $O_2$ plasma와 H$_2$ plasma 그리고 Ai plasma를 이용해 각각의 exposure time을 변화시키며 전처리 세정을 실시하였다. H$_2$ plasma와Ar plasma의 exposure time이 증가됨에 따라 RuO$_2$의 핵생성이 향상되었다. 본 연구에서는 scanning electron microscopy(SEM), Auger electron emission spectrometry(AES), Atomic Force Microscope(AFM), X-ray diffraction (XRD) 등의 분석을 통해 TiN막 표면에 대한 ECR plasma 전처리 세정 이 RuO$_2$의 핵생성과 연속막 성장에 미치는 효과에 대해 조사하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 춘계학술대회 및 기술 세미나 논문집 디스플레이 광소자
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• pp.67-68
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• 2008

A simple bi-layer structure of organic light emitting diode (OLED) was used to study the characteristics of anode preparation. Indium tin oxide (ITO) anode surface treatment of OLEDs was performed to get the optimum condition for the ITO anode. The ITO surface was treated by $O_2$ or $O_2$ / Ar mixed gas plasma with different processing time. The electrical characteristics of OLED were improved by plasma treatment. The operating voltage of OLED with $O_2$ or $O_2$/Ar mixed gas plasma treated anodes decreases from 8.2 to 3.4 V and 3.2V, respectively. The $O_2$ /Ar mixed gas plasma treatment results in better electrical property.

• 조명전기설비학회논문지
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• 제25권4호
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• pp.65-70
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• 2011

Perfluorocompounds (PFCs) gases were decomposed by gliding arc plasma generated by AC pulse power. $N_2$ gas of 10 LPM flow rate and $H_2$ gas of 0.5 LPM were introduced into the gliding arc plasma generated between a pair of electrodes with SUS 303 material, and the PFCs gases were injected in the plasma and thereby were decomposed. The PFCs gas-decomposition-characteristics through the gliding arc plasma were analyzed by FT-IR, where pure $N_2$ and $H_2$-added $N_2$ environment were used to generate the gliding arc plasma. The PFCs gas-decomposition-properties were changed by electric power for gliding arc plasma generation and the H2 gas addition was effective to enhance the PFCs decomposition rate.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.540-540
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• 2013

In this studying, we investigated the basic properties of N-doped plasma polymer. The N-doped ethylcyclohexane plasma polymer thin films were deposited by radio frequency (13.56 MHz) plasma-enhanced chemical vapor deposition method. Ethylcyclohexenewas used as organic precursor (carbon source) with hydrogen gas as the precursor bubbler gas. Additionally, ammonia gas [NH3] was used as nitrogen dopant. The as-grown polymerized thin films were analyzed using ellipsometry, Fourier-transform infrared [FT-IR] spectroscopy, Raman spectroscopy, FE-SEM, and water contact angle measurement. The ellipsometry results showed the refractive index change of the N-doped ethylcyclohexene plasma polymer film. The FT-IR spectrashowed that the N-doped ethylcyclohexene plasma polymer films were completely fragmented and polymerized from ethylcyclohexane.

• 한국염색가공학회지
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• 제5권2호
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• pp.134-138
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• 1993

Wool, silk and nylon 6 fabrics were treated with low-temperature plasma under atmospheric pressure of acetone/argon or helium/argon for 30 and 180 sec, and then dyed with leveling type acid dye, C.I. Acid Red 18 and milling type acid dye, C.I. Acid Blue 83. In spite of short time of the plasma treatment for thirty seconds, the color depth of wool fabrics was increased remarkably with both of the plasma gases, aceton/argon or helium/argon and with the kinds of dyes i.e., levelin type or milling type. But the atmosperic low-temperature plasmas did not increase the depth of silk and nylon 6 fabrics dyed with both of the acid dyes regardless of the teated time and plasma gases. It seems that low-temperature plasma by atmospheric-pressure discharge is effective for improvement of dyeing of wools as is the same way with the low-temperature plasma by glow discharge. The kinds of plasma gases and treated time did not influnce the depth of wool fabric pretreted with the atmosperic low-temperature plasmas.

• Journal of Welding and Joining
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• 제18권3호
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• pp.122-130
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• 2000

Due to the inherent dimensional uncertainty, the tolerances accumulate in the assembly of plasma cutting torch. Tolerance accumulation has serious effect on the performance of the plasma torch. This study proposes a statistical tolerance propagation model, which is based on matrix transform. This model can predict the final tolerance distributions of the completed plasma torch assembly with the prescribed statistical tolerance distribution of each part to be assembled. Verification of the proposed model was performed by making use of Monte Carlo simulation. Monte Carlo simulation generates a large number of discrete plasma torch assembly instances and randomly selects a point within the tolerance region with the prescribed statistical distribution. Monte Carlo simulation results show good agreement with that of the proposed model. This results are promising in that we can predict the final tolerance distributions in advance before assembly process of plasma torch thus provide great benefit at the assembly design stage of plasma torch.

• 한국어병학회지
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• 제15권2호
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• pp.77-82
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• 2002

Effects of stress-induced suppression of humoral immunity on scuticociliate killing activity of olive flounder plasma were investigated. Changes in glucose level. alternative complement activity and Iysozyme activity of plasma by handling stress were analysed in relation to in vitri parasiticidal activity of plasma. The plasma glucose level was about two times higher in fish after a handling stress than in control fish. Plasma lysozyme activity and natural haemolytic activity were decreased in suessed fish.The scuticociliate killing activity of plasma was significantly lower in stressed fish than in non-stressed control fish. The present results indicated that stress-induced immunodepression could be a cause of scuticociliatosis occurrence in olive flounder.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1997년도 추계학술대회 논문집 학회본부
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• pp.364-366
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• 1997

An experimental helical resonator plasma system that can be applied to the next generation semiconductor processing was fabricated and its characteristics was investigated. Helical resonator plasma can operate both in a capacitive and an inductive mode. Such sources will produce an extended plasma for the capacitive mode and a plasma concentrated in the resonator for the inductive mode. Plasma parameters were measured with Double Langmuir Probes. Plasma densities of $10^{11}{\sim}10^{12}cm^{-3}$ were produced in argon for pressure in the $2{\sim}120\;mTorr$ range. From the results, we conclude that helical resonator plasma can be applied to the next generation semiconductor processing.