• 제목/요약/키워드: PCT 박막

검색결과 3건 처리시간 0.018초

졸-겔법에 의한 $(Pb_{0.9}Ca_{0.1})TiO_3$ 박막의 강유전 특성 (Ferroelectric Properties of $(Pb_{0.9}Ca_{0.1})TiO_3$ Thin Films by Sol-Gel Processing)

  • 김행구;정수태;이종헌
    • 한국전기전자재료학회논문지
    • /
    • 제11권2호
    • /
    • pp.138-145
    • /
    • 1998
  • The $(Pb_{0.9}Ca_{0.1})TiO_3$[PCT] thin films have been deposited by sol-gel processing on Si-wafer and ITO glass substrates. The creak-free films have been obtained by rapid thermal annealing at $700^{\circ}C$ for 10 minute and characterized by XRD, SEM and electrical measurements. Their tetragonality c/a was 1.041 and grain size was $0.15{\sim}0.2{\mu}m$. When the electrode system of sample was Au/PCT/ITO(MFM) and film thickness was $0.8{\mu}m$, dielectric constant, dielectric loss and Curie temperature were about 149, 0.085 and $449^{\circ}C$ at 10kHz, respectively. Spontaneous polarization $P_s$, remnant polarization $P_r$ and coercive field $E_c$ were about $5.29{\mu}C/cm^2$, $4.15{\mu}C/cm^2$ and 82kV/cm calculated by hysteresis loop.

  • PDF

Ni-Cr계 합금을 이용한 박막저항의 제작 및 신뢰성 (Fabrication and Reliability Properties of Ni-Cr Alloy Thin Film Resistors)

  • 이봉주
    • 한국전기전자재료학회논문지
    • /
    • 제21권1호
    • /
    • pp.57-62
    • /
    • 2008
  • From the progressing results, it was found that thin film using 52 wt% Ni - 38 wt% Cr - 3 wt% Al - 4 wt% Mn - 3 wt% Si target has good characteristics for low TCR (temperature coefficients of resistance) and high resistivity. The optimum sputtering condition was DC 250 W, 5 mtorr, and 50 sccm and the proper annealing condition was $350^{\circ}C$/3.5 hr in air atmosphere. At these fabricated conditions, thin film resistors with TCR values of less than ${\pm}10ppm/^{\circ}C$ were obtained. The TCR of the packaged-samples made at proper fabrication conditions was $-3{\sim}15ppm/^{\circ}C$ after the thermal cycling and $-20{\sim}180ppm/^{\circ}C$ after PCT (pressure cooker test), we could confirm reliability for the thin film resistor and find the need for enduring research about packaging method.

낮은 저항온도계수를 갖는 박막 저항체 제작 및 신뢰성 특성 평가 (Fabrication and Reliability Properties of Thin film Resistors with Low Temperature Coefficient of Resistance)

  • 이붕주
    • 한국전기전자재료학회논문지
    • /
    • 제20권4호
    • /
    • pp.352-356
    • /
    • 2007
  • The Ni/Cr/Al/Cu (51/41/4/4 wt%) thin films were deposited by using DC magnetron sputtering method for the application of the resistors having low TCR (temperature coefficients of resistance) and high resistivity from the former printed-results[3]. The TCR values measured on the as-deposited thin film resistors were less than ${\pm}10\;ppm/^{\circ}C$ and $-6{\sim}+1\;ppm/^{\circ}C$ after annealing and packaging process. The TCR values were $-3{\sim}1\;ppm/^{\circ}C$ (ratio of variation : about 0.02 %) and $-30{\sim}20\;ppm/^{\circ}C$ (ratio of variation : about $0.5{\sim}1\;%$) for the thermal cycling and PCT (pressure cooker test), respectively. It was confirmed that the reliability properties of the thin film resistor were good for electronic components.