• Journal of Korean Society for Atmospheric Environment
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• v.29 no.1
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• pp.27-37
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• 2013

CFCs (Chlorofluorocarbons) and HCFCs (Hydrochlorofluorocarbons) that are chemically stable were proven to be a greenhouse gases that can destroy ozone layer. On the other hand, HFCs (Hydrofluorocarbons) was developed as an alternative refrigerant for them, but HFCs still have a relatively higher radiative forcing, resulting in a large Global Warming Potential (GWP) of 1,300. Current regulations prohibit production and use of these chemicals. In addition, obligatory removal of existing material is in progress. Methods for the decomposition of these material can be listed as thermal cracking, catalytic decomposition and plasma process. This study reports the development of low cost and high efficiency plasma scrubber. Stability of steam plasma generation and effect of plasma parameters such as frequency of power supply and reactor geometry have been investigated in the course of the development. Method for effective removal of by-product also has been investigated. In this study, elongated rotating arc was proven to be efficient in decomposition of HFCs above 99% and to be able to generate stable steam plasma with steam contents of about 20%.

• Water for future
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• v.29 no.1
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• pp.191-202
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• 1996

Advanced water treatment for water supply is being introduced for the treatment of various organic materials which cannot be removed by conventional water treatment methods. While the development of advanced water treatment system appropriate to the domestic enviropment of advanced water treatment system appropriate to the domestic environment is essential, the study on the economic costs and the social impact is also of importance. In this paper, it is shown how to estimate the costs (capital and maintenance) for advanced water treatment facilities, especially those using ozone treatment combined with activated carbon process and membrance separation. Estimated costs were compared with the government budget. Also, a general relation between the system capacity and investment was derived. Four alternatives were considered form the aspect of the amount of water to be produced and the delivery system to the user. These alternatives were applied to the city of Pusan. It turned out that bottled water, produced only for drinking, has best economic advantages in having minimum system capacity without detriment to water quality.

• KSCE Journal of Civil and Environmental Engineering Research
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• v.4 no.4
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• pp.113-125
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• 1984

Water supply has been mainly dependent on the construction of the dams in Korea. It is difficult, however, to continue to construct dams for many reasons, such as the decrease of construction sites, the increase of construction costs, the compensation of residents in flooded areas, and the environmental effects. Water demands have increased and are expected to continue increasing due to the concentration of people in the cities, the rise of the living standard, and rapid industrial growth. It is acutely important to find countermeasures such as development of ground water, desalination, and recycling of waste water to cope with increasing water demands. Recycling waste water includes all means of supplying non-potable water for their respective usages with proper water quality which is not the same quality as potable water. The usages of the recycled water include toilet flushing, air conditioning, car washing, yard watering, road cleaning, park sprinkling, and fire fighting, etc. Raw water for recycling is obtained from drainage water from buildings, toilets, and cooling towers, treated waste water, polluted rivers, ground water, reinfall, etc. The water quantity must be considered as well as its quality in selecting raw water for the recycling. The types of recycling may be classified roughly into closed recycle systems and open recycle systems, which can be further subdivided into individual recycle systems, regional recycle systems and large scale recycle system. The treatment methods of wastewater combine biochemical and physiochemical methods. The former includes activated sludge treatment, bio-disc treatment, and contact aeration treatment, and the latter contains sedimentation, sand filtration, activated carbon adsorption, ozone treatment, chlorination, and membrane filter. The recycling patterns in other countries were investigated and the effects of the recycling were divided into direct and indirect effects. The problems of water reuse in recycle patterns were also studied. The problems include technological, sanitary, and operational problems as well as cost and legislative ones. The duties of installation and administrative organization, structural standards for reuse of water, maintenance and financial disposal were also studied.

• Journal of Korean Society of Occupational and Environmental Hygiene
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• v.25 no.2
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• pp.202-210
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• 2015

Objectives: The purpose of this study was to examine clean room(C/R) structure, air conditioning and contamination control systems and to provide basic information for identifying a correlation between the semiconductor work environment and workers' disease. Methods: This study was conducted at 200 mm and 300 mm semiconductor wafer fabrication facilities. The C/R structure and air conditioning method were investigated using basic engineering data from documentation for C/R construction. Furthermore, contamination parameters such as airborne particles, temperature, humidity, acids, ammonia, organic compounds, and vibration in the C/R were based on the International Technology Roadmap for Semiconductors(ITRS). The properties of contamination control systems and the current status of monitoring of various contaminants in the C/R were investigated. Results: 200 mm and 300 mm wafer fabrication facilities were divided into fab(C/R) and sub fab(Plenum), and fab, clean sub fab and facility sub fab, respectively. Fresh air(FA) is supplied in the plenum or clean sub fab by the outdoor air handling unit system which purifies outdoor air. FA supply or contaminated indoor air ventilation rates in the 200 mm and 300 mm wafer fabrication facilities are approximately 10-25%. Furthermore, semiconductor clean rooms strictly controlled airborne particles(${\leq}1,000{\sharp}/ft^3$), temperature($23{\pm}0.5^{\circ}C$), humidity($45{\pm}5%$), air velocity(0.4 m/s), air change(60-80 cycles/hr), vibration(${\leq}1cm/s^2$), and differential pressure(atmospheric pressure$+1.0-2.5mmH_2O$) through air handling and contamination control systems. In addition, acids, alkali and ozone are managed at less than internal criteria by chemical filters. Conclusions: Semiconductor clean rooms can be a pleasant environment for workers as well as semiconductor devices. However, based on the precautionary principle, it may be necessary to continuously improve semiconductor processes and the work environment.