• 제목/요약/키워드: Ozone gas

검색결과 391건 처리시간 0.026초

Lamp 형 오존발생기에 관한 연구 (A Study on the Lamp Type Ozonizer)

  • 강천수;송현직;이광식;이동인
    • 대한전기학회:학술대회논문집
    • /
    • 대한전기학회 1995년도 하계학술대회 논문집 C
    • /
    • pp.1407-1409
    • /
    • 1995
  • This paper describes ozone concenteration($O_{3con}$), ozone generation($O_{3g}$) and ozone yield($O_{3Y}$) of lamp type ozonizer which be performed a role of lighting source and ozonizer. OLamp is consist of two of low pressure mercury lamps. The important conclusions obtained from this paper are as follows, The more quality of supplied gas(Q) decrease, the higher $O_{3con}$ rise. The more quality of supplied gas(Q) increase, the higher $O_{3g}$ some rise. When supplied oxygen 10[l/min] obtained 4,010[mg/kwh] $O_{3Y}$. The Echerichia coli which is reacted on ozone can be sterilized about 95[%].

  • PDF

고효율 LCD 감광막 제거기술 구현 연구 (A Study on the Realization of the High Efficiency LCD Photoresist Removal Technology)

  • 손영수;함상용;김병인;이성휘
    • 한국전기전자재료학회논문지
    • /
    • 제20권11호
    • /
    • pp.977-982
    • /
    • 2007
  • The realization of the photoresist(PR) removal method with vaporized water and ozone gas mixture has been studied for the LCD TFT array manufacturing. The developed PR stripper uses the water boundary layer control method based on the high concentration ozone production technology. We develop the prototype of PR stripper and experiment to find the optimal process parameter condition like as the ozone gas flow/concentration, process reaction time and thin boundary layer formation. As a results, we realize the LCD PR strip rate over the 0.4 ${\mu}m/min$ and this PR removal rate is more than 5 times higher than the conventional immersion type ozonized water process.

방전간극변화가 오존생성특성에 미치는 영향 (The Effects of Discharge Gap Variation for Ozone Generation Characteristics)

  • 이상근;전병준;박용권;박원주;이광식
    • 한국조명전기설비학회:학술대회논문집
    • /
    • 한국조명전기설비학회 2001년도 학술대회논문집
    • /
    • pp.135-138
    • /
    • 2001
  • Recently, ozone is utilized In various fields and its needs are expanding. therefore, so many ozone generation methods have been reported in the latest years, its main purpose Is to get the high ozone concentration and to improve the ozone yield. One of them is a plate-type ozone generator. In this paper, the plate-type ozone generator is piled up many folds(3 and 5 electrodes). Ozone concentration and yield were investigated in accordance with power, quantity of supplied gas and gap spacing of plate electrodes.

  • PDF

Evaluation of Ozone Concentration for the Oxide Thin Film Growth

  • 박노봉;임중관;박용필;이희갑
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2003년도 추계학술대회 논문집 Vol.16
    • /
    • pp.579-582
    • /
    • 2003
  • Ozone is usually generated from oxygen gas using a silent discharge apparatus and its concentration is less then 10 mol%. Ozone is condensed by the adsorption method, which is widely used for the growth of oxidation thin films such as superconductor. Highly condensed ozone is analyzed by three methods; ultraviolet absorption, thermal decomposition and Q-mass analyzing methods. Thermal decomposition method is most effective in the highly condensed ozone region and its method is superior to Q-mass analyzer for determining ozone concentration because of the simplicity of the method.

  • PDF

생물테러시 실내제독을 위한 효율적인 오존가스의 적용 방법 (Application of Gaseous Ozone for Cleaning Biological Weapon Agent Contaminated Building)

  • 윤제용;정우동;문성민;조민
    • 한국군사과학기술학회지
    • /
    • 제11권2호
    • /
    • pp.101-108
    • /
    • 2008
  • This study attempted to develop the technology by gaseous ozone for decontaminating building affected by a model of biological weapon agent(Bacillus subtilis spores) instead of Bacillus anthracis spore. The use of ozone is attractive method from a practical point of view of decontamination procedure since it has strong oxidation power but no residue after application. We examined the disinfection efficiency of gaseous ozone to Bacillus subtilis spores which suspension was sprayed on different material surfaces and dried. Three different types of gaseous ozone was applied : dry ozone, dry ozone with humidified air, and water bubbled wet ozone. Dry ozone(1500ppm) failed to achieve any significant inactivation for 2hrs. However, six log reduction of B. subtilis spore was achieved within 30min by 1500ppm of water bubbled wet ozone. This result shows the noticeable inactivation efficiency by gaseous ozone compared with previous studies. Good performance by wet ozone was also found for military material surface.(i.e. : gas mask hood, protective garments, army peinted metal surface).

오존처리를 이용한 기체분리막의 성능 향상에 관한 연구 (A Study on the Enhancement of the Performance of Gas Separation Membranes by Ozone Treatment)

  • 류동현;최승학;오세중;구자경
    • 멤브레인
    • /
    • 제10권4호
    • /
    • pp.192-197
    • /
    • 2000
  • 상용 고분자막으로 많이 사용되는 Polysulfone(PSF)을 오존으로 처리하여 기체의 투과 및 분리특성을 조사하였다. 고분자막의 오존처리는 chamber 내부에 막을 설치하고 약 5vol.%의 오존을 포함한 산소를 chamber에 연속적으로 공급하면서 일정시간 동안 오전처리를 수행하였다. PSF막의 선택도는 오존처리시간에 따라 증가하였으며 적정 오존처리 시간은 1.5시간이면 충분한 것으로 조사되었다. 그리고, 오존처리에 의한 He/$N_2$, $H_2$/$N_2$, $O_2$/$N_2$, $CO_2$/$CH_4$등의 선택도의 증가는 분자크기가 큰 $N_2$$CH_4$의 투과도의 감소에 기인하며 분자크기가 작은 기체의 투과도의 감소는 매우 작은 것으로 나타났다. 오존처리에 의한 선택도의 증가는 오존이 PSF 고분자를 부분적으로 산화시키고 이때 생성된 산소복합체들이 PSF의 자유부피를 감소시키기 때문으로 생각된다.

  • PDF

유전체장벽방전을 이용한 촉매공정의 질소산화물 저감성능 향상 (Improvement in Catalytic NOx Reduction by Using Dielectric Barrier Discharge)

  • 목영선;남창모
    • 한국산업융합학회 논문집
    • /
    • 제9권1호
    • /
    • pp.13-19
    • /
    • 2006
  • The ozone produced by a dielectric barrier discharge device was injected into the exhaust gas to oxidize a part of NO to $NO_2$, and then the exhaust gas containing the mixture of NO and $NO_2$ was further treated in a catalytic reactor where both NO and $NO_2$ were reduced to $N_2$ in the presence of ammonia as the reducing agent. The $NO_2$ content in the mixture of NO and $NO_2$ was changed by the amount of ozone added to the exhaust gas. The experiments were primarily concerned with the effect of reaction temperature on the catalytic $NO_x$ reduction at various $NO_2$ contents. The increase in the $NO_2$ content by the ozone injection remarkably improved the performance of the catalytic $NO_x$ reduction, especially at low temperatures.

  • PDF

자계가 인가된 공기청정장치의 가스 제거 특성 (Gas Removal Characteristics of Air Clean System Applying a Magnetic Field)

  • 신수연;문재덕
    • 전기학회논문지
    • /
    • 제56권5호
    • /
    • pp.921-925
    • /
    • 2007
  • Gas removal characteristics of an air clean system, consisted of a filter and a nonthermal discharge plasma reactor with a magnetic field, have been investigated with emphasis on the enhancing gas removal efficiency of the applied magnetic field. It is found that the magnetic field influenced significantly to the corona discharge characteristics, decreasing the corona onset voltage and increasing the corona current. As a result, the proposed air clean system with the magnetic field showed the higher removal efficiency of the gas (e.g., trimethlyamine) than that of without the magnetic field. This would be because the magnetic field applied to the discharge plasma reactor of the air clean system can elevate the corona characteristics, and activate the generation of ozone, thus the removal efficiency of the gas was concurrently enhanced. This reveals that the proposed air clean system with the magnetic field could be used as an effective means of removal an indoor pollutant gas.

Comparing the Passivation Quality of Ozone and H2O Oxidant of Atomic Layer Deposited Al2O3 by Post-annealing in N2 and Forming Gas Ambients for Passivated Emitter and Rear Cell (PERC)

  • Cho, Young Joon;Chang, Hyo Sik
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
    • /
    • pp.462-462
    • /
    • 2014
  • The effect of rear passivation for passivated emitter and rear cell (PERC) using ozone and H2O oxidant of atomic layer deposited (ALD) Al2O3 was studied by post-annealing in N2 and forming gas ambients. Rear surface of PERC solar cell was passivated by Al2O3 grown by ALD with ozone and H2O oxidant. Al2O3 grown by ALD with ozone oxidant has been known to have many advantages, such as lower interface defects, low leakage current density. Its passivation quality is better than Al2O3 with H2O. Al2O3 layer with 10 nm and 20 nm thickness was grown at $150^{\circ}C$ with ozone oxidant and at $250^{\circ}C$ with H2O oxidant. And then each samples were post-annealled at $450^{\circ}C$ in N2 ambients and at $850^{\circ}C$ in forming gas ambients. The passivation quality was investigated by measuring the minority carrier lifetime respectively. We examined atomic layer deposited Al2O3 such as growth rate, film density, thickness, negative fixed charge density at AlOx/Si interface, and reflectance. The influences of process temperature and heat treatment were investigated using Sinton (WCT-120) by Quasi-Steady State Photoconductance (QSSPC) mode. Ozone-based ALD Al2O3 film shows the best carrier lifetime at lower deposition temperature than H2O-based ALD.

  • PDF