• Title/Summary/Keyword: Oxygen-plasma effect

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Effect of Active Species Generated from Flexible Plasma Patch on Polysaccharide Surface (플렉서블 플라즈마 패치에서 발생되는 활성종이 다당류 표면에 미치는 영향)

  • Lee, Yu Ri;Lee, Seunghun;Kim, Do-Geun
    • Journal of the Korean institute of surface engineering
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    • v.51 no.2
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    • pp.133-137
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    • 2018
  • Plasma devices such as jets, pencils, and torches have been developed as new tools that help penetration of target agents and applied to plasma medicine. However, these devices cannot be used in a large area. Therefore, we introduced a flexible plasma device, which can be treated of large area and designed as bendable plasma. In additional, in vitro model based on agarose gel was prepared that can be show effectiveness in the depth of penetration. Plasma treatment conditions such as power, time and distance can be optimized on the agarose gel wound model. The chemical structure of changed polysaccharides was predicted due to reactive excited atoms and molecules, UV photons, charged particles and reactive oxygen and nitrogen species (RONS).

The Effect of Plasma Power on the Composition and Microhardness of a-SiC:H Films Grown by PECVD

  • Lee, Young-Ku-K;Kim, Yunsoo
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.123-123
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    • 1999
  • Amorphous hydrogenated silicon carbide (a-SiC:H) films were deposited at the temperature of 40$0^{\circ}C$ using plasma enhanced chemical vapor deposition. The a-SiC:H films were characterized by x-ray photoelectron spectroscopy (XPS) and nanoindentation method. By increasing the plasma power from 20W to 160W, the oxygen content of the a-SiC:H films were observed to decrease from 12.1% to 4.4%. On the other hand, the plasma power did not affect the ratio of carbon to silicon in our experiment where the 1, 3-disilabutane was used as the precursor. Microhardness of the films was observed to increase as the plasma power increased, while the elastic modulus was observed to gave a maximum value at the plasma power of 80W. Microhardness of the film is thought to be strongly affected by the content of adventitious oxygen in the film and it is concluded that the hardness of the film can be improved by increasing the plasma power.

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Influence of Hydrogen and Oxygen Plasma Treatment on the Structural Properties of Carbon Nanotubes (수소 및 산소 플라즈마 처리에 따른 탄소나노튜브의 구조적 특성 변화)

  • Lee, Jae-Hyeong;Nah, Chang-Woon;Park, Dae-Hee
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.20 no.11
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    • pp.943-947
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    • 2007
  • The effect of hydrogen and oxygen plasma treatments on the structural properties of carbon nanotube(CNT) has been systematically investigated. As the plasma power was increased, nano particles were appeared at the surface of CNTs. At high plasma power(300 Watt), the structure of CNT was changed from nanotube type to nano particles. However, in case of hydrogen plasma treatment, there was no change in microstructure of CNT. From the Raman analysis, the crystallinity of CNT was deteriorated by the plasma treatment, regardless of gas types.

Effects of Low Pressure and Atmospheric Pressure Plasma Treatment on Contact Angle of Polycarbonate Surface (저압 및 대기압 플라즈마 처리를 통한 폴리카보네이트의 접촉각 변화특성 비교)

  • Won, Dong Su;Kim, Tae Kyung;Lee, Won Gyu
    • Applied Chemistry for Engineering
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    • v.21 no.1
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    • pp.98-103
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    • 2010
  • The effect of plasma treatment on surface characteristics of polycarbonate (PC) films was investigated using low pressure plasma and atmospheric pressure plasma with oxygen and argon. Untreated PC has a contact angle of $82.31^{\circ}$ with de-ionized water which reduced to $9.17^{\circ}$ as the lowest value after being treated with a low pressure plasma treatment with oxygen. Increase of delivered powers such as RF and AC with a high frequency and gas flow rates was not effective to reduce contact angles dramatically but gave the trend of reducing gradually. The surface of PC treated with plasma shows a low contact angle but the contact angle increases rapidly according to the exposure time in air ambient. Oxygen plasma was more effective to generate the polar functional group regardless of the type of plasma. Conclusively, a low plasma treatment with oxygen is more recommendable when the hydrophilic surface of PC is required.

Effect of O2 Plasma Treatments of Carbon Supports on Pt-Ru Electrocatalysts

  • Park, Soo-Jin;Park, Jeong-Min;Seo, Min-Kang
    • Bulletin of the Korean Chemical Society
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    • v.31 no.2
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    • pp.331-334
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    • 2010
  • In the present study, carbon supports mixed with purified multi-walled carbon nanotubes (MWNTs) and carbon blacks (CBs) were used to improve the cell performance of direct methanol fuel cells (DMFCs). Additionally, the effect of $O_2$ plasma treatment on CBs/MWNTs supports was investigated for different plasma RF powers of 100, 200, and 300 W. The surface and structural properties of the CBs/MWNTs supports were characterized by FT-IR, X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), and inductive coupled plasma-mass spectrometer (ICP-MS). The electrocatalytic activity of PtRu/CBs/MWNTs catalysts was investigated by cyclic voltammetry measurement. In the experimental results, the oxygen functional groups of the supports were increased with increasing plasma RF power, while the average Pt particle size was decreased owing to the improvement of dispersibility of the catalysts. The electrochemical activity of the catalysts for methanol oxidation was gradually improved by the larger available active surface area, itself due to the introduction of oxygen functional groups. Consequently, it was found that $O_2$ plasma treatments could influence the surface properties of the carbon supports, resulting in enhanced electrocatalytic activity of the catalysts for DMFCs.

Effect of Hydrogen Plasma Treatment on the Photoconductivity of Free-standing Diamond Film (다이아몬드막의 광전도성에 관한 수소 플라즈마 표면 처리의 효과)

  • Sung-Hoon, Kim
    • Proceedings of the Korea Association of Crystal Growth Conference
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    • 1999.06a
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    • pp.337-350
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    • 1999
  • Thick diamond film having ~700${\mu}{\textrm}{m}$ thickness was deposited on polycrystalline molybdenum (Mo) substrate using high power (4kW) microwave plasma enhanced chemical vapor deposition (MPECVD) system. We could achieve free-standing diamond film via detaching as-deposited diamond film from the substrate by rapid cooling them under vacuum. We investigated the variation of photoconductivity after exposing the film surface to either oxygen or hydrogen plasma. At as-grown state, the growth side (the as-grown surface of the film) showed noticeable photoconductivity. The oxygen plasma treatment of this side led to the insulator. After exposing the film surface to hydrogen plasma, on the other hand, we could observe the reappearing of photoconductivity at the growth side. Based on these results, we suggest that the hydrogen plasma treatment may enhance the photoconductivity of free-standing diamond film.

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Effect of hydrogen plasma treatment on the photoconductivity of free-standing diamond film

  • Kim, Sung-Hoon
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.9 no.4
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    • pp.441-445
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    • 1999
  • Thick diamond film having $~700\mu\textrm{m}$ thickness was deposited on polycrystalline molybdenum(Mo) substrate using high power (4 kW) microwave plasma-enhanced chemical vapor depostion (MPECVD) system. We could achieve free-standing diamond film via detaching as-deposited diamond film from the substrate by rapid cooling them under vacuum. We investigated the variation of photoconductivity after exposing the film surface to either oxygen or hydrogen plasma. At as-grown state, the growth side (the as-grown surface of the film) showed noticeable photoconcuctivity. The oxygen plasma treatment of this side led to the insulator. After exposing the film surface to hydrogen plasma, on the other hand, we could observe the reappearing of photoconductivity at the growth side. Based on these results, we suggest that the hydrogen plasma treatment may enhance the photoconductivity of free-standing diamond film.

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Physical Properties and Dyeing Behaviors of Cotton Fabric Treated with Low Temperature Plasma and/or Cellulase (저온플라즈마 및 효소처리한 면의 물성 및 염색성)

  • Yoon, Nam Sik;Lim, Yong Jin
    • Textile Coloration and Finishing
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    • v.8 no.3
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    • pp.59-65
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    • 1996
  • Cotton fabrics were treated by low temperature plasma and/or cellulase, and its physical and dyeing properties were investigated. All the pretreatments of the cotton with low temperature plasma of oxygen, nitrogen and argon slowed down the rate of weight loss of cotton in cellulase solution. Plasma pretreatment did not show any strength retention effect on cotton fiber in the subsequent cellulase treatment. Pretreatment of cotton with low temperature oxygen plasma decreased the rate of dyeing in direct dye bath, while cellulase or plasma/cellulase pretreatment increased the rate. Equilibrium dye uptake of cotton was not changed greatly by the pretreatments except the normal untreated cotton showed more or less high uptake. The pretreatment of cellulase with a water-soluble carbodiimide reduced the enzymatic activity, and did not show any strength retention of cotton in enzymatic weight loss.

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Influence of Hydrogen and Oxygen Plasma Treatment on the Structural Properties of Carbon Nanotubes (MPECVD를 이용한 탄소나노튜브의 $H_2$$O_2$ 플라즈마 처리에 따른 특성 변화)

  • Lee, Dong-Jin;Lee, Jae-Hyeong;Park, Dae-Hee;Nah, Chang-Woon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.164-165
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    • 2007
  • The effect of hydrogen and oxygen plasma treatments on the structural properties of carbon nanotubes (CNTs) has been systematically investigated. The plasma treatment resulted in the removal of the amorphous carbon particles. As the plasma treatment time was longer, the CNT diameter was reduced, regardless of gas types. Especially, for the sample treated in hydrogen plasma, the catalyst metal on the tip of CNTs was eliminated.

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Effects of Plasma Treatment on the Reliability of a-IGZO TFT

  • Xin, Dongxu;Cui, Ziyang;Kim, Taeyong;Yi, Junsin
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.34 no.2
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    • pp.85-89
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    • 2021
  • High reliability thin film transistors are important factors for next-generation displays. The reliability of transparent a-IGZO semiconductors is being actively studied for display applications. A plasma treatment can fill the oxygen vacancies in the channel layer and the channel layer/insulating layer interface so that the device can work stably under a bias voltage. This paper studies the effect of plasma treatment on the performance of a-IGZO TFT devices. The influence of different plasma gases on the electrical parameters of device and its working reliability are reviewed. The article mentions argon, fluorine, hydrogen and several ways of processing in the atmosphere. Among these methods, F (fluorine) plasma treatment can maximize equipment reliability. It is expected that the presented results will form a basis for further research to improve the reliability of a-IGZO TFT.