• E2M - 전기 전자와 첨단 소재
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• 제7권2호
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• pp.145-151
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• 1994

The multi-dielectric layer SiOz/Si3N4/SiO2(ONO) is used to scale down the memory device. In this paper, the change of composition in ONO layer due to the process condition and the conduction mechanism are observed. The composition of the oxide film grown through the oxidation of nitride film is analyzed using auger electron spectroscopy(AES). AES results show that oxygen concentration increases at the interface between oxide and nitride layers as the thickness -of the top oxide layer increases. Results of I-V measurement show that the insulating properties improve as the thickness of the top oxide layer increases. But when the thickness of the nitride layer decreases below 63.angs, insulating peoperties of film 28.angs. of top oxide and film 35.angs. turn over showing that insulating property of film 28.angs. of top oxide is better than that of film 35.angs. of top oxide. This phenomenon of turn over is thought as the result of generation of surface state due to oxygen flow into nitride during oxidation process. As the thickness of the top oxide and nitride increases, the electrical breakdown field increases, but when the thickness of top oxide reaches 35.angs, the same phenomenon of turn over occurs. Optimum film thickness for scaled multi-layer dielectric of memory device SONOS is estimated to be 63.angs. of nitride layer and 28.angs. of top oxide layer. In this case, maximum electrical breakdown field and leakage current are 18.5[MV/cm] and $8{\times}{10^-12}$[A], respectively.

• 한국미생물·생명공학회지
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• 제40권1호
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• pp.76-81
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• 2012

Removal of methane, benzene and toluene was evaluated in a lab-scale biocover packed with a soil mixture of forest soil and earthworm cast (75:25 weight ratio). The bacterial community in the biocover was characterized using quantitative real-time PCR and terminal restriction fragment length polymorphism. Methane was removed at the upper layer of the biocover (-0.1 ~ -0.4 m), where the oxygen concentration was remarkably lower. The average removal efficiencies for methane and benzene/toluene were 90% and 99%, respectively. The pmoA gene copy numbers, responsible for methane oxidation, in the upper layer were higher than those in the lower layer. While type I methanotrohs dominated the lower layer, type II methanotrophs, such as Methylocystis and Methylosinus, were noted to be predominant in the upper layer. Benzene and toluene were removed from the lower layer (-0.6 ~ -0.9 m) as well as the upper layer. Moreover, the tmoA gene copy number, responsible for benzene/toluene oxidation, seen in the upper layer was not significantly different from those seen in the lower layer. These results suggest that a biocover packed with a soil and earthworm cast mixture is a promising method which could be utilized for the control of methane and volatile organic compounds such as benzene and toluene.

• 한국재료학회:학술대회논문집
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• 한국재료학회 1992년도 춘계학술발표회
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• pp.57-58
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• 1992

The NH$_3$oxidation, which forms thermal oxide layer on silicon substrate with pure $O_2$gas added with small amounts of NH$_3$gas, has good interface sates due to activated gettering effect during oxidation. The superiority of interfae state in NH$_3$ oxidation method is not affected by preprocess but by gettering during oxidation. The dramatec reduction fo interface state is conformed with observing OSF when NH$_3$ oxide is annealed in NH$_3$ atmosphere.

• 한국세라믹학회지
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• 제18권2호
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• pp.79-82
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• 1981

SiC powder was heated in air over the temperature range of 1100-135$0^{\circ}C$. $\beta$-cristobalite was formed to cover the surfaces of SiC particles by the reaction: $SiC(s)+20_2(g)=SiO_2(s)+CO_2(g)$. It is assumed that the diffusion of oxygen ion through the formed surface layer of $\beta$-cristobalite controls the oxidation of the SiC particles. The diffusion coefficient of oxygen ion through the $\beta$-cristobalite layer was obtained as the following equation: $D=3.84{\times}10^{-17}$exp(-14.7/RT)

• 한국표면공학회지
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• 제38권3호
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• pp.126-135
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• 2005

SKD 11 steel has been widely used for tools, metallic mold and die for press working because of its favorable mechanical properties such as high toughness and creep strength as well as excellent oxidation resistance. The ion nitrided tool steel containing Mo results in improvement of corrosion resistance, strength at high temperature and pitting resistance, especially in $Cl^-$ contained environment. But the Mo addition causes a disadvantage such as lower oxidation resistance at elevated temperature. In this study, several effects of ion-disadvantage on the oxidation characteristics for SKD 11 steel with various oxidation temperature were investigated. SKD 11 steels were manufactured by using vacuum furnace and solutionized for 1 hr at $1,050^{\circ}C$. Steel surface was ion nitrided at $500^{\circ}C$ for 1 hr and 5 hr by ion nitriding equipment. ion nitrided specimen were investigated by SEM, OM and hardness tester. Oxidation was carried out by using muffle furnace in air at $500^{\circ}C,\;700^{\circ}C\;and\;900^{\circ}C$ for 1hr, respectively. Oxidation behavior of the ion nitrided specimen was investigated by SEM, EDX and surface roughness tester. The conclusions of this study are as follows: It was found that plasma nitriding for 5 hr at $500^{\circ}C$, compared with ion nitriding for 1 hr at $500^{\circ}C$, had a thick nitrided layer and produced a layer with good wear, corrosion resistance and hardness as nitriding time increased. Nitrided SKD 11 alloy for 1hr showed that wear resistance and hardness decreased, whereas surface roughness increased, compared with nitrided SKD 11 alloy for 5 hr. The oxidation surface at $900^{\circ}C$ showed a good corrosion resistance.

• 한국자기학회지
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• 제13권3호
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• pp.91-96
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• 2003

본 연구에서는 DC 마그네트론 스퍼터를 사용하여 Cr/Co/Al-Ox/Co/Ni-Fe 다층박막에 다양한 두께의 Cr 하지층을 삽입함에 따른 자기적 특성 및 전기적 특성에 관하여 연구하였다. 3 nm 두께의 Cr 하지층 증착시 자기저항비의 변화는 관찰할 수 없었고 적정한 Cr두께가 증가함에 따라 Co의 보자력이 크게 증가되었다 또한, 산화시간이 길수록 두 강자성층간에 보자력 차이 및 절연층의 저항이 점차 증가하였는데, 이는 산화시간에 따라 상부층 계면의 평탄성의 증가에 기인하는 것으로 생각되며 TEM을 통하여 확인할 수 있었다. Cr 하지층 유무에 관계없이 최고 자기저항비가 나타나는 절연층의 산화시간은 60~70초로 비슷하였지만 Cr 두께가 증가할수록 자기저항비는 감소하였다. 이는 전극간 계면의 거칠기의 증가로 인해 미반응 Al의 잔존 확률이 상대적으로 커짐에 따라 터널 전자의 산란이 증가함으로써 나타나는 것으로 생각된다. 이러한 결과로 Cr하지층의 두께는 3 nm로 고정하였으며 하지층의 증착 및 적정산화를 통하여 두 강자성층간에 큰 보자력 차이를 유도할 수 있었다. 이는 재현성에 있어서 가장 큰 문제점을 지닌 TMR 소자에 매우 긍정적인 해결방안을 제시할 수 있게 된다.̄

• 센서학회지
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• 제8권2호
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• pp.202-209
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• 1999

본 연구에서는 기존의 열산화막과 거의 버금가는 전기적 및 화학적인 성질을 가진다고 알려져 있는 다공질 실리콘 산화막을 이용하여 마이크로스트립 전송선을 제작하였다. 실리콘 기판의 결정상태를 유지하면서 표면적과 화학적 활성이 큰 다공질 실리콘층(porous silicon layer)을 형성한 다음, 이를 열산화 하여 수 십 ${\mu}m$ 두께의 산화막을 실리콘 기판 상에 제조하였다. 수십 ${\mu}m$ 이상의 양질의 산화막을 얻기 위한 다공질 실리콘의 산화시에 스트레스에 의한 웨이퍼의 휘어짐을 방지하기 위하여 다단계의 열산화 공정을 수행하였다. 제조된 실리콘 산화막 상에 마이크로스트립 전송선을 제작하고 그 마이크로웨이브 특성을 측정하여 MMIC 기판으로서의 응용 가능성을 조사하였다.

• 열처리공학회지
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• 제20권6호
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• pp.299-305
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• 2007

The effect of spray deposition of oxide particles on oxidation behaviors of as-cast Mo-14.2Si-9.6B (at%) alloys at $1200^{\circ}C$ up to for 100 hrs has been investigated. Various oxide powders are utilized to make coatings by spray deposition, including $SiO_2,\;TiO_2,\;ZrO_2,\;HfO_2$ and $La_2O_3$. It is demonstrated that the oxidation resistance of the cast Mo-Si-B alloy can be significantly improved by coating with those oxide particles. The growth of the oxide layer is reduced for the oxide particle coated Mo-Si-B alloy. Especially, for the alloy with $ZrO_2$ coating, the thickness of oxide layer becomes only one fifth of that of uncoated alloys when exposed to in air for 100 hrs. The reduction of oxide scale growth of the cast Mo-Si-B alloy due to oxide particle coatings are discussed in terms of the change of viscosity of glassy oxide phases that form during oxidation at high temperature.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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• pp.109-109
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• 2011

CO oxidaition reacitvity of bare and $TiO_2$ -coated NiO/$Ni(OH)_2$ nanoparticles was studied. For the deposition of $TiO_2$ atomic layer deposition was used, and formation of three-dimensional island of $TiO_2$ on NiO/$Ni(OH)_2$ could be identified. Based on the data of X-ray Photoelectron Spectroscopy, we suggest that only $Ni(OH)_2$ existed on the surface, whereas NiO disappeared upon $TiO_2$ deposition. Both CO adsorption and CO oxidation took place on NiO/$Ni(OH)_2$ surfaces under our experimental conditions. CO adsorption was completely suppressed after $TiO_2$ deposition, whereas CO oxidation activity was maintained to large extent. It is proposed that bare NiO can uptake CO under our experimental condition, whereas hydroxylated surface of NiO can be active for CO oxidation.

• Corrosion Science and Technology
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• 제2권3호
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• pp.148-154
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• 2003

The addition of Ni leads to the formation of protective rust layer on steel and subsequently high corrosion resistance of steel in $Cl^-$-containing environment. $\alpha$-FeOOH, $\beta$-FeOOH, $\gamma$-FeOOH and $Fe_3O_4$ are formed mainly on steels exposed to $Cl^-$-containing environment. As the first work of this kind, this study reports the influence of Ni on the oxidation behavior of $Ni_xFe_{1-x}(OH)_2$ in $Cl^-$-containing solution at two different pH regions(condition I under which the solution pH is allowed to decrease and condition I under which solution pH is maintained at 8) where $\gamma$-FeOOH and $Fe_3O_4$ are predominantly formed, respectively, upon oxidation of $Fe(OH)_2$, In the presence of Ni(II) in the starting solution, the formation of $\beta$-FeOOH was facilitated and the formation of $\gamma$-FeOOH was suppressed with increasing Ni(II) content and with increasing oxidation rate of Fe(II). Ni(II) was found to have $Fe_3O_4$-suppressing effect under condition II.