• 제목/요약/키워드: Out Layer Removal

검색결과 91건 처리시간 0.027초

Nd:YAG 레이저를 이용한 철제 표면 옻칠 제거 실험 연구 (Experimental Study for Removing Lacquer Layer on Iron Surface by Nd:YAG Laser System)

  • 박창수;조남철;황현성
    • 보존과학회지
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    • 제32권3호
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    • pp.377-384
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    • 2016
  • 철불의 개금 시 표면에 남아 있는 옻칠 제거 방법에는 물리적인 방법과 화학적인 방법을 사용하고 있으나, 표면 손상 및 약품 사용으로 인한 환경오염, 보존과학자의 건강에도 매우 유해하다. 그래서 본 연구에서는 비접촉식이고 친환경적인 Nd:YAG 레이저를 이용하여 옻칠 제거 실험을 실시하였다. 시편은 크기가 $5{\times}5cm$인 철제(Fe 99.9%)시편 표면을 균일하게 연마한 후 생칠을 도포 횟수를 달리하여 각각 $10{\mu}m$, $20{\mu}m$, $30{\mu}m$의 두께 차이로 제작하였다. 본 실험에서 사용된 레이저기기는 Nd:YAG 레이저로, 적외선 영역의 1064 nm(160~800 mJ)와 가시광선 영역인 532nm(50~350 mJ)의 두 가지 파장 모드를 이용하였다. 실험은 레이저 파장 에너지 조사 횟수 등에 따른 시편 표면의 변화를 조사하였다. 레이저 조사 전 후 표면을 실체현미경과 SEM 관찰, 비접촉 표면 조도 측정기, FT-IR 등을 이용하여 옻칠의 제거 및 잔류 여부를 알아보았다. 분석 결과 1064 nm 파장을 이용하여 $1.0J/cm^2$ 밀도에서 표면 손상 없이 $10{\mu}m$, $20{\mu}m$ 두께의 옻칠이 제거됨을 확인할 수 있었다. 이와 같은 결과를 통해 철불 개금 시 잔류하고 있는 옻칠 제거 방법으로 Nd:YAG 레이저가 효율적임을 본 실험을 통해 알 수 있었다. 향후 금속뿐만 아니라 목칠 가구 등 다양한 재질의 연구가 이루어지면 표면 손상 없이 옻칠을 제거 하는데 효과적으로 활용 가능할 것으로 본다.

Shrinkproof Effect and Property of Shrinkproof-Finished Wool Knit

  • Park Myung-Ja;Kwak Soo-Kyoung
    • The International Journal of Costume Culture
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    • 제7권2호
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    • pp.103-111
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    • 2004
  • The shrinkproof-finished wool fibers treated with resin coating and chlorination methods were used to find out an optimal shrinkproof finishing method keeping the quality properties of wool fabric to manufacturers. Shrinkage during repeated washing, electrostatic propensity, thermal resistance and pilling propensity of shrinkproof-finished wool knits, and analysis of finishing methods were measured. Upon the results from the surface examination of shrinkproof-finished wool fibers, the patterns of scale layer and degree of scale removal were subject to change according to the finishing processes. The shrink resistance was significantly enhanced on repeated washing of shrinkproof-finished knits, especially, chlorinated wool. Addition of strong physical force and alkali detergent applied in this washing experiment brought about superior effects with the low shrinkage rate although it was very severe washing conditions for wool fabrics. The results from the washing experiment implies that shrinkproof-finished knitted fabrics can be machine washed at individual households with other ordinary laundry. There was some changes and variation found in thermal resistance, electrostatic propensity, and pilling, however, it seems to be minor within standard limits. Therefore, shrinkproof-finished knitted fabrics did not bring serious changes to other physical properties comparing with original wool, which helps consumers handle wool knitted clothes more conveniently.

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지하철 목업차량내 객실 공기정화장치의 미세먼지(PM10) 및 $CO_2$ 저감성능평가 (Removal Efficiency of PM10 & $CO_2$ in Subway Mock-up Cabin)

  • 권순박;박덕신;조영민;김종범;조관현;남궁석;이주열;김태성
    • 한국철도학회:학술대회논문집
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    • 한국철도학회 2011년도 춘계학술대회 논문집
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    • pp.613-618
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    • 2011
  • More than 7 million persons use Seoul Metropolitan Subways (SMS) everyday and the number has been in increasing trend. With the increasing trend of concerns on indoor air quality(IAQ), the management of IAQ has become an important issue, especially in case of subway operators, because most of subway lines are placed underground with poor ventilation condition. The ultimate object of study develop independent cleaning device that reduce efficient fine particle and $CO_2$. Urban subway has characteristics about proper clean air flow, must be installed in narrow space and maintenance cycle has enough time. Two layered electrically pre-charged filters were used for removing particulate matters and gas absorbers are packed between two layer filters for removing gases pollutants such $CO_2$, VOCs and HCHO. Urban subway has characteristics about proper clean air flow, must be installed in narrow space and maintenance cycle has enough time. SCAP prototype is producted as all in one method which decrease fine dust, $CO_2$ and noxious gas. and basic test carry out with quantity of wind, a gap of pressure, sampling efficiency.

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Dip 추출에서 유체 표면의 영향을 고려한 친환경 포토레지스트 박리공정 (Green Photoresist Stripping Process with the Influence of Free Surface from Dip Withdrawal)

  • 김준현;김승현;정병현;주기태;김용성
    • 한국생산제조학회지
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    • 제25권1호
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    • pp.14-20
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    • 2016
  • This paper describes a green stripping process to effectively strip the remaining DFR layer on a non-alkali-based ITO glass surface after an etching process. A stripper, water-soluble amine compound, is used to investigate the characteristics of stripping ability and to suggest a valid method for the green process. Increasing the composition (5-30% concentration) of the ethanol amine-based stripper was found to greatly reduce the stripping time applied in the dipping method. The composition (30%) achieved an excellent stripping effect and free-residue impurities. Additionally, it was possible to obtain the effect of stripping in a way to sustain the release before generating DFR sludge from the ITO glass surface by using dipping condition (stripping time) in the composition. An Additional stripping process (buffering) out of dipping can realize productivity improvement and cost reduction because of the higher proportion of re-use of the stripping solution used in the DFR removal step.

Cl2/HBr/CF4 반응성 이온 실리콘 식각 후 감광막 마스크 제거 (Removal of Photoresist Mask after the Cl2/HBr/CF4 Reactive Ion Silicon Etching)

  • 하태경;우종창;김관하;김창일
    • 한국전기전자재료학회논문지
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    • 제23권5호
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    • pp.353-357
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    • 2010
  • Recently, silicon etching have received much attention for display industry, nano imprint technology, silicon photonics, and MEMS application. After the etching process, removing of etch mask and residue of sidewall is very important. The investigation of the etched mask removing was carried out by using the ashing, HF dipping and acid cleaning process. Experiment shows that oxygen component of reactive gas and photoresist react with silicon and converting them into the mask fence. It is very difficult to remove by using ashing or acid cleaning process because mask fence consisted of Si and O compounds. However, dilute HF dipping is very effective process for SiOx layer removing. Finally, we found optimized condition for etched mask removing.

$CHF_3$/$C_2$$F_6$ 반응성이온 건식식각에 의한 실리콘 표면의 오염 및 제거에 관한 연구 (A Study on the Silicon surface and near-surface contamination by $CHF_3$/$C_2$$F_6$ RIE and its removal with thermal treatment and $O_2$ plasma exposure)

  • 권광호;박형호;이수민;곽병화;김보우;권오준;성영권
    • 전자공학회논문지A
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    • 제30A권1호
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    • pp.31-43
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    • 1993
  • Thermal behavior and $O_{2}$ plasma effects on residue and penetrated impurities formed by reactive ion etching (RIE) in CHF$_{3}$/C$_{2}$F$_{6}$ have been investigated using X-ray photoelectron spectroscopy (XPS) and secondary ion mass spectrometry (SIMS) techniques. Decomposition of polymer residue film begins between 200-300.deg. C, and above 400.deg. C carbon compound as graphite mainly forms by in-situ resistive heating. It reveals that thermal decomposition of residue can be completed by rapid thermal anneal above 800.deg. C under nitrogen atmosphere and out-diffusion of penetrated impurities is observed. The residue layer has been removed with $O_{2}$ plasma exposure of etched silicon and its chemical bonding states have been changed into F-O, C-O etc.. And $O_{2}$ plasma exposure results in the decrease of penetrated impurities.

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22.9kV/50MVA급 고온초전도 전력케이블의 DC Ic 측정 및 교류손실에 관한 연구 (The study on the DC Ic measurement and AC loss in the 22.9kV, 50MVA HTS power cable)

  • 최석진;이상진;심기덕;조전욱
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2008년도 제39회 하계학술대회
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    • pp.808-809
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    • 2008
  • 22.9kV 50MVA HTS power cable has been developed and tested by Korea Electrotechnology Research Institute and LS Cable Company and it was supported by a grant from Center for Applied Superconductivity Technology of the 21st Century Frontier R&D Program. In this paper, DC Ic of 100m HTS cable which is installed at Kochang testing station was measured and analyzed. A measurement technique of DC Ic used by resistance and inductance removal method is established. The HTS power cable is composed of 2 layers for transmission and 1 layer for shield. For the analysis of AC losses in an HTS power cable, 2-dimensional numerical calculation was carried out to define the magnetic field distribution. We calculated the magnetization losses in the HTS core of that cable from these fields. These calculated results are in accordance with those of experiment.

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Selective fabrication and etching of vertically aligned Si nanowires for MEMS

  • Kar, Jyoti Prakash;Moon, Kyeong-Ju;Das, Sachindra Nath;Kim, Sung-Yeon;Xiong, Junjie;Choi, Ji-Hyuk;Lee, Tae-Il;Myoung, Jae-Min
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2010년도 춘계학술발표대회
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    • pp.27.2-27.2
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    • 2010
  • In recent years, there is a strong requirement of low cost, stable microelectro mechanical systems (MEMS) for resonators, microswitches and sensors. Most of these devices consist of freely suspended microcantilevers, which are usually made by the etching of some sacrificial materials. Herein, we have attempted to use Si nanowires, inherited from the parent Si wafer, as a sacrificial material due to its porosity, low cost and ease of fabrication. Prior to the fabrication of the Si nanowires silver nanoparticles were continuously formed on the surface of Si wafer. Vertically aligned Si nanowires were fabricated from the parent Si wafers by aqueous chemical route at $50^{\circ}C$. Afterwards, the morphological and structural characteristics of the Si nanowires were investigated. The morphology of nanowires was strongly modulated by the resistivity of the parent wafer. The 3-step etching of nanowires in diluted KOH solution was carried out at room temperature in order to control the fast etching. A layer of $Si_3N_4$ (300 nm) was used for the selective fabrication of nanowires. Finally, a freely suspended bridge of zinc oxide (ZnO) was fabricated after the removal of nanowires from the parent wafer. At present, we believe that this technique may provide a platform for the inexpensive fabrication of futuristic MEMS.

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Solute Transport Model with Cation Exchange under Redox Environment and its Application for Designing the Slow Infiltration Set-up

  • GUERRA, GINGGING;JINNO, KENJI;HIROSHIRO, YOSHINARI;NAKAMURA, KOJI
    • 한국수자원학회:학술대회논문집
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    • 한국수자원학회 2004년도 학술발표회
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    • pp.90-101
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    • 2004
  • The present trend of disposing treated sewage water by allowing it to infiltrate the soil brings a new dimension to environmental problems. It is therefore necessary to identify the chemicals likely to be present in treated sewage water. A soil column experiment was conducted to determine the behavior of chemical species in soil columns applied with secondary treated sewage water. To predict the behavior of chemical species, a multicomponent solute transport model that includes the biochemical redox process and cation exchange process was developed. The model computes changes in concentration over time caused by the processes of advection, dispersion, biochemical reactions and cation exchange reactions. The solute transport model was able to predict the behavior of the different chemical species. The model reproduced the sequential reduction reaction. To design the safe depth of plow layer where $NO_3^-$ is totally reduced, a numerical study of $NO_3^-$ leach was done and it was found out that the pore velocity and concentration of $CH_2O$ at the inject water was found to affect $NO_3^-$ reduction in the mobile pore water phase. It is revealed that the multicomponent solute transport model is useful to design the land treatment system for $NO_3^-$ removal from wastewater.

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황사의 크기 및 침착량에 대한 수치 모의 (A Numerical Study on the Size and Depositions of Yellow Sand Events)

  • 정관영;박순웅
    • 한국대기환경학회지
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    • 제14권3호
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    • pp.191-208
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    • 1998
  • Estimations of dry and wet depositions in Korea and the size distributions of yellow sand above Korea have been carried out using the Eulerian aerosol model with the simulated meteorological data from the SNU mesoscale meteorological model. The estimated particle size distribution in Korea shows a bimodal distribution with peak values at 0.6 pm and 7 pm and a minimum at 2 pm in the lower layer However, as higher up, the bimodal distribution becomes an unimodal distribution with a peak value at 4∼5mm. Among the total amount of yellow sand deflated in the source regions , the dry and wet deposition fluxes were about 92%, and about 1.3∼0.5%, repectively, and the rest(5∼6%) is suspended in the air, Most of dust lifted in the air during the clear weather is deposited in the vicinity of the source regions by dry deposition and the rest undergoes the long -range transport with a gradual removal by the wet deposition processes. Over Korean peninsula, the total amount of yellow sand suspended in the air was about 6∼8% of the emissions in the source region and the dry and wet deposition fluxes were about 0.005∼0.7% and 0.003∼0.051% of the total emitted amount, repectively. It is estimated that 2.7∼8.9 mesa-tons of yellow sand is transported annually over the Korean peninsula with the annual mean dry deposition of 2.1∼490 kilo-tons and the annual mean wet deposition of 1.5∼65 kilo-tons.

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