• Title/Summary/Keyword: Optoelectronic

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The Experimental Study in the Micro Drilling of Excimer Laser on Pyrex Glass (엑시머 레이저를 이용한 파이렉스 유리의 미세 구멍 가공)

  • Lee, Chul-Jae;Kim, Ha-Na;Jeong, Yun-Sang;Jun, Chan-Bong;Park, Young-Chul;Kang, Jung-Ho
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.11 no.5
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    • pp.99-103
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    • 2012
  • Presently, A glass is widely used in telecommunication system, optoelectronic devices and micro electro mechanical systems. Micro drilling of glass using the laser can save processing cost and improve the accuracy. This paper experiments micro drilling using KrF excimer laser on the pyrex glass of $500{\mu}m$ thickness. We have experiment to find out optimum laser machining conditions of micro drilling of glass and ablation depth and influence by processing parameter suc'h pulse repetition rate, energy density and number of pulses. Pulse repetition rate don't influence ablation depth at the micro drilling of pyrex glass. Energy density influence micro drilling of parallelism and maximum thickness that can be drilled. Ablation depth is most influenced by number of pulses.

A Study on the Micro-lapping process of Sapphire Wafers for optoelectronic devices (광반도체용 사파이어웨이퍼 기계연마특성 연구)

  • 황성원;김근주;서남섭
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2003.06a
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    • pp.82-85
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    • 2003
  • The sapphire wafers for blue light emitting devices were manufactured by the implementation of the surface machining technology based on micro-tribology. This process has been performed by Micro-lapping process. The sapphire crystalline wafers were characterized by DCXD(Double Crystal X-ray Diffraction). The sample quality of crystalline sapphire wafer at surface has a FWHM(Full Width at Half Maximum) of 250 arcsec. This value at the sapphire wafer surfaces indicated 0.12${\mu}{\textrm}{m}$ sizes. Surfaces of sapphire wafers were mechanically affected by residual stress and surface default. Also Surfaces roughness of sapphire wafers were measured 2.1 by AFM(Atom Force Microscope).

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Synthesis and Characterisation of Hole Transporting Materials Based on N,N,N-Tris-[4-(Naphthalen-1-yl-phenylamino)Phenyl]-N,N,N-Triphenylbenzene-1,3,5-Triamine (N,N,N-Tris-[4-(Naphthalen-1-yl-phenylamino)Phenyl]-N,N,N-Triphenylbenzene-1,3,5-Triamine을 이용한 Hole Transporting 재료의 합성)

  • Mathew, Siji;Haridas, Karickal R.
    • Journal of the Korean Chemical Society
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    • v.54 no.6
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    • pp.717-722
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    • 2010
  • Two derivatives of star shaped compounds based on naphthylamine with symmetric trisubstituted benzene as core, methoxy and ethoxy as end substitutions are synthesized. The synthesized compounds are characterized by UV-visible, FT-IR and NMR spectrometric techniques. The electronic and thermal properties of the compounds are studied using cyclic voltametry (CV) and differential scanning calorimetry (DSC) respectively. The data's obtained have similarity with the arylamines that have been already used in optoelectronic devices. So these compounds are interesting materials for applications in such devices.

Quantum Dot Optoelectronic Devices

  • P., Lever;K., Stewart;Q., Gao;L., Fu;J., Wong-Leung;M., Buda;H.H., Tan;C., Jagadish
    • Proceedings of the Optical Society of Korea Conference
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    • 2004.07a
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    • pp.4-5
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    • 2004
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Single Nanoparticle Photoluminescence Studies of Visible Light-Sensitive TiO2 and ZnO Nanostructures

  • Yoon, Minjoong
    • Rapid Communication in Photoscience
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    • v.2 no.1
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    • pp.9-17
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    • 2013
  • Visible light-sensitive $TiO_2$ and ZnO nanostructure materials have attracted great attention as the promising material for solar energy conversion systems such as photocatalysts for water splitting and environmental purification as well as nano-biosensors. Success of their applications relies on how to control their surface state behaviors related to the exciton dynamics and optoelectronic properties. In this paper, we briefly review some recent works on single nanoparticle photoluminescence (PL) technique and its application to observation of their surface state behaviors which are raveled by the conventional ensemble-averaged spectroscopic techniques. This review provides an opportunity to understand the temporal and spatial heterogeneities within an individual nanostructure, allowing for the potential use of single-nanoparticle approaches in studies of their photoenergy conversion and nano-scale optical biosensing.

Interfacial Reactions Between Au-20Sn Solder and Cu Substrate with or without ENIG plating layer (Eutectic Au-20Sn solder와 Cu/ENIG 기판과의 계면반응)

  • Jeon Hyeon-Seok;Yun Jeong-Won;Jeong Seung-Bu
    • Proceedings of the KWS Conference
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    • 2006.05a
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    • pp.230-232
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    • 2006
  • Eutectic Au-20Sn solder has been widely used for optoelectronic packages because of fluxless soldering process and thus are particularly valuable for many applications such as biomedical, photonic, and MEMS devices that can not use any flux. Also when good joint strength, superior resistance to corrosion, whisker-free, and good thermal conductivity are demanded, eutectic Au-20Sn solder can be satisfied with above-mentions best. In this study, we tried to know the interfacial reactions between Au-20Sn solder and Cu substrate with or without ENIG plating layer In the results, Au-Cu-Sn ternary phases were formed at the Au-20Sn/Cu substrate, and Au-Ni-Sn, Au-Ni-Cu-Sn phases were formed at the Au-20Sn/ENIG substrate.

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Fabrication and Characteristics Study of $n-Bi_2O_3$/n-Si Heterojunction

  • Ismail, Raid A.
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.6 no.2
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    • pp.119-123
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    • 2006
  • This work presents the fabrication and characteristics of $Bi_2O_3/Si$ heterojunction prepared by rapid thermal oxidation technique without any postdeposition annealing condition. The bismuth trioxide film was deposited onto monocrystalline Si and glass substrates by rapid thermal oxidation of bismuth film with aid of halogen lamp at $500^{\circ}C/\;45$ s in static air. The structural, optical and electrical properties of $Bi_2O_3$ film were investigated and compared with other published results. The structural investigation showed that the grown films are polycrystalline and multiphase (${\alpha}-Bi_2O_3$ and ${\beta}-Bi_2O_3$). Optical properties revealed that these films having direct optical band gap of 2.55 eV at 300 K with high transparency in visible and NIR regions. Dark and illuminated I-V, CV, and spectral responsivity of $Bi_2O_3/Si$ heterojunction were investigated and discussed.

Microwave Photonics Frequency-Converted Link Using Electroabsorption Devices

  • Wu, Y.;Shin, D.S.;Chang, W.S.C.;Yu, P.K.L.
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.4 no.1
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    • pp.74-81
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    • 2004
  • We propose a novel scheme to transmit high center frequency RF signals using electroabsorption devices (EADs) as frequency converters at the transmitter and the receiver. In this approach frequency heterodyning is employed for obtaining high center frequency. With the EAD as a detector/mixer at the receiver we demonstrated a smaller conversion loss than that of the conventional modulator/mixer. With EAD as a modulator/mixer at the transmitter and with two heterodyned lasers to generate an optical local oscillator (LO), we demonstrated a large reduction (${\sim}23dB$) in conversion loss, and the transmission is not limited by the optical saturation of the EAD. This transmission scheme has optical single-side-band transmission feature which greatly relieves the fiber dispersion effect.

Study on Misfit Dislocations and Critical Thickness in a $Si_xGe_{1-x}$ Epitaxial Film on a Si Substrate (Si 모재 위의 $Si_xGe_{1-x}$ 박막에서 부정합 전위와 임계두께에 관한 연구)

  • Shin, J.H.;Kim, J.H.;Earmme, Y.Y.
    • Proceedings of the KSME Conference
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    • 2001.06a
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    • pp.298-303
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    • 2001
  • The critical thickness of an epitaxial film on a substrate in electronic or optoelectronic devices is studied on the basis of equilibrium dislocation analysis. Two geometric models, a single dislocation and an array of dislocations in heteroepitaxial system, are considered respectively to calculate the misfit dislocation formation energy. The isotropic linearly elastic stress fields for the models are obtained by means of complex potential method combined with alternating technique, and are used for calculating the formation energies. As a result, the effect of elastic mismatch between film and substrate on critical thickness is presented and $Si_xGe_{1-x}/Si$ epitaxial structure is analyzed to predict the critical thickness with varying germanium concentration.

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Onset on the Rate Limiting Factors of InP Film Deposition in Horizontal MOCVD Reactor (수평형 MOCVD 반응기 내의 InP 필름성장 제어인자에 대한 영향 평가)

  • Im, Ik-Tae;Sugiyama, Masakazu;Nakano, Yoshiyaki;Shimogaki, Yukihiro
    • Proceedings of the KSME Conference
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    • 2003.11a
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    • pp.73-78
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    • 2003
  • The InP thin films grown by metalorganic chemical vapor deposition (MOCVD) are widely used to optoelectronic devices such as laser diodes, wave-guides and optical modulators. Effects of various parameters controlling film growth rate such as gas-phase reaction rate constant, surface reaction rate constant and mass diffusivity are numerically investigated. Results show that at the upstream region where film growth rate increases with the flow direction, diffusion including thermal diffusion plays an important role. At the downstream region where the growth rate decreases with flow direction, film deposition mechanism is revealed as a mass-transport limited. Mass transport characteristics are also studied using systematic analyses.

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