• 제목/요약/키워드: Optoelectrical

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$AgGaSe_2$ 단결정 박막 성장과 광전기적 특성 (Growth and Optoelectrical Properties for $AgGaSe_2$ Single Crystal Thin Films)

  • 홍광준;유상하
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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    • pp.171-174
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    • 2004
  • The stochiometric $AgGaSe_2$ polycrystalline mixture of evaporating materials for the $AgGaSe_2$ single crystal thin film was prepared from horizontal furnace. To obtain the single crystal thin films, $AgGaSe_2$ mixed crystal and semi-insulating GaAs(100) wafer were used as source material and substrate for the Hot Wall Epitaxy (HWE) system, respectively. The source and substrate temperature were fixed at $630^{\circ}C$ and $420^{\circ}C$, respectively. The thickness of grown single crystal thin films is $2.1{\mu}m$. The single crystal thin films were investigated by photoluminescence and double crystal X-ray diffraction(DCXD) measurement. The carrier density and mobility of $AgGaSe_2$ single crystal thin films measured from Hall effect by van der Pauw method are $4.89{\times}10^{17}\;cm^{-3},\;129cm^2/V{\cdot}s$ at 293K, respectively. From the photocurrent spectrum by illumination of perpendicular light on the c - axis of the $AgGaSe_2$ single crystal thin film, we have found that the values of spin orbit splitting ${\Delta}S_o$ and the crystal field splitting ${\Delta}C_r$ were 0.1762 eV and 0.2494 eV at 10 K, respectively. From the photoluminescence measurement of $AgGaSe_2$ single crystal thin film, we observed free excition $(E_X)$ observable only in high quality crystal and neutral bound exciton $(D^o,X)$ having very strong peak intensity And, the full width at half maximum and binding energy of neutral donor bound excition were 8 meV and 14.1 meV, respectively. By Haynes rule, an activation energy of impurity was 141 meV.

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$CuInS_2$ 단결정 박막 성장과 광전기적 특성 (Growth and Optoelectrical Properties for $CuInS_2$ Single Crystal Thin Film)

  • 홍광준;이상열
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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    • pp.230-233
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    • 2004
  • The stochiometric mix of evaporating materials for the $CuInS_2$ single crystal thin films was prepared from horizontal furnance. Using extrapolation method of X-ray diffraction patterns for the $CuInS_2$ polycrystal, it was found tetragonal structure whose lattice constant $a_0$ and $c_0$ were $5.524\;{\AA}$ and $11.142\;{\AA}$, respectively. To obtain the single crystal thin films, $CuInS_2$ mixed crystal was deposited on throughly etched semi-insulator GaAs(100) substrate by the hot wall epitaxy (HWE) system. The source and substrate temperature were 640 t and 430 t, respectively and the thickness of the single crystal thin films was $2{\mu}m$. Hall effect on this sample was measured by the method of van dot Pauw and studied on carrier density and temperature dependence of mobility. The carrier density and mobility deduced from Hall data are $9.64{\times}10^{22}/m^3,\;2.95{\times}10^{-2}\;m^2/V{\cdot}s$ at 293 K, respectively The optical energy gaps were found to be 1.53 eV at room temperature. From the photocurrent spectrum by illumination of perpendicular light on the c - axis of the thin film, we have found that the values of spin orbit coupling splitting ${\Delta}So$ and the crystal field splitting ${\Delta}Cr$ were 0.0211 eV and 0.0045 eV at 10 K, respectively. From PL peaks measured at 10K, 807.7nm (1.5350ev) mean Ex peak of the free exciton emission, also 810.3nm (1.5301eV) expresses $I_2$ peak of donor-bound exciton emission and 815.6nm (1.5201eV) emerges $I_1$ peak of acceptor-bound exciton emission. In addition, the peak observed at 862.0nm (1.4383eV) was analyzed to be PL peak due to donor-acceptor pair(DAP).

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Mg와 ZnO 함량변화에 따른 MAZO, MIZO 박막의 특성비교 (Characteristic Comparison of MAZO and MIZO Thin Films with Mg and ZnO Variation)

  • 장준성;김인영;정채환;문종하;김진혁
    • Current Photovoltaic Research
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    • 제3권3호
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    • pp.101-105
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    • 2015
  • ZnO is gathering great interest for large square optoelectrical devices of flat panel display (FHD) and solar cell as a transparent conductive oxide (TCO). Herewith, Mg and IIIA (Al, In) co-doped ZnO films were prepared on SLG substrate using RF magnetron sputtering system. The effect of variation of atomic weight % of Mg and ZnO have been investigated. The atomic weight % Al and In are of 3% and kept constant throughout. The numbers of samples were prepared according to their different contents, which are $M_{3%}AZO_{94%}$, $M_{4%}AZO_{93%}-(MAZO)$ and $M_{3%}IZO_{94%}$, $M_{4%}IZO_{93%}-(MIZO)$ respectively. A RF power of 225 W and working pressure of 6 m Torr was used for the deposition at $300^{\circ}C$. All of the two thin film show good uniformity in field emission scanning electron microscopy image. $M_{3%}AZO_{94%}$ thin film shows overall better performance among the all. The film shows the best lowest resistivity, carrier concentration, mobility and Sheet resistance and is found to be are of $8.16{\times}10^{-4}{\Omega}cm$, $4.372{\times}10^{20}/cm^3$, $17.5cm^2/vs$ and $8.9{\Omega}/sq$ respectively. Also $M_{3%}AZO_{94%}$ thin film shows the relatively high optical band gap energy of 3.7 eV with high transmittance more than 80% in visible region required for the better solar cell performance.

증착조건과 진공열처리 온도에 따른 ITO/PES 박막의 특성 연구 (Properties of ITO on PES film in dependence on the coating conditions and vacuum annealing temperatures)

  • 이재영;박지혜;김유성;천희곤;유용주;김대일
    • 한국재료학회지
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    • 제17권4호
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    • pp.227-231
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    • 2007
  • Transparent conducting indium tin oxide (ITO) films were deposited onto the Polyethersulfone (PES) substrate by using a magnetron sputter type negative metal ion source. In order to investigate the influence of cesium (Cs) partial pressure during deposition and annealing temperature on the optoelectrical properties of ITO/PES film the films were deposited under different Cs partial pressures and post deposition annealed under different annealing temperature from $100^{\circ}C$ to $170^{\circ}C$ for 20 min at $3\;{\times}\;10^{-1}$ Pa. Optoeleetrical properties of ITO films deposited without intentional substrate heating was influenced strongly by the Cs partial pressure and the Cs partial pressure of $1.5\;{\times}\;10^{-3}$ Pa was characterized as an optimal Cs flow condition. By increasing post-deposition vacuum annealing temperature both optical transmission in visible light region and electrical conductivity of ITO films were increased. Atomic force microscopy (AFM) micrographs showed that the surface roughness also varied with post-deposition vacuum annealing temperature.

열화학 기상 증착법에 의한 비정질 SiOx 나노와이어의 성장 (Growth of Amorphous SiOx Nanowires by Thermal Chemical Vapor Deposition Method)

  • 김기출
    • 융합정보논문지
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    • 제7권5호
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    • pp.123-128
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    • 2017
  • 나노구조를 갖는 물질들은 나노구조물이 갖는 고유의 체적 대비 높은 표면적 비와 양자 갇힘 효과에 기인하는 독특한 전기적, 광학적, 광전기적, 자기적 특성으로 인하여 많은 주목을 받아왔다. 열화학 기상 증착 공정은 나노 구조물의 성장과정에서 다양한 구조를 갖는 나노소재의 합성 능력 때문에 더욱 주목을 받아왔다. 본 연구에서는 두 영역 열화학 기상 증착법과 소스 물질 $TiO_2$ 파우더를 이용하여 VLS 공정으로 Si\$SiO_2$(300 nm)\Pt(5~40 nm) 기판 위에 실리콘 옥사이드 나노와이어를 성장시켰다. 성장된 실리콘 옥사이드 나노와이어의 형상과 결정학적 특성을 전계방출 주사전자현미경과 투과전자현미경으로 분석하였다. 분석결과, 성장된 실리콘 옥사이드 나노와이어의 형상인 지름과 길이는 촉매 박막의 두께에 의존하여 다른 모양을 나타내었다. 또한 성장된 실리콘 옥사이드 나노와이어는 비정질 상을 갖는 것으로 분석되었다.

Ga doped ZnO 박막의 질소분위기 열처리에 따른 특성 변화 (Effect of Annealing in Nitrogen Atmosphere on the Characteristics of Ga Doped ZnO Films)

  • 허성보;이영진;이학민;김선광;김유성;공영민;김대일
    • 열처리공학회지
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    • 제24권6호
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    • pp.338-342
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    • 2011
  • Ga doped ZnO (GZO) thin films were deposited with RF magnetron sputtering on glass substrate and then the effect of post deposition annealing at nitrogen atmosphere on the structural, optical and electrical properties of the films was investigated. The post deposition annealing process was conducted for 30 minutes at different temperature of 150, 300 and $450^{\circ}C$, respectively. As increase annealing temperature, GZO films show the increment of the prefer orientation of ZnO (002) diffraction peak in the XRD pattern and the optical transmittance in a visible wave region was also increased, while the electrical sheet resistance was decreased. The figure of merit obtained in this study means that GZO films which vacuum annealed at $450^{\circ}C$ have the highest optoelectrical performance in this study.

구리 전기도금 방법을 이용한 은 나노와이어 투명전극의 전기전도도 향상 (Enhancement of Electrical Conductivity in Silver Nanowire Network for Transparent Conducting Electrode using Copper Electrodeposition)

  • 지한나;장지성;이상엽;정중희
    • 한국재료학회지
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    • 제29권5호
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    • pp.311-316
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    • 2019
  • Transparent conducting electrodes are essential components in various optoelectrical devices. Although indium tin oxide thin films have been widely used for transparent conducting electrodes, silver nanowire network is a promising alternative to indium tin oxide thin films owing to its lower processing cost and greater suitability for flexible device application. In order to widen the application of silver nanowire network, the electrical conductance has to be improved while maintaining high optical transparency. In this study, we report the enhancement of the electrical conductance of silver nanowire network transparent electrodes by copper electrodeposition on the silver nanowire networks. The electrodeposited copper lowered the sheet resistance of the silver nanowire networks from $21.9{\Omega}{\square}$ to $12.6{\Omega}{\square}$. We perform detailed X-ray diffraction analysis revealing the effect of the amount of electrodeposited copper-shell on the sheet resistance of the core-shell(silver/copper) nanowire network transparent electrodes. From the relationship between the cross-sectional area of the copper-shell and the sheet resistance of the transparent electrodes, we deduce the electrical resistivity of electrodeposited copper to be approximately 4.5 times that of copper bulk.

페로브스카이트 할로겐화물 박막의 발광 측정 조건에 따른 특성 분석 (Photoluminescence Characterization of Halide Perovskite Films according to Measuring Conditions)

  • 조현아;이승민;노준홍
    • 한국재료학회지
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    • 제32권10호
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    • pp.419-424
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    • 2022
  • Halide perovskite solar cells (PSCs) have improved rapidly over the past few years, and research on the optoelectrical properties of halide perovskite thin films has grown as well. Among the characterization techniques, photoluminescence (PL), a method of collecting emitted photons to evaluate the properties of materials, is widely applied to evaluate improvements in the performance of PSCs. However, since only photons emitted from the film in the escape cone are included, the photons collected in PL are a small fraction of the total photons emitted from the film. Unlike PSCs power conversion efficiency, PL measuring methods have not been standardized, and have been evaluated in a variety of ways. Thus, an in-depth study is needed of the methods used to evaluate materials using PL spectra. In this study, we examined the PL spectra of the perovskite light harvesting layer with different measurement protocols and analyzed the features. As the incident angle changed, different spectra were observed, indicating that the PL emission spectrum can depend on the measuring method, not the material. We found the intensity and energy of the PL spectra changes were due to the path of the emitted photons. Also, we found that the PL of halide perovskite thin films generally contains limited information. To solve this problem, the emitted photons should be collected using an integrating sphere. The results of this study suggest that the emission spectrum of halide perovskite films should be carefully interpreted in accordance with PL measuring method, since PL data is mostly affected by the method.

Pt 촉매 박막을 이용한 비정질 SiOx 나노기둥의 수직성장 (Vertical Growth of Amorphous SiOx Nano-Pillars by Pt Catalyst Films)

  • 이지언;김기출
    • 한국산학기술학회논문지
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    • 제19권1호
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    • pp.699-704
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    • 2018
  • 일차원 나노구조물은 양자 갇힘 효과 및 나노와이어가 갖는 체적 대비 높은 표면적 비에 기인하는 독특한 전기적, 광학적, 광전기적, 전기화학적 특성으로 인하여 많은 주목을 받아왔다. 특히 수직으로 성장된 나노와이어는 체적 대비 높은 표면적 비의 특성을 나타낸다. VLS(Vapor-Liquid-Soild) 공정은 나노구조물의 성장 과정에서 자기정렬 효과 때문에 더욱 주목을 받는다. 본 연구에서는 두 영역 열화학 기상증착법을 이용하여 Si\$SiO_2$(300 nm)\Pt 기판 위에 수직으로 정렬된 실리콘 옥사이드 나노기둥을 VLS 공정으로 성장시켰다. 성장된 실리콘 옥사이드 나노기둥의 형상과 결정학적 특성을 주사전자현미경 및 투과전자현미경으로 분석하였다. 그 결과 성장된 실리콘 옥사이드 나노기둥의 지름과 길이는 촉매 박막의 두께에 따라 변하였다. 실리콘 옥사이드 나노 기둥의 몸체는 비정질 상을 나타내었으며, Si과 O로 구성되어 있었다. 또한 성장된 실리콘 옥사이드 나노 기둥의 머리는 결정성을 나타내었으며, Si, O, Pt 및 Ti으로 구성되어 있었다. 실리콘 옥사이드 나노 기둥의 수직 정렬은 촉매물질인 Pt/Ti 합금의 결정성 정렬 선호에 기인하는 것으로 판단되며, 수직 성장된 실리콘 옥사이드 나노기둥은 기능성 나노소재로 활용이 가능할 것으로 기대된다.

이더넷 광 네트워크 구현을 위한 1.25 Gbps 광전 트라이플렉스 트랜시버 모듈의 전기적 혼신의 분석 (Characterization of Electrical Crosstalk in 1.25 Gbps Optoelectrical Triplex Transceiver Module for Ethernet Passive Optical Networks)

  • 김성일;이해영
    • 대한전자공학회논문지SD
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    • 제42권3호
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    • pp.25-34
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    • 2005
  • 본 논문에서는 이더넷 광 네트워크 구현을 위한 핵심 부품인 1.25 Gbps 광전 트라이플렉스 트랜시버 모듈(Opto-electric triplex transceiver module)의 동작성능 안정화를 위하여 모듈내에서 발생되는 전기적 혼신을 해석 및 측정하였으며, 혼신 감소를 위한 가상접지선(Dummy ground line)이 포함된 신호선 구조를 제안하였다. 광전 트라이플렉스 트랜시버 모듈은 전기신호를 광신호로 바꾸어 전송하는 송신부(Laser diode), 디지털 변조되어 입력된 광신호를 전기신호로 변환하는 디지털 수신부 (Digital photodetector)와 고해상도의 CATV (Community antenna or access television) 신호를 수신하는 아날로그 수신부 (Analog photodetector)가 실리콘 기판(Silicon substrate) 상에 하이브리드 집적되어 구성된다. 디지털 수신부와 아날로그 수신부의 수신감도는 각각 BER(Bit error rate) : $10^-{12}$에서 -24 dBm과 44 dB의 신호대잡음비(Signal-to-noise ratio, SNR)에서 -7.7 dBm을 만족해야하므로 모듈 내의 전기적 혼신은 DC에서 3 GHz까지 - 86 dB이하로 유지되어야한다. 전기적 혼신의 해석 및 측정 결과, 실리콘 기판상의 광원과 디지털 광검출기, 디지털 광검출기와 아날로그 광검출기 사이의 거리를 4 mm 이상 확보하며, 가상접지선을 디지털 광검출기와 아날로그 광검출기의 신호선과 $100\;{\mu}m$ 간격으로 설치하였을 경우, -86 dB 이하의 전기적 혼신 레벨을 만족할 수 있음을 확인하였다. 본 논문에서 제안한 가상접지선을 사용하는 방법은 실리콘 기판상에 신호선을 형성할 때 동시에 형성할 수 있으므로 별도의 추가비용 없이 구현할 수 있으며, 단순히 광원 및 광 검출기의 사이간격을 충분히 확보하는 방법에 비하여 실리콘 기판의 크기를 감소시켜 최종 모듈의 크기를 약 $50\%$ 감소시킬 수 있다는 장점이 있다.